| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/11/2011 | US7869725 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 01/11/2011 | US7868998 Lithographic apparatus |
| 01/11/2011 | US7868997 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method |
| 01/11/2011 | US7868992 Liquid crystal display device having patterned spacers and method of fabricating the same |
| 01/11/2011 | US7868629 Proportional variable resistor structures to electrically measure mask misalignment |
| 01/11/2011 | US7868473 Wafer target design and method for determining centroid of wafer target |
| 01/11/2011 | US7868369 Localized masking for semiconductor structure development |
| 01/11/2011 | US7867697 Acid generator (upon actinic radiation), and fluoropolymer increases solubility of resin in alkaline developer |
| 01/11/2011 | US7867696 Method and apparatus for monitoring saturation levels of solvents used during rapid prototyping processes |
| 01/11/2011 | US7867695 rotating a cylindrical platform that includes a radiation sensitive layer, about an axis of, while simultaneously axially rastering a radiation beam across a portion of the radiation sensitive layer, to image the optical microstructures in the radiation sensitive layer |
| 01/11/2011 | US7867693 transferring approximately an inverse of patterned features formed in a positive resist layer on the wafer to a device material on the wafer to form the device structures in the device material |
| 01/11/2011 | US7867692 forming photosensitive film above work piece, exposing photosensitive film, as a first exposure, by irradiating interference light generated by intersecting two laser beams having wavelength shorter than wavelength of visible light, developing exposed photosensitive film to develop shape, etching |
| 01/11/2011 | US7867691 Heated water spray processor |
| 01/11/2011 | US7867690 Tertiary alcohol derivative, polymer compound and photoresist composition |
| 01/11/2011 | US7867689 Method of use for photopatternable dielectric materials for BEOL applications |
| 01/11/2011 | US7867688 coating first layer of resist material on a substrate, creating a pattern on substrate material by image wise radiation induced thermal removal of first resist material to expose substrate, plasma etching substrate which has been exposed, and removing residual resist with oxygen |
| 01/11/2011 | US7867687 Methods and compositions for reducing line wide roughness |
| 01/11/2011 | US7867686 Metal deposition |
| 01/11/2011 | US7867674 allows a desired resist pattern dimension to be attained after a photolithography sequence, so that a uniform resist pattern is formed on the surface of a substrate, independently of the precision level in the light exposure process |
| 01/11/2011 | CA2455220C Photoinitiated reactions |
| 01/06/2011 | WO2011002967A1 Method for printing a material onto a substrate |
| 01/06/2011 | WO2011002518A2 Chucking system with recessed support feature |
| 01/06/2011 | WO2011002252A2 Method for manufacturing color filter for solid state imaging device using ultrashort wave exposure apparatus, color filter manufactured by the same, and solid state imaging device including the same |
| 01/06/2011 | WO2011002247A2 Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same |
| 01/06/2011 | WO2011002107A1 Projection optical system, exposure apparatus, and assembly method thereof |
| 01/06/2011 | WO2011002102A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 01/06/2011 | WO2011002081A1 Radiation-sensitive resin composition |
| 01/06/2011 | WO2011002068A1 ArF-LITHOGRAPHY MIRROR AND ArF-LITHOGRAPHY OPTICAL MEMBER |
| 01/06/2011 | WO2011002060A1 Function-gradient inorganic resist, substrate with function-gradient inorganic resist, cylindrical substrate with function-gradient inorganic resist, method for forming function-gradient inorganic resist, method for forming fine pattern, and inorganic resist and process for producing same |
| 01/06/2011 | WO2011001942A1 Photosensitive adhesive, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, and semiconductor device, which are made using same |
| 01/06/2011 | WO2011001740A1 Polishing device, polishing method, exposure device, and device producing method |
| 01/06/2011 | WO2011001678A1 Exposure condition setting method and surface inspection apparatus |
| 01/06/2011 | WO2011001485A1 Photocurable heat-curable resin composition |
| 01/06/2011 | WO2011001484A1 Photocurable thermosetting resin composition |
| 01/06/2011 | WO2011000932A1 Method for producing a refractive optical element and refractive optical element |
| 01/06/2011 | WO2011000870A1 Processing system |
| 01/06/2011 | WO2011000758A1 Aqueous alkaline cleaning compositions and methods of their use |
| 01/06/2011 | WO2011000689A1 Image-compensating addressable electrostatic chuck system |
| 01/06/2011 | WO2011000671A1 Mountings for rotation of array of reflective elements and lithographic apparatus incorporating same |
| 01/06/2011 | WO2011000622A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
| 01/06/2011 | WO2011000442A1 Substrate processing system |
| 01/06/2011 | US20110003716 Antireflective coatings for high-resolution photolithographic synthesis of dna array |
| 01/06/2011 | US20110003619 Cover glass for mobile terminals, manufacturing method of the same and mobile terminal device |
| 01/06/2011 | US20110003257 Processes for photolithography |
