| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/15/2011 | US7906274 Method of creating a template employing a lift-off process |
| 03/15/2011 | US7906273 Method of manufacturing hollow micro-needle structures |
| 03/15/2011 | US7906272 Method of forming a pattern of a semiconductor device |
| 03/15/2011 | US7906270 Reduced pitch multiple exposure process |
| 03/15/2011 | US7906269 Positive-type resist composition |
| 03/15/2011 | US7906268 Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits |
| 03/15/2011 | US7906258 Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device |
| 03/15/2011 | US7906060 Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
| 03/15/2011 | US7905952 Blue phthalocyanine pigment composition and its preparation |
| 03/15/2011 | US7905756 Method of manufacturing field emission backlight unit |
| 03/15/2011 | CA2610282C Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| 03/15/2011 | CA2462377C Novel difunctional photoinitiators |
| 03/10/2011 | WO2011028590A2 Patterning hydrogels |
| 03/10/2011 | WO2011028393A1 Lithographic printing plate precursors and stacks |
| 03/10/2011 | WO2011027846A1 Color curable composition and method of preparing the same, color filter and method of producing the same, and solid-state image pick-up device |
| 03/10/2011 | WO2011027782A1 Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus |
| 03/10/2011 | WO2011027773A1 Resist remover composition and method for removing resist using the composition |
| 03/10/2011 | WO2011027772A1 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same |
| 03/10/2011 | WO2011027699A1 Plasma light source system |
| 03/10/2011 | WO2011027695A1 Alkali-developable photocurable resin composition, dried film and cured product of the composition, and printed wiring board comprising the dried film or the cured product |
| 03/10/2011 | WO2011027643A1 Color filter and image display device comprising same |
| 03/10/2011 | WO2011027526A1 Curable resin composition |
| 03/10/2011 | WO2011026907A1 Method and apparatus for drying after single-step-processing of lithographic printing plates |
| 03/10/2011 | WO2011026610A2 Pattern generation systems and high bandwidth focus control systems with suppressed reaction forces and noise |
| 03/10/2011 | WO2010120131A3 Method for treating waste organic solvents |
| 03/10/2011 | WO2010065247A3 Three-dimensional articles using nonlinear thermal polymerization |
| 03/10/2011 | WO2010003671A9 Spectral purity filter, radiation source, lithographic apparatus, and device manufacturing method |
| 03/10/2011 | US20110059407 Double patterning strategy for forming fine patterns in photolithography |
| 03/10/2011 | US20110059406 Pattern forming method |
| 03/10/2011 | US20110059405 Substrate processing method |
| 03/10/2011 | US20110059404 Resist underlayer film forming composition and forming method of resist pattern using the same |
| 03/10/2011 | US20110059403 Method of forming wiring pattern, method of forming semiconductor device, semiconductor device, and data processing system |
| 03/10/2011 | US20110059402 Exposure method |
| 03/10/2011 | US20110059401 Method for preparing lithographic printing plates |
| 03/10/2011 | US20110059400 Photoresist composition |
| 03/10/2011 | US20110059399 Positive-working radiation-sensitive imageable elements |
| 03/10/2011 | US20110059398 Photopolymerizable composition |
| 03/10/2011 | US20110059397 Positive photosensitive polyimide composition |
| 03/10/2011 | US20110059396 Patterning process and chemical amplified photoresist with a photodegradable base |
| 03/10/2011 | US20110058252 Bottomless micro-mirror well for 3d imaging for an object of interest |
| 03/10/2011 | US20110058149 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 03/10/2011 | US20110058148 Lithographic apparatus and device manufacturing method |
| 03/10/2011 | US20110056738 Package substrate and manufacturing method thereof |
| 03/10/2011 | DE102009038558A1 Verfahren zur Emulation eines fotolithographischen Prozesses und Maskeninspektionsmikroskop zur Durchführung des Verfahrens Method of emulation as a photolithographic process and mask inspection microscope for performing the method |
| 03/09/2011 | EP2293144A1 Method and apparatus for drying after single-step-processing of lithographic printing plates |
| 03/09/2011 | EP2293143A2 Novel resins and photoresist compositions comprising the same |
| 03/09/2011 | EP2293141A1 Method of manufacturing a high quality and ultra large screen liquid crystal display device. |
| 03/09/2011 | EP2292695A1 Positive type photosensitive composition |
| 03/09/2011 | EP2291323A2 Fabrication of microscale tooling |
| 03/09/2011 | EP2205682B1 Diketopyrrolopyrrole pigment composition for use in color filters |
| 03/09/2011 | EP1701194B1 Projection optical system and exposure apparatus with the same |
