Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2014
12/17/2014CN102981365B 共聚物、树脂组合物、显示板用隔片、平坦化膜、热固性保护膜、微型透镜、以及共聚物的制备方法 Copolymer, the resin composition preparation method display a separator plate, a planarizing film, a thermosetting protective film, micro lens, and a copolymer of
12/17/2014CN102977259B 共聚物、树脂组合物、显示板用隔片、平坦化膜、热固性保护膜、微型透镜、以及共聚物的制备方法 Copolymer, the resin composition preparation method display a separator plate, a planarizing film, a thermosetting protective film, micro lens, and a copolymer of
12/17/2014CN102955365B 一种干涉曝光装置及方法 An exposure apparatus and method for interference
12/17/2014CN102955228B 一种机器视觉成像镜头结构 A machine vision imaging lens structure
12/17/2014CN102866587B 工件台 Worktable
12/17/2014CN102830589B 一种负性光刻胶树脂组合物及其制备方法 One kind of negative photoresist resin composition and its preparation method
12/17/2014CN102809903B 二次预对准装置及对准方法 Apparatus and method for aligning the second pre-alignment
12/17/2014CN102782531B 用于极紫外光刻的反射光学元件 Reflective optical elements for the extreme ultraviolet lithography
12/17/2014CN102768470B 掩模台垂向测量装置 Mask table vertical measuring device
12/17/2014CN102746785B 一种双重固化涂料组合物及其固化方法 A dual-curable coating composition and method of curing
12/17/2014CN102736432B 一种对纳米尺度元件进行套刻的方法 A kind of nanoscale elements overlay method
12/17/2014CN102736428B 一种调焦调平装置及方法 An apparatus and method for focusing leveling
12/17/2014CN102692820B 一种测量投影物镜畸变的装置及方法 An apparatus and method for measuring the projection lens distortion
12/17/2014CN102692817B 模板、模板的表面处理方法、模板的表面处理装置和图案形成方法 The surface treatment method template, template, template surface processing apparatus and a pattern forming method
12/17/2014CN102681366B 凹面全息光栅制作中的曝光光路系统及调整回转中心的方法 Concave holographic grating fabrication exposure optical system and method for adjusting the rotation center
12/17/2014CN102653581B 碱可溶性树脂及其制作方法、感光性树脂组合物、光刻胶 Alkali-soluble resin and its production method, a photosensitive resin composition, the photoresist
12/17/2014CN102629079B 照射系统、光刻设备和方法 Illumination system, lithographic apparatus and method
12/17/2014CN102597873B 焦点测试光罩、焦点测量方法、曝光装置、及曝光方法 Focus test mask, the focus measuring method, an exposure apparatus, and exposure method
12/17/2014CN102486995B 动态晶圆对位方法及曝光扫瞄系统 Dynamic wafer alignment method and exposure scanning system
12/17/2014CN102484045B 等离子体光源系统 Plasma source system
12/17/2014CN102455605B 气体歧管、用于光刻设备的模块、光刻设备和器件制造方法 Gas manifold, a module for a lithographic apparatus, a lithographic apparatus and device manufacturing method
12/17/2014CN102402120B 平版印刷版载体和预制感光版 Lithographic printing plate carrier and pre-sensitized version
12/17/2014CN102314081B 涂覆显影装置和涂覆显影方法 Coating the coating developing method and a developing device
12/17/2014CN102245723B 可湿蚀刻的抗反射涂层 Wet etching may be anti-reflective coating
12/17/2014CN102245385B 一种可成像制品 One kind of product can be imaged
12/17/2014CN102221780B 用于eb或euv平版印刷的化学放大负性抗蚀剂组合物和图案化方法 Chemical or euv for lithographic printing eb amplified negative resist composition and patterning method
12/17/2014CN102096319B 光刻胶组合物和使用其制造显示基板的方法 Photoresist composition and method of use thereof for manufacturing a display substrate
12/17/2014CN102070744B 抗蚀剂墨液用粘结剂树脂和使用其的抗蚀剂墨液 The resist ink binder resin and using the same resist ink
12/17/2014CN101963756B 形成电子器件的方法 The method of forming an electronic device
12/17/2014CN101943856B 用于光刻的包含杂取代的碳环芳基组分的组合物和方法 Compositions and methods comprising substituted hetero photolithography carbocyclic aryl component for
12/16/2014US8913316 Catadioptric projection objective with intermediate images
12/16/2014US8913245 System and method for interferometric autofocusing
12/16/2014US8913237 Device-like scatterometry overlay targets
12/16/2014US8913230 Chucking system with recessed support feature
12/16/2014US8913229 Multi-stage system, a control method therefor, and a lithographic apparatus
12/16/2014US8913228 Lithographic apparatus and device manufacturing method
12/16/2014US8913227 Illumination optical system, aligner, and process for fabricating device
12/16/2014US8913226 Cyclic error compensation in interferometric encoder systems
12/16/2014US8913225 Lithographic apparatus and device manufacturing method
12/16/2014US8913224 Exposure apparatus, exposure method, and device producing method
12/16/2014US8913223 Lithographic apparatus and device manufacturing method
12/16/2014US8913120 Method for emulation of a photolithographic process and mask inspection microscope for performing the method
12/16/2014US8912633 In-situ photoresist strip during plasma etching of active hard mask
12/16/2014US8912489 Defect removal process
12/16/2014US8912103 Method of fabricating and correcting nanoimprint lithography templates
