| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/25/2011 | CN102076732A 新型聚酰亚胺前体组合物及其利用 The new polyimide precursor composition and its use |
| 05/25/2011 | CN102075395A Data transmission bus system |
| 05/25/2011 | CN102074462A Method for forming electronic device |
| 05/25/2011 | CN102074456A Decompression drying apparatus |
| 05/25/2011 | CN102073227A Photoresist removing method |
| 05/25/2011 | CN102073226A Thick film photoresist cleaning solution and cleaning method thereof |
| 05/25/2011 | CN102073225A Precision rotating, positioning and focusing system of nano-photon straight write head |
| 05/25/2011 | CN102073224A Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 05/25/2011 | CN102073223A Lithographic apparatus having parts with a coated film adhered thereto |
| 05/25/2011 | CN102073222A Method for improving alignment signals of step projection photoetching machine |
| 05/25/2011 | CN102073221A System and method for insitu lens cleaning in immersion lithography |
| 05/25/2011 | CN102073220A Phase extracting method of single closed fringes |
| 05/25/2011 | CN102073219A Balancing mass system and workbench |
| 05/25/2011 | CN102073218A Device for measuring projection objective wave aberration, and measurement method thereof |
| 05/25/2011 | CN102073217A Real-time measuring device and method for wave aberration |
| 05/25/2011 | CN102073216A Colored photosensitive resin composition, pattern forming method, manufacture method for color filter, color filter, and display apparatus |
| 05/25/2011 | CN102073215A Ultraviolet curing glue for printing and dyeing |
| 05/25/2011 | CN102073214A Heat treatment unit of gluing developing machine |
| 05/25/2011 | CN102073084A Square hole photon screen and manufacture method thereof |
| 05/25/2011 | CN102073074A Light diffuser |
| 05/25/2011 | CN102072809A Device for measuring scattering property of light diffuser and measurement method thereof |
| 05/25/2011 | CN102072742A Lithographic apparatus and device manufacturing method |
| 05/25/2011 | CN102070954A Color composition for producing color filters |
| 05/25/2011 | CN102070746A Polymer for resist protective layer and polymer composition containing the same |
| 05/25/2011 | CN102070744A Binder resin for resist ink and resist ink using the same |
| 05/25/2011 | CN101609227B Color filter layer and fabrication method thereof |
| 05/25/2011 | CN101556431B Translational symmetrical mark and in-situ detection method of wave aberration of projection objective of photoetching machine |
| 05/25/2011 | CN101477314B Immersion liquid feed apparatus of immersion photo-etching machine |
| 05/25/2011 | CN101472808B Fluid container and fluid-containing container using the same |
| 05/25/2011 | CN101349838B Semi-permeation type FFS type liquid crystal display device and its manufacture method |
| 05/25/2011 | CN101271276B System and method for replacing resist filter |
| 05/25/2011 | CN101226330B Colored photosensitive resin composition |
| 05/25/2011 | CN101137620B Base multiplying agents and base-reactive curable compositions |
| 05/25/2011 | CN101088046B Compound for resist and radiation-sensitive composition |
| 05/25/2011 | CN101086629B Reflecting mirror array for lithography |
| 05/25/2011 | CN101055742B Method and apparatus for manufacturing optical disk master, and method for manufacturing optical disk |
| 05/25/2011 | CN101052919B Sulfonic-ester-containing composition for formation of antireflection film for lithography |
| 05/25/2011 | CN101025571B Device manufacturing method |
| 05/24/2011 | US7949966 Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program |
| 05/24/2011 | US7948608 Exposure apparatus, exposure method, method for manufacturing device |
| 05/24/2011 | US7948604 Exposure apparatus and method for producing device |
| 05/24/2011 | US7948603 Vacuum device, operation method for vacuum device, exposure system, and operation method for exposure system |
| 05/24/2011 | US7948599 Liquid crystal display device having patterned spacers and method of fabricating the same |
| 05/24/2011 | US7948122 Displacement device |
| 05/24/2011 | US7948051 Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same |
| 05/24/2011 | US7947638 Composition for cleaning semiconductor device |
| 05/24/2011 | US7947433 Exposure method |
| 05/24/2011 | US7947432 Forming intermediate layer pattern by etching intermediate film with first resist pattern used as a mask; high resolution attained by double patterning; treatment with acetic, formic, methansulfonic, or butanesulfonic acid; immersion lithography; crosslinking, annealing |
| 05/24/2011 | US7947430 Method of forming 3D micro structures with high aspect ratios |
| 05/24/2011 | US7947429 Long length flexible circuits and method of making same |
| 05/24/2011 | US7947427 Printing element with an integrated printing surface |
| 05/24/2011 | US7947426 Laser-engraveable flexographic printing plate precursors |
| 05/24/2011 | US7947425 Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions |
