| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/05/2011 | CN101937172A Positive type radiation-sensitive composition, cured film, interlayer insulating film, method for forming method interlayer insulating film, display element and siloxane polymer |
| 01/05/2011 | CN101937169A Method for manufacturing photo mask blank, method for manufacturing photo mask, and coating apparatus |
| 01/05/2011 | CN101935492A Coating compositions for use with an overcoated photoresist |
| 01/05/2011 | CN101935431A Improved hot melt compositions |
| 01/05/2011 | CN101935307A Coating compositions for use with an overcoated photoresist |
| 01/05/2011 | CN101655670B On-line detection device with function of calibrating systematic error for wave aberration of projection objective of photoetching machine |
| 01/05/2011 | CN101526755B 193-nanometre immersed lithography illuminating system |
| 01/05/2011 | CN101424882B Exposing device, pattern, channel, pore forming method, liquid crystal display and method for fabricating the same |
| 01/05/2011 | CN101185024B Method of forming graft pattern, graft pattern material obtained thereby, and lithographic process using the same |
| 01/05/2011 | CN101089732B Lighting device for exposal |
| 01/04/2011 | US7865328 Position detecting method and apparatus |
| 01/04/2011 | US7864490 CPP head with parasitic shunting reduction |
| 01/04/2011 | US7864344 Method and system for measuring patterned structures |
| 01/04/2011 | US7864343 Method and system for measuring patterned structures |
| 01/04/2011 | US7864301 Source and mask optimization by changing intensity and shape of the illumination source |
| 01/04/2011 | US7863394 Ni or Pd-catalyzed cationic polymerization of polycyclic olefins with silane chain transfer agents |
| 01/04/2011 | US7863344 Photoacid generators for the synthesis of oligo-DNA in a polymer matrix |
| 01/04/2011 | US7863231 Mixture of oxyester compounds |
| 01/04/2011 | US7862991 Decreases undesirable events caused by a coupling between an active region and a gate pattern while forming a recess pattern due to a decreased design rule; mass producible |
| 01/04/2011 | US7862990 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer |
| 01/04/2011 | US7862989 Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning |
| 01/04/2011 | US7862988 first mask pattern formed on substrate, second mask patterns formed on sidewalls of first mask pattern, third mask patterns fill spaces formed between adjacent second mask patterns, second mask patterns may be removed; portion of substrate may be removed using first and third mask patterns as etch masks |
| 01/04/2011 | US7862987 Method for forming an electrical structure comprising multiple photosensitive materials |
| 01/04/2011 | US7862986 forming a mask layer on the material layer, performing multiple patterning processes on mask layer for transferring at least a first pattern from a first photomask through a first photoresist and a second pattern from a second photomask from a second photoresist layer into the mask layer without etching |
| 01/04/2011 | US7862985 thin films: computer program; photoresist on the ARC layer; Once the layer of photoresist is optionally removed, a double patterned ARC layer remains for etching the underlying thin film |
| 01/04/2011 | US7862983 stable polymers used for patterning electronic circuitry |
| 01/04/2011 | US7862982 Chemical trim of photoresist lines by means of a tuned overcoat material |
| 01/04/2011 | US7862980 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 01/04/2011 | US7862959 For character-projection (CP) type of electron-beam exposure where a mask defect can be corrected or a pattern changed without making a new mask as part of or all the cells can be exchanged at the mask portion as the mask is made up of blocks of cells in polygon shape |
| 12/30/2010 | US20100330508 Developing apparatus and developing method |
| 12/30/2010 | US20100330507 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method |
| 12/30/2010 | US20100330506 Method for transferring an epitaxial layer from a donor wafer to a system wafer appertaining to microsystems technology |
| 12/30/2010 | US20100330505 Resist underlayer film forming composition containing silicone having cyclic amino group |
| 12/30/2010 | US20100330504 Method for electroconductive pattern formation |
| 12/30/2010 | US20100330503 Methods of forming electronic devices |
| 12/30/2010 | US20100330502 High Aspect Ratio Microstructures |
| 12/30/2010 | US20100330501 Methods of forming electronic devices |
| 12/30/2010 | US20100330500 Methods of forming electronic devices |
| 12/30/2010 | US20100330499 Methods of forming electronic devices |
| 12/30/2010 | US20100330498 Self-aligned spacer multiple patterning methods |
| 12/30/2010 | US20100330497 Chemically amplified photoresist composition and method for forming resist pattern |
| 12/30/2010 | US20100330496 Simultaneous two-photon absorption recording-reproduction method, and simultaneous two-photon absorption recording material for use therein |
| 12/30/2010 | US20100330471 Methods of adjusting dimensions of resist patterns |
| 12/30/2010 | US20100330470 Reflective mask blank for euv lithography and reflective mask for euv lithography |
| 12/30/2010 | US20100330468 Halftone mask and manufacturing method thereof and method for forming film using the same |
| 12/30/2010 | US20100330465 Photomask For Forming A Line-Type Pattern And Method Of Fabricating The Pattern Using The Photomask |
