Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2014
12/10/2014CN104204957A 曝光描绘装置及曝光描绘方法 Exposure drawing device and exposure drawing method
12/10/2014CN104204956A 基板处理装置、处理装置以及元件制造方法 Substrate processing apparatus, processing apparatus, and device manufacturing method
12/10/2014CN104204955A 曝光装置、平面显示器的制造方法、及元件制造方法 Exposure device, flat panel display manufacturing method, and device manufacturing method
12/10/2014CN104204954A 微粒污染物测量方法和装置 Method and apparatus for measuring particulate contaminants
12/10/2014CN104204953A 曝光描绘装置、记录了程序的记录介质以及曝光描绘方法 Exposure drawing device, a recording medium recording the program and the exposure drawing method
12/10/2014CN104204952A 测量euv镜头的成像质量的测量系统 Measuring the image quality of the lens measuring system euv
12/10/2014CN104204951A 光刻设备、传感器以及方法 Lithographic apparatus, sensors and a method
12/10/2014CN104204950A 光固化组合物、包含其的阻挡层和包含其的封装装置 Photocurable composition, which comprises a barrier layer and comprising the same packaging unit
12/10/2014CN104204949A 感光性导电糊剂以及导电图案的制造方法 The photosensitive conductive paste, and a method of manufacturing a conductive pattern
12/10/2014CN104204948A 感光性树脂组合物及使用其的加工玻璃基板的制造方法、和触控面板及其制造方法 The photosensitive resin composition and its production method of processing a glass substrate, and a touch panel and manufacturing method thereof
12/10/2014CN104204947A 感光性树脂组合物 The photosensitive resin composition
12/10/2014CN104204946A 感光性导电浆料和导电图案的制造方法 The method of manufacturing a photosensitive conductive paste and conductive pattern
12/10/2014CN104204945A 感光性黑色树脂组合物及树脂黑色矩阵基板 The photosensitive black resin composition and the resin black matrix substrate
12/10/2014CN104204944A 具有弯曲表面缺陷的微光学器件的制造方法 The method of manufacturing a curved surface having a micro-optical device defects
12/10/2014CN104204105A 三芳基甲烷类化合物、着色树脂组合物、滤色片、液晶显示装置及有机el显示装置 Triarylmethane compounds, colored resin composition, a color filter, a liquid crystal display device and an organic el display device
12/10/2014CN104204025A 光固化性热固化性树脂组合物、固化物、印刷电路板以及光源模块 Photocurable and thermosetting resin composition, cured product, the printed circuit board and a light source module
12/10/2014CN104204010A 树脂组合物、使用其的触摸面板传感器用透明膜以及触摸面板 The resin composition, using the same transparent film touch panel and a touch sensor panel
12/10/2014CN104203588A 平版印刷版原版、及其印刷方法 Lithographic printing plate precursor, and printing method
12/10/2014CN104201097A 小尺寸图形的制作方法 Small graphic production methods
12/10/2014CN104200190A 一种用于物流追溯的标记制作及其识读方法 A mark making and reading method for logistics retrospective
12/10/2014CN104199469A 用于浸没式光刻浸没头机位姿调节机构的控制方法 For immersion lithography machine head pose immersion method for controlling mechanism
12/10/2014CN104199261A 适用于去除蚀刻后的光致抗蚀剂和底部抗反射涂层的组合物 Suitable for the photoresist and the bottom antireflective coating composition is removed after etching
12/10/2014CN104199260A 易装配静压出流显影喷嘴 Easy assembly hydrostatic developing outflow nozzle
12/10/2014CN104199259A 大面积无掩膜板快速曝光的装置及其方法 Large area without mask fast exposure apparatus and method
12/10/2014CN104199258A 一种基于二维双频光栅剪切干涉的纳米级检焦方法 Nanoscale detection method based on two-dimensional focal frequency grating shearing interference
12/10/2014CN104199257A 一种精密定位平台绝对定位精度的测量及补偿方法 A precision positioning platform absolute positioning accuracy of measurement and compensation methods
12/10/2014CN104199256A 产生光刻胶图案的方法和装置及其预烘装置 Method and apparatus for generating a photoresist pattern and pre-bake unit
12/10/2014CN104199255A 用于eb或euv平版印刷的化学放大负性抗蚀剂组合物和图案化方法 Chemical or euv for lithographic printing eb amplified negative resist composition and patterning method
12/10/2014CN104199254A 一种相变光刻胶及其制备方法 A phase change photoresist and its preparation method
12/10/2014CN104199253A 阵列式微结构纳米压印方法及装置 An array of micro structure nanoimprint method and device
12/10/2014CN104199252A 一种实现光刻胶微结构的方法 A method for implementing a photoresist microstructures
