| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/21/2011 | WO2011045180A1 Personalization of physical media by selectively revealing and hiding pre-printed color pixels |
| 04/21/2011 | WO2011045132A1 Method, inspection apparatus and substrate for determining an approximate structure of an object on the substrate |
| 04/21/2011 | WO2011044708A1 Method for producing microparticles |
| 04/21/2011 | WO2011019279A3 A method of fabricating an imprinted substrate having regions with modified wettability |
| 04/21/2011 | WO2011011167A3 Curable composition, method of coating a phototool, and coated phototool |
| 04/21/2011 | WO2011011142A3 Method and materials for reverse patterning |
| 04/21/2011 | WO2011011139A3 Method and materials for reverse patterning |
| 04/21/2011 | WO2011008051A3 Composition for removing resists used with copper or copper alloy |
| 04/21/2011 | US20110092007 Method of Fabricating Antireflective Grating Pattern and Method of Fabricating Optical Device Integrated with Antireflective Grating Pattern |
| 04/21/2011 | US20110091821 Resist treatment unit, resist coating and developing apparatus, and resist treatment method |
| 04/21/2011 | US20110091820 Resist processing method |
| 04/21/2011 | US20110091819 Method for forming pattern |
| 04/21/2011 | US20110091818 Process for producing photoresist pattern |
| 04/21/2011 | US20110091817 Sensor with layered electrodes |
| 04/21/2011 | US20110091816 Sensor with layered electrodes |
| 04/21/2011 | US20110091815 Pattern Improvement in Multiprocess Patterning |
| 04/21/2011 | US20110091814 Process for making lithographic printing plate |
| 04/21/2011 | US20110091813 Dynamic projection method for micro-truss foam fabrication |
| 04/21/2011 | US20110091812 Patterning process and resist composition |
| 04/21/2011 | US20110091811 Double-layered patternable adhesive film, method of forming the same, and method of forming patternable adhesive layer using the same |
| 04/21/2011 | US20110091810 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern |
| 04/21/2011 | US20110091809 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 04/21/2011 | US20110091808 Photoresist composition |
| 04/21/2011 | US20110091807 Photoresist composition |
| 04/21/2011 | US20110091797 Superimpose photomask and method of patterning |
| 04/21/2011 | US20110091722 Method for producing silicon-containing ceramic structures |
| 04/21/2011 | US20110091694 Method for forming fine electrode patterns |
| 04/21/2011 | US20110091408 Methods of using fluoroalkyl phosphate compositions |
| 04/21/2011 | US20110090473 Lithographic apparatus |
| 04/21/2011 | US20110088934 Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same |
| 04/21/2011 | US20110088929 Metal structure of flexible multi-layer substrate and manufacturing method thereof |
| 04/21/2011 | US20110088576 Lithographic printing press for processless plate |
| 04/21/2011 | US20110088574 Processless printing plates |
| 04/21/2011 | DE102010019256A1 Zonenoptimierte Spiegel und optische Systeme mit solchen Spiegeln Zone Optimised mirror and optical systems such mirrors |
| 04/21/2011 | DE102009049640A1 Projektionsobjektiv für eine mikrolithographische EUV-Projektionsbelichtungsanlage Projection objective for a microlithographic EUV projection exposure apparatus |
| 04/21/2011 | DE102006043357B4 Photoempfindliche, hitzehärtbare Harzzusammensetzung und Verwendung derselben zur Herstellung einer Schaltungsplatine A photosensitive thermosetting resin composition and use thereof for the manufacture of a circuit board |
| 04/20/2011 | EP2312395A1 Exposure apparatus, exposure method, and method for producing a device |
| 04/20/2011 | EP2312394A1 Negative working photosensitive composition, partition wall for optical element using the nagative working photosensitive composition, and optical element comprising the partition wall |
| 04/20/2011 | EP2312393A1 Method for producing microparticles |
| 04/20/2011 | EP2311888A1 Deprotection method of protected polymer |
| 04/20/2011 | EP2311567A1 Capillary-channel probes for liquid pickup, transportation and dispense using spring beams |
| 04/20/2011 | EP2311081A2 Cylindrical magnetic levitation stage |
| 04/20/2011 | EP2311073A1 Reinforced composite stamp for dry transfer printing of semiconductor elements |
| 04/20/2011 | EP2310914A1 Telecentricity corrector for microlithographic projection system |
| 04/20/2011 | EP2310913A1 Method for photoimaging a substrate |
| 04/20/2011 | EP2310912A1 Radiation source, lithographic apparatus, and device manufacturing method |
| 04/20/2011 | EP2310911A1 Process and system for fabrication of patterns on a surface |
