| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/03/2011 | DE102007059717B4 Vorrichtung und Verfahren zur Herstellung von Mikrobauteilen sowie Verwendung einer derartigen Vorrichtung Device and method for the production of micro-components and the use of such a device |
| 02/03/2011 | DE102005056702B4 TFT-Arraysubstrat und zugehöriges Herstellverfahren TFT array substrate manufacturing process and related |
| 02/02/2011 | EP2280408A2 Light source device |
| 02/02/2011 | EP2280309A1 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film |
| 02/02/2011 | EP2280308A1 Processes for photolithography |
| 02/02/2011 | EP2280295A1 Method for producing optical elements for microlithography, lens systems obtainable therewith and their use |
| 02/02/2011 | EP2279517A2 Methods of forming structures supported by semiconductor substrates |
| 02/02/2011 | EP2279499A1 Method for producing ceramic stereolithography parts |
| 02/02/2011 | EP2279455A2 Method for defining regions of differing porosity of a nitrocellulose film on a substrate |
| 02/02/2011 | EP2279454A1 Photopolymerizable flexographic printing elements for printing with uv inks |
| 02/02/2011 | EP2279453A1 Method of making a pillar pattern using triple or quadruple exposure |
| 02/02/2011 | EP2082287B1 Antireflective coating composition and process for imaging a photoresist using it |
| 02/02/2011 | CN201732247U Multiple light source photoreceptive printing ink exposure machine |
| 02/02/2011 | CN1991580B Chromatic photosensitivity composition and method for manufacturing same |
| 02/02/2011 | CN1959940B Forming method of part semiconductor assembly |
| 02/02/2011 | CN1932643B Photocuring composition and plasma display panel produced by using the same |
| 02/02/2011 | CN1818779B Photosensitive resin composition, its condensate and display panel used interval element formed therewith |
| 02/02/2011 | CN1721992B Star polymer |
| 02/02/2011 | CN1698011B Lithographic printing with polarized light |
| 02/02/2011 | CN1637531B Trans-reflective type liquid crystal display device and method for fabricating the same |
| 02/02/2011 | CN101965626A Process sequence for formation of patterned hard mask film (rfp) without need for photoresist or dry etch |
| 02/02/2011 | CN101965542A Photosensitive polyorganosiloxane composition |
| 02/02/2011 | CN101965541A Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same |
| 02/02/2011 | CN101965375A Photosensitive resin and photosensitive resin composition comprising the same |
| 02/02/2011 | CN101963766A Mask pre-aligning device and method for photoetching machine |
| 02/02/2011 | CN101963765A Light beam stabilizing device in projection mask aligner |
| 02/02/2011 | CN101963764A Photoetching method of wafer |
| 02/02/2011 | CN101963763A Double-driving double-bridge table changing station-based double-workpiece table high-accuracy exchange device |
| 02/02/2011 | CN101963762A Preparation device for synthesizing gene chip in situ |
| 02/02/2011 | CN101963761A Surface plasmon (SPP)-based large-area interference lithography technology |
| 02/02/2011 | CN101963760A Coating apparatus having coater chuck |
| 02/02/2011 | CN101963759A Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus |
| 02/02/2011 | CN101963758A Calixarene blended molecular glass photoresists and processes of use |
| 02/02/2011 | CN101963757A Organic silicon modified alkali soluble photosensitive resin, preparation method thereof and printing ink composition |
| 02/02/2011 | CN101963756A Methods of forming electronic devices |
| 02/02/2011 | CN101963755A Self-aligned spacer multiple patterning methods |
| 02/02/2011 | CN101963754A Methods of adjusting dimensions of resist patterns |
| 02/02/2011 | CN101963753A Multi-color photomask and method of manufacturing the same, and pattern transfer method |
| 02/02/2011 | CN101963752A Manufacturing method of photomask |
| 02/02/2011 | CN101962507A Compositions and processes for photolithography |
| 02/02/2011 | CN101614964B Silicon slice table double-table exchange exposure system and double-table exchange method |
| 02/02/2011 | CN101571675B Balancing and positioning system for workpiece platform of photoetching machine |
| 02/02/2011 | CN101533227B Edge exposure adjusting device |
| 02/02/2011 | CN101510057B Multiple imaging photoetching device and method |
| 02/02/2011 | CN101510056B Adjustment device and method for movement of workpiece platform of photoetching machine |
| 02/02/2011 | CN101509637B Top module installing and adjusting mechanism for illumination |
| 02/02/2011 | CN101487986B Sensor of photo-etching equipment, its production method and self-calibration method |
| 02/02/2011 | CN101482705B Scanning exposure system and method of photo-etching machine |
| 02/02/2011 | CN101482704B Alignment light intensity signal collection and demodulation apparatus |
| 02/02/2011 | CN101477316B Gravity compensator |
| 02/02/2011 | CN101417564B Anti-counterfeiting film with double color-changing pattern and preparation method thereof |
| 02/02/2011 | CN101399171B Method of forming alignment mark |
| 02/02/2011 | CN101373336B Method for optimizing exposure device monitoring |
| 02/02/2011 | CN101324758B Monitoring system and monitoring method of photoetching machine |
