| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/01/2011 | CN101419064B Relative rotation measuring and rotating positioning system and method for small gapping place |
| 06/01/2011 | CN101359178B Optical proximity correction method |
| 06/01/2011 | CN101320208B Reflection holography thin film and preparation method thereof |
| 06/01/2011 | CN101276148B Apparatus for processing substrate |
| 06/01/2011 | CN101211112B Method of forming pattern |
| 06/01/2011 | CN101192002B Preparation method of magnetism remotely-controlled drive microstructure |
| 06/01/2011 | CN101183218B Colored photosensitive composition |
| 06/01/2011 | CN101162368B Method, an alignment mark and use of a hard mask material |
| 06/01/2011 | CN101114121B Method for forming pattern, and method for manufacturing liquid crystal display |
| 06/01/2011 | CN101091138B Photosensitive laminate film for forming top plate portion of precision fine space and method of forming precision fine space |
| 06/01/2011 | CN101086961B Method of forming a semiconductor device |
| 06/01/2011 | CN101065707B Process for producing resist pattern and conductor pattern |
| 06/01/2011 | CN101034258B Liquid light curing resin composition |
| 06/01/2011 | CN101008789B Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
| 05/31/2011 | US7953129 Laser light source device, exposure device, and mask inspection device using this laser light source device |
| 05/31/2011 | US7952797 Reflective optical element and EUV lithography appliance |
| 05/31/2011 | US7952696 Exposure measurement method and apparatus, and semiconductor device manufacturing method |
| 05/31/2011 | US7951764 Hydroxylated organic amine(s), and corrosion inhibitor of arabitol, erythritol, xylitol, mannitol, sorbitol, ethylene glycol, glycerol,1,2-cyclopentanediol, 1,2-cyclohexanediol, and/or methylpentanediol; polar solvent; amino acid-free; photoresist strippers; copper or aluminum metallization |
| 05/31/2011 | US7951527 Method of forming an integrated optical polarization grid on an LCD substrate and liquid crystal display manufactured to include the grid |
| 05/31/2011 | US7951526 Modified silica particles, and photosensitive composition and photosensitive lithographic printing plate each containing the particles |
| 05/31/2011 | US7951525 Low outgassing photoresist compositions |
| 05/31/2011 | US7951524 Self-topcoating photoresist for photolithography |
| 05/31/2011 | US7951523 Material for forming resist protective film and method for forming resist pattern using same |
| 05/31/2011 | US7951522 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| 05/31/2011 | US7951521 Transfer substrate, transfer method, and method of manufacturing display device |
| 05/31/2011 | US7951512 Reticle for projection exposure apparatus and exposure method using the same |
| 05/31/2011 | CA2521616C Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate |
| 05/26/2011 | WO2011062812A2 Magnification control for lithographic imaging system |
| 05/26/2011 | WO2011062779A1 Method for selective deposition and devices |
| 05/26/2011 | WO2011062687A1 Carrier sheet for a photosensitive printing element |
| 05/26/2011 | WO2011062446A2 Photosensitive resin composition |
| 05/26/2011 | WO2011062297A1 Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
| 05/26/2011 | WO2011062296A2 Exposure apparatus, exposing method, and device fabricating method |
| 05/26/2011 | WO2011062283A1 Reflective imaging optical system, exposure apparatus, and method for producing device |
| 05/26/2011 | WO2011062225A1 Compound |
| 05/26/2011 | WO2011062198A1 Dispersion composition, photosensitive resin composition, and solid-state image pickup element |
| 05/26/2011 | WO2011062182A1 Aromatic sulfonium salt compound |
| 05/26/2011 | WO2011062168A1 Radiation-sensitive resin composition, polymer and resist pattern formation method |
| 05/26/2011 | WO2011062053A1 Flame-retardant solder resist composition and flexible wiring board which is obtained using same |
| 05/26/2011 | WO2011061928A1 Optical characteristic measurement method, exposure method and device manufacturing method |
| 05/26/2011 | WO2011061501A2 Photoresist composition |
| 05/26/2011 | WO2011061086A1 Exposure system |
| 05/26/2011 | WO2011061007A1 Multilayer mirror |
| 05/26/2011 | WO2011060975A1 Lithographic apparatus and device manufacturing method |
| 05/26/2011 | WO2011060617A1 Rinse solution for removing thick film resist and removing method of using the same |
| 05/26/2011 | WO2011040646A3 Exposure apparatus and device manufacturing method |
| 05/26/2011 | WO2011039036A3 Optical system, in particular in a microlithographic projection exposure apparatus |
| 05/26/2011 | WO2011020608A3 Programmable stamping device |
| 05/26/2011 | US20110125458 Spectroscopic Scatterometer System |
