Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/09/2010US20100309448 Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device
12/09/2010US20100309411 Diffusion sheet and method of manufacturing the same, backlight, and liquid crystal display device
12/09/2010US20100309151 Touch panel and method for manufacturing the same
12/09/2010US20100308720 Organic electro-luminescence display device and method for fabricating the same
12/09/2010US20100308496 Method of manufacturing stamper
12/09/2010US20100308439 Dual wavelength exposure method and system for semiconductor device manufacturing
12/09/2010US20100308309 Patterning of organic semiconductor materials
12/09/2010US20100307796 Method for Selective Adsorption of Noble Metal Onto Surface of Polymer
12/09/2010US20100307683 Substrate treatment method and substrate treatment apparatus
12/09/2010US20100307360 Method for making a lithographic printing plate precursor
12/08/2010EP2259289A1 Gate insulating material, gate insulating film, and organic field effect transistor
12/08/2010EP2259141A1 Process for producing lithographic printing plate
12/08/2010EP2259140A1 Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate
12/08/2010EP2259139A1 Lithographic apparatus and device manufacturing method
12/08/2010EP2259138A2 Illumination optical system and exposure apparatus
12/08/2010EP2259137A1 Original plate for lithographic printing plate, and method for production of lithographic printing plate using the same
12/08/2010EP2259046A2 Method for synthesis of arrays of dna probes
12/08/2010EP2258741A1 Resin composition for optical components and optical component using the same
12/08/2010EP2258691A1 Coating compositions for use with an overcoated photoresist
12/08/2010EP2258543A2 Method and apparatus for controlling heating and cooling of transfer unit in precision hot press apparatus
12/08/2010EP2257969A2 Methods of patterning a conductor on a substrate
12/08/2010EP2257854A2 Multi-photon exposure system
12/08/2010EP1699073B1 Stage system, exposure apparatus and exposure method
12/08/2010CN201667001U Alignment marking part
12/08/2010CN201665469U Hanging device of PCB equipment
12/08/2010CN201663954U Ultraviolet photosensitive color-changing shoes
12/08/2010CN1996149B Lithographic apparatus and device manufacturing method
12/08/2010CN1996143B Method for cleaning dry film pressed on wafer
12/08/2010CN1975517B Display substrate, method of manufacturing the same and display panel having the same
12/08/2010CN1963669B Hologram recording material and hologram recording medium
12/08/2010CN1958629B Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
12/08/2010CN1954267B Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
12/08/2010CN1952781B Resist coating method and resist coating apparatus
12/08/2010CN1946751B Material for forming resist protection film for liquid immersion lithography and method for forming resist pattern by using the protection film
12/08/2010CN1945443B Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for fpd
12/08/2010CN1938377B Composition curable by both free-radical photocuring and cationic photocuring
12/08/2010CN1918515B Curable resin composition, color filter and liquid crystal display
12/08/2010CN1910221B 树脂和树脂组合物 Resin and the resin composition
12/08/2010CN1892439B Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method
12/08/2010CN1877447B Resist composition and using method thereof
12/08/2010CN1871562B Stage device
12/08/2010CN1828413B Light sensitive paste, roast pattern formed by using same
12/08/2010CN1806207B Photocurable compositions and flexographic printing plates comprising the same
12/08/2010CN1797202B Polarized radiation in lithographic apparatus and device manufacturing method
12/08/2010CN1700101B Focusing and leveling sensor for projection photo-etching machine
12/08/2010CN1655057B Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and uses thereof
12/08/2010CN1619423B Poltier module and manufacturing method thereof
12/08/2010CN1611495B Compound having an epoxy group and a chalcone group, method of preparing the same, and photoresist composition comprising the same
12/08/2010CN1538240B Load lock device, lithographic equipment comprising the deivce and method for making substrate
12/08/2010CN1488998B Optical etching device and manufacturing method
12/08/2010CN1443636B Optical three-dimensional moulding method and device
12/08/2010CN101910952A Resist treatment method
12/08/2010CN101910951A Scanning EUV interference imaging for extremely high resolution
12/08/2010CN101910950A Folded optical encoder and applications for same