| 02/02/2011 | CN101320207B Method for preparing optical grating by holography-ion beam etching |
| 02/02/2011 | CN101295141B Exposure drawing device |
| 02/02/2011 | CN101236360B Method and apparatus for inspecting defects on mask |
| 02/02/2011 | CN101218538B Photosensitive resin composition, and photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma di |
| 02/02/2011 | CN101216666B Manufacture method of master embodying rainbow holographic image and special-purpose holographic image |
| 02/02/2011 | CN101162365B Photosensitive resin composition and method of making the same and film build method |
| 02/02/2011 | CN101116036B 正性光致抗蚀剂组合物 Positive photoresist compositions |
| 02/02/2011 | CN101105637B System and method for using a two part cover for protecting a reticle |
| 02/01/2011 | US7880880 Alignment systems and methods for lithographic systems |
| 02/01/2011 | US7880273 Method of manufacturing semiconductor device from semiconductor wafer |
| 02/01/2011 | US7880152 Device and method for producing resist profiled elements |
| 02/01/2011 | US7879784 Organic solvent, sugar, water and such as n-methylethanolamine; suppressing corrosion; gallium arsenide semiconductors; quality, low cost integrated circuits |
| 02/01/2011 | US7879725 Stripping composition for removing a photoresist and method of manufacturing TFT substrate for a liquid crystal display device using the same |
| 02/01/2011 | US7879627 Overlay marks and methods of manufacturing such marks |
| 02/01/2011 | US7879538 Frequency division multiplexing (FDM) lithography |
| 02/01/2011 | US7879536 Attaching a dry film resist onto a substrate in a sticky or adhesive manner; exposure to light by irradiating a focusable energy beam selectively and directly onto the dry film resist to pattern the dry film resist into the desired shape, a pattern template |
| 02/01/2011 | US7879535 Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material |
| 02/01/2011 | US7879534 Photolithography of a substrate layered with a photosensitive layer, and an electroconductive layer; attaching oligonucleotide, protein or antibody probes to the conductive fingers; the target nucleic acid molecule completes an electronic circuit; high speed detection |
| 02/01/2011 | US7879532 Method of manufacturing semiconductor device |
| 02/01/2011 | US7879531 Immersion lithography fluids |
| 02/01/2011 | US7879530 Antireflective coating composition, antireflective coating, and patterning process |
| 02/01/2011 | US7879529 An alkaline-soluble, water-insoluble acrylic copolymer, a solvent and a fluorocompound to adjust the refractive index of the liquid of the immersion lithography process; antireflectivity; 1,3-tetraoxo,4,5-tetrafluoro-1,3,2-tetrahydrodithiazole |
| 02/01/2011 | US7879528 For forming pattern that prevents contamination within the exposure apparatus; lithography |
| 02/01/2011 | US7879527 Method of producing positive resist composition, positive resist composition, and method of forming resist pattern |
| 02/01/2011 | US7879526 Hardmask compositions for resist underlayer films |
| 02/01/2011 | US7879525 A photoresist comprising a resin that undergoes a change in alkali solubility by an acid, an acid generating compound and a corrosion inhibitor, e.g. trimercapto-1,3,5-triazine; stabiliity prior to development; used in the manufacturing of connection terminals during the mounting of semiconductors |
| 02/01/2011 | US7879524 Heat sensitive transfer image receiver sheet and heat sensitive transfer sheet on support; dye receiver layer; heat insulation layer containing hollow polymer particles and hydrophilic polymer |
| 02/01/2011 | US7879516 Manufacturing method of semiconductor integrated circuit device |
| 02/01/2011 | US7879137 Lithographic projection apparatus, purge gas supply system and gas purging method |
| 02/01/2011 | US7878755 Load lock and method for transferring objects |
| 02/01/2011 | CA2541513C Method for preparing artificial cell tissue and substrate therefor |
| 01/27/2011 | WO2011011167A2 Curable composition, method of coating a phototool, and coated phototool |
| 01/27/2011 | WO2011011142A2 Method and materials for reverse patterning |
| 01/27/2011 | WO2011011140A2 Method and materials for double patterning |
| 01/27/2011 | WO2011011139A2 Method and materials for reverse patterning |
| 01/27/2011 | WO2011010771A1 Resist for electron beam lithography, and method for developing resist for electron beam lithography |
| 01/27/2011 | WO2011010560A1 Lighting optical system, exposure apparatus, and device manufacturing method |
| 01/27/2011 | WO2011010461A1 Photocurable resin composition |
| 01/27/2011 | WO2011010459A1 Photocurable resin composition |
| 01/27/2011 | WO2011010457A1 Photocurable resin composition |
| 01/27/2011 | WO2010140597A3 Transporting method, transporting apparatus, exposure method, and exposure apparatus |
| 01/27/2011 | WO2010067905A3 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 01/27/2011 | WO2010067898A3 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition |
| 01/27/2011 | US20110020757 Method of preparing lithographic printing plate |
| 01/27/2011 | US20110020756 Calixarene Blended Molecular Glass Photoresists and Processes of Use |
| 01/27/2011 | US20110020755 Method of forming patterns |