| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/07/2011 | US7955776 Light sensitive elements comprising substrates having coatings comprising photoinitiators or sensitizers, biuret structural and phosphazene oligomers, having improved photosensitivity, storage stability and wear resistance; photolithography |
| 06/07/2011 | CA2481301C Photocurable compositions containing reactive particles |
| 06/03/2011 | WO2011066450A2 Adhesion layers in nanoimprint lithography |
| 06/03/2011 | WO2011066258A1 Targeted separation of cultured cells |
| 06/03/2011 | WO2011065603A1 Photoresist stripper composition, and method of stripping photoresist using same |
| 06/03/2011 | WO2011065594A1 Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same |
| 06/03/2011 | WO2011065589A2 Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method |
| 06/03/2011 | WO2011065386A1 Exposure unit and method for exposing substrate |
| 06/03/2011 | WO2011065380A1 Pre-alignment apparatus and pre-alignment method |
| 06/03/2011 | WO2011065374A1 Image-forming optical system, exposure apparatus, and device producing method |
| 06/03/2011 | WO2011065215A1 Positive radiation-sensitive composition, cured film, and method for forming same |
| 06/03/2011 | WO2011065207A1 Radiation-sensitive composition and method for forming resist pattern |
| 06/03/2011 | WO2011065004A1 Cyclic compound, process for production thereof, radiation-sensitive composition, and resist pattern formation method |
| 06/03/2011 | WO2011064021A1 Imprint lithography apparatus and method |
| 06/03/2011 | WO2011064020A1 Alignment and imprint lithography |
| 06/03/2011 | WO2010151078A3 Photopolymerizable resin composition |
| 06/02/2011 | US20110129998 Cleaning liquid for lithography and method for forming wiring |
| 06/02/2011 | US20110129991 Methods Of Patterning Materials, And Methods Of Forming Memory Cells |
| 06/02/2011 | US20110129782 Lithographic apparatus and device manufacturing method |
| 06/02/2011 | US20110129781 Methods of forming a pattern using photoresist compositions |
| 06/02/2011 | US20110129780 Method for manufacturing semiconductor device |
| 06/02/2011 | US20110129779 Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same |
| 06/02/2011 | US20110129778 Oxime ester compound and photopolymerization initiator containing the same |
| 06/02/2011 | US20110129777 Chemically amplified resist composition and patterning process |
| 06/02/2011 | US20110129765 Negative resist composition and patterning process |
| 06/02/2011 | US20110129764 Sensitive Liquid Crystalline Polymeric Material Suitable for Reflective Hologram Recording and the Preparing Method Thereof |
| 06/02/2011 | US20110129652 Chemical Trim of Photoresist Lines by Means of A Tuned Overcoat |
| 06/02/2011 | US20110129634 Patterned member and method for manufacturing the patterned member |
| 06/02/2011 | US20110128610 Phenolic configurationally locked polyene bulk single crystals, crystalline thin films and waveguides for electro-optics and thz-wave applications |
| 06/02/2011 | US20110128536 Nanoscale array structures suitable for surface enhanced raman scattering and methods related thereto |
| 06/02/2011 | US20110128522 Method for manufacturing a patterned member and processing apparatus using electromagnetic beam |
| 06/02/2011 | US20110128520 Alignment systems and methods for lithographic systems |
| 06/02/2011 | US20110128514 Optical element and projection exposure apparatus based on use of the optical element |
| 06/02/2011 | US20110128505 Laser beam source device, laser beam source device manufacturing method, projector, and monitoring device |
| 06/02/2011 | US20110127651 Chain scission polyester polymers for photoresists |
| 06/02/2011 | US20110127236 Developing device and developing method |
| 06/01/2011 | EP2328028A1 Lithographic apparatus and method |
| 06/01/2011 | EP2328027A1 Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component |
| 06/01/2011 | EP2328026A2 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 06/01/2011 | EP2326991A1 A hardmask process for forming a reverse tone image |
| 06/01/2011 | EP2326990A2 Spectral purity filter, radiation source, lithographic apparatus, and device manufacturing method |
| 06/01/2011 | EP2326989A1 Vibration damping in projection exposure apparatuses for semiconductor lithography |
| 06/01/2011 | EP2326753A2 Textile colouration with diacetylene compounds |
| 06/01/2011 | EP1716458B1 Illumination system for a microlithographic projection exposure apparatus |
| 06/01/2011 | DE202011003311U1 Isolationskanalbelichter für eine Fräse zum Erzeugen von isolierten Leiterbahnen auf photosensiven Oberflächen von Leiterplatten Isolationskanalbelichter for a milling machine for producing insulated conductors on photosensiven surface of printed circuit boards |
| 06/01/2011 | DE102009047203A1 Position measuring device for light beam of microlithography-project ion exposure system, has evaluation unit for receiving measured values of temperature sensors and for determining size and local position of light beam from measured values |
| 06/01/2011 | DE102008035814B4 Verfahren und System zum Reduzieren der Überlagerungsfehler in der Halbleitermassenproduktion unter Anwendung eines Mischanlagenszenarios A method and system for reducing the overlay error in the semiconductor mass production using a mixing scenarios |
