Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2011
03/03/2011WO2011023627A1 A set for developing a lithographic printing plate
03/03/2011WO2011023517A1 Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets
03/03/2011WO2011023497A1 Chemically amplified photoresist composition and process for its use
03/03/2011WO2011023470A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
03/03/2011WO2011023454A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
03/03/2011WO2011023423A1 Optical apparatus, and method of orienting a reflective element
03/03/2011WO2011023419A1 Illumination system, lithographic apparatus and method of adjusting an illumination mode
03/03/2011WO2011022749A1 Method of removing photoresist and etch-residues from vias
03/03/2011WO2010135120A3 Selective self-aligned double patterning of regions in an integrated circuit device
03/03/2011WO2010065094A3 Flexographic element and method of imaging
03/03/2011WO2009040592A3 Bidirectional imaging with varying intensities
03/03/2011US20110054511 Adding microscopic porosity to the surface of a microcoil to be used for medical implantation
03/03/2011US20110053799 Method of producing microarray substrate, radiation-sensitive composition, partition of microarray substrate, method of producing biochip, and biochip
03/03/2011US20110053362 Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same
03/03/2011US20110053097 Protective film-forming material and method of photoresist patterning with it
03/03/2011US20110053096 Photomasks, methods of exposing a substrate to light, methods of forming a pattern, and methods of manufacturing a semiconductor device
03/03/2011US20110053095 Manufacturing method of planar optical waveguide device with grating structure
03/03/2011US20110053094 Method for fabricating roller mold for nanoimprinting
03/03/2011US20110053092 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
03/03/2011US20110053091 Sulfur atom-containing resist underlayer film forming composition and method for forming resist pattern
03/03/2011US20110053090 Flexographic processing solution and method of use
03/03/2011US20110053089 Method of processing elements with coalesced particles
03/03/2011US20110053088 Electron beam lithography method and method for producing a mold
03/03/2011US20110053087 Method for performing electron beam lithography
03/03/2011US20110053086 Compound, resin, resist composition and method for producing resist pattern
03/03/2011US20110053085 Lithographic printing plate precursors and stacks
03/03/2011US20110053084 Photosensitive Compound and Photosensitive Composition Including the Same
03/03/2011US20110053083 Chemically amplified photoresist composition and process for its use
03/03/2011US20110053082 Resin, resist composition and method for producing resist pattern
03/03/2011US20110053081 Positive Type Photosensitive Composition
03/03/2011US20110053080 Positive Typed Photosensitive Composition
03/03/2011US20110053062 Exposure method, exposure apparatus, and device manufacturing method
03/03/2011US20110053061 Exposure apparatus, exposure method, and device manufacturing method
03/03/2011US20110053060 Exposure device, exposure method, and method for manufacturing semiconductor device
03/03/2011US20110053056 Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography
03/03/2011US20110053055 Compositions, optical data storage media and methods for using the optical data storage media
03/03/2011US20110053054 Compositions, optical data storage media and methods for using the optical data storage media
03/03/2011US20110052883 Methods of forming reversed patterns in a substrate and semiconductor structures formed during same
03/03/2011US20110052871 Heat dissipating material including carbon substrate with nanometer-order uneven structure and its manufacturing method
03/03/2011US20110051586 Optical data storage media and methods for using the same
03/03/2011US20110051251 Optical element and method for producing the same
03/03/2011US20110051249 Optical device, manufacturing method thereof, and method of manufacturing master
03/03/2011US20110051220 Transparent structures
03/03/2011US20110051114 Optimized polarization illumination
03/03/2011US20110051113 Lithography system and optical module thereof
03/03/2011US20110051110 Lens comprising a plurality of optical element disposed in a housing
03/03/2011US20110051106 Exposure apparatus and device manufacturing method
03/03/2011US20110051105 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
03/03/2011US20110051104 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
03/03/2011US20110051058 Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device
03/03/2011US20110049680 Dual exposure track only pitch split process