12/08/2010CN101910949A Composition having urea group for forming silicon-containing resist underlying film
12/08/2010CN101910948A Sulfur atom-containing composition for resist underlayer film formation and method for resist pattern formation
12/08/2010CN101910947A Silicon-based hardmask composition (Si-SOH; Si-base spin-coating hardmask) and process of producing semiconductor integrated circuit device using the same
12/08/2010CN101910946A Composition for formation of anti-reflective film, and pattern formation method using the composition
12/08/2010CN101910945A Photosensitive resin composition
12/08/2010CN101910944A Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions
12/08/2010CN101910943A Layered photosensitive-resin product
12/08/2010CN101910942A Method for replicating master molds
12/08/2010CN101910941A Mask blank, production method of mask blank and production method of mask
12/08/2010CN101910817A Inspection device and inspecting method for spatial light modulator, illuminating optical system, method for adjusting the illuminating optical system, exposure device, and device manufacturing method
12/08/2010CN101909420A Method for producing conductive film and light-sensitive material for conductive film production
12/08/2010CN101908526A Alignment mark arrangement and alignment mark structure
12/08/2010CN101908470A Method and system for forming patterns in semiconductor device and semiconductor device
12/08/2010CN101907835A Detergent composition for photoresists
12/08/2010CN101907834A Vacuum developing mechanism
12/08/2010CN101907833A Optical element gravity deformation draught head compensating device in projection objective system and method thereof
12/08/2010CN101907832A Manufacturing process reaction system
12/08/2010CN101907831A Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate
12/08/2010CN101907830A Monitor method for exposure focus
12/08/2010CN101907829A Positive heat-sensitive planographic plate and manufacturing method thereof
12/08/2010CN101907828A Radiation-sensitive composition, protective film and inter layer insulating film, and process for forming the same
12/08/2010CN101907827A Positive-type photosensitive resin composition and protrusion for liquid crystal orientation control prepared from same
12/08/2010CN101907826A Positive thermosensitive imaging composition
12/08/2010CN101907825A Photoetching encrypted anti-counterfeiting method
12/08/2010CN101907781A Method for manufacturing optical flat plate with beam converging function
12/08/2010CN101907769A Silicon on insulator (SOI) wafer double-mask etching-based vertical comb teeth driven torsional micro-mirror and manufacturing method thereof
12/08/2010CN101907733A Incidence surfaces and optical windows that are solvophobic to immersion liquids
12/08/2010CN101907631A Double-liquid capillary micro-flow control valve in micro-flow control chip, and manufacturing method thereof
12/08/2010CN101906197A Method for synthesizing o-cresol novolac resin
12/08/2010CN101905209A Priming processing method and priming processing device
12/08/2010CN101625440B Method for preparing sampling grating by means of protective layer
12/08/2010CN101614920B Method for manufacturing liquid crystal display device
12/08/2010CN101551482B Color filtering disc with subwavelength grating structure and manufacturing method thereof
12/08/2010CN101526748B Memory device, method and aligning control system for photoetching aligning data detection
12/08/2010CN101526657B Adjusting device of movable lens
12/08/2010CN101493656B Exposure condition setting method, substrate processing unit and computer program
12/08/2010CN101464542B Holographic grating type 1 multiplying 2 waveguide wave separator and manufacturing method thereof
12/08/2010CN101430423B Contaminant removing method and apparatus, and exposure method and apparatus
12/08/2010CN101382712B Method for manufacturing LCD array substrate
12/08/2010CN101359215B Computer generated hologram, exposure apparatus, and device fabrication method
12/08/2010CN101359187B Synchronization triggering on-line diagnostic method and system for photoetching machine
12/08/2010CN101278237B Structure and method for simultaneously determining an overlay accuracy and pattern placement error
12/08/2010CN101266950B Method of fabricating array substrate for liquid crystal display device
12/08/2010CN101256353B Photolithography thin film evoked by probe and preparation method thereof
12/08/2010CN101201552B Illumination optical system, exposure apparatus, and exposure method
12/08/2010CN101194341B Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
1 ... 262 263 264 265 266 267 268 269 270 271 272 273 274 275 276 277 278 279 280 281 282 ... 1272