G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2011
03/24/2011	WO2011034124A1 Photosensitive resin composition, dry film and cured product thereof, and printed wiring board using the same
03/24/2011	WO2011034099A1 Upper layer film forming composition and method for forming photoresist pattern
03/24/2011	WO2011034062A1 Aromatic hydrocarbon resin and composition for forming underlayer film for lithography
03/24/2011	WO2011034007A1 Radiation-sensitive resin composition and resist pattern formation method
03/24/2011	WO2011033965A1 Silicon-containing composition having sulfonamide group for forming resist underlayer film
03/24/2011	WO2011033905A1 Colored curable composition, color filter, and method for producing color filter
03/24/2011	WO2011033447A1 Foil trap device with improved heat resistance
03/24/2011	WO2011032768A2 Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
03/24/2011	WO2011014011A9 Photoresist composition comprising a crosslinkable curing substance
03/24/2011	WO2011012559A3 Post ion implant stripper for advanced semiconductor application
03/24/2011	WO2010141115A3 Directed material assembly
03/24/2011	WO2010034427A3 Lithographic system, lithographic method and device manufacturing method
03/24/2011	US20110070680 Pattern forming method and manufacturing method of semiconductor device
03/24/2011	US20110070547 Methods for mastering microstructures through a substrate using negative photoresist
03/24/2011	US20110070546 Single photoresist approach for high challenge photo process
03/24/2011	US20110070545 High normality solution for removing freeze material in lithographic applications
03/24/2011	US20110070544 Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method
03/24/2011	US20110070543 Aqueous Base-Developable Negative-Tone Films Based On Functionalized Norbornene Polymers
03/24/2011	US20110070542 Photoresist and patterning process
03/24/2011	US20110070534 Reflective mask blank for euv lithography
03/24/2011	US20110070532 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
03/24/2011	US20110070490 Carbon electrodes for electrochemical applications
03/24/2011	US20110070407 Near-infrared absorptive dye-containing curable composition, ink composition and method of producing near-infrared absorptive filter
03/24/2011	US20110070404 Photosensitive material for forming conductive film, and conductive material
03/24/2011	US20110069360 Grid image
03/24/2011	US20110069296 Microlithographic exposure method as well as a projection exposure system for carrying out the method
03/24/2011	US20110069292 Metrology Method and Apparatus, Lithographic Apparatus, and Device Manufacturing Method
03/24/2011	US20110069288 Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method
03/24/2011	US20110069264 Liquid crystal imager and method of making same
03/24/2011	US20110068282 Plasma source of directed beams and application thereof to microlithography
03/24/2011	US20110068281 Charged particle beam drawing apparatus and proximity effect correction method thereof
03/24/2011	DE19708294B4 Alkylphenylbisacylphosphinoxide Alkylphenylbisacylphosphinoxide
03/24/2011	DE102010038748A1 Verfahren zur Herstellung eines Spiegels mit wenigstens zwei Spiegelflächen, Spiegel einer Projektionsbelichtungsanlage der Mikrolithographie und Projektionsbelichtungsanlage Process for the preparation of a mirror with at least two mirror surfaces, mirrors a projection exposure system for microlithography and projection exposure apparatus
03/24/2011	DE102009029282A1 Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie Optical arrangement, especially in a projection exposure apparatus for EUV lithography
03/23/2011	EP2299326A1 Polymerizable compound and polymer compound obtained by using the same
03/23/2011	EP2299325A1 Resist composition, resist pattern forming method and compound
03/23/2011	EP2299324A1 Mould for thermal nanoimprint lithography, process for fabricating the same, and nanoimprint process using the same.