03/03/2011US20110048787 Photo-patternable dielectric materials and formulations and methods of use
03/03/2011US20110048452 Method and device for cleaning at least one optical component
03/03/2011US20110048160 Method and System to Control Movement of a Body for Nano-Scale Manufacturing
03/03/2011DE102010038972A1 Projection illuminating system for micro lithography, has projection lens which forms pattern on light-sensitive layer that is formed on substrate
03/03/2011DE102009059165A1 Vorrichtung und Verfahren zum Herstellen einer Ausrichtungsschicht für eine Flüssigkristallanzeige Apparatus and method for producing an alignment layer for a liquid crystal display
03/02/2011EP2290651A1 Compositions, optical data storage media and methods for using the optical data storage media
03/02/2011EP2290447A1 A set for developing a lithographic printing plate
03/02/2011EP2290446A1 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
03/02/2011EP2290445A2 An image forming method and apparatus
03/02/2011EP2290408A1 Compositions, optical data storage media and methods for using the optical data storage media
03/02/2011EP2290118A2 Thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus using the same
03/02/2011EP2290046A1 Water-rich stripping and cleaning formulation and method for using same
03/02/2011EP2290005A1 Positive type photosensitive composition
03/02/2011EP2289955A1 Photocurable composition and manufacturing method for a molded body having a fine pattern on the surface
03/02/2011EP2289874A1 Photosensitive compound, photosensitive composition including the same, method of manufacturing the same
03/02/2011EP2288965A2 Low ph mixtures for the removal of high density implanted resist
03/02/2011EP2288964A2 Illumination system for sizing focused spots of a patterning system for maskless lithography
03/02/2011EP2288963A1 Illumination system comprising a fourier optical system
03/02/2011EP2288962A1 Molecular resist compositions, methods of patterning substrates using the compositions and process products prepared therefrom
03/02/2011EP2288599A1 Sulfonium derivatives and the use thereof as latent acids
03/02/2011EP2288507A1 Substrate and imageable element with hydrophilic interlayer
03/02/2011EP1618426B1 Method and array for determining the focal position during imaging of a sample
03/02/2011EP1496396B1 Positively photosensitive resin composition and method of pattern formation
03/02/2011CN1892440B Focus determination method, device manufacturing method, and mask
03/02/2011CN101983359A Imageable elements useful for waterless printing
03/02/2011CN101983358A Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
03/02/2011CN101982808A Chemically amplified resist compositon and pattern forming process
03/02/2011CN101982807A Patterning process
03/02/2011CN101614522B Manufacturing method of resistance strain gage based on ion beam technology
03/02/2011CN101438196B Symmetrical objective having four lens groups for microlithography
03/02/2011CN101416115B Exposure apparatus
03/02/2011CN101416114B Device and method for microstructuring a storage medium and storage medium comprising a microstructured region
03/02/2011CN101373342B Acidic stripping liquid and preparing method thereof
03/02/2011CN101355081B 半导体器件 Semiconductor devices
03/02/2011CN101122740B Photosensitive resin composition for layer insulation film and forming method for the layer insulation film
03/02/2011CN101019076B Material for formation of resist protection film and method of forming resist pattern therewith
03/01/2011US7898661 Spectroscopic scatterometer system
03/01/2011US7898645 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
03/01/2011US7898643 Immersion photolithography system and method using inverted wafer-projection optics interface
03/01/2011US7898642 Lithographic apparatus and device manufacturing method
03/01/2011US7897697 Epoxy resin, blocked polyisocyanate or polymers with polyhydroxystyrenes having novolak structure
03/01/2011US7897325 Lithographic rinse solution and method for forming patterned resist layer using the same
03/01/2011US7897324 Lithographic method
03/01/2011US7897323 applying a photoresist to a substrate surface, then exposing the photoresist to radiation through a photomask, baking and anddeveloping to remove the photoresist from regions of intermediate polarity or from both polar and apolar regions; photolithography
03/01/2011US7897321 Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition
03/01/2011US7897320 Thermoplastic material comprising polychromic substances
03/01/2011US7897319 Positive resist composition and method of forming resist pattern
03/01/2011US7897305 Method for forming pattern and method for fabricating LCD device using the same
03/01/2011US7897206 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method