| 05/24/2011 | US7947424 urea compound substituted by hydroxyalkyl group or alkoxyalkyl group for forming urea-formaldehyde resin protective coatings; adjusting refractive index with light absorbers or crosslink-forming resin; semiconductor device, integrated circuits; light-absorption, dry etching rate |
| 05/24/2011 | US7947423 Photosensitive compound and photoresist composition including the same |
| 05/24/2011 | US7947422 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions |
| 05/24/2011 | US7947421 Positive resist composition for immersion exposure and pattern-forming method using the same |
| 05/19/2011 | WO2011060102A1 Method and apparatus for embossing a deformable body |
| 05/19/2011 | WO2011059089A1 Polyimide precursor and photosensitive resin composition containing the polyimide precursor |
| 05/19/2011 | WO2011059057A1 Filter box, light exposure apparatus, and device production method |
| 05/19/2011 | WO2011059056A1 Filter holding implement, light exposure apparatus, and device production method |
| 05/19/2011 | WO2011059055A1 Filter implement, filter housing method, light exposure apparatus, and device production method |
| 05/19/2011 | WO2011058792A1 Chemical liquid supply device and chemical liquid supply method |
| 05/19/2011 | WO2011058789A1 Quinonediazide photosensitizer solution and positive-type resist composition |
| 05/19/2011 | WO2011058634A1 Exposure apparatus and photomask used therein |
| 05/19/2011 | WO2011057906A1 Imaging optics |
| 05/19/2011 | WO2011057835A1 Optimized mask design for fabricating periodic and quasi-periodic patterns |
| 05/19/2011 | WO2011025655A3 Silicon-selective dry etch for carbon-containing films |
| 05/19/2011 | US20110118165 Composition and method for treating semiconductor substrate surface |
| 05/19/2011 | US20110117582 Multi-biomarker biosensor |
| 05/19/2011 | US20110117504 Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method |
| 05/19/2011 | US20110117503 Exposure apparatus and device fabrication method |
| 05/19/2011 | US20110117502 Method for producing multi-layer optical disk |
| 05/19/2011 | US20110117501 Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same |
| 05/19/2011 | US20110117500 Carrier Sheet for a Photosensitive Printing Element |
| 05/19/2011 | US20110117499 Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound |
| 05/19/2011 | US20110117498 Photosensitive resin composition |
| 05/19/2011 | US20110117497 Acrylate derivative, haloester derivative, polymer compound and photoresist composition |
| 05/19/2011 | US20110117496 Negative photosensitive fluorinated aromatic resin composition |
| 05/19/2011 | US20110117495 Salt and photoresist composition containing the same |
| 05/19/2011 | US20110117494 Salt and photoresist composition containing the same |
| 05/19/2011 | US20110117493 Salt and photoresist composition containing the same |
| 05/19/2011 | US20110117492 Photoresist coating and developing apparatus, substrate transfer method and interface apparatus |
| 05/19/2011 | US20110117491 Resist composition and method of forming resist pattern |
| 05/19/2011 | US20110117490 Methods of forming electronic devices |
| 05/19/2011 | US20110117489 Compound and radiation-sensitive composition |
| 05/19/2011 | US20110117479 Reflective exposure mask, method of manufacturing reflective exposure mask, and method of manufacturing semiconductor device |
| 05/19/2011 | US20110117477 Photopolymerizable Compositions |
| 05/19/2011 | US20110117333 Negative photosensitive composition, partition walls for optical device using it and optical device having the partition walls |
| 05/19/2011 | US20110117332 Acrylate resin, photoresist composition comprising the same, and photoresist pattern |
| 05/19/2011 | US20110116069 Computer generated hologram, exposure apparatus and device fabrication method |
| 05/19/2011 | US20110116062 Reflective imaging optical system, exposure apparatus, and method for producing device |
| 05/19/2011 | US20110116061 Lithographic apparatus and device manufacturing method |
| 05/19/2011 | DE102009046809A1 Belichtungsanlage Exposure system |
| 05/19/2011 | DE10010871B4 System zum Bearbeiten von Halbleiterwafern, das einen nach unten gerichteten laminaren Strom von Reinstluft an der Vorderseite von Trocknereinheiten erzeugt A system for processing semiconductor wafers, which produces a downward laminar flow of pure air at the front of the dryer units |
| 05/18/2011 | EP2323158A2 Lithography system and projection method |
| 05/18/2011 | EP2323138A1 Method for smoothing optical member for euvl and optical member for euvl having smoothed optical surface |
| 05/18/2011 | EP2321840A2 Method for optical proximity correction, design and manufacturing of a reticle using variable shaped beam lithography |
| 05/18/2011 | EP2321839A2 Method for design and manufacture of a reticle using variable shaped beam lithography |
| 05/18/2011 | EP2321704A1 Radiation source and lithographic apparatus |