G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2011
03/30/2011	EP2301759A1 Process and apparatus for producing cylindrical printing plate precursor for laser engraving
03/30/2011	EP2301742A1 Viscosity reducible radiation curable resin composition
03/30/2011	EP2300879A1 Extreme uv radiation generating device comprising a contamination captor
03/30/2011	EP2300878A1 Source module of an euv lithographic apparatus, lithographic apparatus, and method for manufacturing a device
03/30/2011	EP2300877A1 Actuator and projection exposure system
03/30/2011	EP2300876A1 Method for producing a multilayer coating, optical element and optical arrangement
03/30/2011	EP2300507A1 Antirelective coating compositions
03/30/2011	EP2300207A1 Versatile high aspect ratio actuatable nanostructured materials through replication
03/30/2011	CN201780454U Exposure glass applied to exposure machine
03/30/2011	CN201780453U Negative cleaning table
03/30/2011	CN1997939B Method of forming resist pattern, positive resist composition, and layered product
03/30/2011	CN1991583B Polymerizable composition and planographic printing plate precursor using the same
03/30/2011	CN1947065B Resist pattern forming method and composite rinse agent
03/30/2011	CN1930194B Resist polymer, resist composition, process for pattern formation, and material compounds for production of the resist polymer
03/30/2011	CN1928720B Photoresist liquid feeding device and modified set using same
03/30/2011	CN1904734B Photosensitive resin composition
03/30/2011	CN1888978B Photoetching patterning method with micro-transfer patterned graph as mask plate
03/30/2011	CN1882883B System and method for characterizing lithography effects on a wafer
03/30/2011	CN1699530B Process solutions containing surfactants
03/30/2011	CN1677237B Pattern exposure method and apparatus
03/30/2011	CN1612292B Supporting plate, stage device, exposure apparatus and exposure method
03/30/2011	CN101999097A Method for forming conductive polymer pattern
03/30/2011	CN101996948A Method for forming semiconductor device
03/30/2011	CN101996945A Method for forming semiconductor device
03/30/2011	CN101996867A Applying/developing apparatus and applying/developing method
03/30/2011	CN101996866A Method for protecting overlay mark graph
03/30/2011	CN101995778A Processing method of liquid
03/30/2011	CN101995777A Composition for stripping color filter and regeneration method of color filter using the same
03/30/2011	CN101995776A Lithographic apparatus and device manufacturing method
03/30/2011	CN101995775A Exposure apparatus and device manufacturing method
03/30/2011	CN101995774A Method for monitoring performance of DMR
03/30/2011	CN101995773A Photoresist coating device
03/30/2011	CN101995772A Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method
03/30/2011	CN101995771A Coloring light-sensitive resin composition, and a colorful optical filter and a liquid crystal display device manufactured by using the coloring light-sensitive resin composition
03/30/2011	CN101995770A Photoresist composition
03/30/2011	CN101995769A Photoresist composition
03/30/2011	CN101995768A Imprint lithography apparatus and method
03/30/2011	CN101995767A Method for reducing photoresist intoxication
03/30/2011	CN101995766A Metal microstructure forming method
03/30/2011	CN101995765A Photoetching method
03/30/2011	CN101995709A Fringing field switching (FFS) type thin film transistor liquid crystal display (TFT-LCD) array substrate and manufacturing method thereof
03/30/2011	CN101995702A Color film substrate and manufacturing method thereof
03/30/2011	CN101995623A Light source device and method of producing the same
03/30/2011	CN101995591A Catadioptric projection objective
03/30/2011	CN101993797A Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
03/30/2011	CN101993537A Alkali-soluble polymer, photosensitive resin composition comprising the same, and uses of the same
03/30/2011	CN101993532A Acrylate containing carboxyl hyperbranched poly(amine-ester) and preparation method thereof
03/30/2011	CN101609264B Method for improving focusing and leveling measurement accuracy
03/30/2011	CN101609263B Mobile device of photoetching machine wafer stage and photoetching machine adopting mobile device
