| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/13/2011 | EP2308865A1 Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
| 04/13/2011 | EP2307928A2 High aspect ratio template for lithography, method of making the same template and use of the template for perforating a substrate at nanoscale |
| 04/13/2011 | CN201797691U Cooling device for exposure machine worktable |
| 04/13/2011 | CN201796227U Exposure device |
| 04/13/2011 | CN201796226U Cooling device of exposure lamp on exposure machine |
| 04/13/2011 | CN1983037B Exposure method, exposure device, and method of manufacturing device |
| 04/13/2011 | CN1965259B Catadioptric projection objective |
| 04/13/2011 | CN1947066B Rinsing fluid for lithography |
| 04/13/2011 | CN1936704B Radiation sensitivity composition for forming pigmentation layer and color filter |
| 04/13/2011 | CN1892431B Method of characterization, method of characterizing a process operation, and device manufacturing method |
| 04/13/2011 | CN1873542B Dual stage lithographic apparatus |
| 04/13/2011 | CN1869811B Reflection mask for EUV photolithography and method of fabricating the reflection mask |
| 04/13/2011 | CN1804726B Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 04/13/2011 | CN1713078B Bare aluminum baffles for resist stripping chambers |
| 04/13/2011 | CN102017071A Methods of patterning a conductor on a substrate |
| 04/13/2011 | CN102016725A Thick film recycling method |
| 04/13/2011 | CN102016724A Photosensitive hardmask for microlithography |
| 04/13/2011 | CN102016723A Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device |
| 04/13/2011 | CN102016722A Robot for in-vacuum use |
| 04/13/2011 | CN102016721A Laser exposure method, photoresist layer working method, and pattern molding manufacturing method |
| 04/13/2011 | CN102016720A 柔版印刷原版 Flexographic printing original |
| 04/13/2011 | CN102016719A An antireflective coating composition |
| 04/13/2011 | CN102016718A Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film |
| 04/13/2011 | CN102016717A Reflective mask blank for EUV lithography, and reflective mask for EUV lithography |
| 04/13/2011 | CN102015835A Polyimide precursor, photosensitive polyimide precursor composition, photosensitive dry film, and flexible printed circuit board using those materials |
| 04/13/2011 | CN102015633A Ketoxime ester compound and use thereof |
| 04/13/2011 | CN102012646A Leveling system of photoetching machine |
| 04/13/2011 | CN102012645A Photoresist stripping solution |
| 04/13/2011 | CN102012644A Method for reducing characteristic dimension of photoresist pattern |
| 04/13/2011 | CN102012643A Decompression drier and decompression dry method |
| 04/13/2011 | CN102012642A Mask aligner vacuum exposure device |
| 04/13/2011 | CN102012641A Exposure apparatus and device producing method |
| 04/13/2011 | CN102012640A Pre-alignment method and device for being compatible with broken silicon wafers |
| 04/13/2011 | CN102012639A Method and device for protecting silicon wafer edge |
| 04/13/2011 | CN102012638A Photoetching machine worktable with driving device capable of balancing torque |
| 04/13/2011 | CN102012637A Accurately-aligned correction model in photolithographic process |
| 04/13/2011 | CN102012636A Method for preparing CTcP plate and CTcP plate prepared by same |
| 04/13/2011 | CN102012635A Method for forming photoresist |
| 04/13/2011 | CN102012634A Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board |
| 04/13/2011 | CN102012633A Method for making self-supporting structure of nano fluid system based on SU-8 photoresist |
| 04/13/2011 | CN102012632A Method for preparing bionic adhesion arrays with different top end structures |
| 04/13/2011 | CN102012617A Forward projection screen capable of shielding ambient light and production method thereof |
| 04/13/2011 | CN102012592A Liquid crystal display device and manufacturing method thereof |
| 04/13/2011 | CN102012590A FFS type TFT-LCD array substrate and manufacturing method thereof |
| 04/13/2011 | CN102012575A Liquid crystal display panel and manufacturing method thereof |
| 04/13/2011 | CN102012561A Method and system for realizing phase shift in laser interference lithography |
| 04/13/2011 | CN102010475A Photopolymerization initiator and photosensitive composition |
| 04/13/2011 | CN101576624B Light-condensing device and method of fabricating the same |
| 04/13/2011 | CN101539725B Method for coarse wafer alignment in a lithographic apparatus |
| 04/13/2011 | CN101487990B Work piece bench with edge exposure protection |
