| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/01/2011 | US7897056 Apparatus for etching or stripping substrate of liquid crystal display device and method thereof |
| 03/01/2011 | CA2326322C Free-form nanofabrication using multi-photon excitation |
| 02/24/2011 | WO2011022703A1 Method and system for manufacturing a surface using character projection lithography with variable magnification |
| 02/24/2011 | WO2011021723A1 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method |
| 02/24/2011 | WO2011021711A1 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method |
| 02/24/2011 | WO2011021709A1 Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method |
| 02/24/2011 | WO2011021555A1 Resist underlayer film-forming composition for lithography containing resin having aliphatic ring and aromatic ring |
| 02/24/2011 | WO2011021444A1 Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method |
| 02/24/2011 | WO2011021398A1 Sugar derivative having a polymerizable group, and resist material using said sugar derivative |
| 02/24/2011 | WO2011021370A1 Photocurable resin composition |
| 02/24/2011 | WO2011021350A1 Photocurable resin composition |
| 02/24/2011 | WO2011020727A1 Apparatus and method for a sub microscopic and optically variable image carrying device |
| 02/24/2011 | WO2011020675A1 Stabilizers for vinyl ether resist formulations for imprint lithography |
| 02/24/2011 | WO2011020655A1 Substrates and mirrors for euv microlithography, and methods for producing them |
| 02/24/2011 | WO2011020654A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
| 02/24/2011 | WO2011020623A1 A reflective optical element and method of producing it |
| 02/24/2011 | WO2011002518A3 Chucking system with recessed support feature |
| 02/24/2011 | WO2011002516A3 A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom |
| 02/24/2011 | WO2010145951A3 Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell |
| 02/24/2011 | WO2010135024A3 Optimizing total internal reflection multilayer optics through material selection |
| 02/24/2011 | WO2009154571A8 A method of making an imprint on a polymer structure |
| 02/24/2011 | US20110046036 Post Plasma Etch/Ash Residue and Silicon-Based Anti-Reflective Coating Remover Compositions Containing Tetrafluoroborate Ion |
| 02/24/2011 | US20110045632 Methods of Manufacturing Solid State Image Pickup Devices |
| 02/24/2011 | US20110045413 Resist composition for negative tone development and pattern forming method using the same |
| 02/24/2011 | US20110045412 Pigment dispersion, colored curable composition, color filter and method of manufacturing the same |
| 02/24/2011 | US20110045410 Production Method of Liquid Crystal Display Device and Liquid Crystal Display Device |
| 02/24/2011 | US20110045409 Method and system for manufacturing a surface using character projection lithography with variable magnification |
| 02/24/2011 | US20110045408 Color-forming photosensitive composition, lithographic printing plate precursor and novel cyanine dye |
| 02/24/2011 | US20110045407 Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same |
| 02/24/2011 | US20110045406 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture |
| 02/24/2011 | US20110045405 (Meth)acrylate compound, photosensitive polymer, and resist composition |
| 02/24/2011 | US20110045404 Composition for forming resist underlayer film for lithography and production method of semiconductor device |
| 02/24/2011 | US20110045389 Method to Recover the Exposure Sensitivity of Chemically Amplified Resins from Post Coat Delay Effect |
| 02/24/2011 | US20110045387 Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles |
| 02/24/2011 | US20110045249 Sliding component and timepiece |
| 02/24/2011 | US20110044597 Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide |
| 02/24/2011 | US20110043900 Method and system for homogenizing diode laser pump arrays |
| 02/24/2011 | US20110043779 Grazing incidence collector optical systems for euv and x-ray applications |
| 02/24/2011 | US20110043777 Target material, a source, an euv lithographic apparatus and a device manufacturing method using the same |
| 02/24/2011 | US20110043238 Method of manufacturing needle for probe card using fine processing technology, needle manufactured by the method and probe card comprising the needle |
| 02/24/2011 | US20110042862 Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography |
| 02/24/2011 | US20110042861 Methods and apparatus of field-induced pressure imprint lithography |
| 02/24/2011 | US20110042771 Near-Infrared Absorbing Film Compositions |
| 02/24/2011 | US20110042653 Near-Infrared Absorbing Film Compositions |
| 02/24/2011 | US20110042622 Resist pattern and reflow technology |
| 02/24/2011 | US20110042345 Methods for manufacturing chucking systems |
| 02/24/2011 | DE102010003446A1 Reflective optical element i.e. collecting mirror, for use in lighting system of projection exposure system, has sections whose layers are arranged at distance from substrate such that rays of diffraction orders interfere at wavelengths |
| 02/24/2011 | DE102009043824A1 Reflektives optisches Element und Verfahren zu dessen Herstellung The reflective optical element and method for its production |
