Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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03/03/2011 | WO2011023627A1 A set for developing a lithographic printing plate |
03/03/2011 | WO2011023517A1 Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets |
03/03/2011 | WO2011023497A1 Chemically amplified photoresist composition and process for its use |
03/03/2011 | WO2011023470A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
03/03/2011 | WO2011023454A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
03/03/2011 | WO2011023423A1 Optical apparatus, and method of orienting a reflective element |
03/03/2011 | WO2011023419A1 Illumination system, lithographic apparatus and method of adjusting an illumination mode |
03/03/2011 | WO2011022749A1 Method of removing photoresist and etch-residues from vias |
03/03/2011 | WO2010135120A3 Selective self-aligned double patterning of regions in an integrated circuit device |
03/03/2011 | WO2010065094A3 Flexographic element and method of imaging |
03/03/2011 | WO2009040592A3 Bidirectional imaging with varying intensities |
03/03/2011 | US20110054511 Adding microscopic porosity to the surface of a microcoil to be used for medical implantation |
03/03/2011 | US20110053799 Method of producing microarray substrate, radiation-sensitive composition, partition of microarray substrate, method of producing biochip, and biochip |
03/03/2011 | US20110053362 Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same |
03/03/2011 | US20110053097 Protective film-forming material and method of photoresist patterning with it |
03/03/2011 | US20110053096 Photomasks, methods of exposing a substrate to light, methods of forming a pattern, and methods of manufacturing a semiconductor device |
03/03/2011 | US20110053095 Manufacturing method of planar optical waveguide device with grating structure |
03/03/2011 | US20110053094 Method for fabricating roller mold for nanoimprinting |
03/03/2011 | US20110053092 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method |
03/03/2011 | US20110053091 Sulfur atom-containing resist underlayer film forming composition and method for forming resist pattern |
03/03/2011 | US20110053090 Flexographic processing solution and method of use |
03/03/2011 | US20110053089 Method of processing elements with coalesced particles |
03/03/2011 | US20110053088 Electron beam lithography method and method for producing a mold |
03/03/2011 | US20110053087 Method for performing electron beam lithography |
03/03/2011 | US20110053086 Compound, resin, resist composition and method for producing resist pattern |
03/03/2011 | US20110053085 Lithographic printing plate precursors and stacks |
03/03/2011 | US20110053084 Photosensitive Compound and Photosensitive Composition Including the Same |
03/03/2011 | US20110053083 Chemically amplified photoresist composition and process for its use |
03/03/2011 | US20110053082 Resin, resist composition and method for producing resist pattern |
03/03/2011 | US20110053081 Positive Type Photosensitive Composition |
03/03/2011 | US20110053080 Positive Typed Photosensitive Composition |
03/03/2011 | US20110053062 Exposure method, exposure apparatus, and device manufacturing method |
03/03/2011 | US20110053061 Exposure apparatus, exposure method, and device manufacturing method |
03/03/2011 | US20110053060 Exposure device, exposure method, and method for manufacturing semiconductor device |
03/03/2011 | US20110053056 Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography |
03/03/2011 | US20110053055 Compositions, optical data storage media and methods for using the optical data storage media |
03/03/2011 | US20110053054 Compositions, optical data storage media and methods for using the optical data storage media |
03/03/2011 | US20110052883 Methods of forming reversed patterns in a substrate and semiconductor structures formed during same |
03/03/2011 | US20110052871 Heat dissipating material including carbon substrate with nanometer-order uneven structure and its manufacturing method |
03/03/2011 | US20110051586 Optical data storage media and methods for using the same |
03/03/2011 | US20110051251 Optical element and method for producing the same |
03/03/2011 | US20110051249 Optical device, manufacturing method thereof, and method of manufacturing master |
03/03/2011 | US20110051220 Transparent structures |
03/03/2011 | US20110051114 Optimized polarization illumination |
03/03/2011 | US20110051113 Lithography system and optical module thereof |
03/03/2011 | US20110051110 Lens comprising a plurality of optical element disposed in a housing |
03/03/2011 | US20110051106 Exposure apparatus and device manufacturing method |
03/03/2011 | US20110051105 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
03/03/2011 | US20110051104 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
03/03/2011 | US20110051058 Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device |
03/03/2011 | US20110049680 Dual exposure track only pitch split process |