12/16/2014US8911932 Photo-imageable hardmask with positive tone for microphotolithography
12/16/2014US8911931 Spiral design graphene nanoribbon
12/16/2014US8911930 Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern
12/16/2014US8911929 Developer and patterning process
12/16/2014US8911928 Resist composition, method of forming resist pattern, polymeric compound and method of producing the same
12/16/2014US8911927 Compositions and processes for immersion lithography
12/16/2014US8911926 Photoresist composition and method of forming a metal pattern using the same
12/16/2014US8911921 Oxime ester photoinitiators
12/16/2014US8911920 Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masks
12/16/2014US8911883 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
12/16/2014US8911852 Fully crosslinked chemically structured monolayers
12/16/2014US8911647 Photosensitive resin composition for color filter and color filter using the same
12/16/2014US8911587 Photoresist double patterning apparatus
12/16/2014US8911193 Substrate processing sequence in a cartesian robot cluster tool
12/11/2014US20140363915 Negative photosensitive resin composition and application thereof
12/11/2014US20140363773 Pattern-forming method
12/11/2014US20140363772 Resist composition and method for forming resist pattern
12/11/2014US20140363771 Display panel and manufacturing method thereof and image display system
12/11/2014US20140363770 Negative tone resist composition for solvent developing and method of forming resist pattern
12/11/2014US20140363769 Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base
12/11/2014US20140363768 Naphthalene derivative, resist bottom layer material, and patterning process
12/11/2014US20140363767 Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured film
12/11/2014US20140363766 Resist pattern-forming method, and radiation-sensitive resin composition
12/11/2014US20140363758 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device
12/11/2014US20140362366 Method and system for gas flow mitigation of molecular contamination of optics
12/11/2014US20140362363 Methods for monitoring source symmetry of photolithography systems
12/11/2014US20140362362 Method for adjusting an optical system of a microlithographic projection exposure apparatus
12/11/2014US20140362361 Illumination optical unit for euv projection lithography
12/11/2014US20140362360 Illumination optical unit for a projection exposure apparatus
12/11/2014US20140362359 Flexible wafer leveling design for various orientation of line/trench
12/11/2014US20140362358 Vacuum system for immersion photolithography
12/11/2014US20140362357 Exposure apparatus and method of manufacturing article
12/11/2014US20140362356 Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
12/11/2014US20140362355 Lithographic apparatus and surface cleaning method
12/11/2014US20140362354 Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium
12/11/2014US20140362353 Temperature adjusting apparatus of mask substrate, mask drawing apparatus, and mask drawing method
12/11/2014US20140361415 Photoresists and methods for use thereof
12/11/2014US20140360763 Conductive paste and method for producing conductive pattern
12/11/2014US20140360396 Lithographic printing plate precursors and processes for preparing lithographic printing plates
12/11/2014US20140360395 Color-forming composition, color-forming curable composition, lithographic printing plate precursor and plate making method, and color-forming compound
12/11/2014US20140359990 Method and Device for Replacing Objective Parts
12/10/2014CN204009829U 面板结构 Panel structure
12/10/2014CN204009818U 一种触摸屏银浆菲林结构 A touch screen silver film structure
12/10/2014CN204009358U 一种棕片显影机 One kind of brown film developing machine
12/10/2014CN204009357U 一种用于光电显示屏显影加工阶段的循环用液系统 Fluid circulation system for a photoelectric display development processing stage
12/10/2014CN204009356U 一种显影线的过滤装置 A developing line filter means
12/10/2014CN204009355U 光阻供给系统 Photoresist supply system
12/10/2014CN204009354U 一种气动遮光门保持结构 Shading of Pneumatic door holding structure
12/10/2014CN204009353U 偏极化曝光装置 Polarization exposure device
12/10/2014CN204009352U 液体供给装置和光刻胶涂布设备 Liquid supply means and the photoresist coating apparatus
12/10/2014CN204009351U 简易玻璃菲林 Simple glass film
12/10/2014CN204009350U 一种电渗驱动纳米压印装置 An electrically driven infiltration nanoimprinter
12/10/2014CN204007749U 一种流量测量工具 A flow rate measuring tool
12/10/2014CN204005057U 一种简易型ccd调整座结构 Simple ccd one kind of structural adjustment of the seat
12/10/2014CN104205291A 曝光描绘装置及曝光描绘方法 Exposure drawing device and exposure drawing method
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