| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/12/2011 | DE19648807B4 Verfahren zum Entfernen einer schützenden Beschichtung und Leitfläche A method for removing a protective coating and guide surface |
| 05/12/2011 | DE102010043235A1 Nano-imprint template producing method for electronic component, involves joining chip and base together by adhesion and/or cohesion forces and/or using material engagement process, and withdrawing transfer body from upper side of chip |
| 05/12/2011 | DE102010043059A1 Imprinttemplate, Nanoimprintvorrichtung und Nanostrukturierungsverfahren Imprinttemplate, Nanoimprintvorrichtung and nanostructuring process |
| 05/12/2011 | DE102009052270A1 Belichtungsvorrichtung und Verfahren zur Belichtung von Substraten An exposure apparatus and method for exposing substrates |
| 05/12/2011 | DE102009037011B3 Molecular lithography process for nanopattern generation in a substrate, comprises producing a mask structure with a self-styled organization, from single unbranched macromolecules with negative load |
| 05/11/2011 | EP2320274A1 Process for producing lithographic printing plate |
| 05/11/2011 | EP2320273A1 Exposure apparatus, exposure method, and method for producing a device |
| 05/11/2011 | EP2319893A1 Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer and semiconductor device using the photosensitive adhesive composition |
| 05/11/2011 | EP2319892A1 Photosensitive adhesive composition, photosensitive film adhesive, adhesive pattern, semiconductor wafer with adhesive, semiconductor device and electronic component |
| 05/11/2011 | EP2319815A1 Board holding device, board holding method, and method of manufacturing laminated glass |
| 05/11/2011 | EP2318886A1 Processing of positive-working lithographic printing plate precursor |
| 05/11/2011 | EP2318885A1 Method for resist coating a recess in the surface of a substrate, in particular a wafer |
| 05/11/2011 | EP2240829B1 Method of forming a patterned material on a substrate using ionic, organic photoacid generators for duv, muv and optical lithography based on peraceptor-substituted aromatic anions |
| 05/11/2011 | EP2132556B1 Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device |
| 05/11/2011 | EP1800186B1 An imprinted polymer support |
| 05/11/2011 | EP1716455B1 Projection lens of a microlithographic projection exposure system |
| 05/11/2011 | EP1672681B1 Exposure apparatus, substrate carrying method, exposure method, and method for producing device |
| 05/11/2011 | EP1275668B1 Photocurable composition, cured object, and process for producing the same |
| 05/11/2011 | EP1245044B1 Method for determining optimal process targets in microelectronic fabrication |
| 05/11/2011 | CN201828770U Developing device |
| 05/11/2011 | CN201828769U Exposure machine and safety detecting and controlling device for workbench of same |
| 05/11/2011 | CN201828768U Platform device of exposure machine |
| 05/11/2011 | CN201824627U Grating printing screen being suitable for three-dimensional chromatic crystallized glass |
| 05/11/2011 | CN1959542B Composition for removing immersion lithography solution and method for manufacturing semiconductor device |
| 05/11/2011 | CN1955849B Cooling plate, bake unit, and substrate treating apparatus |
| 05/11/2011 | CN1950755B Composition for removing a (photo)resist |
| 05/11/2011 | CN1920673B Resist removing method and resist removing apparatus |
| 05/11/2011 | CN1912646B MEMS micro high sensitivity magnetic field sensor and manufacturing method |
| 05/11/2011 | CN1841098B Multi-layer spectral purity filter and lithographic apparatus, device manufacturing method, and device |
| 05/11/2011 | CN102057332A Method and system for thermally conditioning an optical element |
| 05/11/2011 | CN102057331A Exposure apparatus and exposure method |
| 05/11/2011 | CN102057330A Model-based scanner tuning methods |
| 05/11/2011 | CN102057329A Methods for model-based process simulation |
| 05/11/2011 | CN102056954A Antirelective coating compositions |
| 05/11/2011 | CN102056913A Sulfonium derivatives and the use thereof as latent acids |
| 05/11/2011 | CN102054764A Method for manufacturing rectangular hole of semiconductor device by using KrF process and other processes |
| 05/11/2011 | CN102054721A Method and device for detecting coating condition of semiconductor wafer surface coating |
| 05/11/2011 | CN102054668A Method for masking medium etching by electronic beam positive photoresist Zep 520 |
| 05/11/2011 | CN102054667A Method for applying photoresist lifting-off technology to protect photoetching alignment marks |
| 05/11/2011 | CN102054641A Manufacture process of grid-control TWT grid and mold-pressing grinding tool thereof |
| 05/11/2011 | CN102054498A Method for preparing photopolymer holographic storage optical disk |
| 05/11/2011 | CN102054092A Pattern selection for full-chip source and mask optimization |
| 05/11/2011 | CN102053509A Method for manufacturing raised grating alignment mark in imprinting lithography |
| 05/11/2011 | CN102053508A Developer for positive thermosensitive CTP (Computer to Plate) |
| 05/11/2011 | CN102053507A Cleaning system and cleaning method of developing solution circulation process equipment |
| 05/11/2011 | CN102053506A Method for monitoring focusing of exposure machine |
