| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/27/2011 | EP2315289A2 Laser patterning of devices |
| 04/27/2011 | EP2315205A2 Method of producing optical disk-use original and method of producing optical disk |
| 04/27/2011 | EP2315078A1 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern |
| 04/27/2011 | EP2315077A1 An orientation stage for achieving fine movement and alignment of a template in an imprint lithography process |
| 04/27/2011 | EP2315076A1 A process and a system for orienting a template in imprint lithography |
| 04/27/2011 | EP2313270A1 Employing secondary back exposure of flexographic plate |
| 04/27/2011 | EP2198343B1 Improving process model accuracy by modeling mask corner rounding effects |
| 04/27/2011 | EP2153280B1 A lithographic printing plate precursor |
| 04/27/2011 | EP1958028B1 Developer solution and process for use |
| 04/27/2011 | EP1670740B1 Clear photopolymerizable systems for the preparation of high thickness coatings |
| 04/27/2011 | EP1485757B1 Method of producing an etch-resistant polymer structure using electron beam lithography |
| 04/27/2011 | EP1329769B1 Positive photosensitive polyimide resin composition |
| 04/27/2011 | EP0873542B1 Three-dimensional etching process |
| 04/27/2011 | CN201812133U Development horizontal line of printed circuit board |
| 04/27/2011 | CN201812132U Film for printed circuit board |
| 04/27/2011 | CN1877449B Negative light-sensitive resin composition |
| 04/27/2011 | CN102037543A Methods of forming structures supported by semiconductor substrates |
| 04/27/2011 | CN102037409A Orthogonal processing of organic materials used in electronic and electrical devices |
| 04/27/2011 | CN102037408A Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor |
| 04/27/2011 | CN102037407A Polymer pen lithography |
| 04/27/2011 | CN102037406A Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method |
| 04/27/2011 | CN102037346A Photopolymerizable compositions |
| 04/27/2011 | CN102037312A Method and apparatus for overlay compensation between subsequently patterned layers on workpiece |
| 04/27/2011 | CN102037043A Novel polyimide precursor composition, use of the same, and production method of the same |
| 04/27/2011 | CN102037030A Radiation-sensitive resin composition for liquid immersion exposure, polymer and method for forming resist pattern |
| 04/27/2011 | CN102036821A Method of imaging and developing positive-working imageable elements |
| 04/27/2011 | CN102034754A Method for fabricating an integrated circuit device and photoresist stripping composition |
| 04/27/2011 | CN102034750A Array substrate and manufacturing method thereof |
| 04/27/2011 | CN102034749A Array substrate and manufacturing method thereof |
| 04/27/2011 | CN102034732A Attraction member, and attraction device and charged particle beam apparatus using the same |
| 04/27/2011 | CN102034706A Method for controlling growth effect of facet of silicon-germanium (Si-Ge) alloy |
| 04/27/2011 | CN102034691A Method for applying deep-UV photoresist to wet etching |
| 04/27/2011 | CN102034685A Method for using post-epitaxial photoetching to align zero-level marks |
| 04/27/2011 | CN102034679A Wafer cleaning method |
| 04/27/2011 | CN102033438A Focusing and levelling device with expandable measuring range and focusing and levelling method |
| 04/27/2011 | CN102033437A Photoresist-removing method |
| 04/27/2011 | CN102033436A Microlithography projection system |
| 04/27/2011 | CN102033435A Lithographic apparatus and method of operating the same |
| 04/27/2011 | CN102033434A Optical element manufacturing method, optical element exposure device, optical element, lighting optical device, display device, and electronic apparatus |
| 04/27/2011 | CN102033433A Method and apparatus for modeling electromagnetic scattering properties of microscopic structure and method and apparatus for reconstruction of microscopic structure |
| 04/27/2011 | CN102033432A Litho-litho etch (LLE) double patterning methods |
| 04/27/2011 | CN102033431A New polymer blue-ray engraving material |
| 04/27/2011 | CN102033430A Photosensitive conductive paste and method for producing same |
| 04/27/2011 | CN102033429A Photosensitive resin for plasma display screen electrode |
| 04/27/2011 | CN102033428A Colored photosensitive resin composition |
| 04/27/2011 | CN102033427A Colored photosensitive resin composition for ultraviolet laser, pattern forming method, color filter, method for manufacturing color filter, and display device |
| 04/27/2011 | CN102033426A Photoresist composition |
| 04/27/2011 | CN102033425A Method for manufacturing micromechanical shutter |
| 04/27/2011 | CN102033424A Imprint lithography |
| 04/27/2011 | CN102033423A Device and method for calibrating photoetching tool |
| 04/27/2011 | CN102033422A Method and apparatus for performing dark field double dipole lithography (DDL) |
| 04/27/2011 | CN102033420A Photomask, photomask manufacturing method, pattern transfer method and method for manufacturing liquid crystal display device |