| 04/13/2011 | CN101452222B Lithographic apparatus, projection assembly and combination device and active damping method |
| 04/13/2011 | CN101452135B A multi-view display device and its manufacture method |
| 04/13/2011 | CN101450788B Quartz wafer deep micropore processing equipment and method |
| 04/13/2011 | CN101446776B Lithographic apparatus and device manufacturing method |
| 04/13/2011 | CN101441405B Protective film component, accommodating container for accommodating protective film component and accommodating method |
| 04/13/2011 | CN101385125B Exposure method and apparatus, maintenance method, and device manufacturing method |
| 04/13/2011 | CN101369524B Manufacturing method for semiconductor device |
| 04/13/2011 | CN101331157B Fluorine-containing polymer, negative photosensitive composition and partition wall |
| 04/13/2011 | CN101286002B Method for producing elementary moulded board for generating gaze screen mask |
| 04/13/2011 | CN101276141B Method and apparatus for performing model-based OPC for pattern decomposed feature |
| 04/13/2011 | CN101266376B High quality and ultra large screen liquid crystal display device and production method thereof |
| 04/13/2011 | CN101253258B Aqueous solution and method for removing ionic contaminants from the surface of a workpiece |
| 04/13/2011 | CN101243360B Projection objective having a high aperture and a planar end surface |
| 04/13/2011 | CN101218540B Positive photosensitive resin composition and process for pattern formation |
| 04/13/2011 | CN101198904B Sub-micron decal transfer lithography |
| 04/13/2011 | CN101171549B Reticle alignment and overlay for multiple reticle process |
| 04/13/2011 | CN101167017B Photosensitive lithographic printing plate |
| 04/13/2011 | CN101156111B Remover composition for photoresist of semiconductor device |
| 04/13/2011 | CN101142531B Lithographic printing plates with high print run stability |
| 04/13/2011 | CN101134930B Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 04/13/2011 | CN101124517B Photosensitive resin composition and photosensitive dry film using same |
| 04/13/2011 | CN101095083B Photopolymerizable composition |
| 04/13/2011 | CN101088045B Imprint reference template for multilayer or multipattern registration and method therefor |
| 04/13/2011 | CN101048704B Resist composition |
| 04/13/2011 | CN101046637B Assembly, a conditioning system, a lithographic apparatus and methods |
| 04/12/2011 | US7926004 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 04/12/2011 | US7924402 Exposure apparatus and device manufacturing method |
| 04/12/2011 | US7924397 Anti-corrosion layer on objective lens for liquid immersion lithography applications |
| 04/12/2011 | US7923202 Layer patterning using double exposure processes in a single photoresist layer |
| 04/12/2011 | US7923201 Photomasks; photoresists; etching; lithography |
| 04/12/2011 | US7923200 Composition for coating over a photoresist pattern comprising a lactam |
| 04/12/2011 | US7923198 Method of manufacturing fine T-shaped electrode |
| 04/12/2011 | US7923197 Lithographic printing plate precursor |
| 04/12/2011 | US7923196 Positive resist composition and pattern forming method using the same |
| 04/12/2011 | US7923195 Positive resist composition and patterning process using the same |
| 04/12/2011 | US7923194 Sacrificial compositions and methods of fabricating a structure using sacrificial compositions |
| 04/12/2011 | US7923193 Photopolymerizable composition |
| 04/12/2011 | US7923192 Base material for pattern-forming material, positive resist composition and method of resist pattern formation |
| 04/12/2011 | US7923181 Methods of forming photomasks |
| 04/12/2011 | US7923180 Cross technology reticles |
| 04/12/2011 | US7923179 Exposure mask and pattern forming method therefor |
| 04/12/2011 | US7923173 Photo definable polyimide film used as an embossing surface |
| 04/12/2011 | US7922337 Method for establishing a light beam with substantially constant luminous intensity |
| 04/07/2011 | WO2011041046A1 Method of improving print performance in flexographic printing plates |
| 04/07/2011 | WO2011040749A2 Dry film photoresist |
| 04/07/2011 | WO2011040646A2 Exposure apparatus and device manufacturing method |
| 04/07/2011 | WO2011040643A1 Exposure apparatus, exposure method, and device manufacturing method |
| 04/07/2011 | WO2011040642A2 Exposure apparatus, exposure method, and device manufacturing method |
| 04/07/2011 | WO2011040628A1 Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic el display with the color filter |
| 04/07/2011 | WO2011040626A1 Black curable composition for wafer level lens and wafer level lens |