| 04/20/2011 | EP2310910A1 Ultra low post exposure bake photoresist materials |
| 04/20/2011 | EP2310909A1 Negative-working imaging elements and methods of use |
| 04/20/2011 | EP2044487B1 Optical apparatus with corrected or improved imaging behaviour |
| 04/20/2011 | EP1728826B1 Composition curable by both free-radical photocuring and cationic photocuring |
| 04/20/2011 | EP1723203B1 Violet colorant for colour filters, inks for ink-jet, electrophotographic toners and developers and e-inks |
| 04/20/2011 | EP1718474B1 Combined ablation and exposure system and method |
| 04/20/2011 | CN201804846U Pneumatic cutter and hydraulic cutter equipment |
| 04/20/2011 | CN1973357B EUV light source, EUV exposure system, and production method for semiconductor device |
| 04/20/2011 | CN1936709B Lithographic method |
| 04/20/2011 | CN1892421B Method for forming storage junction contact hole |
| 04/20/2011 | CN1834703B Method for fabricating color filter substrate for liquid crystal display device |
| 04/20/2011 | CN1815365B Photocurable resin composition, and its preparing method and use |
| 04/20/2011 | CN1734715B Small lot size lithography bays |
| 04/20/2011 | CN102027577A Selective inductive double patterning |
| 04/20/2011 | CN102027570A Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be ex |
| 04/20/2011 | CN102027418A Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in OPC model space |
| 04/20/2011 | CN102027417A Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method |
| 04/20/2011 | CN102027416A Inspection apparatus for lithography |
| 04/20/2011 | CN102027415A Pattern forming method |
| 04/20/2011 | CN102027414A Positive-type photosensitive composition |
| 04/20/2011 | CN102026967A Sulphonium salt initiators |
| 04/20/2011 | CN102024752A Method for improving chip cutting |
| 04/20/2011 | CN102024697A Etching method for low dielectric constant material |
| 04/20/2011 | CN102024687A Method for improving gluing capacity |
| 04/20/2011 | CN102024686A Semiconductor manufacturing process and apparatus used for the same |
| 04/20/2011 | CN102024680A Substrate processing system |
| 04/20/2011 | CN102024442A Method for realizing color display by using color conversion principle |
| 04/20/2011 | CN102023733A Touch screen, color film substrate and manufacturing method thereof |
| 04/20/2011 | CN102023499A Device and method for testing different baking conditions of photoetching films with one control wafer |
| 04/20/2011 | CN102023498A Resist coating and developing apparatus and method |
| 04/20/2011 | CN102023497A Developing equipment of organic electroluminescent display panel and method thereof |
| 04/20/2011 | CN102023496A Imprint lithography method and apparatus |
| 04/20/2011 | CN102023495A Fluid handling structure, lithographic apparatus and device manufacturing method |
| 04/20/2011 | CN102023494A Actuator, positioning system and lithographic apparatus |
| 04/20/2011 | CN102023493A Method for detecting work alignment mark and exposure apparatus using the same |
| 04/20/2011 | CN102023492A Charged particle beam drawing apparatus and proximity effect correction method thereof |
| 04/20/2011 | CN102023491A Actuator, lithographic apparatus, and actuator constructing method |
| 04/20/2011 | CN102023490A Shutter member, a lithographic apparatus and device manufacturing method |
| 04/20/2011 | CN102023489A Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
| 04/20/2011 | CN102023488A Method for monitoring energy deviation of exposure machine in photoetching technique |
| 04/20/2011 | CN102023487A Clamping mechanism with vacuum edge |
| 04/20/2011 | CN102023486A Method for measuring key size swing curve of photo-etching technique |
| 04/20/2011 | CN102023485A Method for modifying photoresisting materials by photosensitive nano-silica |
| 04/20/2011 | CN102023484A Photoresist composition |
| 04/20/2011 | CN102023483A Photoresist composition |
| 04/20/2011 | CN102023482A Photoresist composition |
| 04/20/2011 | CN102023481A Coloring composition, color filter and color liquid crystal display device |
| 04/20/2011 | CN102023480A Radiation-sensitive resin composition for forming cured product such as protective film for display device, insulating film or spacer, cured product, and process for forming cured product |
| 04/20/2011 | CN102023479A Photoresist composition |
| 04/20/2011 | CN102023478A Etching method for three-dimensional workpiece |
| 04/20/2011 | CN102023477A Photoetching method |
| 04/20/2011 | CN102023476A Semiconductor photoetching process method for forming micro-sized structure |
| 04/20/2011 | CN102023472A Method for detecting photomask and method for reducing rework rate of semiconductor products by using photomask |