| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/11/2011 | CN101271281B Normalization alignment mark combination and its alignment method and alignment system |
| 05/11/2011 | CN101266411B Two-dimensional coding normalization mask target combination and its alignment method and aligning system |
| 05/11/2011 | CN101258581B Exposure apparatus, exposure method, and device production method |
| 05/11/2011 | CN101246315B Photoresist cleaning fluid composition and its application |
| 05/11/2011 | CN101201548B Measuring system and method for focusing and leveling |
| 05/11/2011 | CN101183223B Lithographic apparatus and device manufacturing method |
| 05/11/2011 | CN101149569B Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
| 05/11/2011 | CN101135845B Hologram recording medium |
| 05/11/2011 | CN101109909B Lithographic apparatus, aberration correction device and device manufacturing method |
| 05/11/2011 | CN101103442B Illuminant optical device |
| 05/11/2011 | CN101075097B Photo-etching equipment and method for manufacturing device |
| 05/11/2011 | CN101061436B Etching method including photoresist plasma conditioning step with hydrogen flow rate ramping |
| 05/11/2011 | CN101055428B Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system |
| 05/11/2011 | CN101046632B Planographic printing plate precursor |
| 05/11/2011 | CN101042542B Displacement measurement systems, lithographic apparatus and device manufacturing method |
| 05/11/2011 | CN100999582B Photosensitive bottom anti-reflective coatings |
| 05/10/2011 | USRE42338 Capping layer for EUV optical elements |
| 05/10/2011 | US7941234 Exposure apparatus and parameter editing method |
| 05/10/2011 | US7941232 Control method, control system, and program |
| 05/10/2011 | US7940375 Transmission filter apparatus |
| 05/10/2011 | US7939247 Process of patterning small scale devices |
| 05/10/2011 | US7939246 Charged particle beam projection method |
| 05/10/2011 | US7939245 Light absorbent and organic antireflection coating composition containing the same |
| 05/10/2011 | US7939244 Photosensitive hardmask for microlithography |
| 05/10/2011 | US7939243 Resin, resist composition and method of forming resist pattern |
| 05/10/2011 | US7939242 barrier film material includes, in addition to an alkali-soluble polymer, a multivalent carboxylic acid compound having a plurality of carboxyl groups or a multivalent alcohol compound. The multivalent carboxylic acid compound or the multivalent alcohol compound is adhered onto the surface of a resist |
| 05/10/2011 | US7939241 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method |
| 05/10/2011 | US7939240 Lithographic printing plate precursor and method of producing printing plate |
| 05/10/2011 | US7939229 Photomask, semiconductor device, and method for manufacturing semiconductor device |
| 05/10/2011 | US7939226 Binary mask, method for fabricating the binary mask, and method for fabricating fine pattern of semiconductor device using binary mask |
| 05/10/2011 | US7938990 Pattern drawing method, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 05/05/2011 | WO2011053133A1 Radiation-curable liquid resin composition for additive fabrication and three-dimensional object made therefrom |
| 05/05/2011 | WO2011053100A2 Acrylate resin, photoresist composition comprising same, and photoresist pattern |
| 05/05/2011 | WO2011053093A2 Printing plate for liquid crystal display and manufacturing method thereof, method for printing using same, and method for manufacturing replication master mold and printing plate using same |
| 05/05/2011 | WO2011052954A2 Composition for cleaning photoresist pattern and forming protective film |
| 05/05/2011 | WO2011052925A2 Photosensitive resin composition |
| 05/05/2011 | WO2011052703A1 Exposure apparatus and device manufacturing method |
| 05/05/2011 | WO2011052611A1 Method for forming reversed pattern and polysiloxane resin composition |
| 05/05/2011 | WO2011052610A1 Optical member for deep ultraviolet and process for producing same |
| 05/05/2011 | WO2011052327A1 Aromatic sulfonium salt compound |
| 05/05/2011 | WO2011052111A1 Substrate cleaning device and substrate cleaning method |
| 05/05/2011 | WO2011052060A1 Exposure device and photo mask |
| 05/05/2011 | WO2011051791A2 Method and system for lithography hotspot correction of a post-route layout |
| 05/05/2011 | WO2011051648A2 A method of making a patterned dried polymer and a patterned dried polymer |
| 05/05/2011 | WO2011051249A1 Method of pattern selection for source and mask optimization |
| 05/05/2011 | WO2011051069A1 Catadioptric projection objective comprising a reflective optical component and a measuring device |
| 05/05/2011 | WO2011050817A1 Method and device for nanoimprint lithography |
| 05/05/2011 | WO2011050442A1 Gallotannic compounds for lithographic printing plate coating compositions |
| 05/05/2011 | US20110106287 Wiring forming system and wiring forming method for forming wiring on wiring board |
