Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/15/2010CN1716094B Radiation sensitive resin composition
12/15/2010CN101918898A Lithographic apparatus, method for levelling an object, and lithographic projection method
12/15/2010CN101918897A Exposure method, exposure apparatus, and method for producing device
12/15/2010CN101918896A Composition for mold sheet and method for preparing mold sheet using same
12/15/2010CN101918496A Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution by kneading
12/15/2010CN101918397A Photoactive compound and photosensitive resin composition comprising the same
12/15/2010CN101918199A Process and freeform fabrication system for producing a three-dimensional object
12/15/2010CN101917925A Process and freeform fabrication system for producing a three-dimensional object
12/15/2010CN101917110A Linear motor magnetic shield apparatus
12/15/2010CN101916052A Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
12/15/2010CN101916051A Method for forming microelectronic structure
12/15/2010CN101916050A Lithographic apparatus and device manufacturing method
12/15/2010CN101916049A Workbench
12/15/2010CN101916048A Determining method of exposure parameter and exposure method
12/15/2010CN101916047A Photolithography exposure device for implementing off-axis illumination by using free-form surface lens
12/15/2010CN101916046A Free-form surface lens used for double ring-shaped uniform illumination
12/15/2010CN101916045A Free-form surface lens for quadripole uniform illumination
12/15/2010CN101916044A Free-form surface lens for double-quadrupole uniform illumination
12/15/2010CN101916043A Analogy method for distribution of three-dimensional light intensity compensated by heavy rubber medium in UV-light vertical photoetching technology
12/15/2010CN101916042A Multi-beam semiconductor laser interference nanoimprinting technology and system
12/15/2010CN101916041A Lithographic apparatus
12/15/2010CN101916040A Focal plane detection system and focal plane detection method suitable for projection lithography system
12/15/2010CN101916039A Manufacturing method of mask plate
12/15/2010CN101916038A Method for processing round arrays by electronic beam photo-etching
12/15/2010CN101916037A Method and apparatus for precision surface modification in nano-imprint lithography
12/15/2010CN101914307A Processed pigment and use thereof
12/15/2010CN101615562B Novel-structure glue-spreading development equipment
12/15/2010CN101452218B Submerge self-adapting gas seal device for photoetching machine
12/15/2010CN101446767B Method for measuring focus offsets of exposure tool
12/15/2010CN101308330B Two time graph exposure method utilizing developing filler material
12/15/2010CN101281378B Nanometer photolithography aligning system
12/15/2010CN101281376B Gantry type light shield cleaning device
12/15/2010CN101261930B Process for wafer backside polymer removal
12/15/2010CN101246230B Semi-permeable colorful color filter
12/15/2010CN101135855B Slit coating apparatus
12/15/2010CN101040222B Method and device for the production of photopolymerisable cylindrical jointless flexographic printing elements
12/15/2010CN101025564B Four-gradation photomask manufacturing method and photomask blank for use therein
12/15/2010CN101016634B Method of preparing metal roller with surface relief microstructure
12/15/2010CN101013270B Photomask substrate container unit, photomask substrate transportation and exposal method
12/15/2010CN101002142B Photosensitive resin composition and photosensitive film made with the same
12/14/2010US7852899 Timing control for two-chamber gas discharge laser system
12/14/2010US7852460 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
12/14/2010US7852034 Drive method of moving body, stage unit, and exposure apparatus
12/14/2010US7851551 converting poly(vinylbenzyl chloride) to poly(vinylbenzyl acetate) and hydrolyzing the poly(vinylbenzyl acetate) in the presence of a basic catalyst and pyridine solvent; use as charge blocking layer
12/14/2010US7851363 Pattern forming method and manufacturing method of semiconductor device
12/14/2010US7851141 a method of manufacturing a display includes defining larger-dimension patterns of a photoresist layer using a first photomask and a proximity exposure machine, and defining smaller-dimension patterns of the same photoresist layer using a second photomask and a stepper exposure machine; efficiency
12/14/2010US7851140 A resist for negative tone development comprising a resin increasing polarity by the action of an acid to increase the solubility in a positive tone developer and decrease the solubility in a negative tone; acid generator with actinic radiation, and a solvent; undercutting smoothness
12/14/2010US7851139 Pattern forming method
12/14/2010US7851138 Patterning a surface such as that which is operable as an air bearing surface (ABS) for use in a hard disk drive slider;a photoresist is applied to a 3-(trimethoxysilyl)propyl methacrylate (adhesion promoter) coated surface of carbon and silicon nitride; imaging and etching the surface; removal
12/14/2010US7851137 Transferring a pattern to the resist layer above the film on a substrate by using a reticle, the transfer pattern having a space with a width that becomes narrower than a smallest processing space width when transferred to the resist layer; trimming; patterning the film using the resist layer
12/14/2010US7851136 Stabilization of deep ultraviolet photoresist
12/14/2010US7851135 Method of forming an etching mask pattern from developed negative and positive photoresist layers
