G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2011
05/04/2011	CN102047180A Film type photodegradable transfer material
05/04/2011	CN102047179A Photosensitive resin composition, process for producing cured relief pattern, and semiconductor device
05/04/2011	CN102047178A Photosensitive resin composition
05/04/2011	CN102047152A Method for producing color filter, method for producing substrate with pattern, and small photomask
05/04/2011	CN102047151A Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter
05/04/2011	CN102046677A Photosensitive paste and sintered layer
05/04/2011	CN102046667A Novel compound, polymerizable composition, color filter and process for produciton thereof, solid-state imaging element, and lithographic printing original plate
05/04/2011	CN102046616A Dithiane derivative, polymer, resist composition, and process for producing semiconductor using the resist composition
05/04/2011	CN102044432A Method for preventing uneven surface of wafer and preventing defocus in exposure
05/04/2011	CN102044415A Method for manufacturing semiconductor structure
05/04/2011	CN102044411A Substrate cooling apparatus, substrate cooling method, and storage medium
05/04/2011	CN102043356A Cleaning solution composition for cleaning substrate
05/04/2011	CN102043355A Method for removing photoresist
05/04/2011	CN102043354A Developing apparatus and developing method
05/04/2011	CN102043353A Method for spraying developer solution on wafer
05/04/2011	CN102043352A Focusing and leveling detection device
05/04/2011	CN102043351A Leveling and focusing mechanism and mask platform with same
05/04/2011	CN102043350A Exposure apparatus, device manufacturing method, and control method of exposure apparatus
05/04/2011	CN102043349A Exposure device and exposure method
05/04/2011	CN102043348A Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
05/04/2011	CN102043347A Method and system for detecting and calibrating incident postures of light beams in laser interference nano-lithography
05/04/2011	CN102043346A Light source apparatus
05/04/2011	CN102043345A Exposure device and exposure method
05/04/2011	CN102043344A Monitoring method for exposure machine table
05/04/2011	CN102043343A Method for measuring focus point of exposure machine
05/04/2011	CN102043342A Achromatic position alignment optical system
05/04/2011	CN102043341A Alignment signal acquisition system for photo-etching equipment and alignment method
05/04/2011	CN102043340A Method for uniformly spraying photoresist
05/04/2011	CN102043339A Positive radiation-sensitive resin composition, and interlayer insulating film and method for forming the same
05/04/2011	CN102043338A Photoresist composition
05/04/2011	CN102043337A Colored curable composition, colored pattern, color filter, method of producing color filter and liquid crystal display element
05/04/2011	CN102043336A Photoresist composition
05/04/2011	CN102043335A Photosensitive resin composition, cured film, method for producing cured film, organic el display device and liquid crystal display device
05/04/2011	CN102043334A Photosensitive resin composition, cured film, method for producing cured film, organic el display device and liquid crystal display device
05/04/2011	CN102043333A Photosensitive resin composition, method for producing cured film, cured film, organic el display device and liquid crystal display device
05/04/2011	CN102043332A Photosensitive resin composition, metal-base-containing circuit board and production method thereof
05/04/2011	CN102043331A Process for producing photoresist pattern
05/04/2011	CN102043330A Method for manufacturing cylinder die core for nanoimprint
05/04/2011	CN102043329A Integrated photoetching machine and photoetching process
05/04/2011	CN102043179A Bimetallic sensitive layer-based laser direct-writing grayscale mask manufacturing method
05/04/2011	CN102043178A Compound photon sieve for large-caliber imaging and manufacturing method thereof
05/04/2011	CN102040881A Etching and plating resist ink of hydrophobic printed circuit board
05/04/2011	CN102040795A Resin composition
05/04/2011	CN102040700A Deprotection method of protected polymer
05/04/2011	CN101727020B Method for controlling X-ray exposing clearance
05/04/2011	CN101644898B Method for measuring alignment precision among lithography machines with different magnifications
05/04/2011	CN101595406B Colored composition, color filter, and method for production of the color filter
05/04/2011	CN101592858B Method for amending photoresist pattern error
05/04/2011	CN101576715B Calibration method for microscopic imaging systems
05/04/2011	CN101541880B Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin
