| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/09/2011 | CN101968610A Method for removing optical resist after all-wet etching process |
| 02/09/2011 | CN101968609A Reflective optical element with lower contamination |
| 02/09/2011 | CN101968608A Lithographic apparatus and device manufacturing method |
| 02/09/2011 | CN101968607A Automatic focusing method and device for lithography machine |
| 02/09/2011 | CN101968565A Method for improving imaging quality of endoscope |
| 02/09/2011 | CN101968335A Solar cell crystal silicon wafer inspection template and manufacturing method thereof |
| 02/09/2011 | CN101967116A Chemically amplified resist composition and salt employed therein |
| 02/09/2011 | CN101572265B Thin film transistor structure and manufacture method thereof |
| 02/09/2011 | CN101522879B A low etching property cleaning solution for thicker photoresist |
| 02/09/2011 | CN101503389B Novel method for synthesizing SBQ sensitizer 4-[2-(4-formyl phenyl )vinyl]pyridine |
| 02/09/2011 | CN101490624B Correction of spatial instability of an EUV source by laser beam steering |
| 02/09/2011 | CN101470354B Method for improving non-mask photo-etching definition |
| 02/09/2011 | CN101392062B Alkali soluble light-sensitive organosilicon prepolymer and preparation method thereof |
| 02/09/2011 | CN101385124B Maintenance method, exposure method and apparatus, and device manufacturing method |
| 02/09/2011 | CN101382737B Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 02/09/2011 | CN101334493B Composite lens structure and method for forming same |
| 02/09/2011 | CN101303536B Exposure apparatus and device producing method |
| 02/09/2011 | CN101303535B Lithographic apparatus and sensor calibration method |
| 02/09/2011 | CN101303524B Full forbidden region three-dimensional photon crystal stamp molding method |
| 02/09/2011 | CN101281377B Lithographic apparatus and device manufacturing method |
| 02/09/2011 | CN101281375B Method for removing micro-air blister / particulate in liquid, liquid supplier and uses thereof |
| 02/09/2011 | CN101154052B Light source for exposure, exposure device, exposure method and method for manufacturing panel substrate |
| 02/09/2011 | CN101140425B Exposing device, exposing method and method for manufacturing display panel substrate |
| 02/09/2011 | CN101124089B 纳米级电子光刻 Nanoscale electron lithography |
| 02/09/2011 | CN101107570B Projection optical system |
| 02/09/2011 | CN101058481B Organic EL coating device and method |
| 02/09/2011 | CN101055430B Lithographic apparatus, lens interferometer and device manufacturing method |
| 02/08/2011 | USRE42128 Compositions for removing residue from a substrate and use thereof |
| 02/08/2011 | USRE42118 Projection system for EUV lithography |
| 02/08/2011 | US7884909 Transflective liquid crystal display device and fabricating method thereof |
| 02/08/2011 | US7884249 Bicyclo compound, method for producing pentacene and a film thereof using the same, and method for producing bicyclo compound |
| 02/08/2011 | US7883840 Developing method and method for fabricating semiconductor device using the developing method |
| 02/08/2011 | US7883838 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition |
| 02/08/2011 | US7883836 photoresists; semiconductors; bottom anti reflective coating |
| 02/08/2011 | US7883834 Method for forming pattern |
| 02/08/2011 | US7883833 providing lithographic printing plate including developing exposed imageable element with alkali silicate-containing developer; conductivity of developer and regenerator is suppressed from presence of reducing agents such as glycerin |
| 02/08/2011 | US7883832 Method and apparatus for direct referencing of top surface of workpiece during imprint lithography |
| 02/08/2011 | US7883830 With a photosensitive layer; a photopolymerizable compound, a copolymer undercoat layer from alkoxyvinyl silanes, polyethers, vinyl phosphoric acid, acrylic monomers |
| 02/08/2011 | US7883829 Lithography for pitch reduction |
| 02/08/2011 | US7883828 Functionalized carbosilane polymers and photoresist compositions containing the same |
| 02/08/2011 | US7883827 Polymerizable composition and planographic printing plate precursor |
| 02/08/2011 | US7883826 Improved fast digital speed (high imaging sensitivity) and printability (shelf-life), while eliminating preheat step normally used between exposure and development; lithography |
| 02/08/2011 | US7883823 Photomask and method for manufacturing a semiconductor device using the photomask |
| 02/08/2011 | CA2476591C Azo dyes |
| 02/08/2011 | CA2459374C Photoactivable nitrogen bases |
| 02/03/2011 | WO2011014020A2 Photoresist composition for forming a self-aligned double pattern |
| 02/03/2011 | WO2011014011A2 Photoresist composition comprising a crosslinkable curing substance |
| 02/03/2011 | WO2011013842A1 Actinic ray-sensitive or radiation-sensitive composition and pattern forming method using the same |
