| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/27/2011 | US20110020754 Method of fabricating a metallic microstructure and microstructure obtained via the method |
| 01/27/2011 | US20110020753 Method for reversing tone of patterns on integrated circuit and patterning sub-lithography trenches |
| 01/27/2011 | US20110020752 Extreme ultraviolet radiation source and method for producing extreme ultraviolet radiation |
| 01/27/2011 | US20110020751 Lithographic printing plate precursor and production process of lithographic printing plate using the precursor |
| 01/27/2011 | US20110020750 Lithographic imaging and printing with wet, positive-working printing members |
| 01/27/2011 | US20110020749 Chemically amplified resist composition and salt employed therein |
| 01/27/2011 | US20110020738 Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter |
| 01/27/2011 | US20110020737 Reflection-type exposure mask and method of manufacturing a semiconductor device |
| 01/27/2011 | US20110020616 Method of Determining Overlay Error and a Device Manufacturing Method |
| 01/27/2011 | US20110019174 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
| 01/27/2011 | US20110019170 Projection exposure apparatus and stage unit, and exposure method |
| 01/27/2011 | US20110019168 Lithographic apparatus and device manufacturing method |
| 01/27/2011 | US20110019128 Optical member, lighting device, display device, television receiver and manufacturing method of optical member |
| 01/27/2011 | DE102009034502A1 Optical module for guiding extreme UV radiation beam in lighting system of microlithographic projection-illumination system, has central control unit in signal connection to integrated electronic displacement circuit |
| 01/27/2011 | DE102009033762A1 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper A process for producing a multilayer body as well as multi-layer body |
| 01/26/2011 | EP2278611A1 Organosilicate resin formulation for use in microelectronic devices |
| 01/26/2011 | EP2278404A2 Method of making a photopolymer printing plate |
| 01/26/2011 | EP2278403A1 A filter device for the compensation of an asymmectric pupil illumination |
| 01/26/2011 | EP2278402A2 Optical element and exposure apparatus |
| 01/26/2011 | EP2278401A2 Exposure apparatus and device manufacturing method |
| 01/26/2011 | EP2278400A2 Positive-working resist composition |
| 01/26/2011 | EP2278399A2 Positive-working resist composition |
| 01/26/2011 | EP2278398A2 Positive-working resist composition |
| 01/26/2011 | EP2278397A2 Positive-working resist composition |
| 01/26/2011 | EP2278396A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
| 01/26/2011 | EP2278380A1 Design and manufacturing method of an optical element |
| 01/26/2011 | EP2277929A1 Copolymer and top coating composition |
| 01/26/2011 | EP2277084A1 Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in opc model space |
| 01/26/2011 | EP2277027A1 Photopolymerizable compositions |
| 01/26/2011 | EP2144894B1 Oxime ester photoinitiators |
| 01/26/2011 | CN201725144U Photoresist recycling device |
| 01/26/2011 | CN201725143U Hole sealing solution heating device for sensitizing plate production line for printing |
| 01/26/2011 | CN1981239B Photopolymer printing plate precursor. |
| 01/26/2011 | CN1975568B Pattern forming method using photomask |
| 01/26/2011 | CN1961065B Nanoelectronic and microelectronic cleaning compositions |
| 01/26/2011 | CN1955844B Salt suitable for an acid generator and a chemically amplified resist composition containing the same |
| 01/26/2011 | CN1947061B Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers |
| 01/26/2011 | CN1941283B Semiconductor device fabrication method |
| 01/26/2011 | CN1938370B Method of coloring a coating composition |
| 01/26/2011 | CN1918694B Development device and developing method |
| 01/26/2011 | CN1875325B Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| 01/26/2011 | CN1860414B Positive photosensitive resin composition, method for forming pattern, and electronic component |
| 01/26/2011 | CN1727996B Improved image forming composition and method |
| 01/26/2011 | CN1661475B Photocuring resinoid compositio and printed circuit board using same |
| 01/26/2011 | CN1605918B Thin film transistor array substrate and method of fabricating the same |
| 01/26/2011 | CN1506768B Alignment system and method for photoetching system |
| 01/26/2011 | CN101960388A Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition |
| 01/26/2011 | CN101960387A Lithographic apparatus and method |
| 01/26/2011 | CN101960386A Debris mitigation device with rotating foil trap and drive assembly |
| 01/26/2011 | CN101960385A Multi-photon exposure system |
| 01/26/2011 | CN101960384A Method for operating an illumination system of a microlithographic projection exposure apparatus |
