Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2011
02/16/2011CN101441418B Pattern formation method and semiconductor device manufacturing method
02/16/2011CN101438385B Exposure apparatus and device manufacturing method
02/16/2011CN101398562B Colorful film substrate and method for manufacturing same
02/16/2011CN101393391B Nanometer stamping device
02/16/2011CN101373334B Method for manually shivering materials of grating net semi-etching connection point
02/16/2011CN101329517B Lithographic apparatus having parts with a coated film adhered thereto
02/16/2011CN101320225B Deionized water nozzle device and its spraying and brushing method
02/16/2011CN101320211B Mold with micro-structure mould core and manufacturing method thereof
02/16/2011CN101266412B Lithographic apparatus and method
02/16/2011CN101266410B Method for confirming front feeding transfer function, lithographic apparatus and device manufacturing method
02/16/2011CN101226332B Method for manufacturing barrier wall slurry
02/16/2011CN101205291B Hard mask composition, process for forming material layer, and semiconductor integrated circuit device
02/16/2011CN101135850B Image forming member having bluish purple laser photosensitive resist material layer and method for forming resist image
02/16/2011CN101109908B Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor
02/15/2011US7890203 Wiring forming system and wiring forming method for forming wiring on wiring board
02/15/2011US7889473 Combination current sensor and relay
02/15/2011US7889411 System and method for calculating aerial image of a spatial light modulator
02/15/2011US7889407 Method for producing a duplicate hologram recording medium, apparatus for producing a duplication master, apparatus for producing a duplicate hologram recording medium, and duplication master
02/15/2011US7889320 Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method
02/15/2011US7888528 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
02/15/2011US7888415 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
02/15/2011US7888301 Resist, barc and gap fill material stripping chemical and method
02/15/2011US7887999 a plurality of pillar shaped devices are formed arranged in a hexagonal or rectangular pattern
02/15/2011US7887997 contacting first photoresist layer having photosensitive and discolored emulsion on first conducting coat on first surface of transparent substrate, contacting second photoresist on second coat on second surface, exposing first photoresist , employing circuit pattern as aligning benchmark for second
02/15/2011US7887996 Patterned hard masking layer with circuit patterns; multilayer; removal of segment exposure to first patterned mask
02/15/2011US7887995 Electroforming mold and method for manufacturing the same, and method for manufacturing electroformed component
02/15/2011US7887992 Photosensitive paste and process for production of pattern using the same
02/15/2011US7887991 Positive resist composition and patterning process using the same
02/15/2011US7887990 Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same
02/15/2011US7887989 Compositions and processes for preparing color filter elements
02/15/2011US7887988 Positive resist composition and pattern forming method using the same
02/15/2011US7887980 Sub-resolutional grayscale reticle
02/15/2011US7887885 Nanolithography methods and products therefor and produced thereby
02/15/2011US7887875 Method to reduce photoresist poisoning
02/15/2011US7887739 Methods and apparatus of pressure imprint lithography
02/15/2011CA2449040C Directed assembly of functional heterostructures
02/15/2011CA2434752C Compact device for imaging a printing form
02/15/2011CA2406006C Particle deposition apparatus and method for forming nanostructures
02/10/2011WO2011016849A2 Adjacent field alignment
02/10/2011WO2011016839A1 Nanostructured organic solar cells
02/10/2011WO2011016655A2 Super-hydrophobic photosensitive resin composition and black matrix thereof
02/10/2011WO2011016425A1 Photoacid generator, photocurable composition and cured product of same
02/10/2011WO2011016255A1 Exposure apparatus, exposure method, and device manufacturing method
02/10/2011US20110034362 Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same
02/10/2011US20110033932 Substrate for cell adhesion or culture and method for producing the same
02/10/2011US20110033887 Three-Dimensional Microfabricated Bioreactors with Embedded Capillary Network
02/10/2011US20110033804 Photoresist composition
02/10/2011US20110033803 Patterning process and resist composition
02/10/2011US20110033802 Method for preparing a photo-crosslinkable composition
02/10/2011US20110033801 Coating compositions for use with an overcoated photoresist
