| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/25/2010 | WO2010134645A2 Exposure apparatus, exposure method, and device manufacturing method |
| 11/25/2010 | WO2010134644A1 Movable body apparatus, exposure apparatus and method, and device manufacturing method |
| 11/25/2010 | WO2010134643A2 Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method |
| 11/25/2010 | WO2010134640A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 11/25/2010 | WO2010134639A1 Method for formation of resist pattern, and developing solution |
| 11/25/2010 | WO2010134623A1 Cleaning method, exposure method, and device manufacturing method |
| 11/25/2010 | WO2010134550A1 Method for manufacturing optical elements |
| 11/25/2010 | WO2010134549A1 Photosensitive resin composition |
| 11/25/2010 | WO2010134513A1 Resist composition |
| 11/25/2010 | WO2010134487A1 Wavefront measuring method and device, and exposure method and device |
| 11/25/2010 | WO2010134477A1 Radiation-sensitive resin composition and compound |
| 11/25/2010 | WO2010134314A1 Photocurable heat-curable resin composition, dry film and cured product of the composition, and printed wiring board utilizing those materials |
| 11/25/2010 | WO2010134207A1 Positive photosensitive resin composite, curing film, protective film, interlayer insulating film, and semiconductor device and display element us |
| 11/25/2010 | WO2010133231A1 Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement |
| 11/25/2010 | WO2010091045A3 Non-fluoride containing composition for the removal of polymers and other organic material from a surface |
| 11/25/2010 | WO2010088274A3 Device, system, and method for multidirectional ultraviolet lithography |
| 11/25/2010 | WO2010085751A3 Apparatus and method for culturing stem cells |
| 11/25/2010 | US20100297851 Compositions and methods for multiple exposure photolithography |
| 11/25/2010 | US20100297564 Polymerizable fluorine-containing monomer, fluorine-containing polymer and method of forming resist pattern |
| 11/25/2010 | US20100297563 Resist-modifying composition and pattern forming process |
| 11/25/2010 | US20100297562 Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method |
| 11/25/2010 | US20100297561 Lithographic apparatus and device manufacturing method |
| 11/25/2010 | US20100297560 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 11/25/2010 | US20100297559 Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board |
| 11/25/2010 | US20100297558 Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom |
| 11/25/2010 | US20100297557 Coating compositions suitable for use with an overcoated photoresist |
| 11/25/2010 | US20100297556 Coating compositions suitable for use with an overcoated photoresist |
| 11/25/2010 | US20100297555 Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition |
| 11/25/2010 | US20100297554 Resist-modifying composition and pattern forming process |
| 11/25/2010 | US20100297553 Positive resist composition and pattern-forming method using the same |
| 11/25/2010 | US20100297552 Resist film forming method |
| 11/25/2010 | US20100297551 Process for producing photoresist polymeric compounds |
| 11/25/2010 | US20100297550 Compositions comprising sulfonamide material and processes for photolithography |
| 11/25/2010 | US20100297549 Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography |
| 11/25/2010 | US20100297542 Sulphonium salt initiators |
| 11/25/2010 | US20100297541 Sulphonium salt initiators |
| 11/25/2010 | US20100297540 Sulphonium salt initiators |
| 11/25/2010 | US20100297539 Antireflective hard mask compositions |
| 11/25/2010 | US20100297538 Holographic Reticle and Patterning Method |
| 11/25/2010 | US20100297439 Photosensitive adhesive resin composition, adhesive film and light-receiving device |
| 11/25/2010 | US20100297398 Lithography Masks and Methods of Manufacture Thereof |
| 11/25/2010 | US20100296381 Apparatus and Method to Store Information in a Holographic Data Storage Medium |
| 11/25/2010 | US20100296182 Optical element position adjusting mechanism and optical element position adjusting method, exposure apparatus using same, and device manufacturing method |
| 11/25/2010 | US20100295762 Display apparatus including an optical plate and method of manufacturing the same |
| 11/25/2010 | US20100295633 Electromagnetic bandgap pattern structure, method of manufacturing the same, and security product using the same |
| 11/25/2010 | US20100295190 Photosensitive adhesive composition, film-like adhesive, adhesive sheet, method for forming adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device and method for manufacturing semiconductor device |
| 11/25/2010 | US20100294955 Method and system of monitoring e-beam overlay and providing advanced process control |
| 11/25/2010 | DE19935558B4 Verfahren zur Erzeugung von Strukturen in einem Substrat im Nanometerbereich A process for the production of structures in a substrate in the nanometer range |
| 11/25/2010 | DE102010028941A1 Optical arrangement device i.e. microlithography projection exposure system device, has coupling elements applying pressing force into contact points and comprising force components exceeding weight of optical element |