03/30/2011	CN101539719B Manufacturing method of vibration amplitude mask template used for manufacturing sampling fiber grating
03/30/2011	CN101533230B Anomaly detection method of UV photoresist hardening platform
03/30/2011	CN101526751B Flexible positioning structure with safety protection function
03/30/2011	CN101526745B Flexible connecting device and exposure platform using same
03/30/2011	CN101493657B Mask plate positioning device
03/30/2011	CN101487987B Iris measuring apparatus and image processing process
03/30/2011	CN101464637B Measurement apparatus and method for wave aberration of photo-etching machine projection objective
03/30/2011	CN101446775B Alignment light source apparatus
03/30/2011	CN101414235B In-mold moulding touch control module group and producing method thereof
03/30/2011	CN101403866B Object position measurement apparatus and method
03/30/2011	CN101403865B Pre-aligning system for mask of photo-etching machine
03/30/2011	CN101364116B Thermostatic control device
03/30/2011	CN101305323B Methods and systems for pattern generation based on multiple forms of design data
03/30/2011	CN101286005B Local micro photolithography film possessing oxide mask
03/30/2011	CN101286004B Inorganic heat resistance film for photoetching technique
03/30/2011	CN101271268B Method and system for optimizing lithography focus and/or energy
03/30/2011	CN101270271B Disposal hologram image autogram film hot diversion adhesion agent and preparation method thereof
03/30/2011	CN101251714B Method for making semi-penetrating reflecting film colourful optical filter
03/30/2011	CN101226316B Method for preparing substrate of LCD
03/30/2011	CN101216679B Edge exposure device
03/30/2011	CN101208636B Toner and toner production process
03/30/2011	CN101206412B Decompression drying device
03/30/2011	CN101171548B Exposure device for printing plates
03/30/2011	CN101162725B Semiconductor structure and methods of fabricating same
03/30/2011	CN101082780B Device for changing pitch between light beam axes, and substrate exposure apparatus
03/30/2011	CN101078874B Method for producing high-resolution nano-imprint masters
03/30/2011	CN101071239B Display substrate, method of manufacturing the same and display apparatus having the same
03/30/2011	CN101063817B Resist for printing and patterning method using the same
03/30/2011	CN101055418B System, method, and apparatus for non-contact and diffuse curing exposure
03/29/2011	US7916391 Apparatus for providing a pattern of polarization
03/29/2011	US7916276 Lithographic apparatus and device manufacturing method with double exposure overlay control
03/29/2011	US7916272 Exposure apparatus and device fabrication method
03/29/2011	US7914975 Multiple exposure lithography method incorporating intermediate layer patterning
03/29/2011	US7914974 Anti-reflective imaging layer for multiple patterning process
03/29/2011	US7914973 Method of forming a pattern in a semiconductor device and method of forming a gate using the same
03/29/2011	US7914972 Exposure method and device manufacturing method
03/29/2011	US7914968 Positive resist composition and method of forming resist pattern
03/29/2011	US7914967 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
03/29/2011	US7914965 Resist composition and method of pattern formation with the same
03/29/2011	US7914957 Production method for color filter
03/29/2011	US7914956 Dye-containing negative working curable composition, color filter and production method thereof
03/29/2011	US7914955 Masks, lithography device and semiconductor component
03/29/2011	US7914687 Ultra pure water for use as an immersion liquid
03/29/2011	US7913620 Method of on-press developing overcoated lithographic printing plate
03/24/2011	WO2011034847A1 Fluorinated coating and phototools made therewith
03/24/2011	WO2011034845A1 Fluorinated coating and phototools made therewith
03/24/2011	WO2011034756A1 Limiting plate shifting within a plate pallet
03/24/2011	WO2011034728A2 Laser ablation tooling via distributed patterned masks
03/24/2011	WO2011034213A1 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
03/24/2011	WO2011034212A1 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
03/24/2011	WO2011034176A1 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

1 ... 243 244 245 246 247 248 249 250 251 252 253 254 255 256 257 258 259 260 261 262 263 ... 1272