Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/01/2010EP1677341B1 Exposure apparatus, exposure method, and method for manufacturing device
12/01/2010CN201662945U Marking structure of light-transmission base plate and manufacturing device thereof
12/01/2010CN1987663B Light resistance washing agent
12/01/2010CN1983026B Polymer for hardmask of semiconductor device and composition containing the same
12/01/2010CN1977220B Lower layer film forming composition for lithography including naphthalene ring having halogen atom
12/01/2010CN1977218B Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head
12/01/2010CN1971418B Photosensitive resin precursor composition
12/01/2010CN1954007B Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate
12/01/2010CN1949081B A lithographic apparatus
12/01/2010CN1896870B Positive PS-process photosensitive coating liquid for high-speed vehicle coating
12/01/2010CN1847980B Low voltage treating device
12/01/2010CN1808267B Mask, manufacturing method and application thereof
12/01/2010CN1800981B Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel
12/01/2010CN1758138B Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets
12/01/2010CN1609638B Color filter composition, and method and device for manufacturing color filter using the same
12/01/2010CN1577106B Lithographic apparatus and device manufacturing method
12/01/2010CN1577088B 感光性树脂前体组合物 The photosensitive resin precursor composition
12/01/2010CN101903832A Diffraction based overlay metrology tool and method
12/01/2010CN101903831A A method for preparing lithographic printing plate precursors
12/01/2010CN101903830A Process for imaging a photoresist coated over an antireflective coating
12/01/2010CN101903808A Grating for euv-radiation, method for manufacturing the grating and wavefront measurement system
12/01/2010CN101900956A Process for removing material from substrates
12/01/2010CN101900955A Film cleaning agent and using method thereof
12/01/2010CN101900954A Slope monitoring method for post-exposure baking (PEB) hot plate of developer
12/01/2010CN101900953A Compositions comprising block polymer and processes for photolithography
12/01/2010CN101900952A Mask aligner mask platform adopting magnetic suspension technology
12/01/2010CN101900951A Lithographic apparatus and device manufacturing method
12/01/2010CN101900950A Pattern exposure method, conductive film producing method, and conductive film
12/01/2010CN101900949A Fluid handling structure, lithographic apparatus and device manufacturing method
12/01/2010CN101900948A Pulse stretcher with reduced energy density on optical components
12/01/2010CN101900947A Method for forming exposure pattern
12/01/2010CN101900946A Detection method and system of zero mark exposure
12/01/2010CN101900945A Overlay error compensation method
12/01/2010CN101900944A Coating compositions suitable for use with an overcoated photoresist
12/01/2010CN101900943A Coating compositions suitable for use with an overcoated photoresist
12/01/2010CN101900942A Resist composition
12/01/2010CN101900941A High-fluorine negative photoresist and application thereof to polymer optical waveguide device
12/01/2010CN101900940A Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method
12/01/2010CN101900939A Negative resist composition and patterning process using the same
12/01/2010CN101900938A Apparatus and method for providing resist alignment marks in a double patterning lithographic process
12/01/2010CN101900937A Imprint lithography method and apparatus
12/01/2010CN101900936A Impression mould and production method thereof
12/01/2010CN101900935A Ultraviolet impressing method and device thereof
12/01/2010CN101900932A Multi-gradation photomask and method of manufacturing the same, and pattern transfer method
12/01/2010CN101900862A Axial jog adjustment device for optical element in projection objective system
12/01/2010CN101900844A Method for reactive ion beam etching of blazed convex grating
12/01/2010CN101900842A Mold core and manufacturing method of micro-optical lens array
12/01/2010CN101899241A Pigment dispersion for color filter and pigment dispersed resist composition for color filter containing the same
12/01/2010CN101899027A Salt and photoresist composition containing the same
12/01/2010CN101898988A Salt and photoresist composition containing the same
12/01/2010CN101898987A Salt and photoresist composition containing the same
12/01/2010CN101898984A Salt and photoresist composition containing the same
12/01/2010CN101615561B Process wall for glue spreading development equipment
12/01/2010CN101571676B Photoetching machine wafer stage dual-stage switching system
12/01/2010CN101556437B Method of lithography patterning
12/01/2010CN101556412B Bidirectional visual array baseplate, color film baseplate, liquid crystal display device and manufacturing method
