| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/06/2011 | CN101243359B Image-projecting system, particularly a projection objective of a microlithographic projection exposure apparatus |
| 04/06/2011 | CN101211104B Method for manufacturing photomask and phase shift mask |
| 04/06/2011 | CN101198905B Positive resist composition and method for forming resist pattern |
| 04/06/2011 | CN101185028B Photosensitive resin composition, photosensitive element employing the same, method of forming resist pattern, and process for producing printed wiring board |
| 04/06/2011 | CN101180582B Lithographic apparatus and device manufacturing method |
| 04/06/2011 | CN101107568B Composite composition for micropatterned layers |
| 04/06/2011 | CN101090067B Manufacturing method of semiconductor device |
| 04/06/2011 | CN101063755B Method of manufacturing metal line and resulting method for manufacturing display substrate |
| 04/06/2011 | CN101019073B Method for pre-exposing relief image printing plate |
| 04/06/2011 | CN101010630B Improved slip film compositions containing layered silicates |
| 04/05/2011 | US7920232 Method of producing liquid crystal cell substrate, liquid crystal cell substrate, and liquid crystal display device |
| 04/05/2011 | US7919445 Aqueous solution for removing post-etch residue |
| 04/05/2011 | US7919377 Contactless flash memory array |
| 04/05/2011 | US7919231 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 04/05/2011 | US7919228 Photoresist patterns are formed between photomask patterns using a self-aligned method employing a negative type photoresist; forming micro photomask patterns |
| 04/05/2011 | US7919227 Positive resist composition and method of forming resist pattern |
| 04/05/2011 | US7919226 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 04/05/2011 | US7919225 Photopatternable dielectric materials for BEOL applications and methods for use |
| 04/05/2011 | US7919224 Coating materials consisting of low- or medium-molecular organic compounds |
| 04/05/2011 | US7919223 Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance |
| 04/05/2011 | US7919218 Method for a multiple exposure beams lithography tool |
| 04/05/2011 | US7918182 Developing device and developing method |
| 03/31/2011 | WO2011037809A1 High normality solution for removing freeze material in lithographic applications |
| 03/31/2011 | WO2011037638A1 Resist exposure and contamination testing appparatus for euv lithography |
| 03/31/2011 | WO2011037438A2 Dry film photoresist |
| 03/31/2011 | WO2011037435A2 Composition for forming a pattern for a nano-/microfluidic channel, and apparatus for forming a pattern using same |
| 03/31/2011 | WO2011037300A1 Photoresist stripper composition and photoresist peeling method employing same |
| 03/31/2011 | WO2011037278A1 Stage apparatus and driving method |
| 03/31/2011 | WO2011037277A1 Exposure apparatus and device fabricating method |
| 03/31/2011 | WO2011037276A1 Exposure apparatus and device fabricating method |
| 03/31/2011 | WO2011037275A1 Stage apparatus, exposure apparatus, and device fabricating method |
| 03/31/2011 | WO2011037246A1 Radiation-sensitive resin composition, resist pattern formation method, and polymer |
| 03/31/2011 | WO2011037195A1 Coloring composition and color filter |
| 03/31/2011 | WO2011037182A1 Photosensitive resin composition for resist material, and photosensitive resin laminate |
| 03/31/2011 | WO2011037080A1 Apparatus for reducing waste lithographic printing plate developing liquid |
| 03/31/2011 | WO2011037073A1 Process for production of trans cyclic polyphenol compounds |
| 03/31/2011 | WO2011037072A1 Cyclic compound, radiation-sensitive composition, and resist pattern formation method |
| 03/31/2011 | WO2011037071A1 Cyclic compound, radiation-sensitive composition, and resist pattern formation method |
| 03/31/2011 | WO2011037036A1 Radiation-sensitive resin composition |
| 03/31/2011 | WO2011037005A1 Lithographic printing original plate |
| 03/31/2011 | WO2011036931A1 Lithographic printing plate precursor and process for producing same |
| 03/31/2011 | WO2011036923A1 Method for processing waste solution in plate-making process of photosensitive lithographic printing plate |
| 03/31/2011 | WO2011036816A1 Pattern formation process |
| 03/31/2011 | WO2011036248A1 Source collector apparatus, lithographic apparatus and device manufacturing method |
| 03/31/2011 | WO2011035963A1 Spectral purity filter, lithographic apparatus, and device manufacturing method |
| 03/31/2011 | WO2011011140A3 Method and materials for double patterning |
| 03/31/2011 | WO2011002518A9 Chucking system with recessed support feature |
| 03/31/2011 | WO2011002252A3 Method for manufacturing color filter for solid state imaging device using ultrashort wave exposure apparatus, color filter manufactured by the same, and solid state imaging device including the same |
| 03/31/2011 | WO2011001123A3 Functionalization of sp3 hybridized carbon, silicon, and/or germanium surfaces |
| 03/31/2011 | US20110077321 Compositions and methods for use in three dimensional model printing |
| 03/31/2011 | US20110076845 Method Of Forming An Interconnect Of A Semiconductor Device |
| 03/31/2011 | US20110076626 Positive-Working Photoimageable Bottom Antireflective Coating |
| 03/31/2011 | US20110076625 Method of forming patterns |
| 03/31/2011 | US20110076624 Photoresist stripping technique |
