| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/22/2011 | US7892903 Device manufacturing method and substrate comprising multiple resist layers |
| 02/22/2011 | US7892723 Method for forming patterned photoresist layer |
| 02/22/2011 | US7892722 Pattern forming method |
| 02/22/2011 | US7892720 Negative photosensitive fluorinated aromatic resin composition |
| 02/22/2011 | US7892719 Creating photoresist composition by applying to substrate surface coating of DNA polymers capable of self-assembling into photonic crystal, allowing DNA polymers to form crystalline structure, and applying coating of photoresist polymer and compound capable of generating an acid on exposure to radiation |
| 02/22/2011 | US7892707 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 02/22/2011 | US7892703 CPL mask and a method and program product for generating the same |
| 02/22/2011 | US7892702 Sensitizer dyes for photoacid generating systems |
| 02/22/2011 | US7892344 P.R. 254 pigment preparation for use in color filters |
| 02/17/2011 | WO2011019279A2 A method of fabricating an imprinted substrate having regions with modified wettability |
| 02/17/2011 | WO2011019189A2 Resist stripping solution composition, and method for stripping resist by using same |
| 02/17/2011 | WO2011018983A1 Laminated substrate production method |
| 02/17/2011 | WO2011018928A1 Resist underlayer film-forming composition which contains polymer photoacid generator, and method for forming resist pattern using same |
| 02/17/2011 | WO2011018907A1 Photosensitive composition and solder resist composition |
| 02/17/2011 | WO2011018418A1 Method and device for keeping mask dimensions constant |
| 02/17/2011 | WO2011018295A1 Euv radiation system and lithographic apparatus |
| 02/17/2011 | WO2010149487A3 Imaging optical system for imaging an object field in an image field and illumination optical system for illuminating an object field |
| 02/17/2011 | WO2010148520A3 Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
| 02/17/2011 | US20110041104 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device |
| 02/17/2011 | US20110040068 Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern |
| 02/17/2011 | US20110039747 Composition and method for removing ion-implanted photoresist |
| 02/17/2011 | US20110039214 Pattern Forming Method and Method of Manufacturing Semiconductor Device |
| 02/17/2011 | US20110039213 Method and system for photolithographic fabrication with resolution far below the diffraction limit |
| 02/17/2011 | US20110039212 Circuitized substrate with internal resistor, method of making said circuitized substrate, and electrical assembly utilizing said circuitized substrate |
| 02/17/2011 | US20110039211 Method for preparing a composite printing form |
| 02/17/2011 | US20110039210 Novel resins and photoresist compositions comprising same |
| 02/17/2011 | US20110039209 Compound and photoresist composition containing the same |
| 02/17/2011 | US20110039208 Photoresist composition containing the same |
| 02/17/2011 | US20110039207 Resist composition and method of forming resist pattern |
| 02/17/2011 | US20110039206 Novel resins and photoresist compositions comprising same |
| 02/17/2011 | US20110039205 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof |
| 02/17/2011 | US20110039204 Ester compounds and their preparation, polymers, resist compositions and patterning process |
| 02/17/2011 | US20110039203 Hydrofluoroalkanesulfonic Acids and Salts from Fluorovinyl Ethers |
| 02/17/2011 | US20110039195 Photosensitive transparent resin composition, production method of color filter, and color filter |
| 02/17/2011 | US20110039194 Solid inks for masks for printed circuit boards and other electronic devices |
| 02/17/2011 | US20110039061 Directed material assembly |
| 02/17/2011 | US20110037959 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 02/17/2011 | US20110037957 Monitoring apparatus and method particularly useful in photolithographically processing substrates |
| 02/17/2011 | US20110037824 Laser exposure method, photoresist layer processing method and method for manufacturing patterned casting |
| 02/17/2011 | US20110037489 Silicon chicklet pedestal |
| 02/17/2011 | US20110037175 Interconnection between sublithographic-pitched structures and lithographic-pitched structures |
| 02/17/2011 | US20110037150 Substrate comprising different types of surfaces and method for obtaining such substrates |
| 02/17/2011 | DE112009000979T5 Photoempfindliche Hartmaske für die Mikrolithographie Photosensitive hard mask for microlithography |
| 02/17/2011 | DE10297564B4 Verfahren und Vorrichtung zum Steuern der Photolithographie-Überlagerungsjustierung mit vorwärtsgekoppelter Überlagerungsinformation Method and apparatus for controlling the photolithography overlay adjustment with feedforward overlay information |
| 02/17/2011 | DE102009037077B3 Katadioptrisches Projektionsobjektiv A catadioptric projection lens |
| 02/17/2011 | DE102004026206B4 Belichtungsmaskensubstrat-Herstellungsverfahren und Belichtungsmasken-Herstellungsverfahren Exposure mask substrate manufacturing method, and exposure mask manufacturing method |
