Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2010
11/17/2010CN101359185B Exposure apparatus, exposure method, and method for manufacturing display panel substrate
11/17/2010CN101295140B Projection optical system, exposure device and exposure method
11/17/2010CN101265328B Method for preparing negative photosensitive polyimide based on 2,2-di[4-(2,4-diaminophenyloxy)phenyl]hexafluoropropane
11/17/2010CN101241317B Exposure apparatus and method for producing device
11/17/2010CN101231477B Exposure apparatus and method for producing device
11/17/2010CN101231476B Exposure apparatus and method for producing device
11/17/2010CN101231472B Method of measurement, an inspection apparatus and a lithographic apparatus
11/17/2010CN101216600B Projection optical system, exposure apparatus, and exposure method
11/17/2010CN101216598B Projection optical system, exposure apparatus, and exposure method
11/17/2010CN101063813B Printing plate and method of manufacturing liquid crystal display device using the same
11/17/2010CN101021691B Lithographic apparatus and device manufacturing method
11/16/2010US7835565 System and method of providing mask defect printability analysis
11/16/2010US7835070 Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus
11/16/2010US7834982 Substrate holder and exposure apparatus having the same
11/16/2010US7834977 Lithographic apparatus and device manufacturing method
11/16/2010US7834976 Exposure apparatus and method for producing device
11/16/2010US7834213 Colorant compound and method of manufacturing the same as well as blue resist composition for use in color filter containing the same
11/16/2010US7833957 Removing solution
11/16/2010US7833696 Using curable polysilsesquioxanes having units of phenylsilanetriol, methylsilanetriol, hydrogensilanetriol, and an (poly)ether or ester-containing silanetriol; good etch selectivity to photoresist, spin coating application
11/16/2010US7833695 Methods of fabricating metal contact structures for laser diodes using backside UV exposure
11/16/2010US7833694 improved line edge roughness (LER) without sacrificing resolution; photoresists; immersion lithography; (meth)acrylic esters linked trough an alkyl chain conntect via another ester to a tricyclic lactone ring, such as 2,6-norbornane carbolactone
11/16/2010US7833693 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity
11/16/2010US7833692 Amine-arresting additives for materials used in photolithographic processes
11/16/2010US7833691 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether
11/16/2010US7833690 high molecular weight acid generators for photoresists with improved compatibility with the resist polymer matrix to solve problems such as phase separation, nonuniform acid distribution; for extreme ultraviolet (EUV) lithography; e.g. triphenylsulfonium 4-(methacryloxy)benzenesulfonate
11/16/2010US7833689 Comprising a support and an image-recording layer containing at least one infrared absorbing agent of a cyanine dye in which a HOMO energy level of each of substituents present on both terminal nitrogen atoms is -10.0 eV or higher;(HOMO=Highest Occupied Molecular Orbitals); directly developed on printer
11/16/2010US7833612 Substrate for inkjet printing and method of manufacturing the same
11/16/2010US7833598 Splittable sheet structure
11/16/2010US7832333 Housing and method for making the same
11/11/2010WO2010129319A2 Self-assembly of lithographically patterned polyhedral nanostructures and formation of curving nanostructures
11/11/2010WO2010128969A1 Functionalized perfluoropolyether material as a hydrophobic coating
11/11/2010WO2010128597A1 Vibration control apparatus, vibration control method, exposure apparatus, and device production method
11/11/2010WO2010128027A1 Optical imaging with reduced immersion liquid evaporation effects
11/11/2010WO2010127943A1 Resist stripping compositions and methods for manufacturing electrical devices
11/11/2010WO2010127942A1 Resist stripping compositions and methods for manufacturing electrical devices
11/11/2010WO2010127941A1 Resist stripping compositions and methods for manufacturing electrical devices
11/11/2010WO2010127831A1 Bandwidth narrowing module for setting a spectral bandwidth of a laser beam
11/11/2010WO2010104603A3 Radiation curable resin composition and rapid three-dimensional imaging process using the same
11/11/2010WO2010056349A3 Large area patterning of nano-sized shapes
11/11/2010WO2010047833A3 Fluid transport and dispensing
11/11/2010US20100285412 Method for fabricating 3d microstructure
11/11/2010US20100285411 Micro-fluid ejection devices with a polymeric layer having an embedded conductive material
11/11/2010US20100285410 Method For Manufacturing A Semiconductor Device Using A Modified Photosensitive Layer