05/04/2011	CN101533121B Optical film, die for forming optical film and method for manufacturing die
05/04/2011	CN101464636B Immersion lithographic apparatus and device manufacturing method
05/04/2011	CN101452201B Method for detecting mask printing plate
05/04/2011	CN101432139B Bakeable lithographic plate with a high resistance to chemicals
05/04/2011	CN101408737B Platform-type exposure image detection method
05/04/2011	CN101382612B Method for producing large area holographic grating based on single exposure of reference grating
05/04/2011	CN101377555B Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof
05/04/2011	CN101349877B Method of lifting off and fabricating array substrate for liquid crystal display device using the same
05/04/2011	CN101349873B Lithographic pellicle
05/04/2011	CN101335198B Method for forming fine pattern of semiconductor device
05/04/2011	CN101304003B Single slice integration technique for diffraction microlens array and ultraviolet focal plane array
05/04/2011	CN101196689B Hot rolling high fine aluminum plate substrate and its production method
05/04/2011	CN101196686B Photosensitive resin composition and use of the same
05/04/2011	CN101144983B Liquid crystal display panel and its production method
05/04/2011	CN101103311B Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member
05/03/2011	US7936444 Lithographic apparatus and device manufacturing method
05/03/2011	US7935954 Artificial band gap
05/03/2011	US7935665 Non-corrosive cleaning compositions for removing etch residues
05/03/2011	US7935477 Double patterning strategy for contact hole and trench
05/03/2011	US7935476 Negative laser sensitive lithographic printing plate having specific photosensitive composition
05/03/2011	US7935474 Acid-amplifier having acetal group and photoresist composition including the same
05/03/2011	US7935473 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes
05/03/2011	US7935472 Photo-curable resin composition and a method for forming a pattern using the same
05/03/2011	US7935471 NIR/IR curable coatings for light directed imaging
05/03/2011	US7935463 Reusable paper media with compatibility markings and printer with incompatible media sensor
05/03/2011	US7935462 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
05/03/2011	US7935266 Wet etching method using ultraviolet-light and method of manufacturing semiconductor device
05/03/2011	CA2477439C Thioxanthone derivatives, and their use as cationic photoinitiators
04/2011
04/28/2011	WO2011050048A2 Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
04/28/2011	WO2011049803A1 Plate developer with a configurable transport path
04/28/2011	WO2011049740A1 Method and system for forming a pattern on a surface using charged particle beam lithography
04/28/2011	WO2011049133A1 Substrate supporting apparatus, substrate supporting member, substrate transfer apparatus, exposure apparatus, and device manufacturing method
04/28/2011	WO2011049090A1 Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element
04/28/2011	WO2011048919A1 Radiation-sensitive resin composition and novel compound
04/28/2011	WO2011048877A1 Laser exposure device
04/28/2011	WO2011028590A3 Patterning hydrogels and cell culture article
04/28/2011	US20110097835 Photoresist composition and method of manufacturing a display substrate using the same
04/28/2011	US20110097672 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
04/28/2011	US20110097671 Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent
04/28/2011	US20110097670 Patterning process and chemical amplified photoresist composition
04/28/2011	US20110097669 Photocurable composition
04/28/2011	US20110097668 Negative tone molecular glass resists and methods of making and using same
04/28/2011	US20110097667 Positive resist composition, method of forming resist pattern, and polymeric compound
04/28/2011	US20110097666 Lithographic printing plate precursors
04/28/2011	US20110097532 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
04/28/2011	US20110096450 Combination current sensor and relay
04/28/2011	US20110096317 Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus
04/28/2011	US20110095194 Neutron detector with neutron converter, method for manufacturing the neutron detector and neutron imaging apparatus
04/28/2011	DE112009001389T5 Polymer für lithografische Zwecke und Verfahren zur Herstellung derselben Polymer for lithographic purposes and processes for producing the same
04/28/2011	DE102009045694A1 Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik Illumination optics for microlithography and lighting system and projection exposure apparatus having an illumination optics

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