| 02/16/2011 | EP2284866A2 Exposure apparatus, exposure method and device manufacturing method |
| 02/16/2011 | EP2284864A1 Electron beam lithography system and method for electron beam lithography |
| 02/16/2011 | EP2284615A2 Optical element and exposure apparatus |
| 02/16/2011 | EP2284614A2 Exposure apparatus, exposure method and device producing method |
| 02/16/2011 | EP2284613A1 Lithographic apparatus and device manufacturing method |
| 02/16/2011 | EP2284612A1 Flexographic printing original plate |
| 02/16/2011 | EP2284611A1 Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method |
| 02/16/2011 | EP2284610A1 A method of fabricating an imprinted substrate having regions with modified wettability |
| 02/16/2011 | EP2284609A2 Method for preparing a composite printing form |
| 02/16/2011 | EP2284581A1 LC Layers Having a Spatially-Varying Tilt Angle |
| 02/16/2011 | EP2284250A1 Formulations and Method for Post-CMP Cleaning |
| 02/16/2011 | EP2284005A1 Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers |
| 02/16/2011 | EP2283396A1 Multilayer mirror and lithographic apparatus |
| 02/16/2011 | EP2283395A1 Polymer pen lithography |
| 02/16/2011 | EP2283388A1 Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter |
| 02/16/2011 | EP2283310A1 Method and apparatus for overlay compensation between subsequently patterned layers on workpiece |
| 02/16/2011 | EP1877870B1 Non-aqueous photoresist stripper that inhibits galvanic corrosion |
| 02/16/2011 | EP1730596B1 Projection objective and projection exposure apparatus |
| 02/16/2011 | CN201749295U Spray device of developing device |
| 02/16/2011 | CN201749294U Developer concentration control system |
| 02/16/2011 | CN201749293U Exposure machine |
| 02/16/2011 | CN201749292U Exposing energy uniformity testing device |
| 02/16/2011 | CN201749291U Lithography system and shielding group for patterned integrated circuit layer |
| 02/16/2011 | CN1942824B Uv radiation blocking protective layers compatible with thick film pastes |
| 02/16/2011 | CN1940720B Photosensitive resin composition |
| 02/16/2011 | CN1928712B Mould for use in production structure and marking device |
| 02/16/2011 | CN1906478B Advanced roughness metrology |
| 02/16/2011 | CN1847987B Lithographic apparatus and device manufacturing method |
| 02/16/2011 | CN1841201B Salt suitable for acid generator and chemical amplifying type corrosion-resistant composition containing the same |
| 02/16/2011 | CN1833205B Measuring the effect of flare on line width |
| 02/16/2011 | CN1760764B Lithographic apparatus and device manufacturing method |
| 02/16/2011 | CN1666144B Reticle carrier |
| 02/16/2011 | CN101978324A Projection objective for microlithography |
| 02/16/2011 | CN101978323A Projection exposure system for microlithography with a measurement device |
| 02/16/2011 | CN101978322A Positive photosensitive resin composition |
| 02/16/2011 | CN101978321A Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board |
| 02/16/2011 | CN101978320A Photosensitive resin composition, film for photosensitive resin spacer, and semiconductor device |
| 02/16/2011 | CN101978255A A method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus |
| 02/16/2011 | CN101976655A Thin film transistor substrate of liquid crystal display panel and manufacturing method thereof |
| 02/16/2011 | CN101976646A Substrate processing method, program, computer-readable recording medium, and substrate processing system |
| 02/16/2011 | CN101976021A Installation and adjustment device and method for alignment system reference board and detection optical fiber |
| 02/16/2011 | CN101976020A Photoetching device and photoetching method |
| 02/16/2011 | CN101976019A Nano-size photoetching method and photoetching equipment for special-shaped surface |
| 02/16/2011 | CN101975983A High-resolution aspheric photoetching object lens |
| 02/16/2011 | CN101974202A Silicon-contained I-ray ultraviolet positive photoresist and film-forming resin thereof |
| 02/16/2011 | CN101974201A Ultraviolet thick-film photoresist and film-forming resin thereof |
| 02/16/2011 | CN101974121A Chemical amplified high-resolution silicon-containing I-ray ultraviolet photoresist and forming resin thereof |
| 02/16/2011 | CN101974120A Nano-crystalline silicon containing deep ultraviolet negative amplification type photoresist and film forming resin thereof |
| 02/16/2011 | CN101974119A Nano silicon containing deep ultraviolet positive photoresist and forming resin thereof |
| 02/16/2011 | CN101973169A Method for printing bar codes on iridescent paper |
| 02/16/2011 | CN101566768B Pixel structure for thin film transistor liquid crystal display and manufacturing method thereof |
| 02/16/2011 | CN101562129B Method of making inverted trapezoidal cross-section structure by S18 series of positive photoresist |
| 02/16/2011 | CN101498890B Violet laser-sensitive silver salt aluminum-base offset plate and its production method |
| 02/16/2011 | CN101446772B Method of measuring focus of a lithographic projection apparatus |