| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/18/2011 | US7871755 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation |
| 01/18/2011 | US7871754 Photosensitive composition |
| 01/18/2011 | US7871753 Positive resist composition and method of forming resist pattern |
| 01/18/2011 | US7871752 Lactone-containing compound, polymer, resist composition, and patterning process |
| 01/18/2011 | US7871751 Resist composition |
| 01/18/2011 | US7871556 combination of high viscosity and slower acting low viscosity resins, curable toughener, initiator and stabilizer; rapid homogeneous droplet merging and curing; tensile strength, ductility; computer controlled piezoelectric printing of three dimensional multilayer articles |
| 01/18/2011 | US7871211 Coating and developing system, coating and developing method and storage medium |
| 01/18/2011 | US7871171 Focusing-device for the radiation from a light source |
| 01/18/2011 | US7871004 Method and apparatus for self-referenced wafer stage positional error mapping |
| 01/13/2011 | WO2011004991A1 Wide area stamp for antireflective surface |
| 01/13/2011 | WO2011004908A1 Colored composition for light-shielding film, light-shielding pattern, method for forming the same, solid-state image sensing device, and method for producing the same |
| 01/13/2011 | WO2011004840A1 Polymer production method, polymer for use in lithography, resist composition and substrate production method |
| 01/13/2011 | WO2011004787A1 Copolymer for lithography and method for evaluating same |
| 01/13/2011 | WO2011004721A1 Composition for forming resist underlayer film and method for forming resist pattern using same |
| 01/13/2011 | WO2011004573A1 Alkali-soluble resin, positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device using the cured film |
| 01/13/2011 | WO2011004528A1 Pattern formation method |
| 01/13/2011 | WO2011004527A1 Chemically amplified resist material and pattern formation method using same |
| 01/13/2011 | WO2011003851A1 Method for producing pigments |
| 01/13/2011 | WO2011003736A1 Lithographic apparatus and device manufacturing method |
| 01/13/2011 | WO2011003734A1 Inspection method and apparatus, lithographic apparatus and lithographic processing cell |
| 01/13/2011 | WO2011003676A1 Mirror for the euv wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective |
| 01/13/2011 | WO2010118206A3 Process and apparatus for removal of contaminating material from substrates |
| 01/13/2011 | US20110009992 Process for the Production of a Three-Dimensional Object With Resolution Improvement by Pixel Shift |
| 01/13/2011 | US20110008735 Sulfonium salt, resist composition, and patterning process |
| 01/13/2011 | US20110008734 Exposure apparatus and device manufacturing method |
| 01/13/2011 | US20110008733 Phototools having a protective layer |
| 01/13/2011 | US20110008732 Photoacid generator compounds and compositions |
| 01/13/2011 | US20110008731 Actinic-ray-or radiation-sensitive resin composition, compound and method of forming pattern using the composition |
| 01/13/2011 | US20110008730 Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film |
| 01/13/2011 | US20110008729 Compositions and methods for forming electronic devices |
| 01/13/2011 | US20110008728 Resist composition and method of forming resist pattern |
| 01/13/2011 | US20110008727 Low Activation Energy Photoresist Composition and Process for Its Use |
| 01/13/2011 | US20110008719 Method and apparatus for measurement and control of photomask to substrate alignment |
| 01/13/2011 | US20110008718 Substrate conveyance method and substrate conveyance device, exposure apparatus using same, and device manufacturing method |
| 01/13/2011 | US20110008717 Exposure apparatus, exposure method and device manufacturing method |
| 01/13/2011 | US20110008611 Photosensitive resin composition, film for photosensitive resin spacer, and semiconductor device |
| 01/13/2011 | US20110008589 Positive Photosensitive Composition |
| 01/13/2011 | US20110007298 Method and apparatus for measurement of exit pupil transmittance |
| 01/13/2011 | US20110007293 Microlithographic projection exposure apparatus |
| 01/13/2011 | US20110007285 Lithographic apparatus and device manufacturing method |
| 01/13/2011 | US20110006402 Methods to reduce the critical dimension of semiconductor devices and related semiconductor devices |
| 01/13/2011 | US20110006401 Method and system for combining photomasks to form semiconductor devices |
| 01/13/2011 | DE102009032779A1 Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, projection lens for microlithography with such a mirror and projection exposure system for microlithography with such a projection lens |
| 01/13/2011 | CA2765288A1 Method and device for treating substrates |
| 01/12/2011 | EP2273315A1 Curable composition, color filter and process for production thereof, and solid-state imaging device |
| 01/12/2011 | EP2273314A1 Photosensitive resin composition, film for photosensitive resin spacer, and semiconductor device |
