| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/07/2011 | WO2011040488A1 Illumination optical system, exposure system and method for manufacturing device |
| 04/07/2011 | WO2011040462A1 Base-generating agent, photosensitive resin composition, material for pattern-forming comprising said photosensitive resin composition, pattern-forming method using said photosensitive resin composition, and article |
| 04/07/2011 | WO2011040413A1 Photosensitive resin composition for photospacer, photosensitive resin transfer material, photospacer and process for production thereof, substrate for liquid crystal display device, and liquid crystal display device |
| 04/07/2011 | WO2011040340A1 Pattern forming method and composition for forming resist underlayer film |
| 04/07/2011 | WO2011040324A1 Semiconductor element substrate |
| 04/07/2011 | WO2011040299A1 Photosensitive composition, photosensitive solder resist composition, photosensitive solder resist film, and permanent pattern, method for forming same, and printed substrate |
| 04/07/2011 | WO2011040255A1 Curable composition, curable film, curable laminate, method for forming a permanent pattern, and printed substrate |
| 04/07/2011 | WO2011040248A1 Positive photosensitive resin composition, cured film obtained using same, and optical device |
| 04/07/2011 | WO2011040175A1 Polymer, radiation-sensitive composition, monomer, and manufacturing method therefor |
| 04/07/2011 | WO2011040114A1 Method for producing planographic printing plate precursor |
| 04/07/2011 | WO2011040083A1 Colored photosensitive resin composition, color filter, and liquid crystal display device |
| 04/07/2011 | WO2011039984A1 Photosensitive resin composition, cured product thereof, and printed wiring board |
| 04/07/2011 | WO2011039847A1 Pattern forming method |
| 04/07/2011 | WO2011039560A1 Positive-working photoimageable bottom antireflective coating |
| 04/07/2011 | WO2011039261A2 Illumination system for microlithography |
| 04/07/2011 | WO2011039136A1 Illumination optical unit for microlithography |
| 04/07/2011 | WO2011039124A1 Optical arrangement in a projection exposure apparatus for euv lithography |
| 04/07/2011 | WO2011039103A1 Optical arrangement in a microlithographic projection exposure apparatus |
| 04/07/2011 | WO2011039093A1 Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus |
| 04/07/2011 | WO2011039061A1 Reflective optical element and method for operating an euv lithography apparatus |
| 04/07/2011 | WO2011039031A1 Mesh structure for surface plasmon resonance spectroscopy |
| 04/07/2011 | WO2011038840A1 Catadioptric projection objective comprising deflection mirrors and projection exposure method |
| 04/07/2011 | WO2011038741A1 Injection molding tools with micro/nano-meter pattern |
| 04/07/2011 | WO2010148520A4 Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
| 04/07/2011 | US20110083113 System and Method for Lithography Simulation |
| 04/07/2011 | US20110081618 Litho-litho etch (lle) double patterning methods |
| 04/07/2011 | US20110081617 Integrated lithography equipment and lithography process thereof |
| 04/07/2011 | US20110081616 Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method |
| 04/07/2011 | US20110081615 Material for forming resist sensitization film and production method of semiconductor device |
| 04/07/2011 | US20110081614 Method of Improving Print Performance in Flexographic Printing Plates |
| 04/07/2011 | US20110081613 Radiation-sensitive resin composition |
| 04/07/2011 | US20110081612 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith |
| 04/07/2011 | US20110081602 Optical data storage media and methods for using the same |
| 04/07/2011 | US20110081526 Patterning of solid state features by direct write nanolithographic printing |
| 04/07/2011 | US20110081521 Hierarchical structure and manufacturing method thereof |
| 04/07/2011 | US20110080574 Stage apparatus, exposure apparatus, and exposure method |
| 04/07/2011 | US20110080538 Optical element manufacturing method, optical element exposure device, optical element, lighting optical device, display device, and electronic apparatus |
| 04/07/2011 | US20110079927 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part |
| 04/07/2011 | DE102009045217B3 Katadioptrisches Projektionsobjektiv A catadioptric projection lens |
| 04/07/2011 | DE102009045170A1 Reflektives optisches Element und Verfahren zum Betrieb einer EUV-Lithographievorrichtung The reflective optical element and method for operating an EUV lithography apparatus |
| 04/07/2011 | DE102009045163A1 Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage Optical arrangement in a microlithography projection exposure apparatus |
| 04/07/2011 | DE102008064504B4 Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie The projection exposure method and projection exposure system for microlithography |
| 04/07/2011 | CA2773364A1 Method of improving print performance in flexographic printing plates |
| 04/06/2011 | EP2306246A1 Manufacturing method of lithographic printing plate |
| 04/06/2011 | EP2306245A1 Photosensitive letterpress printing original plate |