12/10/2014CN104199175A 一种应用于投影光刻机的大视场投影曝光物镜 Applied to projection lithography machine large field projection exposure lens
12/10/2014CN104199173A 一种单倍率对称式投影曝光物镜 A single-rate symmetric projection exposure lens
12/10/2014CN104199135A 一种用于激光直写的长焦深扇形分区光子筛 Telephoto deep sector for laser direct writing partition photon sieve
12/10/2014CN104193944A 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物 One kind of an acid value of controllable photosensitive alkali-soluble polyurethane acrylate resins and photoresist compositions
12/10/2014CN104191614A 三维成像系统、其部件以及三维成像的方法 Three-dimensional imaging system, its components and the three-dimensional imaging method
12/10/2014CN104191613A 三维成像系统、其部件以及三维成像的方法 Three-dimensional imaging system, its components and the three-dimensional imaging method
12/10/2014CN104190482A 以感光干膜为抗腐蚀掩膜制作玻璃微流体装置的方法 In the photosensitive dry film as a corrosion-resistant mask production method of a glass microfluidic device
12/10/2014CN103435004B 基于模板复制技术的表面增强拉曼活性基底制备方法 Template-based replication technology SERS active substrate preparation
12/10/2014CN103279013B 一种基于滚珠定位的三自由度精密调节装置 A three-DOF precision adjustment device positioning based on ball
12/10/2014CN103268059B 用于浸没式光刻机的多级负压回收密封和气密封装置 Multistage vacuum for an immersion lithography machine recovered gas sealing means sealing
12/10/2014CN103246174B 衬底拓扑可知的光刻模型化 Knowable lithography substrate topology modeling
12/10/2014CN103207531B 一种步进扫描投影光刻机掩模台硅片台扫描运动同步误差校正系统 A stepping scanning projection lithography mask stage silicon scanners movement synchronization error correction system
12/10/2014CN103176368B 用于浸没式光刻机的气密封和气液减振回收装置 Gas seal for immersion lithography machines and gas-liquid damping recovery
12/10/2014CN103154162B 颜料分散液及其制造方法、使用该颜料分散液的感光性着色树脂组合物、喷墨用墨液以及电子照相印刷用调色剂、以及滤色器 A method of manufacturing a pigment dispersion, the pigment dispersion using a photosensitive colored resin composition, the inkjet ink and toner for electrophotographic printing, and the color filters
12/10/2014CN103135354B 正型光敏树脂组合物、由其制造的光敏树脂膜及含有该光敏树脂膜的半导体装置 Positive type photosensitive resin composition, a photosensitive resin film fabricated by a semiconductor device comprising the photosensitive resin film,
12/10/2014CN103073668B 碱可溶性树脂及制备方法、感光树脂组合物和彩色滤光片 Alkali-soluble resin and production method, the photosensitive resin composition and the color filter
12/10/2014CN103048893B 一种基于导模干涉的偶氮苯聚合物表面起伏光栅光刻机 Based guided mode interference azobenzene polymer surface relief grating lithography
12/10/2014CN103030107B 三维纳米结构阵列的制备方法 Preparation of three-dimensional structure of the array
12/10/2014CN102967992B 一种掩膜板及其制造方法、一种阵列基板的制造方法 A mask and its manufacturing method, a method of manufacturing an array substrate
12/10/2014CN102880011B 一种层间图形对准精度的检测方法 An inter-layer pattern alignment accuracy of detection methods
12/10/2014CN102854751B 光刻机调焦调平机构以及光刻机调平机构 Lithography focusing leveling mechanism and lithography leveling mechanism
12/10/2014CN102768439B 一种母板取向膜的制作方法及转印版、取向液 A method of making a motherboard alignment film and a transfer plate, alignment liquid
12/10/2014CN102754035B 光刻设备和器件制造方法 Lithographic apparatus and device manufacturing method
12/10/2014CN102725696B 用于平版印刷成像系统的放大控制 Amplification control for lithography imaging system
12/10/2014CN102668046B 半导体元件基板 Semiconductor device substrate
12/10/2014CN102627586B 光酸产生剂、其制备方法及包含光酸产生剂的抗蚀剂组合物 Photoacid generator, its preparation method and a resist composition comprising a photoacid generator of
12/10/2014CN102608876B 光刻装置及光刻装置的制造方法 The method of manufacturing a lithographic apparatus and a lithographic apparatus
12/10/2014CN102597872B 选择与设计相关的图案子组的方法 Methods associated with the design pattern subgroups
12/10/2014CN102540754B 源、掩模和投影光学装置的优化流程 Optimize the flow source, mask and projection optics devices
12/10/2014CN102472976B 用于euv波长范围的反射镜、包括这种反射镜的用于微光刻的投射物镜、以及包括这种投射物镜的用于微光刻的投射曝光设备 Mirror for euv wavelength range, comprising such a mirror projection objective for microlithography, comprising such a projection objective for microlithography projection exposure apparatus
