| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 03/22/2011 | US7910285 Positive resist composition for immersion exposure and method of forming resist pattern |
| 03/22/2011 | US7910284 Negative-tone photoresist material well suited to the EB lithography or the EUV (extreme ultraviolet light) lithography; high sensitivity, high resolution, and low line edge roughness |
| 03/22/2011 | US7910283 Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method |
| 03/22/2011 | US7910282 From a monomer having a hydroxyl group and a monomer having no hydroxyl group, hydroxyl group-containing repeating unit in a low molecular weight region is controlled; improving a resist pattern shape |
| 03/22/2011 | US7910281 Positive resist composition for thin-film implantation process and method for forming resist pattern |
| 03/22/2011 | US7910272 Dye-containing photosensitive composition, color filter using the same, and production method thereof |
| 03/22/2011 | US7910269 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same |
| 03/22/2011 | US7910266 Pattern forming method and mask |
| 03/22/2011 | US7910264 Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film |
| 03/22/2011 | US7910223 Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| 03/22/2011 | US7910042 Capillary imprinting technique |
| 03/17/2011 | WO2011031396A2 Near-infrared absorbing film compositions |
| 03/17/2011 | WO2011031123A2 Isocyanurate compound for forming organic anti-reflective layer and composition including same |
| 03/17/2011 | WO2011031092A2 Cleaning solution composition for substrate for preparation of flat panel display |
| 03/17/2011 | WO2011031047A2 Method for manufacturing stamper for injection molding |
| 03/17/2011 | WO2011031028A2 Resist stripper composition for forming copper-based wiring |
| 03/17/2011 | WO2011030930A1 Catadioptric System, Aberration Measuring Apparatus, Method of Adjusting Optical System, Exposure Apparatus, and Device Manufacturing Method |
| 03/17/2011 | WO2011030744A1 Photosensitive resin composition and method for producing photosensitive resin film |
| 03/17/2011 | WO2011030737A1 Radiation-sensitive composition and novel compound |
| 03/17/2011 | WO2011030688A1 Photosensitive resin composition containing copolymer |
| 03/17/2011 | WO2011030683A1 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern |
| 03/17/2011 | WO2011030645A1 Photopolymerizable composition, color filter, method for producing same, solid-state image pickup element, liquid crystal display device, lithographic printing original plate, and novel compound |
| 03/17/2011 | WO2011030580A1 Photosensitive composition and printed wiring board |
| 03/17/2011 | WO2011029761A1 Optical arrangement in a projection exposure apparatus for euv lithography |
| 03/17/2011 | WO2011029467A1 Optical element with low surface figure deformation |
| 03/17/2011 | WO2010145947A3 A lithographic printing plate precursor |
| 03/17/2011 | WO2010129319A3 Self-assembly of lithographically patterned polyhedral nanostructures and formation of curving nanostructures |
| 03/17/2011 | WO2010049348A3 Inspection method and apparatus |
| 03/17/2011 | US20110065622 Novel nitrile and amidoxime compounds and methods of preparation for semiconductor processing |
| 03/17/2011 | US20110065053 Material for forming protective film and method for forming photoresist pattern |
| 03/17/2011 | US20110065052 Resist coating and developing apparatus and method |
| 03/17/2011 | US20110065051 Supporting device, optical apparatus, exposure apparatus, and device manufacturing method |
| 03/17/2011 | US20110065050 Methods of forming intermediate semiconductor device structures using spin on, photopatternable, interlayer dielectric materials |
| 03/17/2011 | US20110065049 Pattern forming method and manufacturing method of semiconductor device |
| 03/17/2011 | US20110065048 Lithographic imaging and printing with printing members having fusible polymeric particles |
| 03/17/2011 | US20110065047 Photoresist composition |
| 03/17/2011 | US20110065046 Photosensitive resin compositions and photosensitive dry films using the same |
| 03/17/2011 | US20110065045 Epoxy-functionalized perfluoropolyether polyurethanes |
| 03/17/2011 | US20110065044 Polymer for lithographic purposes and method for producing same |
| 03/17/2011 | US20110065043 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part |
| 03/17/2011 | US20110065042 Photopolymerizable composition |
| 03/17/2011 | US20110065041 Photoresist composition |
| 03/17/2011 | US20110065040 Photoresist composition |
| 03/17/2011 | US20110065030 Mask pattern determining method, mask manufacturing method, and device manufacturing method |
| 03/17/2011 | US20110065028 Pattern generating method, manufacturing method of mask, and manufacturing method of semiconductor device |
| 03/17/2011 | US20110065027 Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device |
| 03/17/2011 | US20110064913 Positive-type photosensitive composition |
| 03/17/2011 | US20110063592 Fluorescent film, method of forming fluorescent film, multilayer dielectric film, optical element, optical system, imaging unit, optical property measuring apparatus, method of measuring optical property, exposure apparatus, exposure method, and method of manufacturing device |