| 01/26/2011 | CN101960383A Method for processing work having photoresist layer |
| 01/26/2011 | CN101960382A Positive photosensitive polyimide composition |
| 01/26/2011 | CN101960381A Radiation-sensitive composition for the formation of colored layers, color filters, and color liquid crystal displays |
| 01/26/2011 | CN101960380A Colored curable composition, color filter and solid-state imaging device |
| 01/26/2011 | CN101960338A Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
| 01/26/2011 | CN101960337A Coloring resin composition for color filter, color filter, organic EL display and liquid crystal display |
| 01/26/2011 | CN101959980A Antireflective coating compositions |
| 01/26/2011 | CN101959909A Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition |
| 01/26/2011 | CN101959908A Radiation-sensitive composition, polymer and monomer |
| 01/26/2011 | CN101959686A Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates |
| 01/26/2011 | CN101959685A A method for making a lithographic printing plate |
| 01/26/2011 | CN101959663A Mold processing method and mold manufacturing method |
| 01/26/2011 | CN101958278A Manufacturing method of semiconductor device |
| 01/26/2011 | CN101958237A Method for forming photolithography alignment marks |
| 01/26/2011 | CN101958234A Photoetching manufacturing process |
| 01/26/2011 | CN101957567A Position calibration of alignment heads in a multi-head alignment system |
| 01/26/2011 | CN101957565A Organic film removing agent |
| 01/26/2011 | CN101957564A Cleaning method for photoresist layer residues |
| 01/26/2011 | CN101957563A Fluorine-containing plasma etching residue cleaning solution |
| 01/26/2011 | CN101957562A Double-exposure method |
| 01/26/2011 | CN101957561A Sensor, table and lithographic apparatus |
| 01/26/2011 | CN101957560A Patterning method and stacking structure for patterning |
| 01/26/2011 | CN101957559A Optical reversible nanoimprint photoresist as well as preparation method and application method thereof |
| 01/26/2011 | CN101957558A Screen printing photosensitive emulsion and production method thereof |
| 01/26/2011 | CN101957475A Method of manufacturing optical waveguide device |
| 01/26/2011 | CN101955852A Cleaning solution for plasma etching residues |
| 01/26/2011 | CN101955690A Method for manufacturing the pigment dispersed solution |
| 01/26/2011 | CN101955595A Method for guiding fixed-point cell growth by preparing chemical micro-patterns on surfaces of various materials |
| 01/26/2011 | CN101955476A Salt and photoresist composition containing the same |
| 01/26/2011 | CN101955454A Salt and photoresist composition containing the same |
| 01/26/2011 | CN101955453A Salt and photoresist composition containing the same |
| 01/26/2011 | CN101551597B A self-imaging double-sided overlay aligning method |
| 01/26/2011 | CN101551594B Detection system and method of lithography machine projection lens odd chromatic aberration based on two-stage illumination |
| 01/26/2011 | CN101533795B Apparatus for conveying substrate and apparatus for processing substrate |
| 01/26/2011 | CN101354539B Exposure apparatus and method for producing device |
| 01/26/2011 | CN101339364B Method for manufacturing microlens array by soft mode impressing |
| 01/26/2011 | CN101256551B Method and system for detecting photo mask, computer readable storage medium |
| 01/26/2011 | CN101200566B Photosensitive resin composition for forming organic insulating film and device using the same |
| 01/26/2011 | CN101183220B Apparatus for suppling chemical agent supply |
| 01/26/2011 | CN101156227B Process for the formation of miniaturized getter deposits and getterdeposits so obtained |
| 01/26/2011 | CN101097407B Tracing system, tracing material correction device and method, substrate manufacture method |
| 01/26/2011 | CN101051184B Large area micro nano structure soft impression method |
| 01/25/2011 | USRE42065 Illumination system particularly for microlithography |
| 01/25/2011 | US7876440 Apparatus and methods for detecting overlay errors using scatterometry |
| 01/25/2011 | US7876418 Optical element and projection exposure apparatus based on use of the optical element |
| 01/25/2011 | US7876417 Lithographic systems and methods with extended depth of focus |
| 01/25/2011 | US7875864 Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles and other objects |
| 01/25/2011 | US7875420 after exposing and developing substrate, supplying solvent gas of treatment film to dissolve surface, supplying solvent gas (vapor of acetone); surface treatment; photoresists; photolithography; semiconductors |
| 01/25/2011 | US7875419 Cleaning after doping or etching without leaving residue; decomposing photosensitizer with light exposure prior to nonaqueous solvent treatment |