Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/22/2010CN101276155B Measurement system lithographic apparatus and measuring method
12/22/2010CN101271277B Nozzle cleaning device
12/22/2010CN101221280B Full reflection projection optical system
12/22/2010CN101154046B Manufacturing method for double-mosaic structure
12/22/2010CN101154037B Materials for photoresist, photoresist composition and method of forming resist pattern
12/22/2010CN101137935B Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate
12/22/2010CN101135861B Method and apparatus for performing dark field double dipole lithography
12/22/2010CN101118380B Imprint method and imprint device
12/22/2010CN101099114B Resist pattern forming method
12/22/2010CN101097409B Substrate processing apparatus and method
12/22/2010CN101082779B Lithographic apparatus and device manufacturing method
12/22/2010CN101076760B Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
12/22/2010CN101032068B Linear motor, stage apparatus and exposure apparatus
12/22/2010CN101027375B Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent
12/21/2010US7856606 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
12/21/2010US7855777 Exposure apparatus and method for manufacturing device
12/21/2010US7855154 cap layer and a photoresist layer are each formed over the photopatternable layer; cap layer absorbs or reflects radiation and protects the photopatternable layer from a first wavelength of radiation used in patterning photoresist layer; photopatternable material is convertible to a SiO2 based material
12/21/2010US7855047 multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking; improved accuracy
12/21/2010US7855045 comprising at least one solvent and a polymer having a dissolution rate of at least 3000 A /sec in an aqueous alkaline developer; useful for immersion lithography in which a liquid such as water is used as the exposure medium between the lens fixture of an exposure tool and the photoresist-coated wafer
12/21/2010US7855044 Positive resist composition and method of forming resist pattern
12/21/2010US7855043 Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film
12/21/2010US7855038 Mask patterns for semiconductor device fabrication and related methods and structures
12/21/2010US7854613 Demonstration kit and method for enhancing and/or demonstrating photoactive properties
12/21/2010CA2473766C High-performance non-contact support platforms
12/16/2010WO2010144350A1 System and method for providing sub-publication content in an electronic device
12/16/2010WO2010144119A1 Negative-working imageable elements
12/16/2010WO2010144117A1 Preparing lithographc printing plates with enhanced contrast
12/16/2010WO2010143745A1 Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof
12/16/2010WO2010143701A1 Conductive composition, transparent conductive film, display element and integrated solar battery
12/16/2010WO2010143652A1 Method and apparatus for exposure and device fabricating method
12/16/2010WO2010143436A1 Cyclic compound, photoresist base material, and photoresist composition
12/16/2010WO2010143163A1 Patterning nano-scale patterns on a film comprising unzipping polymer chains
12/16/2010WO2010143054A1 Spin on organic antireflective coating composition comprising polymer with fused aromatic rings
12/16/2010WO2010142596A1 Inspection method and apparatus, lithographic appratrus and lithographic cell
12/16/2010WO2010142497A1 Lithographic apparatus and method for reducing stray radiation
12/16/2010WO2010096593A3 Beam pen lithography
12/16/2010WO2010096591A3 Gel polymer pen lithography
12/16/2010US20100317194 Method for fabricating opening
12/16/2010US20100316961 Substrate treatment method and substrate treatment apparatus
12/16/2010US20100316960 Patterning nano-scale patterns on a film comprising unzipping polymer chains
12/16/2010US20100316959 Methods for forming sheeting with a composite image that floats and a master tooling
12/16/2010US20100316958 Method and system for calibrating exposure system for manufacturing of integrated circuits
12/16/2010US20100316957 Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method
12/16/2010US20100316956 Preparing lithographic printing plates with enhanced contrast
12/16/2010US20100316955 Chemically amplified positive photoresist composition and pattern forming process
12/16/2010US20100316954 Monomer having lactone skeleton, polymer compound and photoresist composition
12/16/2010US20100316953 Siloxane-based resin composition
12/16/2010US20100316952 Salt and photoresist composition containing the same
12/16/2010US20100316951 Salt and photoresist composition containing the same