| 06/01/2011 | CN201853068U Exposure curing machine for PS board |
| 06/01/2011 | CN201853067U PS (Photosensitive) material plate |
| 06/01/2011 | CN1991585B Salt suitable for an acid generator and a chemically amplified corrosion resistant composition containing the same |
| 06/01/2011 | CN1969231B Method of forming plated product using negative photoresist composition |
| 06/01/2011 | CN1938162B Hollow cylindrical printing element, its production method and hollow cylindrical core material |
| 06/01/2011 | CN1904702B Liquid crystal display and method of manufacturing the same |
| 06/01/2011 | CN1827659B Polymer for forming anti-reflective coating layer |
| 06/01/2011 | CN1771072B Collector for EUV light source |
| 06/01/2011 | CN1746769B Lithographic apparatus, method for generating a mask pattern and device manufacturing method using same |
| 06/01/2011 | CN1720110B Pollutant removal method optical element, and exposure method and apparatus |
| 06/01/2011 | CN1646989B Composition for reflecting hardmask layer and method for forming characteristic of patterned material |
| 06/01/2011 | CN1582091B Method for forming store grid cofferdam and pattern ,photoelectronic device and electronic machine |
| 06/01/2011 | CN1469193B Objective table apparatus and exposure apparatus |
| 06/01/2011 | CN102084301A Coating composition and pattern-forming method |
| 06/01/2011 | CN102084300A Fine pattern mask, method for producing the same, and method for forming fine pattern using the mask |
| 06/01/2011 | CN102084299A Source module of an EUV lithographic apparatus, lithographic apparatus, and method for manufacturing a device |
| 06/01/2011 | CN102084298A Illumination system comprising a fourier optical system |
| 06/01/2011 | CN102084297A Method for producing a multilayer coating, optical element and optical arrangement |
| 06/01/2011 | CN102084296A Positive photosensitive resin composition, cured film, protective film, insulation film, and semiconductor device and display device using same |
| 06/01/2011 | CN102084295A Molecular resist compositions, methods of patterning substrates using the compositions and process products prepared therefrom |
| 06/01/2011 | CN102084294A Polychromic substances and their use |
| 06/01/2011 | CN102084280A Spatial light modulator with structured mirror surfaces |
| 06/01/2011 | CN102083888A Method for preparing a photo-crosslinkable composition |
| 06/01/2011 | CN102082104A Method for manufacturing semiconductor device |
| 06/01/2011 | CN102082093A Chip for two-way voltage regulator diode DB3 and manufacturing technique thereof |
| 06/01/2011 | CN102081312A Double-sided alignment apparatus and alignment method thereof |
| 06/01/2011 | CN102081311A Method for simulating three-dimensional light intensity distribution of thick photoresist backside oblique incidence photoetching process |
| 06/01/2011 | CN102081310A Lithographic apparatus and lithographic apparatus cleaning method |
| 06/01/2011 | CN102081309A Method for improving alignment scanning success rate |
| 06/01/2011 | CN102081308A Measuring device for wave aberration of projection objective and method thereof |
| 06/01/2011 | CN102081307A Method for controlling exposure dose of photoetching machine |
| 06/01/2011 | CN102081306A Thermosensitive waterless offset plate containing diazophotographic resin and preparation method thereof |
| 06/01/2011 | CN102081305A Blue colored composition for color filter, color filter and color display |
| 06/01/2011 | CN102081304A Negative resist composition and patterning process |
| 06/01/2011 | CN102081303A Photoresist composition |
| 06/01/2011 | CN102081302A Photosensitive resin composition |
| 06/01/2011 | CN102081301A Photosensitive resin composite and preparation method thereof |
| 06/01/2011 | CN102081300A Photoetching method of round-hole pattern |
| 06/01/2011 | CN102081256A Color filter substrate for liquid crystal display devices and liquid crystal display devices |
| 06/01/2011 | CN102081181A Method for preparing color separation grating by using chemical method |
| 06/01/2011 | CN102081180A Method for manufacturing micro step reflecting mirror by extruding substrates with adjustable inclination angles |
| 06/01/2011 | CN102081179A Method for orderly arranging angle substrates to manufacture micro-step reflecting mirror |
| 06/01/2011 | CN102081178A Method for manufacturing micro ladder reflecting mirror by sequentially arranging substrates on wedge block |
| 06/01/2011 | CN102080683A Multi-functional vacuum chuck |
| 06/01/2011 | CN102079961A Ultraviolet curing adhesive |
| 06/01/2011 | CN101650529B Mask for manufacturing TFT and method for manufacturing source and drain of TFT |
| 06/01/2011 | CN101634810B Stepping arrangement type interference microlithography and system thereof |
| 06/01/2011 | CN101614965B Lithographic apparatus and device manufacturing method |
| 06/01/2011 | CN101593717B Preparation method of shallow trench isolation structure |
| 06/01/2011 | CN101520600B Method for preparing transparent nano imprinting template based on X-ray exposure technology |
| 06/01/2011 | CN101511599B Photosensitive resin composition |
| 06/01/2011 | CN101452209B Automatic cap-covering mechanism in photoresist coating unit of square substrate |
| 06/01/2011 | CN101424884B Lithographic apparatus immersion damage control |