Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2010
12/29/2010CN101931280A Coil, positioning device, actuator, and lithographic apparatus
12/29/2010CN101930949A Method for improving defects of photoresist coating in manufacturing process of flash memory
12/29/2010CN101930917A Method for etching connecting hole by dry method
12/29/2010CN101930184A Developing treatment apparatus
12/29/2010CN101930183A Lithographic apparatus and device manufacturing method
12/29/2010CN101930182A Exposure apparatus for internal substrate and method for peeling substrate and mask
12/29/2010CN101930181A Proximity exposure apparatus, method for controlling substrate temperature and method of manufacturing panel substrate
12/29/2010CN101930180A Method and device for detecting focal plane change of exposure machine table
12/29/2010CN101930179A Method for passivating photoresist surface and photoetching method
12/29/2010CN101930178A Chemically amplified photoresist composition and method for forming resist pattern
12/29/2010CN101930177A Coloring composition, color filter and color liquid crystal display device
12/29/2010CN101930176A Coloring photosensitive composition
12/29/2010CN101930175A Photosensitive imaging liquid containing alpha-diazonium-1,3-diketone structure and used for photosensitive macromolecule flat printing plate
12/29/2010CN101930174A Two-photon photo-acid generator containing triphenylamine as electron donating group and preparation method thereof
12/29/2010CN101930173A Photoacid generators and photoresists comprising same
12/29/2010CN101930172A Thermosensitive CTP thermal-induction imaging liquid taking active etherate of pyrogallol and divinylbenzene polycondensate resin as dissolution inhibitor
12/29/2010CN101930171A Ultraviolet curing composition and preparation method thereof and pattern preparation method
12/29/2010CN101930170A Conformal photo-sensitive layer and process
12/29/2010CN101930169A Separator of stamping die
12/29/2010CN101930168A Vacuum forming apparatus and method for vacuum forming of substrate
12/29/2010CN101930090A Multi-ring beam shaper and manufacturing method thereof
12/29/2010CN101928489A Pigment dispersion, pigment photoresist and color filter
12/29/2010CN101928396A Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
12/29/2010CN101928378A Photosensitive resin and use thereof for preparing liquid photoimageable solder resist ink
12/29/2010CN101928369A Resin and resist composition
12/29/2010CN101587306B Alignment signal processing method in photoetching technology
12/29/2010CN101581866B Line width compression device containing beam shaping and wavelength rotation tuning
12/29/2010CN101526753B Parameter measuring method of worktable coordinate system
12/29/2010CN101506885B Drawing method, drawing apparatus, and information recording medium
12/29/2010CN101487991B Silicon slice alignment system
12/29/2010CN101487989B Six-freedom precise positioning platform
12/29/2010CN101487988B Scanning exposure method for photo-etching machine
12/29/2010CN101487984B Silicon chip placing apparatus used for photo-etching machine pre-alignment system
12/29/2010CN101477319B Optical system used for focusing and leveling
12/29/2010CN101414117B Method for cleaning photo mask by wet method
12/29/2010CN101369105B Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate
12/29/2010CN101300528B Pattern exposure method and pattern exposure apparatus
12/29/2010CN101226327B Method for manufacturing polyalcohol material pattern structure capable of transfer print
12/29/2010CN101180577B Photosensitive resin composition, heat resistance film forming method, flat display and semiconductor device possessing the film
12/29/2010CN101105640B Lithographic apparatus and device manufacturing method
12/29/2010CN101097401B Method for fabricating soft mold and pattern forming method using the same
12/29/2010CN101075091B Photographic soluble organic semiconductor material
12/29/2010CN101063816B Resist composition, method for forming resist pattern, array substrate fabricated and method of fabricating the array substrate
12/29/2010CN101034256B Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
12/29/2010CA2768722A1 Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
12/28/2010US7860594 Method for making opthalmic devices
12/28/2010US7859748 Microlithographic reduction projection catadioptric objective
12/28/2010US7859665 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device
12/28/2010US7859659 Spectroscopic scatterometer system
12/28/2010US7858958 Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
12/28/2010US7858721 Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
12/28/2010US7858294 Contacting silica dielectric film with plasma comprising at least one surface modification agent, at a concentration and for a time period effective to render the silica dielectric film hydrophobic; imparting hydrophobicity to both new and damaged silica dielectric films