| 05/26/2011 | US20110123937 Compositions and processes for immersion lithography |
| 05/26/2011 | US20110123936 Resist pattern coating agent and resist pattern-forming method |
| 05/26/2011 | US20110123935 Method for producing hollow structure |
| 05/26/2011 | US20110123934 Scanning exposure apparatus |
| 05/26/2011 | US20110123933 Polymer, composition for protective layer, and patterning method using the same |
| 05/26/2011 | US20110123932 Method for forming a fluid ejection device |
| 05/26/2011 | US20110123931 High-precision ceramic substrate preparation process |
| 05/26/2011 | US20110123930 Ceramic substrate preparation process |
| 05/26/2011 | US20110123929 Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element |
| 05/26/2011 | US20110123928 Photosensitive Resin Composition and Pattern Forming Method Using the Same |
| 05/26/2011 | US20110123927 Photosensitive resin composition containing polyimide resin and novolak resin |
| 05/26/2011 | US20110123926 Photoresist composition |
| 05/26/2011 | US20110123925 Polymer for protective layer of resist, and polymer composition including the same |
| 05/26/2011 | US20110123913 Exposure apparatus, exposing method, and device fabricating method |
| 05/26/2011 | US20110123912 Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks |
| 05/26/2011 | US20110122393 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method |
| 05/26/2011 | US20110122390 Exposing method, method of manufacturing semiconductor device, and exposure apparatus |
| 05/26/2011 | US20110122384 Imaging optics |
| 05/26/2011 | US20110122380 Immersion photolithography system and method using inverted wafer-projection optics interface |
| 05/26/2011 | US20110122377 Projection exposure apparatus, projection exposure method, and method for producing device |
| 05/26/2011 | US20110122376 Lithographic apparatus and device manufacturing method |
| 05/26/2011 | DE112005001847B4 Verfahren und Vorrichtung zur Bildung eines kristallisierten Films Method and apparatus for forming a crystallized film |
| 05/26/2011 | DE102010048471A1 Dynamisches Maskierungsverfahren zur Mikrofachwerkschaumherstellung Dynamic masking process for microtruss foam production |
| 05/26/2011 | DE102009054024A1 Elektronisch ansteuerbare Matrix-Maske Electronically controllable matrix mask |
| 05/26/2011 | DE102009046685A1 Abbildende Optik The imaging optics |
| 05/25/2011 | EP2325696A1 Electronically controlled matrix screen |
| 05/25/2011 | EP2325695A1 Radiation-sensitive resin composition |
| 05/25/2011 | EP2325694A1 Radiation-sensitive resin composition, and resist pattern formation method |
| 05/25/2011 | EP2325693A1 Composition for Forming a Patterned Film of Surface-Modified Carbon Nanotubes |
| 05/25/2011 | EP2325676A1 Pattern-forming member and method of manufacturing the same |
| 05/25/2011 | EP2324477A1 Data storage medium |
| 05/25/2011 | EP2324393A1 Method and apparatus for thermal processing of photosensitive printing elements |
| 05/25/2011 | EP2324392A1 Photosensitive composition, pattern-forming method using the composition and resin used in the composition |
| 05/25/2011 | EP1913445B1 Imaging system, in particular projection lens of a microlithographic projection exposure unit |
| 05/25/2011 | CN1967388B Composition for removing photoresist and method of forming a pattern using the same |
| 05/25/2011 | CN1950929B Exposure equipment, exposure method and device manufacturing method |
| 05/25/2011 | CN1940721B Photoresistance material for immersion lithography and immersion lithography method |
| 05/25/2011 | CN1928716B Photosensitive composition |
| 05/25/2011 | CN1881090B Substrate processing system for performing exposure process in gas atmosphere |
| 05/25/2011 | CN1877451B Substrate processing system and substrate processing method |
| 05/25/2011 | CN1859893B Photoiniators having triarylsulfonium and arylsulfinate ions |
| 05/25/2011 | CN1821878B Photresist compositions comprising resin blends |
| 05/25/2011 | CN1770012B Staining light-sensitive resin composition |
| 05/25/2011 | CN1641485B Exposure system method for evaluating lithography process |
| 05/25/2011 | CN102077144A Resin composition for making insoluble resist pattern, and method for formation of resist pattern by using the same |
| 05/25/2011 | CN102077143A Telecentricity corrector for microlithographic projection system |
| 05/25/2011 | CN102077142A Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method |
| 05/25/2011 | CN102077141A Photosensitive composition, partition wall, color filter, and organic EL device |
| 05/25/2011 | CN102077140A Filters |
| 05/25/2011 | CN102077139A Print plate handling system |
| 05/25/2011 | CN102076740A Heat-resistant resin precursor and photosensitive resin composition comprising the same |