| 02/03/2011 | WO2011013664A1 Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern |
| 02/03/2011 | WO2011013630A1 Composition for forming resist underlayer film for nanoimprint lithography |
| 02/03/2011 | WO2011013601A1 Flexographic printing original plate |
| 02/03/2011 | WO2011013547A1 Negative photosensitive resin composition, polyimide resin film using same, and flexible printed circuit board |
| 02/03/2011 | WO2011013318A1 Coloring composition, color filter and color liquid crystal display element |
| 02/03/2011 | WO2011012624A1 Metrology method and apparatus, lithographic system, and lithographic processing cell |
| 02/03/2011 | WO2011012560A1 Macrophotoinitiators |
| 02/03/2011 | WO2011012559A2 Post ion implant stripper for advanced semiconductor application |
| 02/03/2011 | WO2011012412A1 Inspection method for lithography |
| 02/03/2011 | WO2011012368A1 Low and high pressure proximity sensors |
| 02/03/2011 | WO2011012267A1 Magnifying imaging lens and metrology system having said imaging lens |
| 02/03/2011 | WO2011012266A1 Magnifying imaging lens and metrology system having said imaging lens |
| 02/03/2011 | WO2011012265A1 Determination of the relative position of two structures |
| 02/03/2011 | WO2011012263A1 Holding arrangement for an optical element |
| 02/03/2011 | WO2011012148A1 Optical beam deflecting element and method of adjustment |
| 02/03/2011 | WO2011012144A1 Component of an euv or uv lithography apparatus and method for producing it |
| 02/03/2011 | US20110027727 Substrate developing method, substrate processing method and developing solution supply nozzle |
| 02/03/2011 | US20110027726 Polymer compound for photoresist |
| 02/03/2011 | US20110027725 Polyol compound for photoresist |
| 02/03/2011 | US20110027724 Spatial light modulating unit, illumination optical system, exposure apparatus, and device manufacturing method |
| 02/03/2011 | US20110027723 Measuring apparatus, optical system manufacturing method, exposure apparatus, device manufacturing method, and processing apparatus |
| 02/03/2011 | US20110027722 Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same |
| 02/03/2011 | US20110027721 Lithographic apparatus and device manufacturing method |
| 02/03/2011 | US20110027720 Method and Device for Fabricating Volume Bragg Gratings |
| 02/03/2011 | US20110027719 Photomask etching method for chemical vapor deposition film |
| 02/03/2011 | US20110027718 Radiation-sensitive resin composition and compound |
| 02/03/2011 | US20110027717 Photoresist composition |
| 02/03/2011 | US20110027716 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition |
| 02/03/2011 | US20110027704 Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells |
| 02/03/2011 | US20110027702 Hardcoat composition |
| 02/03/2011 | US20110027701 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 02/03/2011 | US20110027697 Holographic Recording Medium |
| 02/03/2011 | US20110027544 Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components |
| 02/03/2011 | US20110027542 Exposure apparatus and exposure method |
| 02/03/2011 | US20110027407 Profile control utilizing a recessed imprint template |
| 02/03/2011 | US20110027385 Nano-particle dispersions |
| 02/03/2011 | US20110026876 Nano/micro-patterned optical device and fabrication method thereof |
| 02/03/2011 | US20110026002 Euv radiation generation apparatus |
| 02/03/2011 | US20110026000 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 02/03/2011 | US20110025999 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 02/03/2011 | US20110025998 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 02/03/2011 | US20110025997 Exposure apparatus, and device manufacturing method |
| 02/03/2011 | US20110025996 Exposure apparatus, and device manufacturing method |
| 02/03/2011 | US20110025973 Method of producing patterned birefringent product and birefringent pattern building material |
| 02/03/2011 | US20110025954 Retardation substrate, semi-transparent liquid crystal display, and method for manufacturing retardation substrate |
| 02/03/2011 | US20110025953 Retardation plate, method for manufacturing the retardation plate, and liquid crystal display |
| 02/03/2011 | US20110025952 Retardation plate, method for manufacturing the retardation plate, and liquid crystal display |
| 02/03/2011 | US20110025909 Wafer-level camera module and method for coating the same |
| 02/03/2011 | US20110025891 Polymerizable compositions, color filters, production methods thereof, and solid-state imaging devices |
| 02/03/2011 | DE19847305B4 Herstellungsverfahren für eine mikromechanische Vorrichtung Manufacturing method for a micromechanical device |
| 02/03/2011 | DE102009035788A1 Optische Anordnung in einem optischen System, insbesondere einer Beleuchtungseinrichtung An optical arrangement in an optical system, in particular a lighting device |
| 02/03/2011 | DE102009035583A1 Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik Magnifying imaging optics and metrology system with such imaging optics |