Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/08/2010CN101183212B Optical tool and method for forming soldering-resistant pattern
12/08/2010CN101162306B Liquid crystal display device and manufacturing method thereof
12/08/2010CN101151559B Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same
12/08/2010CN101144978B Method for forming microlens array structure
12/08/2010CN101123192B Method of fabricating lateral double diffused metal oxide semiconductor field effect transistor
12/08/2010CN101121348B Ink-jetting pattern transfer producing process and its device
12/08/2010CN101109906B Methods of determining quality of a light source applied in photolithography process
12/08/2010CN101093349B Apparatus and method of fabricating thin film pattern
12/08/2010CN101069129B Radiation-curable coating substances
12/08/2010CN101002140B Apparatus and method for maintaining immersion fluid in the gap under the projection lens in a lithography machine
12/08/2010CN101000463B System, method, and apparatus for membrane, pad, and stamper architecture
12/07/2010US7848594 Measurement method, transfer characteristic measurement method, adjustment method of exposure apparatus, and device manufacturing method
12/07/2010US7847926 Defining a pattern on a substrate
12/07/2010US7847921 Microlithographic exposure method as well as a projection exposure system for carrying out the method
12/07/2010US7847920 Illumination system and polarizer for a microlithographic projection exposure apparatus
12/07/2010US7847916 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
12/07/2010US7847272 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
12/07/2010US7847003 Use in making liquid crystal displays (LCD); acrylic copolymer with N-substituted maleimide units, a photosensitizer comprising the reaction product of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and a trisphenol compound, and a crosslinking agent comprising a cyclohexene oxide; heat resistance
12/07/2010US7846988 CYCLIC TRIMETHYLOLPROPANE FORMAL ACRYLATE monomer such as SR531, an amine modified epoxy diacrylate oligomer such as Ebecryl 3703, pentaerythritol triacrylate, tetrahydrofurfuryl acrylate , pigment, photoinitiators and methyl ethyl ketone solvent; durable low viscosity ink jet ink for printing golf ball
12/07/2010US7846984 recycling ultraviolet curing resins that are in a colored, uncured state to reduce both cost and environmental burden; decoloring the ultraviolet curing resin by irradiating light having a wavelength near the maximum absorption wavelength of the coloring material; making DVD-R, CD-Rs
12/07/2010US7846851 Method and apparatus for a two-step resist soft bake to prevent ILD outgassing during semiconductor processing
12/07/2010US7846765 Use of polyimide with maleic anhydride end groups, and units of a heteroaryl-substituted monomer such as 2,2-bis(3-amino-4-(3-pyrid-4ylpropoxy)phenyl)hexafluoropropane, a crosslinking agent such as dipentaerythritol hexaacrylate, and a photoinitiator; form a fine pattern, without complicated photoresist
12/07/2010US7846648 Supplying a developing solution to develop the resist film formed on the substrate; supplying a treatment solution to the substrate to dissolve the base film at a portion exposed by the development of the resist film
12/07/2010US7846647 Method of producing pattern-formed structure and photomask used in the same
12/07/2010US7846646 Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method
12/07/2010US7846645 Method and system for reducing line edge roughness during pattern etching
12/07/2010US7846644 Photopatternable deposition inhibitor containing siloxane
12/07/2010US7846642 Direct incident beam lithography for patterning nanoparticles, and the articles formed thereby
12/07/2010US7846641 free of laser irradiation defect; thin film layer of antimony doped tin oxide or mixed oxides of tin and iridium; thin film layer is irradiated with an excimer laser light or a YAG laser light
12/07/2010US7846640 quaternaryammonium having a lower alkyl or a lower hydroxyalkyl groups as main component; anionic surfactant containing biphenyl ether having one or more metal sulfonate group and an alkyl or alkoxy group; prebaking resist layer, exposing to light, alkali developing; improved dimensional controllability
12/07/2010US7846638 Coating comprises oligomer or resin of tris(hydroxyalkyl)isocyanurate or derivative on a substrate; baking to form an antireflective coating; photoresist covering; high dry etching rate; selectivity; semiconductors
12/07/2010US7846637 Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film
12/07/2010US7846623 integrated circuit semiconductors; reflow stabilizing solution comprises a polymer, is applied after the photoresist material has been developed and patterned; provides structural and mechanical support, stable dimensions in the submicron range
12/07/2010US7846618 Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same
12/07/2010US7845930 Process for the production of a three-dimensional object with an improved separation of hardened material layers from a construction plane
12/07/2010CA2452884C Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
12/07/2010CA2385119C Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification
12/02/2010WO2010138312A1 Method and apparatus for photoimaging a substrate
12/02/2010WO2010137472A1 Water repellent additive for immersion resist
12/02/2010WO2010136304A1 Method for producing an optoelectronic semiconductor component
