| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/18/2011 | EP2321703A2 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element |
| 05/18/2011 | EP2321702A2 Exposure apparatus and methods |
| 05/18/2011 | EP2321701A2 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography |
| 05/18/2011 | EP2321700A2 Low-contamination optical arrangement |
| 05/18/2011 | EP1958025B1 Method for expelling gas positioned between a substrate and a mold |
| 05/18/2011 | EP1896903B1 Debris mitigation system with improved gas distribution |
| 05/18/2011 | EP1820377B1 Method and apparatus for operating an electrical discharge device |
| 05/18/2011 | CN201837832U Silicon chip drying controllable device |
| 05/18/2011 | CN201837831U Exposure frame with improved anti-welding window size |
| 05/18/2011 | CN1932650B Lithographic apparatus and device manufacturing method |
| 05/18/2011 | CN1892437B Lithografic apparatus and device manufacturing method |
| 05/18/2011 | CN1821871B Resist pattern thickening material and process for forming resist pattern, and process for manufacturing the same |
| 05/18/2011 | CN1716095B Radiation sensitive resin composition, cured resin and liquid crystal display device |
| 05/18/2011 | CN1573564B Lithographic apparatus and device manufacturing method |
| 05/18/2011 | CN102067282A Method for forming fine pitch structures |
| 05/18/2011 | CN102067041A Method of resist treatment |
| 05/18/2011 | CN102067040A Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus |
| 05/18/2011 | CN102067039A Lithographic apparatus and device manufacturing method |
| 05/18/2011 | CN102067038A Exposure apparatus, exposure method, and device manufacturing method |
| 05/18/2011 | CN102067037A Photosensitive resin composition, photosensitive element wherein same is used, method for forming a resist-pattern, and method for producing a printed wiring board |
| 05/18/2011 | CN102066509A Aqueous composition for coating over a photoresist pattern |
| 05/18/2011 | CN102066439A Monomer having lactone skeleton, polymer compound and photoresist composition |
| 05/18/2011 | CN102066124A Substrate and imageable element with hydrophilic interlayer |
| 05/18/2011 | CN102064102A Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 05/18/2011 | CN102063025A Measurement method of two-faced registration error and lithographic equipment applying measurement method |
| 05/18/2011 | CN102063024A Developing solution composition |
| 05/18/2011 | CN102063023A Lithographic apparatus and device manufacturing method |
| 05/18/2011 | CN102063022A A method of performing model-based scanner tuning |
| 05/18/2011 | CN102063021A Attenuation device capable of adjusting light beam energy |
| 05/18/2011 | CN102063020A Exposure device and exposure method |
| 05/18/2011 | CN102063019A Lithographic method and apparatus |
| 05/18/2011 | CN102063018A Lithographic apparatus and device manufacturing method |
| 05/18/2011 | CN102063017A Exposure apparatus and method of manufacturing device |
| 05/18/2011 | CN102063016A Aligning mark detecting method |
| 05/18/2011 | CN102063015A Semiconductor wafer and pattern alignment method |
| 05/18/2011 | CN102063014A Illumination optical system for microlithography |
| 05/18/2011 | CN102063013A Method for manufacturing patterning substrate by nano-microspheres |
| 05/18/2011 | CN102061228A Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 05/18/2011 | CN102060981A Aromatic ring-containing polymer and hard mask composition containing the polymer |
| 05/18/2011 | CN102060980A Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same |
| 05/18/2011 | CN101675500B Exposure apparatus, exposure method and device manufacturing method |
| 05/18/2011 | CN101666982B Bearing box for photomask box and buffering and positioning device thereof |
| 05/18/2011 | CN101611130B Peroxide activated oxometalate based formulations for removal of etch residue |
| 05/18/2011 | CN101589453B Device and method for wet treating plate-like-articles |
| 05/18/2011 | CN101515117B Lithographic apparatus having a chuck with a visco-elastic damping layer |
| 05/18/2011 | CN101369054B Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method |
| 05/18/2011 | CN101362809B Anti-reflective polymer, anti-reflective composition, and method for forming pattern using the same |
| 05/18/2011 | CN101226336B Method for forming a coating with a liquid, and method for manufacturing a semiconductor device |
| 05/18/2011 | CN101216673B Stage device, exposure device, and device manufacturing method |
| 05/18/2011 | CN101206408B Exposure data generating apparatus |
| 05/18/2011 | CN101190903B Oxetane-containing compound, photoresist composition having the same, method of preparing pattern, and inkjet print head |
| 05/18/2011 | CN101154053B Resonant scanning mirror |
| 05/18/2011 | CN101151338B Colorant dispersion, coloring resin composition, color filter, and liquid-crystal display device |
