Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2014
11/27/2014US20140347639 Developing method for developing apparatus
11/27/2014US20140346909 Lithography device with eddy-current brake
11/27/2014US20140346700 Imprinting method, imprinting apparatus, and device manufacturing method
11/27/2014US20140346519 Active Array Substrate and Manufacturing Method Thereof
11/27/2014US20140346373 Droplet generator with actuator induced nozzle cleaning
11/27/2014US20140346137 Method for making three-dimensional nano-structure array
11/27/2014US20140345483 Method of concentrating plate-making process waste liquid, and method of recycling plate-making process waste liquid
11/27/2014US20140345482 Printing form for use in relief printing, in particular flexographic printing
11/25/2014US8898599 Gradient-based pattern and evaluation point selection
11/25/2014US8896909 Method and device scanning a two-dimensional brush through an acousto-optic deflector (AOD) having an extended field in a scanning direction
11/25/2014US8896827 Diode laser based broad band light sources for wafer inspection tools
11/25/2014US8896817 Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method
11/25/2014US8896816 Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source
11/25/2014US8896815 Lithographic apparatus and device manufacturing method
11/25/2014US8896814 Catadioptric projection objective comprising deflection mirrors and projection exposure method
11/25/2014US8896813 Exposure apparatus, exposure method, method for manufacturing device
11/25/2014US8896811 Positioning system and a method for positioning a substage with respect to a frame
11/25/2014US8896809 Lithographic apparatus and device manufacturing method
11/25/2014US8896808 Lithographic apparatus and method
11/25/2014US8896807 Apparatus and method for providing fluid for immersion lithography
11/25/2014US8896188 Resonator electrodes and related methods and apparatus
11/25/2014US8895943 Lithography system and method of processing substrates in such a lithography system
11/25/2014US8895909 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
11/25/2014US8895676 Resin composition and display device using the same
11/25/2014US8895439 Method for forming pattern and method for manufacturing display device by using the same
11/25/2014US8895438 Method for forming a multi-level surface on a substrate with areas of different wettability and a semiconductor device having the same
11/25/2014US8895235 Process for production of photoresist pattern
11/25/2014US8895234 Immersion lithography watermark reduction
11/25/2014US8895233 Three-dimensional direct-write lithography
11/25/2014US8895232 Mask material conversion
11/25/2014US8895231 Patterning process and resist composition
11/25/2014US8895230 Spin-on carbon compositions for lithographic processing
11/25/2014US8895229 Composition for formation of upper layer film, and method for formation of photoresist pattern
11/25/2014US8895228 Method for thermal treatment of relief surface for a relief printing form
11/25/2014US8895227 Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern
11/25/2014US8895226 Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
11/25/2014US8895225 Method of forming patterns
11/25/2014US8895224 Lithographic printing plate precursors and processes for preparing lithographic printing plates
11/25/2014US8895223 Radiation-sensitive resin composition
11/25/2014US8895222 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
11/25/2014US8895213 Mask
11/25/2014US8895212 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
11/25/2014US8895127 Method of creating two-sided template from a single recorded master
11/25/2014US8894871 Lithography method using tilted evaporation
11/25/2014US8894406 Patterning mold and manufacturing method thereof
11/25/2014US8894225 Device for controlling temperature of an optical element
11/25/2014US8894187 Liquid application device, liquid application method, and nanoimprint system
11/25/2014US8894052 Active oscillation isolation system by means of a hysteresis-free pneumatic bearing
11/25/2014US8893649 Imprint apparatus and article manufacturing method
11/20/2014US20140342564 Photomask With Three States For Forming Multiple Layer Patterns With A Single Exposure
11/20/2014US20140342292 Di-t-butoxydiacetoxysilane-based silsesquioxane resins as hard-mask antireflective coating material and method of making
11/20/2014US20140342291 Novel Dual-Tone Resist Formulations And Methods
11/20/2014US20140342290 Composition comprising a polymeric thermal acid generator and processes thereof
11/20/2014US20140342289 Patterning process and composition for forming silicon-containing film usable therefor
11/20/2014US20140342288 Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound
11/20/2014US20140342287 Method of patterning a device
11/20/2014US20140342275 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition
11/20/2014US20140342274 Chemically amplified negative resist composition and patterning process
11/20/2014US20140342273 Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
11/20/2014US20140342272 Method to Define Multiple Layer Patterns With a Single Exposure by E-Beam Lithography
11/20/2014US20140342167 Silicon-rich antireflective coating materials and method of making same
11/20/2014US20140340667 Exposure apparatus, exposure method, and device manufacturing method
11/20/2014US20140340666 Lithographic apparatus and device manufacturing method
11/20/2014US20140340665 Ultraviolet light emitting diode array light source for photolithography and method
11/20/2014US20140340664 Projection Exposure Apparatus Comprising a Measuring System for Measuring an Optical Element
11/20/2014US20140340663 Apparatus for Monitoring a Lithographic Patterning Device
11/20/2014US20140340662 Maskless exposure device
11/20/2014US20140340661 Exposure apparatus and method of manufacturing article
11/20/2014US20140340660 Pattern formation method and pattern formation apparatus
11/20/2014US20140340659 Lithographic Apparatus and Device Manufacturing Method
11/20/2014US20140338960 Transparent conductive element, method for manufacturing the same, input device, electronic apparatus, and method for machining transparent conductive layer
11/18/2014US8893311 Three-dimensional imaging and manipulation
11/18/2014US8893067 System and method for lithography simulation
11/18/2014US8893060 Optimization of source, mask and projection optics
11/18/2014US8893058 Methods and system for model-based generic matching and tuning
11/18/2014US8891172 Optical element and method
11/18/2014US8891163 Reflective optical element and EUV lithography appliance
11/18/2014US8891065 Patterning non-planar surfaces
11/18/2014US8891064 Moving body apparatus and exposure apparatus
11/18/2014US8891063 Lithographic apparatus and device manufacturing method
11/18/2014US8891062 Illumination optical system, exposure apparatus, and method of manufacturing device
11/18/2014US8891061 Lithographic focus and dose measurement using a 2-D target
11/18/2014US8891060 Optical system, in particular of a microlithographic projection exposure apparatus
11/18/2014US8891059 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
11/18/2014US8891057 Microlithographic projection exposure apparatus
11/18/2014US8891055 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
11/18/2014US8891054 Stage device including a heat insulating sheet supported by an auxiliary member
11/18/2014US8891053 Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method
11/18/2014US8890099 Radiation source and method for lithographic apparatus for device manufacture
11/18/2014US8890095 Reliability in a maskless lithography system
11/18/2014US8889919 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
11/18/2014US8889901 Photoacid generator, method for producing the same, and resist composition comprising the same
11/18/2014US8889888 Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt
11/18/2014US8889344 Coating compositions
11/18/2014US8889343 Optimizing lithographic processes using laser annealing techniques
11/18/2014US8889341 Negative-working lithographic printing plate precursors and use
11/18/2014US8889340 Method for making a lithographic printing plate
11/18/2014US8889339 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks
11/18/2014US8889338 Flexographic printing forme precursor for laser engraving
11/18/2014US8889337 Film forming method, film forming apparatus and pattern forming method
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