| 05/11/2011 | CN102053505A Method for dynamically regulating focal depth of focal lens in photoetching imaging equipment |
| 05/11/2011 | CN102053504A Selection of optimum patterns in a design layout based on diffraction signature analysis |
| 05/11/2011 | CN102053503A Determination method |
| 05/11/2011 | CN102053502A Lithographic apparatus and patterning device |
| 05/11/2011 | CN102053501A Calibration method and lithographic apparatus using such a calibration method |
| 05/11/2011 | CN102053500A Method for preventing adhesive in nozzle from crystallizing in photoetching technology |
| 05/11/2011 | CN102053499A Method for producing a base material for screen printing, and base material of this type |
| 05/11/2011 | CN102053498A Positive photosensitive resin composition |
| 05/11/2011 | CN102053497A Positive type radiation-sensitive resin composition, inter-layer insulating film and method for forming the same |
| 05/11/2011 | CN102053496A Colored photosensitive resin composition |
| 05/11/2011 | CN102053495A Photoresist composition |
| 05/11/2011 | CN102053494A Colored photosensitive resin composition |
| 05/11/2011 | CN102053493A Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same |
| 05/11/2011 | CN102053492A Compositions and processes for photolithography |
| 05/11/2011 | CN102053491A Ultra-deep subwavelength tunable nano photoetching structure and method based on surface plasma resonant cavity |
| 05/11/2011 | CN102053490A Impression equipment |
| 05/11/2011 | CN102053489A Mercaptan-alkene based high-precision ultraviolet imprinting method of continuous embossment micro optical elements |
| 05/11/2011 | CN102053488A Main shaft vacuum dynamic sealing system |
| 05/11/2011 | CN102053487A Process method for forming inverse trapezium shape on positive photoresistor |
| 05/11/2011 | CN102053486A Method for forming symmetrical photoresist pattern |
| 05/11/2011 | CN102053485A Photoetching method |
| 05/11/2011 | CN102053473A UV LED area light source for silk-screen printing-down machine and manufacturing method thereof |
| 05/11/2011 | CN102053432A Displayer and manufacturing method thereof |
| 05/11/2011 | CN102051121A Antireflection coating for 193-nano-wavelength photolithography and preparation method and application thereof |
| 05/11/2011 | CN102051028A Laser marked PETG poly(ethylene terephthlate-co-cyclohex-anedimethyllene terephthalate) composition and preparation method thereof |
| 05/11/2011 | CN102050946A Ultraviolet positive photoresist containing nano silicon polyamide and film-forming resin thereof |
| 05/11/2011 | CN102050908A Chemical amplitude-increasing type silicon-containing I-line ultraviolet negative photoresist and forming resin thereof |
| 05/11/2011 | CN102049966A Colorful wheel rim and method for spraying colors on surface of wheel rim |
| 05/11/2011 | CN102049898A Technology for producing liquid wallpaper silk screen mould |
| 05/11/2011 | CN101727019B Double-platform exchange system for silicon chip platform of lithography machine and exchange method thereof |
| 05/11/2011 | CN101718959B Method and system for exchanging two silicon wafer stages of photoetching machine |
| 05/11/2011 | CN101718957B Fixing device of photoelectric detector |
| 05/11/2011 | CN101702079B Method for accurately determining height of space image |
| 05/11/2011 | CN101609691B Method for making a master mold for nanoimprinting patterned magnetic recording disks |
| 05/11/2011 | CN101609193B Movable optical element adjusting and positioning device |
| 05/11/2011 | CN101566800B Aligning system and aligning method for lithography equipment |
| 05/11/2011 | CN101526752B Self-regulating exposure path programming method |
| 05/11/2011 | CN101520322B Telecentric measurement device and method |
| 05/11/2011 | CN101510055B Alignment system and alignment method for photolithography equipment |
| 05/11/2011 | CN101510054B Exposure control system and control method for photolithography equipment |
| 05/11/2011 | CN101479832B Apparatus with mobile body, exposure apparatus, exposure method and device manufacturing method |
| 05/11/2011 | CN101458442B Production of layout and photo mask and graphic method |
| 05/11/2011 | CN101446758B Method for improving smoothness of reflector in micro-mechanical non-refrigeration infrared imaging chip |
| 05/11/2011 | CN101446755B Method for preparing photo-mask and method for patterning |
| 05/11/2011 | CN101441367B Platen for printing alignment film |
| 05/11/2011 | CN101438631B Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 05/11/2011 | CN101436000B Exposure apparatus, method for manufacturing device, and method for controlling exposure apparatus |
| 05/11/2011 | CN101424885B Mask alignment system and method thereof |
| 05/11/2011 | CN101398635B Auto gain link closed-loop feedback control method in self-adapting focusing and leveling sensor system |
| 05/11/2011 | CN101344723B Layer-by-layer automatic forming method and device for micro photo-curing thick film |
| 05/11/2011 | CN101276745B Coating and developing system, coating and developing method |
| 05/11/2011 | CN101276159B Apparatus and method of polymer photoresist ultrasonic ageing effect |
| 05/11/2011 | CN101276151B Method and apparatus for measuring wafer surface flatness |
| 05/11/2011 | CN101273304B Illuminator for a photolithography device |