12/28/2010US7858293 thin films: computer program; photoresist on the ARC layer; Once the layer of photoresist is optionally removed, a double patterned ARC layer remains for etching the underlying thin film
12/28/2010US7858292 Imageable elements with components having 1H-tetrazole groups
12/28/2010US7858291 Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method
12/28/2010US7858289 acid generators; semiconductors; aging resistance
12/28/2010US7858288 1-[2-(2,2,2-trifluoroethoxy)ethoxy]ethyl methacrylate resin; increased solubility in alkali developing solution under action of the acid; (4-methylphenyl)diphenylsulfonium nonafluoro-n-butane sulfonate an acid generator, which generates acid upon irradiation; high hydrophobic film
12/28/2010US7858287 monomers containing reaction proudct of polystyrene and 4-vinyloxyethoxyphenyldiphenylsulfonium bis(perfluoromethanesulfon)imide; styrene, hydroxystyrene/p-/, styrene-4-oxyisopropyl-oxyethyl-; acid generation through irradiation with active radiation, and an acid dissociable group; photoresist material
12/28/2010US7858286 increased alkali solubility under action of acid, acid-generator; comprises acrylate ester having lactone-containing polycyclic group
12/28/2010US7858275 Photosensitive resin composition and color filter
12/28/2010US7858271 Method of measuring dimension of pattern and method of forming pattern
12/28/2010US7858268 Method for generating a circular periodic structure on a basic support material
12/28/2010US7858156 oxidizing the surfaces of an elastomeric layer comprising crosslinked polysiloxanes, the swelling with polimerizable butyl acrylate and ethylene dimethacrylate monomers, and polymerizing the monomers, thereby stabilizing and wrinkling the surfaces; lenses; microfluidics; diffraction grids; optics
12/28/2010US7857530 Developing method and developing unit
12/23/2010WO2010147671A1 Dual zone template chuck
12/23/2010WO2010147245A2 Exposure apparatus and device manufacturing method
12/23/2010WO2010147244A2 Exposure apparatus and device manufacturing method
12/23/2010WO2010147243A2 Exposure apparatus, exposure method and device manufacturing method
12/23/2010WO2010147242A2 Movable body apparatus, exposure apparatus and device manufacturing method
12/23/2010WO2010147241A2 Exposure apparatus and device manufacturing method
12/23/2010WO2010147240A2 Exposure apparatus and device manufacturing method
12/23/2010WO2010147228A1 Pattern forming method, chemical amplification resist composition and resist film
12/23/2010WO2010147195A1 Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
12/23/2010WO2010147155A1 Carbazole novolak resin
12/23/2010WO2010147099A1 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer
12/23/2010WO2010147079A1 Radiation-sensitive resin composition
12/23/2010WO2010146965A1 Photo mask, photolithography method, substrate production method and display panel production method
12/23/2010WO2010146901A1 Alicyclic compound, production method therefor, composite containing said compound, and resist pattern forming method using same
12/23/2010WO2010146883A1 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
12/23/2010WO2010145959A1 Lithographic apparatus and method
12/23/2010WO2010145951A2 Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell
12/23/2010US20100324865 Method and system for measuring patterned structures
12/23/2010US20100324330 Process for Preventing Development Defect and Composition for Use in the Same
12/23/2010US20100324245 Copolymer for semiconductor lithography and producing method thereof, and composition
12/23/2010US20100323926 Diagnosis device and method of manufacturing the diagnosis device
12/23/2010US20100323307 Developing apparatus and method
12/23/2010US20100323306 Substrate treatment system, substrate treatment method, and computer readable storage medium
12/23/2010US20100323305 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
12/23/2010US20100323304 Inspection method for patterning of photoresist
12/23/2010US20100323303 Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
12/23/2010US20100323302 Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
12/23/2010US20100323301 Method and apparatus for making three-dimensional parts
12/23/2010US20100323300 Digital optical chemistry micromirror imager
12/23/2010US20100323299 Projection objective for immersion lithography
12/23/2010US20100323298 Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof
12/23/2010US20100323297 Method of manufacturing optical waveguide laminated wiring board
12/23/2010US20100323296 Resin and resist composition
12/23/2010US20100323295 Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
12/23/2010US20100323294 Photoacid generators and photoresists comprising same
12/23/2010US20100323293 Optical recording material, optical recording method, photosensitive material, photolithography method, photopolymerization initiator, and photosensitizer
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