| 03/17/2011 | US20110063589 Exposure apparatus and method for manufacturing device |
| 03/17/2011 | US20110062633 Process for the production of a three-dimensional object with an improved separation of hardened material layers from a construction plane |
| 03/17/2011 | US20110062422 Systems And Methods For Forming Defects On Graphitic Materials And Curing Radiation-Damaged Graphitic Materials |
| 03/17/2011 | US20110062146 Conductive film, and transparent heating element |
| 03/17/2011 | DE112009000120T5 Kollektor mit streifendem Einfall für Laser-Erzeuge Plasmaquellen Grazing incidence collector for laser-plasma sources Create |
| 03/17/2011 | DE112005002263B4 Kalibrierung von optischen Linienverkürzungsmessungen Calibration of optical line shortening measurements |
| 03/16/2011 | EP2296042A2 Resist coating and developing apparatus and method |
| 03/16/2011 | EP2296041A2 Lithographic systems and methods with extended depth of focus |
| 03/16/2011 | EP2296040A1 Positive photosensitive composition |
| 03/16/2011 | EP2296039A1 Positive photosensitive composition |
| 03/16/2011 | EP2295247A1 Lithographic printing plate precursor and lithographic printing method |
| 03/16/2011 | EP2294484A1 Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method |
| 03/16/2011 | EP2294149A1 Aqueous composition for coating over a photoresist pattern |
| 03/16/2011 | EP2041622B1 Precise positioning system for dual stage switching exposure |
| 03/16/2011 | EP1810085B1 A system and a method for generating periodic and/or quasi-periodic pattern on a sample |
| 03/16/2011 | EP1716456B1 A system and method for positioning a product |
| 03/16/2011 | EP1649324B1 An illumination system for microlithography |
| 03/16/2011 | EP1438634B1 Holographic recording material and method for creating a light-resistant hologram |
| 03/16/2011 | EP1358623B1 Method and apparatus for inspecting a substrate |
| 03/16/2011 | EP1256734B1 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for the hydrostatic gas bearing device |
| 03/16/2011 | CN201765435U Light source deice of exposure machine |
| 03/16/2011 | CN201765434U Displacement driving mechanism and exposure machine |
| 03/16/2011 | CN201765433U Gelatinizing developer |
| 03/16/2011 | CN201765414U Array needles, array needle cleaning device and array needle cleaning system |
| 03/16/2011 | CN1708728B Radiation-sensitive resin composition |
| 03/16/2011 | CN1637608B Lithographic apparatus and device manufacturing method |
| 03/16/2011 | CN1618716B Loading lock and loading lock chamber therewith |
| 03/16/2011 | CN1592528B Conductive film pattern forming method, electrooptical apparatus and electronic apparatus |
| 03/16/2011 | CN101986209A Exposure apparatus, exposure method and device manufacturing method |
| 03/16/2011 | CN101986208A Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate |
| 03/16/2011 | CN101986207A Exposure apparatus and exposure method |
| 03/16/2011 | CN101985531A Photosensitive coating and preparation method thereof and photosensitive film made by utilizing same |
| 03/16/2011 | CN101446777B Super-resolution i-ray lithography device |
| 03/16/2011 | CN101446771B Lithographic apparatus having an active damping subassembly |
| 03/16/2011 | CN101441419B Substrate transferring method and system and photolithography projector equipment |
| 03/16/2011 | CN101400775B Cleaning treatment liquid |
| 03/16/2011 | CN101398614B Method for making three-dimensional needlepoint electrode array based on parylene |
| 03/16/2011 | CN101384694B Stabilized, non-aqueous cleaning compositions for microelectronics substrates |
| 03/16/2011 | CN101322076B Method of making a lithographic printing plate |
| 03/16/2011 | CN101320223B Photoetching apparatus, control method and calibration method |
| 03/16/2011 | CN101283313B Method for preparing surface concaves and convexes |
| 03/16/2011 | CN101272911B Apparatus and method for manufacturing photosensitive laminate |
| 03/16/2011 | CN101261453B Electron-beam exposure device film jacket library system |
| 03/16/2011 | CN101261443B Nanometer crystal graph transfer printing process and nanometer crystal graph material |
| 03/16/2011 | CN101126898B Method for shrinking pi phase migration lithographic feature size using metal layer |
| 03/15/2011 | US7908581 Information management and tracking system (IMTS) |
| 03/15/2011 | US7907255 Lithographic apparatus and device manufacturing method |
| 03/15/2011 | US7907254 Exposure apparatus, exposure method, and method for producing device |
| 03/15/2011 | US7907253 Exposure apparatus, exposure method, and method for producing device |
| 03/15/2011 | US7907226 Method of fabricating an array substrate for liquid crystal display device |
| 03/15/2011 | US7906775 Superlattice nanopatterning of wires and complex patterns |
| 03/15/2011 | US7906275 forming a second pattern by nonlinear processing, using the first pattern having a first pitch p on the photoresist layer; doubling in one dimension; photolithography |