12/02/2010WO2010098618A3 Polymer for coating photoresist pattern, and method for forming pattern for semiconductor device using same
12/02/2010WO2010098617A3 Polymer for coating a photoresist pattern, and method for forming a pattern of a semiconductor device using same
12/02/2010WO2010093210A3 Photoactive compound and photosensitive resin composition containing the same
12/02/2010US20100304568 Pattern forming method
12/02/2010US20100304313 Process Solutions Containing Surfactants
12/02/2010US20100304312 Cleaning liquid used in photolithography and a method for treating substrate therewith
12/02/2010US20100304311 Method of producing resist pattern
12/02/2010US20100304310 Exposure apparatus, exposure method, and device manufacturing method
12/02/2010US20100304309 Method and apparatus for photoimaging a substrate
12/02/2010US20100304308 Process for thick film circuit patterning
12/02/2010US20100304307 Exposure apparatus and device manufacturing method
12/02/2010US20100304306 Flexible micro/nanofluidic devices
12/02/2010US20100304305 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group
12/02/2010US20100304304 Method for making lithographic plates
12/02/2010US20100304303 Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent
12/02/2010US20100304302 Chemically amplified resist composition and pattern forming process
12/02/2010US20100304301 Negative resist composition and patterning process using the same
12/02/2010US20100304300 Photosensitive composition and pattern-forming method using the photosensitive composition
12/02/2010US20100304299 Chemically amplified positive photoresist composition
12/02/2010US20100304298 Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method
12/02/2010US20100304297 Patterning process and resist composition
12/02/2010US20100304296 Salt and photoresist composition containing the same
12/02/2010US20100304295 Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
12/02/2010US20100304294 Salt and photoresist composition containing the same
12/02/2010US20100304293 Salt and photoresist composition containing the same
12/02/2010US20100304292 Salt and photoresist composition containing the same
12/02/2010US20100304291 Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method
12/02/2010US20100304290 Compositions and processes for photolithography
12/02/2010US20100304289 Positive resist composition and method of forming resist pattern
12/02/2010US20100304284 Thermally stable cationic photocurable compositions
12/02/2010US20100304281 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
12/02/2010US20100304280 Method of forming a template, and method of manufacturing a semiconductor device using the template
12/02/2010US20100304279 Manufacturing method of phase shift mask, creating method of mask data of phase shift mask, and manufacturing method of semiconductor device
12/02/2010US20100303673 Solar energy powered molecular engine
12/02/2010US20100303435 Optical device and method of fabricating the same
12/02/2010US20100302522 Pulse Stretcher with Reduced Energy Density on Optical Components
12/02/2010US20100302519 Lithographic apparatus and device manufacturing method
12/02/2010US20100301457 Lithography Masks, Systems, and Manufacturing Methods
12/02/2010US20100301027 System and method for cutting using a variable astigmatic focal beam spot
12/02/2010US20100300729 Pattern exposure method, conductive film producing method, and conductive film
12/02/2010DE102010017089A1 Lithographiemasken, -systeme und Herstellungsverfahren Lithography masks, systems and manufacturing processes
12/02/2010DE102009030502A1 Illumination system for microlithography-projection exposure system used during manufacturing of e.g. LCD, has aperture formed for generating preset correction of intensity distribution produced by mirror array in pupil shaping surfaces
12/02/2010DE102009029776B3 Optisches Element An optical element
12/01/2010EP2256790A2 exposure apparatus, device manufacturing method and maintenance method
12/01/2010EP2256788A1 Uv nanoimprint method, resin replica mold and method for producing the same, magnetic recording medium and method for producing the same, and magnetic recording/reproducing apparatus
12/01/2010EP2256555A1 Lithographic apparatus and device manufacturing method
12/01/2010EP2256553A1 Fluid handling structure and lithographic apparatus
12/01/2010EP2256552A1 Negative resist composition and patterning process using the same
12/01/2010EP2256551A1 Chemically amplified resist compositon and pattern forming process
12/01/2010EP2256550A1 Spin-printing of electronic and display components
12/01/2010EP2256549A1 Fabrication of Metallic Stamps for Replication Technology
12/01/2010EP2256526A1 Color filter, method for producing the same, and solid-state imaging device
12/01/2010EP2255891A1 Coat film forming method and coat film forming apparatus
12/01/2010EP2255377A2 Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography
12/01/2010EP2255252A1 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material
12/01/2010EP2255251A1 Projection objective for microlithography
12/01/2010EP2255250A1 Positive resist composition and pattern forming method using the same
12/01/2010EP2255249A1 Plate pallet alignment system
12/01/2010EP1883534B1 Regeneratable, structured plate comprising oxidation catalysts
12/01/2010EP1766737B1 Laser output beam wavefront splitter for bandwidth spectrum control
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