03/03/2011 | US20110048787 Photo-patternable dielectric materials and formulations and methods of use |
03/03/2011 | US20110048452 Method and device for cleaning at least one optical component |
03/03/2011 | US20110048160 Method and System to Control Movement of a Body for Nano-Scale Manufacturing |
03/03/2011 | DE102010038972A1 Projection illuminating system for micro lithography, has projection lens which forms pattern on light-sensitive layer that is formed on substrate |
03/03/2011 | DE102009059165A1 Vorrichtung und Verfahren zum Herstellen einer Ausrichtungsschicht für eine Flüssigkristallanzeige Apparatus and method for producing an alignment layer for a liquid crystal display |
03/02/2011 | EP2290651A1 Compositions, optical data storage media and methods for using the optical data storage media |
03/02/2011 | EP2290447A1 A set for developing a lithographic printing plate |
03/02/2011 | EP2290446A1 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
03/02/2011 | EP2290445A2 An image forming method and apparatus |
03/02/2011 | EP2290408A1 Compositions, optical data storage media and methods for using the optical data storage media |
03/02/2011 | EP2290118A2 Thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus using the same |
03/02/2011 | EP2290046A1 Water-rich stripping and cleaning formulation and method for using same |
03/02/2011 | EP2290005A1 Positive type photosensitive composition |
03/02/2011 | EP2289955A1 Photocurable composition and manufacturing method for a molded body having a fine pattern on the surface |
03/02/2011 | EP2289874A1 Photosensitive compound, photosensitive composition including the same, method of manufacturing the same |
03/02/2011 | EP2288965A2 Low ph mixtures for the removal of high density implanted resist |
03/02/2011 | EP2288964A2 Illumination system for sizing focused spots of a patterning system for maskless lithography |
03/02/2011 | EP2288963A1 Illumination system comprising a fourier optical system |
03/02/2011 | EP2288962A1 Molecular resist compositions, methods of patterning substrates using the compositions and process products prepared therefrom |
03/02/2011 | EP2288599A1 Sulfonium derivatives and the use thereof as latent acids |
03/02/2011 | EP2288507A1 Substrate and imageable element with hydrophilic interlayer |
03/02/2011 | EP1618426B1 Method and array for determining the focal position during imaging of a sample |
03/02/2011 | EP1496396B1 Positively photosensitive resin composition and method of pattern formation |
03/02/2011 | CN1892440B Focus determination method, device manufacturing method, and mask |
03/02/2011 | CN101983359A Imageable elements useful for waterless printing |
03/02/2011 | CN101983358A Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device |
03/02/2011 | CN101982808A Chemically amplified resist compositon and pattern forming process |
03/02/2011 | CN101982807A Patterning process |
03/02/2011 | CN101614522B Manufacturing method of resistance strain gage based on ion beam technology |
03/02/2011 | CN101438196B Symmetrical objective having four lens groups for microlithography |
03/02/2011 | CN101416115B Exposure apparatus |
03/02/2011 | CN101416114B Device and method for microstructuring a storage medium and storage medium comprising a microstructured region |
03/02/2011 | CN101373342B Acidic stripping liquid and preparing method thereof |
03/02/2011 | CN101355081B 半导体器件 Semiconductor devices |
03/02/2011 | CN101122740B Photosensitive resin composition for layer insulation film and forming method for the layer insulation film |
03/02/2011 | CN101019076B Material for formation of resist protection film and method of forming resist pattern therewith |
03/01/2011 | US7898661 Spectroscopic scatterometer system |
03/01/2011 | US7898645 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method |
03/01/2011 | US7898643 Immersion photolithography system and method using inverted wafer-projection optics interface |
03/01/2011 | US7898642 Lithographic apparatus and device manufacturing method |
03/01/2011 | US7897697 Epoxy resin, blocked polyisocyanate or polymers with polyhydroxystyrenes having novolak structure |
03/01/2011 | US7897325 Lithographic rinse solution and method for forming patterned resist layer using the same |
03/01/2011 | US7897324 Lithographic method |
03/01/2011 | US7897323 applying a photoresist to a substrate surface, then exposing the photoresist to radiation through a photomask, baking and anddeveloping to remove the photoresist from regions of intermediate polarity or from both polar and apolar regions; photolithography |
03/01/2011 | US7897321 Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition |
03/01/2011 | US7897320 Thermoplastic material comprising polychromic substances |
03/01/2011 | US7897319 Positive resist composition and method of forming resist pattern |
03/01/2011 | US7897305 Method for forming pattern and method for fabricating LCD device using the same |
03/01/2011 | US7897206 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method |