| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/20/2011 | CN102023439A TFT (Thin Film Transistor) array structure and manufacturing method thereof |
| 04/20/2011 | CN102023429A TFT-LCK array substrate and method for manufacturing same and method for repairing broken lines |
| 04/20/2011 | CN102023392A Array two-ring phase-ring light uniformity device and manufacturing method whereof |
| 04/20/2011 | CN102023391A Array 3-ring 2-value phase ring light evener and manufacturing method thereof |
| 04/20/2011 | CN102023390A Array three-ring multiple-valued phase-ring light uniformity device and manufacturing method thereof |
| 04/20/2011 | CN102023389A Homogenizer of array partial phase zone photon sieve and manufacturing method thereof |
| 04/20/2011 | CN102023388A Array photon sieve light evener and manufacturing method thereof |
| 04/20/2011 | CN102023387A Array type light evening device with annulus photon screen and manufacturing method thereof |
| 04/20/2011 | CN102023386A Array full-ring photon sieve light evener and manufacturing method thereof |
| 04/20/2011 | CN102020727A Pyrazole oxime ester photoinitiator with high photosensibility, preparation method and application thereof |
| 04/20/2011 | CN102019266A Coating method for coating material |
| 04/20/2011 | CN101718958B System and method for controlling nonlinear aberration correction of green-laser trimmed focusing lens |
| 04/20/2011 | CN101710204B Lens eccentricity fine adjustment mechanism in projection lithography objective |
| 04/20/2011 | CN101639630B Coaxial alignment system in projection lithography |
| 04/20/2011 | CN101614906B Liquid crystal display panel and manufacturing method thereof |
| 04/20/2011 | CN101609870B Organic solar cells and method of manufacturing the same |
| 04/20/2011 | CN101609692B Magnetic recording disks, a master mold for nanoimprinting, and a method for making the master mold |
| 04/20/2011 | CN101562130B Method of fabricating a photomask using self assembly molecule |
| 04/20/2011 | CN101546112B Method for replacing mask |
| 04/20/2011 | CN101452221B Methods and system for lithography process window simulation |
| 04/20/2011 | CN101421823B Aberration evaluation pattern,aberration evaluation method,aberration correction method |
| 04/20/2011 | CN101405658B Apparatus for cooling |
| 04/20/2011 | CN101405310B Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof |
| 04/20/2011 | CN101391744B Method for preparing micro needle array by means of lithography based on tilting rotary substrate and template |
| 04/20/2011 | CN101390194B Maintenance method, exposure method and apparatus and device manufacturing method |
| 04/20/2011 | CN101385121B Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
| 04/20/2011 | CN101382733B Method for making graphics of nanometer dimension |
| 04/20/2011 | CN101354543B Liquid for removing filin |
| 04/20/2011 | CN101338416B Shading member, manufacturing method thereof, film and photo mask using the member |
| 04/20/2011 | CN101325149B Device, system and method for manufacturing semiconductor |
| 04/20/2011 | CN101286013B Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method |
| 04/20/2011 | CN101276154B Lithographic apparatus and method |
| 04/20/2011 | CN101162364B Photosensitive resin composition and method of making the same and film build method |
| 04/20/2011 | CN101154054B Substrate exposure apparatus and illumination apparatus |
| 04/20/2011 | CN101154043B High-resolution negative-type photoresist |
| 04/20/2011 | CN101135853B Initiator system, infrared sensitive composition comprising same, Print precursor and method for providing images |
| 04/20/2011 | CN101133363B Colored alkali-developable photosensitive resin composition and color filters made by using the same |
| 04/20/2011 | CN101131545B Drawing device and its contraposition method |
| 04/20/2011 | CN101131537B Accurately digitized micro-nano imprint method |
| 04/20/2011 | CN101105629B Light solidifying/heat solidifying one-part welding resistant agent composition and printing circuit plate |
| 04/20/2011 | CN101097403B Resist for soft mold and method for fabricating liquid crystal display using the same |
| 04/20/2011 | CN101038446B Lithographic apparatus and device manufacturing method |
| 04/20/2011 | CN101027281B Adamantane derivative, process for producing the same, and photosensitive material for photoresist |
| 04/20/2011 | CN101021690B Lithographic apparatus and stage apparatus |
| 04/19/2011 | US7929111 Environmental system including a transport region for an immersion lithography apparatus |
| 04/19/2011 | US7929110 Environmental system including a transport region for an immersion lithography apparatus |
| 04/19/2011 | US7928262 Onium salts, oxime sulfonates and sulfonyloxyimides derived from these sulfonium salts are effective photoacid generators in chemically amplified resist compositions; sensitive to high-energy radiation |
| 04/19/2011 | US7928046 Stripping and cleaning compositions for microelectronics |
| 04/19/2011 | US7927783 Tunable lithography with a refractive mask |
| 04/19/2011 | US7927782 Simplified double mask patterning system |