02/10/2011US20110033800 Coating compositions for use with an overcoated photoresist
02/10/2011US20110033799 Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition
02/10/2011US20110033790 Detection apparatus, exposure apparatus, and device fabrication method
02/10/2011US20110033789 Exposure method using charged particle beam
02/10/2011US20110033788 Charged particle beam drawing apparatus and method
02/10/2011US20110033787 Frame cell for shot layout flexibility
02/10/2011US20110033785 Method of fabricating integrated circuit using alternating phase-shift mask and phase-shift trim mask
02/10/2011US20110032587 System and Method for Autostereoscopic Imaging
02/10/2011US20110032498 Exposure apparatus, exposure method, and method for producing device
02/10/2011US20110032464 Liquid crystal display and manufacturing method for the same
02/10/2011US20110031651 Desirable wetting and release between an imprint lithography mold and a polymerizable composition
02/10/2011US20110031416 Liquid jet and recovery system for immersion lithography
02/10/2011US20110030998 Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method
02/10/2011US20110030722 Cleaning water for electronic material, method for cleaning electronic material and system for supplying water containing dissolved gas
02/10/2011DE102010003169A1 Field facet mirror for use in illumination lens in illumination system of projection exposure system, during extreme UV-projection-lithography to manufacture semiconductor chip, has reference bodies arranged in reference levels with vectors
02/10/2011DE102006022361B4 Verfahren zum mehrfachen Bestrahlen eines Resists Method for multiple irradiation of a resist
02/10/2011DE10128813B4 Bebilderung einer Druckplatte mit ultrakurzen Laserpulsen Imaging a printing plate with ultrashort laser pulses
02/09/2011EP2282233A1 Lithographic apparatus
02/09/2011EP2282188A1 Inspection device and inspecting method for spatial light modulator, illuminating optical system, method for adjusting the illuminating optical system, exposure device, and device manufacturing method
02/09/2011EP2281867A1 Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same
02/09/2011EP2281866A1 Aqueous stripping and cleaning compositon
02/09/2011EP2280737A2 Magnetic microstructures for magnetic resonance imaging
02/09/2011CN201740971U Photoresist removing device of electron beam photoresist light mask plate
02/09/2011CN1971395B A manufacturing method of optical limiter of photon crystal
02/09/2011CN1924640B Method for manufacturing spectacles leg used spring mandrel body
02/09/2011CN1869798B Liquid crystal display and method of manufacturing of a tft array panel of the same
02/09/2011CN1800970B Forming method of mask pattern
02/09/2011CN1771465B Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate
02/09/2011CN1670628B Resist composition
02/09/2011CN101971336A Three-dimensional hexagonal matrix memory array and method of manufacturing the same
02/09/2011CN101971102A On-track process for patterning hardmask by multiple dark field exposures
02/09/2011CN101971101A Actuator system, lithographic apparatus, and device manufacturing method
02/09/2011CN101971100A Lithographic apparatus, plasma source, and reflecting method
02/09/2011CN101971099A Laser processing a multi-device panel
02/09/2011CN101971098A Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material
02/09/2011CN101971097A Photosensitive resin composition, photosensitive element, resist pattern forming method and method for manufacturing printed circuit board
02/09/2011CN101971096A Radiation-sensitive resin composition
02/09/2011CN101971095A Negative-working imageable elements with improved abrasion resistance
02/09/2011CN101971094A Coloring curable composition, color filter and method for producing color filter
02/09/2011CN101971093A Method to produce nanometer-sized features with directed assembly of block copolymers
02/09/2011CN101971092A 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
02/09/2011CN101971090A Low chlorine epoxy resin formulations
02/09/2011CN101971061A Optical sheets
02/09/2011CN101970532A Photosensitive resin and photosensitive resin composition comprising the same
02/09/2011CN101970400A Novel salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method
02/09/2011CN101970242A Method for making lithographic printing original plate
02/09/2011CN101969042A Ink jet printing and laser interference exposure based circuit interconnecting method
02/09/2011CN101969026A Electrode preparation method based on ink jet printing and laser interference exposure
02/09/2011CN101969025A Method for forming self-aligned silicide area block film pattern
02/09/2011CN101968941A Process for preparing anti-counterfeiting marks by using exposure method