11/11/2010US20100285409 Method for manufacturing semiconductor device
11/11/2010US20100285408 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
11/11/2010US20100285407 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
11/11/2010US20100285406 Ablatable elements for making flexographic printing plates
11/11/2010US20100285405 Radiation-sensitive resin composition
11/11/2010US20100285404 Method for producing polyamide and resin composition
11/11/2010US20100285400 Position detecting apparatus, position detecting method, exposure apparatus and device manufacturing method
11/11/2010US20100285399 Wafer edge exposure unit
11/11/2010US20100285398 Tamper indicating article
11/11/2010US20100284511 Zone-optimized mirrors and optical systems using same
11/11/2010US20100284008 Method of Determining Overlay Error and a Device Manufacturing Method
11/11/2010US20100283986 Stage unit, exposure apparatus, and exposure method
11/11/2010US20100283052 Metrology Systems and Methods for Lithography Processes
11/11/2010US20100282505 Method for producing conductive film and light-sensitive material for conductive film production
11/11/2010DE102008043324B4 Optische Anordnung zur dreidimensionalen Strukturierung einer Materialschicht Optical arrangement for three-dimensional structure of a material layer
11/11/2010DE10063066B4 Iodoniumsalze als latente Säurespender Iodonium salts as latent acid donors
11/10/2010EP2249378A1 Stage device and method for cleaning stage
11/10/2010EP2249206A1 Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition
11/10/2010EP2249205A1 Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
11/10/2010EP2249204A1 Silicon-containing resist underlayer film-forming composition containing cyclic amino group
11/10/2010EP2248778A1 Microprocessing of synthetic quartz glass substrate
11/10/2010EP2248655A1 Optical element, roller type nanoimprinting apparatus, and process for producing die roll
11/10/2010EP2247968A1 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
11/10/2010EP2137140B1 Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof
11/10/2010EP1404795B1 Microelectronic cleaning compositions containing ammonia-free fluoride salts
11/10/2010EP1381656B1 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
11/10/2010CN201628844U Rotary screen photo-sensitive resists cleaning device
11/10/2010CN201628843U Positioning device for green oil exposure alignment
11/10/2010CN201628842U External manual exposure machine
11/10/2010CN201628841U Motor rotating table of spin coater
11/10/2010CN201628840U Liquid plate-making machine
11/10/2010CN1908819B Developing treatment apparatus and developing treatment method
11/10/2010CN1866128B 压印光刻 Imprint lithography
11/10/2010CN1854133B Heterocycle-bearing onium salts
11/10/2010CN1818796B Light-intensity data bus system and bus controller
11/10/2010CN1760757B Radioactivity sensitive resin composition
11/10/2010CN1704847B Light shield and method for making inclined reflection bumpers by using the same
11/10/2010CN1591183B Image recording material and planographic printing plate
11/10/2010CN101884017A Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method
11/10/2010CN101884016A Lithography system, method of clamping and wafer table
11/10/2010CN101884015A Resist underlayer film forming composition and method for forming resist pattern
11/10/2010CN101884014A Imageable elements with components having 1h-tetrazole groups
11/10/2010CN101884013A Photoresist compositions and method for multiple exposures with multiple layer resist systems
11/10/2010CN101882580A Strip with reduced low-K dielectric damage
11/10/2010CN101881930A Lithographic appartus and device manufacturing method
11/10/2010CN101881929A Method for preparing rinse-free negative image CTP plate
11/10/2010CN101881928A Method for preparing film-free positive image PS plate
11/10/2010CN101881927A Method for preparing inverted trapezoid-shaped photoresist section
11/10/2010CN101881926A Method for coating mask body of SiO2 on glass substrate
11/10/2010CN101881925A Method for copying micro-nano structure on any three-dimensional curve
11/10/2010CN101881880A Micro-mirror structure and manufacturing method thereof
11/10/2010CN101881847A Method and device for manufacturing lenticulation
11/10/2010CN101881844A Girdle photon sieve and manufacturing method thereof
11/10/2010CN101880352A Copolymer for gap filling material composition, preparation method thereof and gap filling material composition for antireflective coating layer
11/10/2010CN101609266B Field measurement device of wave aberration of projection objective in photo-etching machine
11/10/2010CN101599434B Fabricating method of semiconductor device
11/10/2010CN101587833B Method for removing residual photoresist
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