| 03/31/2011 | US20110076623 Method for reworking silicon-containing arc layers on a substrate |
| 03/31/2011 | US20110076622 Positive resist composition for immersion exposure and pattern-forming method using the same |
| 03/31/2011 | US20110076621 Lithographic printing plate precursor and plate making method thereof |
| 03/31/2011 | US20110076620 Dithiane derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition |
| 03/31/2011 | US20110076619 Method for modifying first film and composition for forming acid transfer resin film used therefor |
| 03/31/2011 | US20110076618 Lithographic printing plate precursor and plate making method thereof |
| 03/31/2011 | US20110076617 Photoresist composition |
| 03/31/2011 | US20110076616 Lithographic printing plate precursor and plate making method of lithographic printing plate |
| 03/31/2011 | US20110076615 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 03/31/2011 | US20110076614 Method of drying organic pigment, method of processing phthalocyanine pigment, and method of manufacturing electrophotographic photosensitive member |
| 03/31/2011 | US20110076613 Resin composition for laser engraving, relief printing plate precursor for laser engraving and method for producing the same, and relief printing plate and method for making the same |
| 03/31/2011 | US20110076601 Monitoring method of exposure apparatus |
| 03/31/2011 | US20110076467 High-Throughput Imaging of Graphene Based Sheets by Fluorescence Quenching Microscopy and Applications of Same |
| 03/31/2011 | US20110076465 Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film |
| 03/31/2011 | US20110076464 Structuring of conductive polymer layers by means of the lift-off process |
| 03/31/2011 | US20110076458 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment |
| 03/31/2011 | US20110076454 Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing same, and relief printing plate and process for making same |
| 03/31/2011 | US20110076448 Methods for Patterning Substrates Using Heterogeneous Stamps and Stencils and Methods of Making the Stamps and Stencils |
| 03/31/2011 | US20110075249 Charged particle migration type display panel and method of manufacturing charged particle migration type display panel |
| 03/31/2011 | US20110075238 Method and System for Increasing Alignment Target Contrast |
| 03/31/2011 | US20110075124 Source and Mask Optimization By Changing Intensity and Shape of the Illumination Source |
| 03/31/2011 | US20110075119 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof |
| 03/31/2011 | US20110074528 Micromachined radio frequency circuit structures |
| 03/31/2011 | DE102010029050A1 Magnifying imaging lens for use in aerial image metrology system for e.g. simulation of effects of characteristics of lithography masks used for manufacturing semiconductor elements, has image plane representing lens field plane |
| 03/31/2011 | DE102009045223A1 Optische Anordnung in einer Projektionsbelichtungsanlage für die EUV-Lithographie Optical arrangement in a projection exposure apparatus for EUV lithography |
| 03/31/2011 | DE102009045219A1 Beleuchtungssystem für die Mikrolithographie An illumination system for microlithography |
| 03/31/2011 | DE102009045135A1 Beleuchtungsoptik für die Mikrolithographie Illumination optics for microlithography |
| 03/31/2011 | DE102009045114A1 Wet chemical structuring of superconducting, ferromagnetic and/or ferroelectric oxides, comprises partially covering oxide surface of superconducting, ferromagnetic and ferroelectric oxide with a mask and contacting with etching solution |
| 03/31/2011 | DE102009043501A1 Optical system for use in microlithography projection illumination system for microlithography for production of e.g. LCD, has two optical components, where length measurement sections directly run between optical components |
| 03/31/2011 | DE102009029471A1 Spiegel zur Verwendung in einer Mikrolithographie-Projektionsbelichtungsanlage Mirror for use in a microlithography projection exposure apparatus |
| 03/31/2011 | DE102004059439B4 Methode zur Entfernung eines Resistmusters Method of removing a resist pattern |
| 03/30/2011 | EP2302659A2 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
| 03/30/2011 | EP2302463A1 Method of preparing a lithographic printing plate |
| 03/30/2011 | EP2302462A2 Method of preparing a lithographic printing plate |
| 03/30/2011 | EP2302461A1 Method of preparing lithographic printing plate |
| 03/30/2011 | EP2302460A2 Lithography system |
| 03/30/2011 | EP2302459A2 Lithography system |
| 03/30/2011 | EP2302458A2 Lithography system |
| 03/30/2011 | EP2302457A2 Lithography system |
| 03/30/2011 | EP2302456A1 Positive-type resist composition, and method for production of microlens |
| 03/30/2011 | EP2302455A1 Plate cutting apparatus |
| 03/30/2011 | EP2302454A1 Dispersion composition and method of producing the same, photosensitive resin composition and method of producing the same, light-shielding color filter and method of producing the same, and solid-state image sensor |
| 03/30/2011 | EP2302419A1 Silicon oxyfluoride glass |
| 03/30/2011 | EP2302418A1 Silicon oxyfluoride glass |
| 03/30/2011 | EP2302360A2 Methods and apparatus for modeling electromagnetic scattering properties of microscopic structures and methods and apparatus for reconstruction of microscopic structures |
| 03/30/2011 | EP2302010A1 Ink composition and method of producing a processed product of printed matter |