| 05/18/2011 | CN101135840B Method of forming a mask structure and method of forming a minute pattern using the same |
| 05/18/2011 | CN101118379B Microlenses of cmos image sensor and method for fabricating the same |
| 05/17/2011 | US7944540 Color filter on thin film transistor type liquid crystal display device and method of fabricating the same |
| 05/17/2011 | US7944025 Wafers supporting photoresists with channels containing an effervescent, gas-fortified liquid to help with scum removal |
| 05/17/2011 | US7943516 Manufacturing method for semiconductor device |
| 05/17/2011 | US7943290 Method of forming fine pattern using azobenzene-functionalized polymer and method of manufacturing nitride-based semiconductor light emitting device using the method of forming fine pattern |
| 05/17/2011 | US7943289 Forming submicron lithographic features using currently available resist materials and radiation sources; simple, efficient, high fidelity |
| 05/17/2011 | US7943287 Improved energy efficiency with simplified manufacturing process; a dielectric layer is formed over a light absorbing layer, selective exposure, forming a conductive film; televisions, video cameras, cellular phones, computers |
| 05/17/2011 | US7943286 Reproducible, high yield method for fabricating ultra-short T-gates on HFETs |
| 05/17/2011 | US7943285 Forming intermediate layer pattern by etching intermediate film with first resist pattern used as a mask; high resolution attained by double patterning; treatment with acetic, formic, methansulfonic, or butanesulfonic acid; immersion lithography; crosslinking, annealing |
| 05/17/2011 | US7943284 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern |
| 05/17/2011 | US7943275 Structure for pattern formation, method for pattern formation, and application thereof |
| 05/17/2011 | US7943203 Colored curable composition, colored pattern and color filter using the same |
| 05/17/2011 | US7942967 Method and system of coating polymer solution on a substrate in a solvent saturated chamber |
| 05/17/2011 | US7942379 Active vibration isolation system with a combined position actuator |
| 05/12/2011 | WO2011056905A2 Negative-working lithographic printing plate precursors |
| 05/12/2011 | WO2011056777A1 Method of producing color change in overlapping layers |
| 05/12/2011 | WO2011056358A2 Lithographic printing plate precursors |
| 05/12/2011 | WO2011055860A1 Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method |
| 05/12/2011 | WO2011055826A1 Mask holding mechanism |
| 05/12/2011 | WO2011055758A1 Focus test mask, focus measuring method, exposure apparatus, and exposure method |
| 05/12/2011 | WO2011055209A1 Antifeflective composition for photoresists |
| 05/12/2011 | WO2011054818A2 Novel non-crystallizing methacrylates, production and use thereof |
| 05/12/2011 | WO2011054799A2 Urethanes used as additives in a photopolymer formulation |
| 05/12/2011 | WO2011054797A1 Photopolymer formulation having different writing comonomers |
| 05/12/2011 | WO2011054796A1 Selection method for additives in photopolymers |
| 05/12/2011 | WO2011054795A1 Fluorourethane as an additive in a photopolymer formulation |
| 05/12/2011 | WO2011054749A1 Photopolymer formulations having the adjustable mechanical modulus guv |
| 05/12/2011 | WO2011054572A1 Silicon containing coating compositions and methods of use |
| 05/12/2011 | WO2011054538A1 Light exposure apparatus and method for exposing substrates to light |
| 05/12/2011 | US20110111351 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof |
| 05/12/2011 | US20110111350 Conjugated Polymers |
| 05/12/2011 | US20110111349 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same |
| 05/12/2011 | US20110111348 Semiconductor device fabrication using a multiple exposure and block mask approach to reduce design rule violations |
| 05/12/2011 | US20110111347 Method for making a lithographic printing plate |
| 05/12/2011 | US20110111346 Positive Photosensitive Resin Composition |
| 05/12/2011 | US20110111345 Silicon containing coating compositions and methods of use |
| 05/12/2011 | US20110111344 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board |
| 05/12/2011 | US20110111343 Positive resist composition and method of forming resist pattern |
| 05/12/2011 | US20110111342 Photoresist composition |
| 05/12/2011 | US20110111341 Polyimide and photoresist resin composition comprising thereof |
| 05/12/2011 | US20110111340 Novel siloxane polymer compositions |
| 05/12/2011 | US20110111339 Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof |
| 05/12/2011 | US20110110104 Optical plate and method of manufacturing the same |
| 05/12/2011 | US20110109894 Polarization-modulating optical element and method for manufacturing thereof |
| 05/12/2011 | US20110109893 Microlithographic projection exposure apparatus |
| 05/12/2011 | US20110108316 Axiocentric scrubbing land grid array contacts and methods for fabrication |