Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/23/2010US20100323292 Resist pattern formation method, and resin composition capable of insolubilizing resist pattern
12/23/2010US20100323285 Photosensitive colored composition, color filter and method for producing the same
12/23/2010US20100323284 Pigment-dispersed composition, curable composition, color filter and production method thereof
12/23/2010US20100323283 Optical compensation devices, systems, and methods
12/23/2010US20100323282 method of correcting a flare and computer program product
12/23/2010US20100323280 Mask for EUV Lithography and Method for Exposure Using the Same
12/23/2010US20100323171 Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process
12/23/2010US20100321831 Write pole fabricated using a carbon hard mask and method of making
12/23/2010US20100321784 Optical Elements with Gradient Structure
12/23/2010US20100321685 Type selective and polarization selective device for raman spectroscopy
12/23/2010US20100321656 Transmission mask with differential attenuation to improve iso-dense proximity
12/23/2010US20100321652 Lithographic apparatus and device manufacturing method
12/23/2010US20100321650 Lithographic apparatus and device manufacturing method
12/23/2010US20100321283 Liquid crystal display device and manufacturing method for same
12/23/2010US20100321191 Ceramic sensors for wireless high-temperature sensing
12/23/2010US20100320573 Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions
12/23/2010US20100320464 Thin film transistor, photo mask for defining thin film transistor, and method of making thin film transistor
12/23/2010US20100319813 Bare aluminum baffles for resist stripping chambers
12/23/2010DE102009047316A1 Optical reflective component for inserting in illuminating optics of illuminating system for illuminating object field of projection illumination system, has static structures on reflective upper surface
12/23/2010DE102005016785B4 Verfahren zur Bilderzeugung auf einem Aufzeichnungsmaterial A process for forming an image on a recording material,
12/22/2010EP2264536A1 An apparatus and process for exposing a printing form having a cylindrical support
12/22/2010EP2264535A2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
12/22/2010EP2264534A2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
12/22/2010EP2264533A2 Exposure apparatus, method for producing device, and exposure method
12/22/2010EP2264532A2 Exposure apparatus and device manufacturing method
12/22/2010EP2264531A2 Exposure apparatus and device manufacturing method
12/22/2010EP2264530A1 Lithographic apparatus and device manufacturing method
12/22/2010EP2264529A2 A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus
12/22/2010EP2264528A1 Sensor and lithographic apparatus
12/22/2010EP2264527A1 Method for processing work having photoresist layer
12/22/2010EP2264526A1 Photosensitive transparent resin composition, process for production of color filters, and color filters
12/22/2010EP2264525A2 Chemically amplified positive photoresist composition and pattern forming process
12/22/2010EP2264524A2 High-resolution overlay alignement methods and systems for imprint lithography
12/22/2010EP2264523A2 A method of forming a pattern on a substrate in imprint lithographic processes
12/22/2010EP2264522A2 Method of forming a pattern on a substrate
12/22/2010EP2264511A1 Spatial light modulating unit, illumination optical system, aligner, and device manufacturing method
12/22/2010EP2264468A2 Merged-mask micro-machining process
12/22/2010EP2264409A2 Lithographic apparatus and device manufacturing method
12/22/2010EP2264107A1 Azo pigment composition, process for production of the composition, dispersions containing the composition, colored compositions and jet printing ink
12/22/2010EP2264106A1 Azo pigment composition, process for production of the composition, dispersions containing the composition, colored compositions and jet printing ink
12/22/2010EP2264007A1 Novel salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method
12/22/2010EP2263885A1 Method for making lithographic printing original plate
12/22/2010EP2263874A1 A lithographic printing plate precursor
12/22/2010EP2263121A2 Immersion lithography using hafnium-based nanoparticles
12/22/2010EP2263120A1 Low chlorine epoxy resin formulations
12/22/2010EP2262848A1 Method for preparing a photo-crosslinkable composition
12/22/2010EP2262592A2 Large area roll-to-roll imprint lithography
12/22/2010EP1999515B1 Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process