12/10/2014CN102472891B 用于反射元件阵列的旋转的安装部件以及包括所述安装部件的光刻设备 Mounting member for rotating the array of reflective elements and said mounting member comprises a lithographic apparatus
12/10/2014CN102452798B 涂布装置及利用该涂布装置形成涂布层的方法 Coating apparatus and a coating apparatus utilizing the method of forming the coating layer
12/10/2014CN102445858B 一种光刻机之间的工艺匹配方法 A method of matching process between lithography
12/10/2014CN102445856B 一种光刻机硅片载物台温度控制系统及其控制方法 A lithographic machine Wafer stage temperature control system and control method
12/10/2014CN102414621B 扫掠期间剂量可变的转子光学部件成像方法及系统 Dose during the sweep variable rotor imaging method and system for optical component
12/10/2014CN102375347B 光刻设备和器件制造方法 Lithographic apparatus and device manufacturing method
12/10/2014CN102354327B 一种扫描式无掩膜光刻机的数据处理方法 A data processing method for scanning maskless lithography
12/10/2014CN102311371B 化合物、含有该化合物的聚合物及包含该聚合物的化学放大型抗蚀剂组合物 Compound, a polymer containing the compound and the polymer containing the chemically amplified resist composition
12/10/2014CN102159996B 用于半导体光刻的投射曝光设备中的振动衰减 Projection exposure apparatus for semiconductor lithography in the vibration damping
12/10/2014CN102082104B 用于制造半导体器件的方法 The method for manufacturing a semiconductor device
12/10/2014CN101930182B 内层基板用曝光装置以及基板和掩膜的剥离方法 Inner substrate and the substrate with the exposure apparatus and the mask peeling method
12/10/2014CN101685266B 光学照明装置、曝光装置以及曝光方法 Illumination optical apparatus, exposure apparatus and exposure method
12/10/2014CN101288027B 用于光致抗蚀剂应用的低活化能溶解改性剂 Low activation energy for photoresist application dissolution modifier
12/09/2014US8910096 Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device
12/09/2014US8910093 Fast photoresist model
12/09/2014US8910091 Method, program product and apparatus for performing double exposure lithography
12/09/2014US8908302 Exposure method for color filter substrate
12/09/2014US8908293 Dispersion composition, photosensitive resin composition, and solid-state image pick-up element
12/09/2014US8908269 Immersion catadioptric projection objective having two intermediate images
12/09/2014US8908192 Method and apparatus for qualifying optics of a projection exposure tool for microlithography
12/09/2014US8908153 Method to calculate transmission cross coefficient in an exposure apparatus
12/09/2014US8908151 Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
12/09/2014US8908150 Substrate processing method, manufacturing method of EUV mask, and EUV mask
12/09/2014US8908149 Projection exposure system and use thereof
12/09/2014US8908148 Calibration method and inspection apparatus
12/09/2014US8908147 Method and apparatus for determining an overlay error
12/09/2014US8908146 Actuator system, lithographic apparatus, and device manufacturing method
12/09/2014US8908145 Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
12/09/2014US8908144 Lithographic apparatus and device manufacturing method
12/09/2014US8908143 Substrate holder, lithographic apparatus, and device manufacturing method involving a heater and/or temperature sensor
12/09/2014US8907346 Imprint apparatus, imprint method, and manufacturing method of semiconductor device
12/09/2014US8907310 EUV optics
12/09/2014US8907122 Method of preparing photoacid generating monomer
12/09/2014US8906979 Macrophotoinitiators
12/09/2014US8906838 Microelectronic cleaning and arc remover compositions
12/09/2014US8906684 Three dimensional cell patterned biopolymer scaffolds and methods of making the same
12/09/2014US8906600 Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask
12/09/2014US8906599 Enhanced scanner throughput system and method
12/09/2014US8906598 Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern
1 ... 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 ... 1272