| 12/30/2010 | US20100330345 Methods utilizing scanning probe microscope tips and products thereof or produced thereby |
| 12/30/2010 | US20100329616 Photosensitive resin composition, method for control of refractive index, and optical waveguide and optical component using the same |
| 12/30/2010 | US20100328809 Method for removing resist and for producing a magnetic recording medium, and systems thereof |
| 12/30/2010 | US20100328595 Method for manufacturing display device and liquid crystal display device |
| 12/30/2010 | US20100328589 Thin resin film and production method thereof, and color filter for liquid crystal display and production method thereof |
| 12/30/2010 | US20100327218 Chemical solution for selectively treating or removing a deteriorated layer at a surface of an organic film, and method for using such |
| 12/30/2010 | US20100326476 Method for processing a substrate and apparatus for performing the same |
| 12/30/2010 | US20100326469 Apparatus and method of fabricting thin film transistor array substrate |
| 12/30/2010 | DE102010016729A1 Verfahren und Vorrichtung zum Markieren von Objekten Method and apparatus for marking objects |
| 12/30/2010 | DE102009030230A1 Reflektives optisches Element mit einer Messeinrichtung The reflective optical element with a measuring device |
| 12/30/2010 | DE102005001168B4 Verfahren und System zum Erzeugen einer Mehrzahl von Dünnfilmvorrichtungen Method and system for generating a plurality of thin-film devices |
| 12/29/2010 | WO2010151471A1 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| 12/29/2010 | WO2010151123A1 Illumination system |
| 12/29/2010 | WO2010151078A9 Photopolymerizable resin composition |
| 12/29/2010 | WO2010151078A2 Photopolymerizable resin composition |
| 12/29/2010 | WO2010151041A2 Composition for a water-soluble coating film |
| 12/29/2010 | WO2010150917A1 Chemical amplification resist composition, and mold preparation method and resist film using the same |
| 12/29/2010 | WO2010150844A1 Photosensitive letterpress printing original plate |
| 12/29/2010 | WO2010150843A1 Colorant composition for a color filter, color filter using the same, and liquid crystal display device |
| 12/29/2010 | WO2010150550A1 Optical element, illumination apparatus, exposure apparatus, and method for manufacturing device |
| 12/29/2010 | WO2010150518A1 Alkali-soluble resin, positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device both including same |
| 12/29/2010 | WO2010150428A1 Chemically amplified resist material and method for forming pattern using same |
| 12/29/2010 | WO2010149438A1 Lithographic apparatus and device manufacturing method |
| 12/29/2010 | WO2010149436A1 Illumination optical unit with a reflective optical element comprising a measuring device |
| 12/29/2010 | WO2010110847A3 Compositions and methods for removing organic substances |
| 12/29/2010 | EP2267759A2 Exposure apparatus, exposure method and device manufacturing method |
| 12/29/2010 | EP2267540A1 Process for producing lithographic printing plate |
| 12/29/2010 | EP2267539A1 Lithographic apparatus and device manufacturing method |
| 12/29/2010 | EP2267538A1 Lithographic Apparatus and Device Manufacturing Method |
| 12/29/2010 | EP2267537A1 Lithographic apparatus |
| 12/29/2010 | EP2267536A1 Lithographic apparatus |
| 12/29/2010 | EP2267535A1 Lithographic apparatus and device manufacturing method |
| 12/29/2010 | EP2267534A1 Illumination system |
| 12/29/2010 | EP2267533A1 Resist composition and patterning process |
| 12/29/2010 | EP2267532A1 Photoacid generators and photoresists comprising same |
| 12/29/2010 | EP2267531A2 Method to vary dimensions of a substrate during nano-scale manufacturing |
| 12/29/2010 | EP2267530A1 Method and apparatus for performing dark field double dipole lithography |
| 12/29/2010 | EP2266781A1 Method for creating a three dimensional object with resolution enhancement by means of pixel shift |
| 12/29/2010 | EP2265995A1 Illumination optical system, exposure apparatus, device manufacturing method, and exposure optical system |
| 12/29/2010 | EP2265994A1 Method and apparatus for detecting non-uniform fracturing of a photomask shape |
| 12/29/2010 | EP2153279B1 A lithographic printing plate precursor |
| 12/29/2010 | EP1713113B1 Stage drive method and stage drive apparatus, exposure apparatus, and device producing method |
| 12/29/2010 | EP1493018B1 Method for preparing a holographic sensor based on a volume hologram in a porous medium |
| 12/29/2010 | EP1112578B1 Apparatus for generating focused electromagnetic radiation |
| 12/29/2010 | CN201689280U Liquid crystal display panel mask repairing system |
| 12/29/2010 | CN201689279U Motherboard storage device |
| 12/29/2010 | CN1982388B Organic anti-reflective coating polymer, anti-reflective coating polymer and preparing method thereof |
| 12/29/2010 | CN1928713B Photosensitive composition and black matrix |
| 12/29/2010 | CN1896877B Decision method and exposure method |
| 12/29/2010 | CN1896876B Polarized radiation in lithographic apparatus and device manufacturing method |
| 12/29/2010 | CN1841200B Salt suitable for acid generator and chemical amplifying type corrosion-resistant composition containing the same |
| 12/29/2010 | CN1828415B Polymer for forming anti-reflective coating layer |
| 12/29/2010 | CN101933408A Method for electroconductive pattern formation |
| 12/29/2010 | CN101932975A Illumination optics and projection exposure apparatus |