| 11/25/2010 | DE102009045491A1 Illumination lens for illumination of object field of projection lens of illumination system for extreme UV-projection microlithography during manufacturing e.g. nano structured component, has aperture shading distribution of facets |
| 11/25/2010 | DE102009029673A1 Manipulator for positioning optical element i.e. reflector, in projection exposure system, has actuators for moving reflector in spatial degree of movement, where one of actuators has coupling element connected with reflector |
| 11/24/2010 | EP2253997A2 Illumination system for a microlithographic contact and proximity exposure apparatus |
| 11/24/2010 | EP2253996A1 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition |
| 11/24/2010 | EP2253674A1 Azo pigment, pigment dispersion, coloring composition, and inkjet recording ink |
| 11/24/2010 | EP2253647A1 Novel resins and photoresist compositions comprising same |
| 11/24/2010 | EP2252915A1 Resist composition and pattern forming method using the same |
| 11/24/2010 | EP2252857A1 Method and arrangement for displacement |
| 11/24/2010 | EP2252725A1 Single phase fluid imprint lithography method |
| 11/24/2010 | EP1861751B1 Positive-working photoresist composition for thick film formation |
| 11/24/2010 | EP1688793B1 Chemically amplified photosensitive resin composition for forming a thick film or ultrathick film |
| 11/24/2010 | EP1643543B1 Exposure apparatus and method for manufacturing device |
| 11/24/2010 | EP1542078B1 Composition for antireflection coating and method for forming pattern |
| 11/24/2010 | EP1452918B1 Positive resist composition and method of forming resist pattern |
| 11/24/2010 | EP1305984B1 Method and apparatus for generating x-ray radiation |
| 11/24/2010 | CN201654459U PS plate whirler device |
| 11/24/2010 | CN201654458U Printing plate drying device |
| 11/24/2010 | CN201654457U Liquid recovery device and developing apparatus |
| 11/24/2010 | CN201654456U Figure development device for manufacturing TFT (Thin Film Transistor) high-precision circuit |
| 11/24/2010 | CN201654455U Power spray device for PS plates |
| 11/24/2010 | CN201654454U TFT high-precision graph photographic mask exposure device |
| 11/24/2010 | CN201654453U Digital photolithography device for optical fiber end face micro-optical device |
| 11/24/2010 | CN201654452U Original PS plate with air guide layer |
| 11/24/2010 | CN201654451U Optical adjuster of excimer laser micro-machining system |
| 11/24/2010 | CN201654269U Making device of arbitrary chirp optical fiber grating |
| 11/24/2010 | CN1916603B Method and apparatus for angular-resolved spectroscopic lithography characterisation |
| 11/24/2010 | CN1856742B Photosensitive element, method of forming resist pattern, and process for producing printed wiring board |
| 11/24/2010 | CN1842741B Chemical amplification photoresist composition, photoresist layer laminate, method for producing photoresist composition, method for producing photoresist pattern and method for producing connecting t |
| 11/24/2010 | CN1828411B Photosensitive resin composition |
| 11/24/2010 | CN1512273B Mask box and method for transport light etched mask in box and scanning mask in box |
| 11/24/2010 | CN101896869A Illumination optics for microlithography |
| 11/24/2010 | CN101896868A Two-photon stereolithography using photocurable compositions |
| 11/24/2010 | CN101896537A Alkali-developable curable composition, insulating thin film using the same, and thin film transistor |
| 11/24/2010 | CN101894827A Test wafer for gluing and edge cleaning detection |
| 11/24/2010 | CN101894792A Method for forming metal patterns by stripping |
| 11/24/2010 | CN101894767A Manufacturing method of bump bottom metal layer |
| 11/24/2010 | CN101894756A Groove formation method, metal wire formation method, photoetching method and equipment |
| 11/24/2010 | CN101894754A Developing method in wafer etching process |
| 11/24/2010 | CN101894751A Method of removing photoresist |
| 11/24/2010 | CN101894736A Coating developing machine |
| 11/24/2010 | CN101893827A Lithographic apparatus and device manufacturing method |
| 11/24/2010 | CN101893826A Photosensitive circuit board making method and circuit board making machine |
| 11/24/2010 | CN101893825A Tunable wavelength illumination system |
| 11/24/2010 | CN101893824A Negative resist composition, patterning process, and testing process and preparation process of negative resist composition |
| 11/24/2010 | CN101893823A Method for preventing damage of photoresist layer graph |
| 11/24/2010 | CN101893525A Centrifugal double-channel trace liquid quantitative sampling device and manufacturing method thereof |
| 11/24/2010 | CN101891999A Water soluble photosensitive fluorescent powder coating and method for making anode fluorescent powder layer by same |
| 11/24/2010 | CN101891888A Diphenol divinyl ether acetal polymer and preparation method thereof |
| 11/24/2010 | CN101891845A Application of carbazole oxime ester compound serving as photoinitiator in photopolymerisable acrylate composition |
| 11/24/2010 | CN101891612A Compound and chemically amplified positive resist composition |
| 11/24/2010 | CN101223265B Release agent composition |