Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2010
11/24/2010CN101164015B Liquid immersion lithography system comprising a tilted showerhead
11/24/2010CN101154055B Method and apparatus for angular-resolved spectroscopic lithography characterization
11/24/2010CN101142530B Positive-working photoresist composition for thick film formation
11/24/2010CN101133096B Carboxyl group-containing polyurethane and thermosetting resin composition using the same
11/24/2010CN101037422B Phenothiazine double-photon photoacid initiator and preparation method thereof
11/24/2010CN101020869B Cleaning agent for slit type coater, slit type coater for manufacturing display device, and method for manufacturing display device
11/23/2010US7840057 Simultaneous computation of multiple points on one or multiple cut lines
11/23/2010US7839489 Assembly of a reticle holder and a reticle
11/23/2010US7838957 Semiconductor device having a plurality of photoelectric conversion elements, a transfer transistor, an amplifying transistor, a reset transistor, and a plurality of wirings defining an aperture of the photoelectric conversion elements
11/23/2010US7838606 Purifying an addition polymerization reaction mixture by precipitation and filtration steps in a hermetically-closable single vessel divided by a filter; using a poor solvent for feeding; backwashing of filter; temperature control; high efficiency and good quality reproducibility; stable quality
11/23/2010US7838571 camphorquinone or 2,2-dimethoxy-2-phenylacetophenone as initiator; thiol monomer and vinyl monomer; pentaerythritol tetramercaptopropionate and Triallyl-1,3,5-triazine-2,4,6-trione; polythiol-polyene polymer; shrinkage inhibition
11/23/2010US7838466 Device for chemical and biochemical reactions using photo-generated reagents
11/23/2010US7838209 forming a design on a semiconductor devices, integrated circuits; at least two irradiation steps; second irradiation step are defocused compared to the first irradiation
11/23/2010US7838206 stripping and removing a resist at the center portion of the surface and supplying a protective fluid which protects the center portion from the organic solvent; stripping resist no longer required on semiconductor wafer, liquid crystal display devices
11/23/2010US7838205 Utilization of electric field with isotropic development in photolithography
11/23/2010US7838202 disposing the photo mask between the UV light source and the substrate, wherein the UV light-blocking portion blocks the UV light from being incident onto the top surfaces of the banks; irradiating the substrate and the banks with UV light; depositing ink into the spaces and curing the ink
11/23/2010US7838201 Method for manufacturing a semiconductor device
11/23/2010US7838200 Photoresist compositions and method for multiple exposures with multiple layer resist systems
11/23/2010US7838199 Photosensitive acid generators ; photoresist imaged at short wavelengths
11/23/2010US7838198 an acrylic lactone termpolymer , a thermal carbamate base generator, a photosensitive acid generator ((trifluoro-methylsulfonyloxy)-bicyclo[2.2.1]hept-5-ene-2,3 -dicarboxyimide); polymer has the properties of being soluble in a first solvent and becoming insoluble after heating the polymer
11/23/2010US7838197 Photosensitive composition
11/23/2010US7838196 a soft mold includes a hydrophilic liquid prepolymer ( 2-hydroxyethyl acrylate, ethylene glcyol dimethacrylate etc.) , a photoinitiator "irgacure" tradename and ( fluoroalkyloxy terminated polyoxyethylene glycol or an adduct ) as a surface active agent; curing, detechingl; cured hydrophilic resist
11/23/2010US7838195 Planar test substrate for non-contact printing
11/23/2010US7838184 Azo dye with substituted pyrazole and a diamino benzene; sharp absorption and excellent fastness
11/23/2010US7838177 Photolithography using extreme ultraviolet radiation especially light having wavelength in a soft X-ray region, a reflection type photomask and a reflection type photomask blank
11/23/2010US7837921 coating a surface of the mold with a volume of surfactant containing solution which includes a fluorinated hydrophobic component providing a contact angle with a magnitude that is less than about 20 degrees with respect to the polymerizable monomers ( vinyl ethers); imprint lithography
11/23/2010US7837459 Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning
11/23/2010CA2387427C Composite relief image printing elements
11/23/2010CA2387424C Uv-absorbing support layers and flexographic printing elements comprising same
11/18/2010WO2010132071A1 Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers
11/18/2010WO2010131781A1 Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
11/18/2010WO2010131774A1 Optical apparatus, exposure apparatus, exposure method, and method for producing device
11/18/2010WO2010131649A1 Photosensitive resin composition, dry film and cured product of same, and printed wiring board using these materials
11/18/2010WO2010131592A1 Exposure apparatus, exposure method and device fabricating method
11/18/2010WO2010131490A1 Exposure apparatus and device manufacturing method
11/18/2010WO2010131485A1 Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method
11/18/2010WO2010131258A1 Clay nanocomposite forming microcapsule useful for guest encapsulation and process thereof