12/16/2010US20100316950 Composition for forming base film for lithography and method for forming multilayer resist pattern
12/16/2010US20100316949 Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic Rings
12/16/2010US20100316943 Illumination optical system, exposure apparatus, and device manufacturing method
12/16/2010US20100316941 Solid-state imaging device producing method and exposure mask
12/16/2010US20100316938 Multi-chip reticle photomasks
12/16/2010US20100316850 Negative-working imageable elements
12/16/2010US20100316802 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
12/16/2010US20100315651 System for measuring the image quality of an optical imaging system
12/16/2010US20100315611 Exposure method, exposure apparatus, photomask and method for manufacturing photomask
12/16/2010US20100314989 Patterning a thick film paste in surface features
12/16/2010US20100314799 Pattern forming method and pattern forming apparatus in which a substrate and a mold are aligned in an in-plane direction
12/16/2010US20100314785 Processing method and manufacturing method for mold
12/16/2010US20100314783 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
12/16/2010US20100314541 Microstructured pattern inspection method
12/16/2010DE102010020550A1 Method for controlling electric stepper motor for printing plate exposure device, involves positioning rotor of motor in position by controller in accordance with rotating field of stator before switching off motor current
12/16/2010DE102009047180A1 Facet mirror for use in extreme ultraviolet lithography, has facet which consists of multilayer structure, where multilayer structure is designed for reflection of electromagnetic radiation in extreme ultraviolet wavelength range
12/15/2010EP2261966A2 A chucking system to hold a substrate and a lithographic system including the chucking system
12/15/2010EP2261745A2 Lithographic apparatus and device manufacturing method
12/15/2010EP2261744A2 Lithographic apparatus and device manufacturing method
12/15/2010EP2261743A2 Lithographic apparatus and device manufacturing method
12/15/2010EP2261742A2 Lithographic apparatus and device manufacturing method.
12/15/2010EP2261741A2 Lithographic apparatus and device manufacturing method
12/15/2010EP2261740A2 Lithographic apparatus and device manufacturing method.
12/15/2010EP2261739A2 Method and apparatus for creating overlapping patterns on a substrate
12/15/2010EP2261738A2 Coating compositions suitable for use with an overcoated photoresist
12/15/2010EP2261737A1 Positive photosensitive resin composition and method of forming cured film from the same
12/15/2010EP2261721A1 Light irradiation device
12/15/2010EP2261699A1 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
12/15/2010EP2261171A1 Composite micromechanical part and method for manufacturing same
12/15/2010EP2261033A1 Method of preparing lithographic printing plate
12/15/2010EP2260995A1 Surface-structured polyurethane substrates and methods for producing the same
12/15/2010EP2260353A1 Process for preparing a polymeric relief structure
12/15/2010EP2260352A1 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith
12/15/2010EP2260351A1 Negative-working imageable elements with improved abrasion resistance
12/15/2010EP2260350A2 Imageable elements useful for waterless printing
12/15/2010EP2260336A1 Method of making micron or submicron cavities
12/15/2010EP1546809B1 Multiphoton photosensitization system
12/15/2010EP1485763B1 Method and apparatus for printing large data flows
12/15/2010EP1060441B1 Improved pattern generator
12/15/2010EP1060440B1 Pattern generator using euv
12/15/2010EP1023635B1 Multi-level conductive matrix formation method
12/15/2010CN1979338B Coating-developing apparatus, coating-developing method, computer program and computer-readable recording medium
12/15/2010CN1965266B Photosensitive resin for flexographic printing plate and production method
12/15/2010CN1961261B Radiation-sensitive composition, laminate, process for producing the sane and electronic part
12/15/2010CN1959541B Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of lithographic apparatus
12/15/2010CN1938646B Microlithographic projection exposure apparatus and measuring device for a projection lens
12/15/2010CN1904741B Mask-free exposure method
12/15/2010CN1877455B Immersion photo-etching device and method thereof
12/15/2010CN1875322B Chemically amplified positive photosensitive thermosetting resin composition, method of forming cured article, and method of producing functional device
12/15/2010CN1791793B Method and device for cleaning at least one optical component
12/15/2010CN1726433B Compositions and processes for nanoimprinting
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