| 02/24/2011 | DE102009036953A1 Method for stabilizing dimensions of mask in mask plane constant during lithography, involves compressing and stretching mask for stabilizing mask dimensions, and utilizing air cooling or air heating part of mask |
| 02/23/2011 | EP2287894A2 Exposure apparatus, exposure method and device manufacturing method |
| 02/23/2011 | EP2287893A2 Exposure apparatus, exposure method and device manufacturing method |
| 02/23/2011 | EP2287672A1 A photosensitive flexographic printing original plate |
| 02/23/2011 | EP2287671A1 Process for forming a coated substrate |
| 02/23/2011 | EP2287670A1 Methods of forming electronic devices |
| 02/23/2011 | EP2287669A1 Methods of forming electronic devices |
| 02/23/2011 | EP2287668A1 Methods of forming electronic devices |
| 02/23/2011 | EP2287667A1 Self-aligned spacer multiple patterning methods |
| 02/23/2011 | EP2287666A1 Device for embossing substrates |
| 02/23/2011 | EP2287665A1 Solid inks for printing masks for printed circuit boards |
| 02/23/2011 | EP2286981A1 Method and device for heat embossing a polymer layer |
| 02/23/2011 | EP2285845A1 Low outgassing photoresist compositions |
| 02/23/2011 | EP2285836A1 Photoinitiator mixtures |
| 02/23/2011 | EP2285571A1 Method of imaging and developing positive-working imageable elements |
| 02/23/2011 | EP2074617B1 Optical storage medium comprising tracks with positive and negative marks, and stampers and production methods for manufacturing of the optical storage medium |
| 02/23/2011 | EP2027509B1 Immersion flow field maintenance system for immersion lithography machine |
| 02/23/2011 | EP1883534B9 Regeneratable, structured plate comprising oxidation catalysts |
| 02/23/2011 | EP1692570B1 Improved lithographic process |
| 02/23/2011 | EP1649480B1 Master mold for duplicating fine structure and production method thereof |
| 02/23/2011 | EP0935778B1 Direct positive lithographic plate |
| 02/23/2011 | CN201751876U Optical acryl jig board device of exposure machine |
| 02/23/2011 | CN101981511A Photoresist stripper composition, and a photoresist peeling method employing the same |
| 02/23/2011 | CN101981509A A process for shrinking dimensions between photoresist pattern comprising a pattern hardening step |
| 02/23/2011 | CN101981508A A method for preparing lithographic printing plates |
| 02/23/2011 | CN101981507A Process for producing lithographic printing plate |
| 02/23/2011 | CN101981506A Process for producing lithographic printing plate |
| 02/23/2011 | CN101981505A Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate |
| 02/23/2011 | CN101981504A Lithographic apparatus and contamination detection method |
| 02/23/2011 | CN101981503A Original plate for lithographic printing plate, and method for production of lithographic printing plate using the same |
| 02/23/2011 | CN101981502A Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board |
| 02/23/2011 | CN101981501A A photoresist image-forming process using double patterning |
| 02/23/2011 | CN101981154A Base-generating agent, photosensitive resin composition, pattern-forming material comprising the photosensitive resin composition, pattern formation method using the photosensitive resin composition, and article |
| 02/23/2011 | CN101980873A A method for treating a lithographic printing plate |
| 02/23/2011 | CN101980087A Immersion exposure appratus and method |
| 02/23/2011 | CN101980086A Immersion exposure apparatus and method |
| 02/23/2011 | CN101980085A Exposure apparatus, exposure method, and device manufacturing method |
| 02/23/2011 | CN101980084A Exposure apparatus, exposure method, and device manufacturing method |
| 02/23/2011 | CN101980083A Method and system for preparing filter membrane mesh structure by laser interference photoetching technology |
| 02/23/2011 | CN101980082A Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board |
| 02/23/2011 | CN101980081A Solder resist composition and printed circuit board |
| 02/23/2011 | CN101979435A Nanometer silicon-containing ultraviolet thick film positive photoresist and film forming resin thereof |
| 02/23/2011 | CN101241300B Method, computer readable medium, device manufacture method and mask for performing decomposition of a pattern |
| 02/22/2011 | US7895541 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 02/22/2011 | US7894924 System and method for internet based automated memorial design and manufacturing |
| 02/22/2011 | US7894319 Optical recording medium, method of producing the same, and, optical recording method and optical reproducing method |
| 02/22/2011 | US7894041 Limiting a portion of a patterning device used to pattern a beam |
| 02/22/2011 | US7894023 Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby, colored pigment dispersion composition therewith, colored photosensitive resin composition therewith and photosensitive resin transfer material therewith, and color filter and liquid crystal display device using the same |
| 02/22/2011 | US7893410 Method and apparatus for processing multiphoton curable photoreactive compositions |
| 02/22/2011 | US7893293 Chemically amplified positive resist composition |
| 02/22/2011 | US7893130 Photocurable dental composition |
| 02/22/2011 | US7893129 Stable, cationically polymerizable/crosslinkable dental compositions |