11/18/2010WO2010130963A1 Method of nanostructuring a film or a wafer of material of the metal oxide or semi-conductor type
11/18/2010WO2010130673A1 Inspection method for lithography
11/18/2010WO2010130600A1 Inspection method for lithography
11/18/2010WO2010130516A1 Method of determining overlay error
11/18/2010WO2010101691A3 Methods of forming patterns
11/18/2010WO2010098352A9 Process for producing porous quartz glass object, and optical member for euv lithography
11/18/2010WO2010061977A3 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method
11/18/2010US20100292826 Reticle manipulation device
11/18/2010US20100291491 Resist pattern slimming treatment method
11/18/2010US20100291490 Resist pattern slimming treatment method
11/18/2010US20100291489 Exposure methods for forming patterned layers and apparatus for performing the same
11/18/2010US20100291488 Manufacturing method for multilayer core board
11/18/2010US20100291487 Silicon-containing resist underlayer film forming composition having urea group
11/18/2010US20100291486 Method of manufacturing carbon nanotube device array
11/18/2010US20100291485 Nanoscale molecule synthesis
11/18/2010US20100291484 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition
11/18/2010US20100291483 Resist underlayer film forming composition containing branched polyhydroxystyrene
11/18/2010US20100291479 Method for fabricating color filter layer
11/18/2010US20100291478 Etching method and photomask blank processing method
11/18/2010US20100291477 Pattern forming method, pattern designing method, and mask set
11/18/2010US20100291476 Patterning A Single Integrated Circuit Layer Using Automatically-Generated Masks And Multiple Masking Layers
11/18/2010US20100291475 Silicone Coating Compositions
11/18/2010US20100291466 Diffusion media formed by photopolymer based processes
11/18/2010US20100291357 Hydrogels and methods for producing and using the same
11/18/2010US20100291355 Uv-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
11/18/2010US20100290737 Optical wavelength division multiplexed multiplexer/demultiplexer for an optical printed circuit board and a method of manufacturing the same
11/18/2010US20100290101 Light screening device and manufacturing method thereof
11/18/2010US20100290023 Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
11/18/2010US20100290015 Ex-situ removal of deposition on an optical element
11/18/2010US20100290014 Supporting plate, stage device, exposure apparatus, and exposure method
11/18/2010US20100290013 Immersion Lithographic Apparatus and a Device Manufacturing Method
11/18/2010US20100289034 Method for forming lens, method for manufacturing semiconductor apparatus, and electronic information device
11/18/2010US20100289019 Patterning devices using fluorinated compounds
11/18/2010US20100288643 Method for manufacturing electroformed mold, electroformed mold, and method for manufacturing electroformed parts
11/18/2010US20100288614 Lightguides having light extraction structures providing regional control of light output
11/17/2010EP2251896A1 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method
11/17/2010EP2251742A1 Composition for forming resist underlayer film and method for forming resist pattern using the same
11/17/2010EP2251199A1 Method for preparing a printing form from a sleeve
11/17/2010EP2251195A1 Lithographic printing plate precursor
11/17/2010EP2250535A1 Debris mitigation device with rotating foil trap and drive assembly
11/17/2010EP2250534A1 Laser processing a multi-device panel
11/17/2010EP2250533A2 Array and cantilever array leveling
11/17/2010EP2250020A2 Critical dimension control during template formation
11/17/2010EP1720966B1 Nanoelectronic and microelectronic cleaning compositions
11/17/2010EP1641908B1 Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate
11/17/2010EP1493061B1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
11/17/2010EP1483623B1 Solvent resistent copolymers
11/17/2010EP1252691B1 Wavemeter for gas discharge laser
11/17/2010EP1157407B1 Methods utilizing scanning probe microscope tips
11/17/2010CN201638004U Screen drier and system
11/17/2010CN201638003U Laser direct-write device for manufacturing of panel circuit
11/17/2010CN1952777B Imprint method, imprint apparatus, and process for producing chip
11/17/2010CN1818799B Surface processing and forming method of photoresist layer
11/17/2010CN1595300B Method for exposing a substrate and lithographic projection apparatus
11/17/2010CN101889247A Composition for forming base film for lithography and method for forming multilayer resist pattern
11/17/2010CN101887219A Lithography apparatus, immersion projection apparatus, and method of manufacturing device
11/17/2010CN101887218A Mask knife edge moving device of photo-etching machine
11/17/2010CN101887217A Exposure apparatus
11/17/2010CN101887216A Color composition for color filter, color filter using the composition and liquid crystal display device
11/17/2010CN101887214A Method for preparing fine metal mask bushing by wet etching
11/17/2010CN101887199A Liquid crystal display and manufacturing method thereof
11/17/2010CN101452228B Automatic aligner
11/17/2010CN101398315B Method for producing cylinder grid pitch changing grating