| 04/06/2011 | EP2306244A1 Positive photosensitive resin composition, cured film, protective film, insulation film, and semiconductor device and display device using same |
| 04/06/2011 | EP2306243A1 A sensitive liquid crystalline polymeric material suitable for reflective hologram recording and the preparing method thereof |
| 04/06/2011 | EP2306242A2 Method of forming a pattern on a substrate |
| 04/06/2011 | EP2305754A1 Epoxy-containing polymer photo-curable resin composition, patterning process and electric/electronic part protective film |
| 04/06/2011 | EP2304771A2 Method for forming fine pitch structures |
| 04/06/2011 | EP2304505A1 A method and apparatus for preparing lithographic printing plate precursors |
| 04/06/2011 | EP2304504A1 Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus |
| 04/06/2011 | EP2304503A1 Filters |
| 04/06/2011 | EP2304502A1 Print plate handling system |
| 04/06/2011 | EP2304501A2 Adaptive nanotopography sculpting |
| 04/06/2011 | EP2304078A2 Method of forming a microstructure |
| 04/06/2011 | EP2303833A2 Oxime ester photoinitiators |
| 04/06/2011 | EP1664927B1 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography |
| 04/06/2011 | EP1601931B1 Method for detecting overlay errors using scatterometry |
| 04/06/2011 | CN1975578B Coating and developing system and coating and developing method |
| 04/06/2011 | CN1975571B Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same |
| 04/06/2011 | CN1952778B Compositions and processes for photolithography |
| 04/06/2011 | CN1892441B Lithographic apparatus, contaminant trap, and device manufacturing method |
| 04/06/2011 | CN1854908B Heating apparatus, coating and developing device and heating method |
| 04/06/2011 | CN1790162B Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same |
| 04/06/2011 | CN102007455A Rapid exchange device for lithography reticles |
| 04/06/2011 | CN102007454A Method for analyzing masks for photolithography |
| 04/06/2011 | CN102007453A Apparatus for supporting an optical element, and method of making same |
| 04/06/2011 | CN102007452A Photosensitive resin composition and layered object obtained therewith |
| 04/06/2011 | CN102007451A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
| 04/06/2011 | CN102007450A Photosensitive resin composition for black matrix |
| 04/06/2011 | CN102006717A Resistance welding layer and printed circuit board |
| 04/06/2011 | CN102005382A Dual exposure track only pitch split process |
| 04/06/2011 | CN102004399A Water-rich stripping and cleaning formulation and method for using same |
| 04/06/2011 | CN102004398A Two-side exposure device |
| 04/06/2011 | CN102004397A Measuring structure for improving accuracy of exposure conditions |
| 04/06/2011 | CN102004396A Positive typed photosensitive composition |
| 04/06/2011 | CN102004395A Positive typed photosensitive composition |
| 04/06/2011 | CN102004394A Solder resist composition and printed circuit board |
| 04/06/2011 | CN102004393A Composite patterning devices for soft lithography |
| 04/06/2011 | CN102004392A Manufacturing method of infrared focal plane packaged window metallization pattern |
| 04/06/2011 | CN102004274A Micro lens structure, micro lens technology and bank pattern applied to micro lens technology |
| 04/06/2011 | CN102004272A Optical device, manufacturing method thereof, and method of manufacturing master |
| 04/06/2011 | CN102002257A Acylic resin processed dye composition, dye dispersion fluid, manufacture methods and uses thereof |
| 04/06/2011 | CN102002121A Resin, resist composition and method for producing resist pattern |
| 04/06/2011 | CN102001976A Photosensitive compound and photosensitive composition including the same |
| 04/06/2011 | CN102001926A Compound, resin, resist composition and method for producing resist pattern |
| 04/06/2011 | CN102001618A Masking method for deep-etching multi-layer silicon structure by dry method |
| 04/06/2011 | CN102000676A Surface treatment method of metal member and cleaning nozzle |
| 04/06/2011 | CN101685261B Off-axis light source, light shading panel and method for defining different patterns by single exposure |
| 04/06/2011 | CN101634811B Flexible seal and self-adaption recycling device for immersed photoetching machine |
| 04/06/2011 | CN101625529B Circuit board exposure alignment device and circuit board exposure alignment method |
| 04/06/2011 | CN101576719B Lithographic apparatus and device manufacturing method |
| 04/06/2011 | CN101504948B Hollow pen tip like structure, apparatus comprising the same, and manufacturing method therefor |
| 04/06/2011 | CN101477306B High-speed multi-beam parallel laser direct-writing device |
| 04/06/2011 | CN101387825B Compensation gray level mask plate structure |
| 04/06/2011 | CN101324756B Method for improving prepared thin film thickness in rotary coating method |
| 04/06/2011 | CN101291989B Fine particle-containing composition, ink for forming colored film for display, light-blocking film for display, light-blocking material, substrate with light-blocking film, color filter, liquid crystal element and device |
| 04/06/2011 | CN101281860B Semiconductor manufacturing apparatus and manufacturing method of semiconductor device |
| 04/06/2011 | CN101268114B Curable compositions containing dithiane monomers |