| 01/06/2011 | US20110003256 Lithographic Apparatus and Device Manufacturing Method |
| 01/06/2011 | US20110003255 Method for processing workpiece with photoresist layer |
| 01/06/2011 | US20110003254 Layout decomposition method applicable to a dual-pattern lithography |
| 01/06/2011 | US20110003253 Method of manufacturing semiconductor device and pattern formation method |
| 01/06/2011 | US20110003252 Functionalized fullerenes for nanolithography applications |
| 01/06/2011 | US20110003251 Positive resist composition and pattern forming process |
| 01/06/2011 | US20110003250 Coating compositions suitable for use with an overcoated photoresist |
| 01/06/2011 | US20110003249 Silsesquioxane Resins |
| 01/06/2011 | US20110003248 Positive photosensitive resin composition |
| 01/06/2011 | US20110003247 Photoacid generator, resist composition, and patterning process |
| 01/06/2011 | US20110003246 Electrode and method for manufacturing the same |
| 01/06/2011 | US20110003241 Resin, pigment dispersion, colored curable composition, color filter produced using the same, and method for producing the same |
| 01/06/2011 | US20110003240 Method for forming holograms |
| 01/06/2011 | US20110003166 Method for Producing a Film Element |
| 01/06/2011 | US20110003123 Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates |
| 01/06/2011 | US20110001955 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle |
| 01/06/2011 | US20110001949 Optical imaging arrangement |
| 01/06/2011 | US20110001948 Illumination system for a microlithography projection exposure apparatus |
| 01/06/2011 | US20110001947 Facet mirror for use in a projection exposure apparatus for microlithography |
| 01/06/2011 | US20110001945 Projection optical system, exposure apparatus, and assembly method thereof |
| 01/06/2011 | US20110001943 Exposure apparatus, exposure method, and device manufacturing method |
| 01/06/2011 | US20110001942 Lithographic apparatus and device manufacturing method |
| 01/06/2011 | US20110001190 Alkali-developable curable composition, insulating thin film using the same, and thin film transistor |
| 01/06/2011 | US20110000874 Method for stripping photoresist |
| 01/05/2011 | EP2270599A1 Lithographic apparatus |
| 01/05/2011 | EP2270598A1 Laser exposure method, photoresist layer working method, and pattern molding manufacturing method |
| 01/05/2011 | EP2270597A1 Exposure method and apparatus and device manufacturing method |
| 01/05/2011 | EP2270596A2 Positive resist compostion and pattern forming process |
| 01/05/2011 | EP2270595A1 Radiation-sensitive resin composition |
| 01/05/2011 | EP2270594A1 Coloring curable composition, color filter and method for producing color filter |
| 01/05/2011 | EP2270593A1 Colored curable composition, color filter and solid-state imaging device |
| 01/05/2011 | EP2270592A2 Method of forming a pattern on a substrate |
| 01/05/2011 | EP2270114A1 Photobase generator |
| 01/05/2011 | EP2269710A1 Filters employing both acidic polymers and physical-adsorption media |
| 01/05/2011 | EP2269108A2 Spatial light modulator with structured mirror surfaces |
| 01/05/2011 | EP2268744A1 Azo pigments, and pigment dispersion, coloring composition and ink for inkjet recording containing the azo pigment |
| 01/05/2011 | EP1955114B1 Lithographic apparatus |
| 01/05/2011 | EP1362364B1 Semiconductor package and method of preparing same |
| 01/05/2011 | DE102009044462A1 Optical element for filtering electromagnetic radiations for illuminating system of projection exposure system, has multilayer structure, which is designed for reflection of electromagnetic radiations in extreme ultraviolet wavelength range |
| 01/05/2011 | DE102009032210A1 Bearbeitungsanlage Processing plant |
| 01/05/2011 | DE102009030501A1 Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes The imaging optics for imaging an object field in an image field and illumination optics for illuminating an object field |
| 01/05/2011 | CN201698153U Exposure equipment |
| 01/05/2011 | CN201698152U Exposure machine with humidity adjusting function |
| 01/05/2011 | CN1641414B Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method |
| 01/05/2011 | CN101939818A Elimination of photoresist material collapse and poisoning in 45-nm feature size using dry or immersion lithography |
| 01/05/2011 | CN101939166A Method of imaging and developing positive-working imageable elements |
| 01/05/2011 | CN101937928A Silicon controlled rectifier structure capable of eliminating hazards of punching through lithography pinholes and production method thereof |
| 01/05/2011 | CN101937910A LED light source, its manufacturing method, and LED-based photolithography apparatus and method |
| 01/05/2011 | CN101937904A Semiconductor device and method of manufacturing the same |
| 01/05/2011 | CN101937879A Preparation technique of SiGe Bi-CMOS appliance |
| 01/05/2011 | CN101937843A Pattern definition method of wet-method etching |
| 01/05/2011 | CN101937842A Method for processing a substrate and apparatus for performing the same |
| 01/05/2011 | CN101937838A Methods of forming electronic devices |
| 01/05/2011 | CN101937175A Photoetching method |
| 01/05/2011 | CN101937174A Substrate table, lithographic apparatus, method of using a substrate table and device manufacturing method |
| 01/05/2011 | CN101937173A Exposure method of exposure machine |