| 04/19/2011 | US7927781 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same |
| 04/19/2011 | US7927780 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator |
| 04/19/2011 | US7927779 Water mark defect prevention for immersion lithography |
| 04/19/2011 | US7927778 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| 04/19/2011 | US7927773 Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method |
| 04/19/2011 | US7927764 an optical proximity correction being applied only to the first mask opening, exposing the photoresist using a second mask pattern including a third mask opening and a fourth mask opening, an optical proximity correction being applied only to the fourth mask opening |
| 04/19/2011 | US7927763 Pellicle for photolithography and pellicle frame |
| 04/19/2011 | US7927657 Liquid processing apparatus and liquid processing method |
| 04/19/2011 | US7927541 Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography |
| 04/19/2011 | US7927538 Light-curing slips for the stereolithographic preparation of dental ceramics |
| 04/14/2011 | WO2011044198A1 Negative-working imageable elements |
| 04/14/2011 | WO2011044196A1 Electrode comprising a boron oxide oxidation resistance layer and method for manufacturing the same |
| 04/14/2011 | WO2011043963A1 Plate monitoring system |
| 04/14/2011 | WO2011043820A1 Large area linear array nanoimprinting |
| 04/14/2011 | WO2011043481A1 Pattern forming method, chemical amplification resist composition and resist film |
| 04/14/2011 | WO2011043320A1 Photosensitive resin composition and use thereof |
| 04/14/2011 | WO2011043029A1 Cyclic compound, method for producing same, radiation sensitive composition, and method for forming resist pattern |
| 04/14/2011 | WO2011042770A1 Positive-working photoimageable bottom antireflective coating |
| 04/14/2011 | WO2011042329A1 Photolithography mask set and masking method |
| 04/14/2011 | WO2011042225A1 A polymer washout solvent, and the use thereof for developing a flexographic printing plate |
| 04/14/2011 | WO2011016849A3 Adjacent field alignment |
| 04/14/2011 | WO2011002247A3 Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same |
| 04/14/2011 | WO2010151041A3 Composition for a water-soluble coating film |
| 04/14/2011 | US20110086420 Polymer substrate with fluorescent structure, method for the production thereof and the use thereof |
| 04/14/2011 | US20110086316 Coating and developing apparatus and coating and developing method |
| 04/14/2011 | US20110086315 Exposure apparatus, exposure method, and device manufacturing method |
| 04/14/2011 | US20110086314 Melts |
| 04/14/2011 | US20110086313 Method and system of manufacturing semiconductor device |
| 04/14/2011 | US20110086312 Positive-Working Photoimageable Bottom Antireflective Coating |
| 04/14/2011 | US20110086311 Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition |
| 04/14/2011 | US20110086310 Positive resist composition and method for production of microlens |
| 04/14/2011 | US20110086309 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board |
| 04/14/2011 | US20110086298 Substrate holding device, lithography apparatus using same, and device manufacturing method |
| 04/14/2011 | US20110086202 Negative-working imageable elements |
| 04/14/2011 | US20110085939 Node polypeptides for nanostructure assembly |
| 04/14/2011 | US20110085241 Transmissive optical microstructure substrates that produce visible patterns |
| 04/14/2011 | US20110085152 Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method |
| 04/14/2011 | US20110085151 Illumination optical system for microlithography and illumination system and projection exposure system with an illumination optical system of this type |
| 04/14/2011 | US20110084787 Photosensitive resin composition, metal-base-containing circuit board production method employing the photosensitive resin composition, and metal-base-containing circuit board |
| 04/14/2011 | US20110083887 Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof |
| 04/14/2011 | DE202010015018U1 Anordnung zur Herstellung von strukturierten Substraten Arrangement for producing patterned substrates |
| 04/14/2011 | DE102009045193A1 Optische Anordnung in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage Optical arrangement in an optical system, particularly in a microlithography projection exposure apparatus |
| 04/14/2011 | DE102008008232B4 Vorrichtung und Verfahren zum Belichten eines Fotomaterials Apparatus and method for exposing a photographic material |
| 04/14/2011 | CA2763951A1 A polymer washout solvent, and the use thereof for developing a flexographic printing plate |
| 04/13/2011 | EP2309332A1 Positive-type radiation-sensitive composition, and resist pattern formation method |
| 04/13/2011 | EP2309331A1 A polymer washout solvent and the use thereof for developing a flexographic printing plate |
| 04/13/2011 | EP2309330A1 Photosensitive composition, partition wall, color filter, and organic el device |
| 04/13/2011 | EP2309329A1 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film |
| 04/13/2011 | EP2309328A2 Microcontact printing stamps |
| 04/13/2011 | EP2309130A2 Microfabricated elastomeric valve and pump systems |