| 05/05/2011 | US20110104974 Liquid crystal display device having patterned spacers and method of fabricating the same |
| 05/05/2011 | US20110104618 Self-aligned masking for solar cell manufacture |
| 05/05/2011 | US20110104617 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition |
| 05/05/2011 | US20110104616 Line width roughness improvement with noble gas plasma |
| 05/05/2011 | US20110104615 Curing of photo-curable printing plates with flat tops or round tops by variable speed exposure |
| 05/05/2011 | US20110104614 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom |
| 05/05/2011 | US20110104613 Antireflective Composition for Photoresists |
| 05/05/2011 | US20110104612 Positive-type radiation-sensitive composition, and resist pattern formation method |
| 05/05/2011 | US20110104611 Novel compound, polymer, and radiation-sensitive composition |
| 05/05/2011 | US20110104610 Positive photosensitive composition and pattern forming method using the same |
| 05/05/2011 | US20110104596 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device |
| 05/05/2011 | US20110104595 Reflective mask blank for euv lithography and mask for euv lithography |
| 05/05/2011 | US20110104594 Method for Manufacturing a Surface and Integrated Circuit Using Variable Shaped Beam Lithography |
| 05/05/2011 | US20110104454 Composition for forming layer to be plated, method of producing metal pattern material, and metal pattern material |
| 05/05/2011 | US20110104450 Negative-working lithographic printing plate precursors |
| 05/05/2011 | US20110104445 Process for preparing a polymeric relief structure |
| 05/05/2011 | US20110103621 Thermo-acoustic loudspeaker |
| 05/05/2011 | US20110102757 Lithographic Method and Apparatus |
| 05/05/2011 | US20110102753 Apparatus and Method of Measuring a Property of a Substrate |
| 05/05/2011 | US20110102662 Colored curable composition, color filter and method of producing the same, and solid-state imaging device |
| 05/05/2011 | US20110102528 Composition, resist film, pattern forming method, and inkjet recording method |
| 05/05/2011 | US20110100688 Electro-Optical Device and Method of Manufacturing the Same |
| 05/05/2011 | US20110100393 Method of cleaning mask and mask cleaning apparatus |
| 05/05/2011 | DE10055280B4 Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleiterbauelementen Phase shift photomask blank, phase shift photomask and method for the production of semiconductor devices |
| 05/05/2011 | DE10032282B4 Lithografisches Belichtungs- und Strukturierungsverfahren unter Verwendung einer Antireflexionsschicht A lithographic exposure and patterning process using an antireflection film |
| 05/05/2011 | CA2763435A1 Gallotannic compounds for lithographic printing plate coating compositions |
| 05/04/2011 | EP2317511A1 Photopolymer formulations with adjustable mechanical module Guv |
| 05/04/2011 | EP2317388A2 Method and system for wafer inspection |
| 05/04/2011 | EP2317387A2 Curing of photo-curable printing plates with flat tops or round tops by variable speed exposure |
| 05/04/2011 | EP2317386A2 Illumination system of a microlithographic projection exposure apparatus |
| 05/04/2011 | EP2316056A1 Process for fabricating multi-level metal parts by the uv-liga technique |
| 05/04/2011 | EP2316055A1 Polychromic substances and their use |
| 05/04/2011 | EP2315739A1 New propanoates and processes for preparing the same |
| 05/04/2011 | EP2135124B1 Optical mounting and optical component comprising said type of optical mounting |
| 05/04/2011 | EP1818723B1 Composition for forming antireflection film, layered product, and method of forming resist pattern |
| 05/04/2011 | EP1668038B1 Arylsulfinate salts in initiator systems for polymeric reactions |
| 05/04/2011 | EP1369708B1 Method of producing an optical member for a projection aligner |
| 05/04/2011 | CN201820072U Double-sided exposure device |
| 05/04/2011 | CN201820055U Liquid crystal array-based aperture device of polarized light source |
| 05/04/2011 | CN201815397U Flushing sprayer of semiconductor photolithographic developing tank |
| 05/04/2011 | CN1996151B Circuit pattern exposure method and mask |
| 05/04/2011 | CN1977217B Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head |
| 05/04/2011 | CN1892438B Lithographic apparatus and device manufacturing method |
| 05/04/2011 | CN1880080B Method for manufacturing liquid discharge head, liquid discharge head, and liquid discharge recording apparatus |
| 05/04/2011 | CN1862376B Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 05/04/2011 | CN1848303B Black conductive compositions, black electrodes, and product using same |
| 05/04/2011 | CN1832982B 感光性倍半硅氧烷树脂 Photosensitive silsesquioxane resin |
| 05/04/2011 | CN1777624B Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
| 05/04/2011 | CN102047183A Multilayer mirror and lithographic apparatus |
| 05/04/2011 | CN102047182A Exposure apparatus, exposure method, and device manufacturing method |
| 05/04/2011 | CN102047181A Photosensitive resin composition |