12/01/2010CN101551598B Double-stage switching system of photoetching machine wafer stage
12/01/2010CN101546131B Output-image geometric-error correction method based on laser photoplotters
12/01/2010CN101546008B Color filter and manufacturing method thereof
12/01/2010CN101452224B Recovery system for tetramethylammonium hydroxide developing solution and method thereof
12/01/2010CN101431015B Plasma surface treatment to prevent pattern collapse in immersion lithography
12/01/2010CN101419910B Apparatus for fabricating semiconductor device and method thereof
12/01/2010CN101364092B Bottle body locking device, liquid management system and method thereof
12/01/2010CN101349876B Immersion lithographic apparatus and device manufacturing method
12/01/2010CN101331433B Method of making a lithographic printing plate
12/01/2010CN101311834B Knife jet apparatus capable of providing uniform fluid water-curtain to substrate
12/01/2010CN101253454B Photosensitive composition for volume hologram recording
12/01/2010CN101246307B Method for manufacturing autogram template by semiconductor technology and autogram template manufactured by the same
12/01/2010CN101246225B Aspheric lens structures fabrication methods
12/01/2010CN101241306B Hologram recording material, process for producing the same and hologram recording medium
12/01/2010CN101201554B Lithographic device manufacturing method, lithographic cell
12/01/2010CN101164016B Non-aqueous photoresist stripper that inhibits galvanic corrosion
12/01/2010CN101158809B Sub-wavelength micro-nano structure using polystyrol ball to focused photoetching form
12/01/2010CN101154031B Method of forming hardmask pattern of semiconductor device
12/01/2010CN101144980B Photosensitive resin plate support and process for preparing the same
12/01/2010CN101131547B Apparatus and method for treating substrates
12/01/2010CN101083208B Apparatus and method for processing substrate
12/01/2010CN101078882B Apparatus and method for measuring widthwise ejection uniformity of slit nozzle
12/01/2010CN101078881B Apparatus and method for measuring widthwise ejection uniformity of slit nozzle
12/01/2010CN101076759B Cleaning liquid for lithography and method for resist pattern formation
12/01/2010CN101063829B Overlay measuring method and overlay measuring apparatus using the same
12/01/2010CN101055419B Ultraviolet photo-cured radical type etching glue for micro nano structure imprinting and copying
12/01/2010CN101042531B Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
11/2010
11/30/2010US7843552 Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto
11/30/2010US7843550 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method
11/30/2010US7843532 Liquid crystal display panel with color filters and method of fabricating the same
11/30/2010US7843480 Image-recording device for generating a number of image spots in projection line
11/30/2010US7842935 Raster frame beam system for electron beam lithography
11/30/2010US7842933 System and method for measuring overlay errors
11/30/2010US7842525 Method and apparatus for personalization of semiconductor
11/30/2010US7842452 increasing its solubility in an alkaline developer under action of an acid generator; prevent development defect after development in immersion photolithography; silicon-free resin is a copolymer of trimethylsilanol modified methacrylic acid-methyl methacrylate; semiconductors
11/30/2010US7842451 Method of forming pattern
11/30/2010US7842450 forming an intermediate material layer on a first mask pattern on a target layer, and forming a second mask pattern on the intermediate material layer; patterning the target layer using the first and second mask patterns as patterning masks
11/30/2010US7842441 Norbornene polymer for photoresist and photoresist composition comprising the same
11/30/2010US7842440 Colored curable composition, color filter and manufacturing method thereof
11/30/2010US7842436 for semiconductor integrated circuits; improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern
11/30/2010US7842351 Oxirane derivative, epoxy, vinyl ether, oxetane compound; generates an acid by irradiation; pigment, oil soluble dye coloring agent; hydrophobic image on the support by irradiating the ejected ink composition with actinic radiation to cure the ink; directly make planographic printing plate by inkjet
11/30/2010US7842350 Method and apparatus for coating a photosensitive material
11/30/2010US7841278 Method and apparatus for treating a re-imageable printing form, machine for processing printing material and method for treating a surface making contact with printing material
11/25/2010WO2010135120A2 Selective self-aligned double patterning of regions in an integrated circuit device
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