12/22/2010EP1720918B1 Adhesive film functionalizing color compensation and near infrared ray (nir) blocking and plasma display panel filter using the same
12/22/2010EP1546788B1 Methods and systems for improved boundary contrast
12/22/2010CN201681253U Precise adjustable positioning device
12/22/2010CN201681252U Torque damping device
12/22/2010CN1934501B Method for producing a base material for screen printing, and base material of this type
12/22/2010CN1831644B Micronano transfer device
12/22/2010CN1823304B Material for forming fine pattern and method for forming fine pattern using the same
12/22/2010CN1811603B Alkaline solution and manufacturing method, and alkaline solution application, solution applying device and application thereof
12/22/2010CN1799006B Micropattern formation material and method of micropattern formation
12/22/2010CN1743963B Method for developing processing
12/22/2010CN1713077B Composition for removing photoresist
12/22/2010CN1690850B Negative thermosensitive offset matrix
12/22/2010CN101925976A Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method
12/22/2010CN101925863A Method of making lithographic printing plates
12/22/2010CN101925862A Lithography robustness monitor
12/22/2010CN101925861A Layered product of photosensitive resin
12/22/2010CN101925858A Polychromic substances and their use
12/22/2010CN101925636A Resin, pigment dispersion liquid, coloring curable composition, color filter produced by using composition, and method for producing color filter
12/22/2010CN101925616A Photolatent amidine bases for redox curing of radically curable formulations
12/22/2010CN101924087A Inversed-chip lug structure and manufacturing process thereof
12/22/2010CN101924077A Manufacturing method for reducing area of SONOS storage unit
12/22/2010CN101924029A Process for remanufacturing photoresist layer in process of manufacturing double grid oxide layer
12/22/2010CN101924013A Method for increasing photo-etching alignment precision after extension
12/22/2010CN101923295A Rotary label and method for monitoring photolithographic quality using same
12/22/2010CN101923294A Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof
12/22/2010CN101923293A Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation
12/22/2010CN101923292A Removal method of chromium residues on border of mask
12/22/2010CN101923291A A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus
12/22/2010CN101923290A Lithographic apparatus and device manufacturing method
12/22/2010CN101923289A Method and system of monitoring e-beam overlay and providing advanced process control
12/22/2010CN101923288A Chemically amplified positive photoresist composition and pattern forming process
12/22/2010CN101923287A Photosensitive composite containing photoinitiator of diphenyl sulfide based ketoxime esters and application thereof
12/22/2010CN101923286A Coating and developing device and substrate backside cleaning method
12/22/2010CN101923285A Lithographic method and arrangement
12/22/2010CN101923284A Manufacturing method and equipment of optical slices
12/22/2010CN101923283A Nano-imprint resist and nano-imprint method adopting same
12/22/2010CN101923282A Nano-imprint resist and nano-imprint method adopting same
12/22/2010CN101923279A Nano-imprint template and preparation method thereof
12/22/2010CN101923235A Display panel and manufacturing method thereof
12/22/2010CN101923182A Method for producing phase type photon sieve based on HSQ (Hexadecimal Sequential) process
12/22/2010CN101923181A Producing method of anti-dizziness film and anti-dizziness film mold
12/22/2010CN101922675A Optical slice and manufacture method thereof
12/22/2010CN101921375A Curable composition, cured product, and liquid crystal display device using the same
12/22/2010CN101921259A Salt and photoresist composition containing the same
12/22/2010CN101921219A Salt and photoresist composition containing the same
12/22/2010CN101477969B Method of manufacturing a thin film transistor substrate and stripping composition
12/22/2010CN101430566B Method for controlling etching deviation
12/22/2010CN101345188B Plate, apparatus for adjusting temperature of substrate having the plate and apparatus for processing substrate having the plate
12/22/2010CN101344729B Method for measuring rotation degree of mask bench relative to workpiece bench
12/22/2010CN101316726B Product with concave-convex pattern on its surface and method of forming the concave-convex pattern
12/22/2010CN101310990B Automobile instrument light dial bound edge typography method
12/22/2010CN101278375B Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method
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