| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/25/2011 | US7875418 Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| 01/25/2011 | US7875417 Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method |
| 01/25/2011 | US7875416 Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition |
| 01/25/2011 | US7875408 comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure; to improve the aerial image effectively seen by the photoresist and thereby improve the contrast |
| 01/25/2011 | US7875197 Methods of etching articles via microcontact printing |
| 01/25/2011 | US7875118 Crystallization method and crystallization apparatus |
| 01/25/2011 | CA2401187C Substrate having character/symbol section and processing method of character/symbol section |
| 01/25/2011 | CA2378190C Microfabricated elastomeric valve and pump systems |
| 01/20/2011 | WO2011009094A2 Leveling devices and methods |
| 01/20/2011 | WO2011008781A1 Methods for forming hydrogels on surfaces and articles formed thereby |
| 01/20/2011 | WO2011008270A2 A system for engraving flexographic plates |
| 01/20/2011 | WO2011008246A1 System for collision detection between objects |
| 01/20/2011 | WO2011008051A2 Composition for removing resists used with copper or copper alloy |
| 01/20/2011 | WO2011008042A2 A polyimide and a light-sensitive resin composition comprising the same |
| 01/20/2011 | WO2011008036A2 Photosensitive polyimide and photosensitive resin composition comprising same |
| 01/20/2011 | WO2011007901A1 Pattern forming device, pattern forming method, and device manufacturing method |
| 01/20/2011 | WO2011007896A1 Pattern formation apparatus, pattern formation method, and device manufacturing method |
| 01/20/2011 | WO2011007780A1 Radiation-sensitive resin composition and compound |
| 01/20/2011 | WO2011007566A1 Photocurable resin composition |
| 01/20/2011 | WO2011006685A1 Micromirror arrangement having a coating and method for the production thereof |
| 01/20/2011 | WO2011006581A1 Illumination system for illuminating a mask in a microlithographic projection exposure apparatus |
| 01/20/2011 | WO2011006522A1 Microlithographic projection exposure apparatus and method of measuring a parameter related to an optical surface contained therein |
| 01/20/2011 | WO2010134645A3 Exposure apparatus, exposure method, and device manufacturing method |
| 01/20/2011 | US20110015108 Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners |
| 01/20/2011 | US20110014577 Pellicle inspection device, exposure apparatus using same, and device manufacturing method |
| 01/20/2011 | US20110014576 Method for manufacturing substrate structure |
| 01/20/2011 | US20110014575 Method of manufacturing optical waveguide device |
| 01/20/2011 | US20110014574 Method of forming pitch multipled contacts |
| 01/20/2011 | US20110014573 System for engraving flexographic plates |
| 01/20/2011 | US20110014572 Self-powered lithography method and apparatus using radioactive thin films |
| 01/20/2011 | US20110014571 Positive resist composition and pattern forming method using the same |
| 01/20/2011 | US20110014570 Resist composition and pattern forming method using the same |
| 01/20/2011 | US20110014569 Radiation-sensitive resin composition and polymer |
| 01/20/2011 | US20110014568 Salt and photoresist composition containing the same |
| 01/20/2011 | US20110014567 Salt and photoresist composition containing the same |
| 01/20/2011 | US20110014566 Salt and photoresist composition containing the same |
| 01/20/2011 | US20110014555 Method of manufacturing a color liquid crystal panel |
| 01/20/2011 | US20110014554 Colored curable composition, color filter, and method for producing color filter |
| 01/20/2011 | US20110014551 Reticle and manufacturing method of solid-state image sensor |
| 01/20/2011 | US20110013161 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 01/20/2011 | US20110013121 Phase difference layer laminated body for three dimensional liquid crystal display device and manufacturing method thereof |
| 01/20/2011 | US20110011157 Gas chromatograph column with carbon nanotube-bearing channel |
| 01/20/2011 | DE102009032939A1 Wabenkondensor, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage Honeycomb condenser, particularly for microlithography projection exposure apparatus |
| 01/20/2011 | CA2809726A1 Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
| 01/20/2011 | CA2768140A1 Methods for forming hydrogels on surfaces and articles formed thereby |
| 01/20/2011 | CA2763640A1 Leveling devices and methods |
| 01/19/2011 | EP2275870A1 Method of manufacturing cylinder-shaped flexographic plates using digital images |
| 01/19/2011 | EP2275869A2 Exposure apparatus and device manufacturing method |
| 01/19/2011 | EP2275868A1 Interferometric analysis of surfaces |
| 01/19/2011 | EP2275867A1 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device |
| 01/19/2011 | EP2275495A1 Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter |
| 01/19/2011 | EP2275490A1 Coating compositions for use with an overcoated photoresist |