12/14/2010US7851134 Method for exposure of flexo printing plates
12/14/2010US7851133 Lithographic printing process
12/14/2010US7851132 Photopolymerization type photosensitive lithographic printing plate precursor
12/14/2010US7851131 Photopolymerization; polyimides; photomasks; wafers; sheets; films
12/14/2010US7851130 Sulfonium or iodonium acid generators of sulfonimide, carbonylaminosulfonyl or imido compounds of given formula; improved in the pattern profile, line edge roughness and defocus latitude depended on line pitch and resolution with actinic rays or radiation
12/14/2010US7851129 A photoresist comprising a compound in which a portion or all of hydrogen atoms of phenolic hydroxyl groups in a polyhydric phenol compound having >2 phenolic hydroxyl groups and a molecular weight of 300-2,500 are substituted with acid dissociable dissolution inhibiting groups; resolution; fineness
12/14/2010US7851128 Mixture of polyimide and acid generator; forming relief images
12/14/2010US7851127 Polymer compound, positive resist composition and resist pattern forming method
12/14/2010US7851126 Lithographic printing plate precursor and lithographic printing process
12/14/2010US7851125 Bilayer resist technolgy involving a resist pattern of self-assembled molecular layer silica formed by a sol-gel on a mask pattern with openings exposing the underlayer covering a wafer; silica layer is selectively formed on the resist pattern surface to expose the underlayer to a smaller width
12/14/2010US7851124 Composition for forming wiring protective film and uses thereof
12/14/2010US7851123 dye-containing curable composition suitable for exhibiting a cyan color and a blue color; containing an azaporphyrin base phthalocyanine compound and being excellent in heat resistance and light fastness
12/14/2010US7851122 Such as rapid prototyping and tooling; monofunctional acrylate monomers with glass transition temperature (Tg) higher than 60 degrees Celcius, and di-functional acrylate oligomers such as urethane diacrylates with Tg lower than 40 degrees Celcius; three-dimensional printing of complex structures
12/14/2010US7851121 Photosensitive polyimides used as photoresists and having having an acid or base-cleavable group to promote solubility at low temperatures; also photosensitive additives to differentiate the dissolution rate into developer solution to develop a pattern; positives; negatives; accuracy; stability
12/14/2010US7851033 Photo-sensitive adhesive and liquid crystal display employing the same
12/14/2010US7850257 Ticket dispensing device, installation and displays
12/14/2010CA2465397C Resin composition
12/09/2010WO2010141708A1 Apparatus and method to fabricate an electronic device
12/09/2010WO2010141444A1 Chemically amplified positive photoresist composition
12/09/2010WO2010141115A2 Directed material assembly
12/09/2010WO2010140709A1 Method of forming pattern using actinic-ray- or radiation-sensitive resin composition, and pattern
12/09/2010WO2010140697A1 Lithographic printing plate precursor
12/09/2010WO2010140637A1 Radiation-sensitive resin composition, polymer and method for forming resist pattern
12/09/2010WO2010140597A2 Transporting method, transporting apparatus, exposure method, and exposure apparatus
12/09/2010WO2010140551A1 Composition for forming silicon-containing resist underlayer film having sulfide bond
12/09/2010WO2010140527A1 Reactive urethane compound, actinic-energy-ray-curable resin composition containing same, and use thereof
12/09/2010WO2010140483A1 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method
12/09/2010WO2010096615A3 Acid-sensitive, developer-soluble bottom anti-reflective coatings
12/09/2010WO2010047769A8 Reduction of stress during template separation from substrate
12/09/2010US20100311613 Patterned nanosubstrates made by directed self assembly of amphiphilic molecules
12/09/2010US20100311244 Double-exposure method
12/09/2010US20100311242 Methods for fabricating semiconductor devices
12/09/2010US20100310995 Double patterning strategy for contact hole and trench in photolithography
12/09/2010US20100310994 Stage device, method for controlling stage device, exposure apparatus using same, and device manufacturing method
12/09/2010US20100310993 Transporting method, transporting apparatus, exposure method, and exposure apparatus
12/09/2010US20100310992 Device and method for exposing a photo material
12/09/2010US20100310991 Positive resist composition for immersion exposure and pattern-forming method using the same
12/09/2010US20100310990 Method for manufacturing structure
12/09/2010US20100310989 Method of providing lithographic printing plates
12/09/2010US20100310988 Resist pattern-forming method and resist pattern miniaturizing resin composition
12/09/2010US20100310987 Polymer, radiation-sensitive composition, monomer, and method of producing compound
12/09/2010US20100310986 Positive resist compositions and patterning process
12/09/2010US20100310985 Positive resist composition and method of forming resist pattern
12/09/2010US20100310972 Performing double exposure photolithography using a single reticle
12/09/2010US20100310840 On-press development of imaged elements
12/09/2010US20100310836 Lithographic method and arrangement
12/09/2010US20100310817 Support plate, method for producing the same, and method for processing substrate
12/09/2010US20100309539 Phase-Change Materials and Optical Limiting Devices Utilizing Phase-Change Materials
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