| 03/09/2011 | EP1697936B1 Novel optical storage materials based on narrowband optical properties |
| 03/09/2011 | EP1669802B1 Imprinting machine and device manufacturing method using the same |
| 03/09/2011 | EP1610177B1 Photosensitive resin film and cured film made therefrom |
| 03/09/2011 | EP1490412B1 Photoinitiator, novel compound, and photocurable composition |
| 03/09/2011 | EP1395877B1 Lithographic method of manufacturing a device |
| 03/09/2011 | CN1904726B Method for producing optical shield pattern |
| 03/09/2011 | CN1751270B Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 03/09/2011 | CN1577090B Method of exposing layer with light and method of manufacturing thin film transistor substrate for liquid crystal display device using the same |
| 03/09/2011 | CN101984756A Curable resin composition for nanoimprint |
| 03/09/2011 | CN101983959A Multifunctional acrylic ester monomer for photopolymerization and preparing method thereof |
| 03/09/2011 | CN101393397B Method for making liquid light-sensitive resin relief printing plate with groove |
| 03/09/2011 | CN101238414B Antireflective hardmask composition and its usage method |
| 03/09/2011 | CN101176039B Making a relief image using a removable film |
| 03/09/2011 | CN101109900B Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same |
| 03/08/2011 | US7903264 Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus |
| 03/08/2011 | US7903258 System and method for positioning a product using a laser interferometer |
| 03/08/2011 | US7903211 Liquid crystal display having reflection electrodes |
| 03/08/2011 | US7903049 Apparatus and a method for illuminating a light-sensitive medium |
| 03/08/2011 | US7902528 Method and system for proximity effect and dose correction for a particle beam writing device |
| 03/08/2011 | US7901871 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method |
| 03/08/2011 | US7901869 Double patterning with a double layer cap on carbonaceous hardmask |
| 03/08/2011 | US7901868 Mixtures of functionalized polyhedral oligomeric silsesquioxanes derivatives; immersion photolithography; water insolubility, soluble in photoresist developer and casting solvents, leaching inhibition; resolution |
| 03/08/2011 | US7901867 Sulphonium salt initiators |
| 03/08/2011 | US7901866 Pattern forming method |
| 03/08/2011 | US7901865 Resist composition and process for formation of resist patterns |
| 03/08/2011 | US7901863 Photosensitive resin composition for laser engravable printing substrate |
| 03/08/2011 | US7901851 Colored curable composition, color filter and method of producing thereof |
| 03/08/2011 | US7901848 Method of fabricating a photomask using self assembly molecule |
| 03/03/2011 | WO2011025795A1 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur |
| 03/03/2011 | WO2011025655A2 Silicon-selective dry etch for carbon-containing films |
| 03/03/2011 | WO2011025523A1 Processing solution for flexographic printing plates and method of use |
| 03/03/2011 | WO2011025522A1 Functional nanoparticles |
| 03/03/2011 | WO2011025307A2 Photosensitive resin composition which is curable at a low temperature, and dry film produced using same |
| 03/03/2011 | WO2011025305A2 Novel polyamic acid, polyimide, photosensitive resin composition comprising same, and dry film produced from the composition |
| 03/03/2011 | WO2011025180A2 A photoresist stripping composition for manufacturing lcd |
| 03/03/2011 | WO2011025070A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 03/03/2011 | WO2011025065A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 03/03/2011 | WO2011024985A1 Exposure apparatus, exposure method, and device manufacturing method |
| 03/03/2011 | WO2011024984A1 Exposure method, exposure apparatus, and device manufacturing method |
| 03/03/2011 | WO2011024983A1 Exposure method, exposure apparatus, and device manufacturing method |
| 03/03/2011 | WO2011024967A1 Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern |
| 03/03/2011 | WO2011024957A1 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern |
| 03/03/2011 | WO2011024953A1 N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition |
| 03/03/2011 | WO2011024916A1 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern |
| 03/03/2011 | WO2011024836A1 Alkali-soluble resin containing silicone resin, light-sensitive resin composition, and cured object using light-sensitive resin composition |
| 03/03/2011 | WO2011024734A1 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 03/03/2011 | WO2011024557A1 Novel compound, process for preparation thereof, radiation -sensitive compositions containing the novel compound, and cured films |
| 03/03/2011 | WO2011024545A1 Photosensitive resin composition for microlens |
| 03/03/2011 | WO2011023765A1 Metrology module for laser system |