| 01/19/2011 | EP2275459A1 Polyfunctional vinyl aromatic copolymer, process for producing the same, and resin composition |
| 01/19/2011 | EP2274652A1 A process for shrinking dimensions between photoresist pattern comprising a pattern hardening step |
| 01/19/2011 | EP2274651A1 Thick film recycling method |
| 01/19/2011 | EP2274650A1 A photoresist image-forming process using double patterning |
| 01/19/2011 | EP2274090A1 Nano-getter device |
| 01/19/2011 | EP1614704B1 Crosslinked polyimide, composition comprising the same and method for producing the same |
| 01/19/2011 | EP1299237B1 Printing plates comprising modified pigment products |
| 01/19/2011 | EP1114355B8 Method and apparatus for developing photoresist patterns |
| 01/19/2011 | CN201716521U Negative film frame of exposure machine |
| 01/19/2011 | CN1912739B Light exposure mask and method for manufacturing semiconductor device using the same |
| 01/19/2011 | CN1846173B Liquid photoresist remover composition, process for producing pattern with the same, and display employing the same |
| 01/19/2011 | CN1837960B Lithographic apparatus and manufacturing method thereof |
| 01/19/2011 | CN1818797B Light-intensity data bus system and method |
| 01/19/2011 | CN1768418B Organosilicate resin formulation for use in microelectronic devices |
| 01/19/2011 | CN1737682B Planographic printing plate precursor |
| 01/19/2011 | CN101952780A Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method |
| 01/19/2011 | CN101952779A Optcal system for a microlithographic projection exposure apparatus and microlithographic exposure method |
| 01/19/2011 | CN101952778A Photosensitive resin laminate |
| 01/19/2011 | CN101952777A Method for producing cured resist using negative photosensitive resin laminate, negative photosensitive resin laminate, and use of negative photosensitive resin laminate |
| 01/19/2011 | CN101952269A Sulphonium salt initiators |
| 01/19/2011 | CN101952248A Sulphonium salt initiators |
| 01/19/2011 | CN101950132A Device for measuring clearance between mask and silicon chip and leveling mask and silicon chip in nanolithography |
| 01/19/2011 | CN101950131A Photomask processor and device producing method |
| 01/19/2011 | CN101950130A Lithographic apparatus and lithographic projection apparatus |
| 01/19/2011 | CN101950129A Lithographic apparatus and a method of measuring flow rate in a two phase flow |
| 01/19/2011 | CN101950128A Photosensitive resin for plasma display screen |
| 01/19/2011 | CN101950127A Novel resins and photoresist compositions comprising same |
| 01/19/2011 | CN101950126A Method for manufacturing three-dimensional smooth curved surface microstructure based on SU-8 thick photo-resist |
| 01/19/2011 | CN101950065A Fully-spherical deep ultraviolet lithography objective |
| 01/19/2011 | CN101949734A Method for improving measurement precision of beam polarization degree |
| 01/19/2011 | CN101947894A Process for printing optical variable color counterfeiting ink |
| 01/19/2011 | CN101581347B Vibration reduction support device and photoetching machine using same |
| 01/19/2011 | CN101414536B 电子束曝光系统 Electron beam exposure system |
| 01/19/2011 | CN101359182B Lithographic apparatus having encoder type position sensor system |
| 01/19/2011 | CN101286015B Developing method for improving critical dimension uniformity |
| 01/19/2011 | CN101258169B Radiation-sensitive resin composition and color filters |
| 01/19/2011 | CN101203805B Thermal development system and method of using the same |
| 01/19/2011 | CN101114034B Black dispersion, pigmentation composition, photosensitive transprinting material containing metal particulate |
| 01/19/2011 | CN101082781B Tracing system and method, exposure parameter calculating device and method, substrate manufacturing method |
| 01/19/2011 | CN101082684B Paint dispersion combination, optical solidification combination, filter produced thereof and producing method |
| 01/19/2011 | CN101036086B A flexible nano-imprint stamp |
| 01/19/2011 | CN101025460B Micro optical component positioning structure and micro channel module preparation using micro channel array |
| 01/18/2011 | US7873937 System and method for lithography simulation |
| 01/18/2011 | US7871761 Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern |
| 01/18/2011 | US7871760 Method to fabricate a redirecting mirror in optical waveguide devices |
| 01/18/2011 | US7871759 Includes compound whose alkali-insoluble property is changed to an alkali-soluble property by an alkaline solution such as aqueous cesium sulfate or phosphoric acid solution; selectively irradiating the resist film through the barrier film (polylactone) with exposing light; lithography |
| 01/18/2011 | US7871758 lamination of support having an upper surface on which copper exists, an inorganic substance layer and a photoresist layer, then selectively irradiating the laminate and developing to form a resist patterns |
| 01/18/2011 | US7871756 used for producing a permanent film, capable of forming a resin layer which is good in fluidity upon heat bonding after pattern, formation and also has good adhesion as well as bonding properties and/or sealing properties |