| 01/12/2011 | EP2273305A2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 01/12/2011 | EP2273304A1 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 01/12/2011 | EP2273270A1 Method and apparatus for the preparation and/or analysis of biochemical carriers |
| 01/12/2011 | EP2272929A1 Process for improving the adhesion of a material crosslinkable by UV on a substrat |
| 01/12/2011 | EP2272919A1 Method for manufacturing pigments |
| 01/12/2011 | EP2271966A1 Exposure apparatus, cleaning method, and device fabricating method |
| 01/12/2011 | EP2102895B1 Device and method for wet treating plate-like-articles |
| 01/12/2011 | EP1952201B1 Method of making a photopolymer printing plate |
| 01/12/2011 | CN1975585B Substrate processing method and substrate processing apparatus |
| 01/12/2011 | CN1910516B Computer-implemented methods for detecting defects in reticle design data |
| 01/12/2011 | CN1834784B Photosensitive composition and lithographic printing plate precursor |
| 01/12/2011 | CN1794085B Multi-transmission phase mask and exposure method using the same |
| 01/12/2011 | CN1721999B Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 01/12/2011 | CN1670623B Coating compositions |
| 01/12/2011 | CN101946305A Method for making structures with improved edge definition |
| 01/12/2011 | CN101946212A Microlithographic projection exposure apparatus |
| 01/12/2011 | CN101946211A Illumination system for a microlithographic projection exposure apparatus |
| 01/12/2011 | CN101946210A Composition for forming resist underlayer film and method for forming resist pattern using the same |
| 01/12/2011 | CN101946209A Silicon-containing resist underlayer film-forming composition containing cyclic amino group |
| 01/12/2011 | CN101946190A Facet mirror for use in a projection exposure apparatus for microlithography |
| 01/12/2011 | CN101946155A Gas gauge compatible with vacuum environments |
| 01/12/2011 | CN101944503A Etching method of semiconductor device |
| 01/12/2011 | CN101944483A Method for enhancing anti-etching capacity of photoresist |
| 01/12/2011 | CN101944475A Method of manufacturing semiconductor device and pattern formation method |
| 01/12/2011 | CN101943868A Method for removing photoresist and device thereof |
| 01/12/2011 | CN101943867A Adjacent exposure device, forming method of exposure beam and manufacturing method of panel substrate |
| 01/12/2011 | CN101943866A Exposure device |
| 01/12/2011 | CN101943865A Alignment marks for photoetching equipment and alignment method |
| 01/12/2011 | CN101943864A Positive resist composition and patterning process |
| 01/12/2011 | CN101943863A Photosensitive resin composition for black resist, and light shielding film of color filter |
| 01/12/2011 | CN101943862A Sulfonium salt photo-acid generator using stilbene as main body and preparation method thereof |
| 01/12/2011 | CN101943861A Novel resin and photoresist composition comprising the same |
| 01/12/2011 | CN101943860A Processes for photolithography |
| 01/12/2011 | CN101943859A Reel-to-reel ultraviolet nanometer coining device and method |
| 01/12/2011 | CN101943858A Compositions comprising sulfonamide material and processes for photolithography |
| 01/12/2011 | CN101943857A Compositions and processes for photolithography |
| 01/12/2011 | CN101943856A Composition containing hetero-substituted carbocyclic aryl component for photolithography and preparing method thereof |
| 01/12/2011 | CN101943855A Phase shift mask plate structure and manufacturing method thereof |
| 01/12/2011 | CN101572217B Method for incinerating etched substrate and method for forming etched structure |
| 01/12/2011 | CN101382738B Lithographic projection apparatus |
| 01/12/2011 | CN101369056B Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method |
| 01/12/2011 | CN101354528B Mask and related photo-etching method |
| 01/12/2011 | CN101344731B Device and method for transmission image sensing |
| 01/12/2011 | CN101320221B Systems and methods for insitu lens cleaning in immersion lithography |
| 01/12/2011 | CN101293425B Process for manufacturing fine-narrow ink supply groove suitable for ink jet head chip |
| 01/12/2011 | CN101211103B Manufacturing method for photo mask |
| 01/12/2011 | CN101175777B (methyl)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and method for forming pattern |
| 01/12/2011 | CN101077768B Preparation method of tiny structure body and pattern medium |
| 01/12/2011 | CN101057181B Photosensitive resin composition for flexographic printing |
| 01/12/2011 | CN101055427B Lithographic apparatus and device manufacturing method |
| 01/12/2011 | CN101055417B Sprinkler device |
| 01/12/2011 | CN101042987B Method of processing substrate |
| 01/12/2011 | CN101013269B Lithographic apparatus, device manufacturing method and exchangeable optical element |
| 01/12/2011 | CN101008784B Photosensitive monomer, liquid crystal material, liquid crystal panel and manufacture method, and photoelectric equipment and manufacture method thereof |