| 04/27/2011 | CN102033417A Photomask blank, photomask and method for producing photomask |
| 04/27/2011 | CN102033370A Liquid crystal display substrate and manufacturing method thereof |
| 04/27/2011 | CN102033345A Manufacture method of liquid crystal display and array baseplate |
| 04/27/2011 | CN102033323A Method for manufacturing parallax barrier and method for manufacturing photomask |
| 04/27/2011 | CN102033315A Projection optical system, exposure apparatus and method of manufacturing a device |
| 04/27/2011 | CN102033299A Catadioptric projection objective |
| 04/27/2011 | CN102033127A Microfluidic chip for cotinine quick detection and preparation method thereof |
| 04/27/2011 | CN102031204A Cleaning composition, cleaning process, and process for producing semiconductor device |
| 04/27/2011 | CN102031015A Pigment particle dispersion, light-cured composition using same, color filter, and method of making pigment particle dispersion |
| 04/27/2011 | CN102030855A Urethanated unsaturated water-soluble vinyl multipolymer and preparation method thereof |
| 04/27/2011 | CN102030643A Acrylic monomer, polymer and chemically amplication photoresist composition |
| 04/27/2011 | CN102029753A Coating compositions suitable for use with overcoated photoresist coatings |
| 04/27/2011 | CN101661128B Method for forming color filter |
| 04/27/2011 | CN101556404B Bistable liquid crystal display and forming method thereof |
| 04/27/2011 | CN101441422B Developing solution for heat-sensitive positive picture CTP plate |
| 04/27/2011 | CN101359189B Developing solution for positive photosensitive polyimide photoresist |
| 04/27/2011 | CN101347053B Method for a printed circuit board using laser assisted metallization and patterning of a substrate |
| 04/27/2011 | CN101266413B Illuminator for a lithographic apparatus and method |
| 04/27/2011 | CN101183224B Decompression drying device |
| 04/27/2011 | CN101126893B Forming method for protecting image |
| 04/26/2011 | US7933475 Method and apparatus for providing back-lighting in a display device |
| 04/26/2011 | US7933186 Method for manufacturing optical disk master, method for manufacturing optical disk, and apparatus for manufacturing optical disk master |
| 04/26/2011 | US7933169 Optical head for near-field recording and reproducing device |
| 04/26/2011 | US7933016 Apparatus and methods for detecting overlay errors using scatterometry |
| 04/26/2011 | US7932999 Lithographic apparatus and device manufacturing method |
| 04/26/2011 | US7932996 Exposure apparatus, exposure method, and device fabrication method |
| 04/26/2011 | US7932991 Exposure apparatus, exposure method, and method for producing device |
| 04/26/2011 | US7932989 Liquid jet and recovery system for immersion lithography |
| 04/26/2011 | US7932340 Comprises self cleavage type radical-generating part and at least one unsaturated group in one molecule; suppresses volatilization of low molecular weight decomposition materials during radiation and post-baking, leaving no decomposition residues in final product; for use in printing inks, color filters |
| 04/26/2011 | US7932020 Contact or proximity printing using a magnified mask image |
| 04/26/2011 | US7932019 Gettering members, methods of forming the same, and methods of performing immersion lithography using the same |
| 04/26/2011 | US7932018 Antireflective coating composition |
| 04/26/2011 | US7932017 Stacks; photoresists; photolithography |
| 04/26/2011 | US7932016 Photosensitive composition |
| 04/26/2011 | US7932014 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 04/26/2011 | US7932013 Pattern coating material and pattern forming method |
| 04/26/2011 | US7932012 Polymer (polyimide or polybenzoxazole precursor) having an acid functional group, a compound having substituent(s) derived from an amine functional group as chain extender, a photoreactive compound, and a solvent; surface protecting film or interlayer dielectric for semiconductor device |
| 04/26/2011 | CA2487894C Actinic radiation curable compositions and their use |
| 04/26/2011 | CA2480421C Polymerisable composition |
| 04/21/2011 | WO2011046989A1 Generalization of shot definitions for mask and wafer patterning tools |
| 04/21/2011 | WO2011046517A1 Apparatus and method of applying a film to a semiconductor wafer and method of processing a semiconductor wafer |
| 04/21/2011 | WO2011046397A2 Light-sensitive resin composition and a dry film comprising the same |
| 04/21/2011 | WO2011046230A1 Radiation-sensitive resin composition and method of forming interlayer dielectric |
| 04/21/2011 | WO2011046192A1 Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic el display, image display device and colorant compound |
| 04/21/2011 | WO2011046174A1 Exposure apparatus, exposure method, maintenance method, and method for manufacturing device |
| 04/21/2011 | WO2011046169A1 Method for producing microstructure |
| 04/21/2011 | WO2011045918A1 Method for producing polybutadiene |
| 04/21/2011 | WO2011045753A1 Scanning probe lithography apparatus and method, and material accordingly obtained |