03/23/2011	EP2298540A2 Compositions and methods for use in three dimensional model printing
03/23/2011	EP2297613A2 Orthogonal processing of organic materials used in electronic and electrical devices
03/23/2011	EP2297612A1 Imaging optics
03/23/2011	EP2297611A1 On-press developable imageable elements
03/23/2011	EP2297610A1 An antireflective coating composition
03/23/2011	EP2297609A1 Method and apparatus for determining the effect of process variations
03/23/2011	EP2297608A2 Negative tone molecular glass resists and methods of making and using same
03/23/2011	EP2296827A1 Method and device for coating a peripheral surface of a sleeve core
03/23/2011	EP2296541A1 Metallization process to obtain a microelectrode on a photopatternable substrate and its biomedical application on an organ transplant monitoring device
03/23/2011	EP2193404B1 Calibration of a position-measuring device of an optical device
03/23/2011	EP1938150B1 Collector for lighting systems with a wavelength </= 193 nm
03/23/2011	EP1673663B1 Light sensitive coating compositions for lithographic elements
03/23/2011	EP1279071B1 Multi depth substrate fabrication processes
03/23/2011	EP1269264B1 Method of analyzing a wafer manufacturing process
03/23/2011	CN201774751U PCB screen developing platform
03/23/2011	CN201773263U contraposition exposure
03/23/2011	CN101990652A Shear-layer chuck for lithographic apparatus
03/23/2011	CN101989521A Photosensitive paste for elextrode of plasma display pannel
03/23/2011	CN101989161A Projected capacitive touch panel and manufacturing method thereof
03/23/2011	CN101989083A Photoresist management system of glue spreader
03/23/2011	CN101989050A Positioning system, lithographic apparatus and method
03/23/2011	CN101989049A Lithographic apparatus and monitoring method
03/23/2011	CN101989048A Light source device
03/23/2011	CN101989047A Method for detecting pattern topography of maskplate by dual exposure method
03/23/2011	CN101989046A Pattern transfer method and mask manufacturing method
03/23/2011	CN101989045A Method for avoiding graphics damage of photoresist layer
03/23/2011	CN101989043A Multi-gray scale photomask, photomask blank, method of manufacturing multi-gray scale photomask and pattern transfer method
03/23/2011	CN101989042A Method of manufacturing multi-gray scale photomask and pattern transfer method
03/23/2011	CN101989038A Mask detection device and detection method
03/23/2011	CN101989037A Method for reducing foggy defect of sediment on photomask
03/23/2011	CN101989007A Colourful film substrate and manufacturing method thereof
03/23/2011	CN101987880A Novel copolymer and photoresist composition comprising the same
03/23/2011	CN101673010B Color film base plate of liquid crystal display and manufacture method thereof
03/23/2011	CN101661227B Large size conductive substrate thick circuit write-through device and write-through technology thereof
03/23/2011	CN101661224B Method for improving photoetching alignment precision
03/23/2011	CN101655667B Lithographic equipment with fiber module
03/23/2011	CN101625492B Manufacturing method of array base plate of film transistor
03/23/2011	CN101556436B A system and a method for light shield tracking monitoring
03/23/2011	CN101458462B Photolithography developing method for reducing photoresist developing defect in semiconductor process
03/23/2011	CN101452213B Secondary image exposure method of contact hole
03/23/2011	CN101373338B A method of performing model-based scanner tuning
03/23/2011	CN101315514B Mask plate and matching method of photo-etching machine nesting precision using mask plate
03/23/2011	CN101241302B Preparation method for improving mask critical size trend
03/23/2011	CN101231470B Method for determining temperature distortion correcting parameter of lens array system apparatus
03/23/2011	CN101192011B System and method for self aligning etching
03/23/2011	CN101144986B Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
03/23/2011	CN101138070B Stage apparatus and exposure apparatus
03/23/2011	CN101101453B Method of reducing a wave front aberration
03/23/2011	CN101025573B Lithographic apparatus and device manufacturing method
03/22/2011	US7912671 Method for measuring the position of a mark in a deflector system
03/22/2011	US7911588 Exposure apparatus and original
03/22/2011	US7911586 Lithographic apparatus and device manufacturing method
03/22/2011	US7911584 Illumination system for microlithography
03/22/2011	US7911583 Exposure apparatus, exposure method, and method for producing device
03/22/2011	US7911582 Exposure apparatus and device manufacturing method
03/22/2011	US7911012 Flexible and elastic dielectric integrated circuit
03/22/2011	US7910768 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
03/22/2011	US7910292 Lithographic process
03/22/2011	US7910291 Method for manufacturing semiconductor device using immersion lithography process
03/22/2011	US7910290 Photoresist topcoat for a photolithographic process
03/22/2011	US7910289 Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approach
03/22/2011	US7910287 Relief printing plate, and method for manufacturing electronic circuit pattern, organic electroluminescence device and organic electronic device by using the same
03/22/2011	US7910286 Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors

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