| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/09/2011 | WO2011068014A1 Exposure apparatus |
| 06/09/2011 | WO2011067998A1 Photosensitive resin composition, laminate utilizing same, and solid-state imaging device |
| 06/09/2011 | WO2011040642A3 Exposure apparatus, exposure method, and device manufacturing method |
| 06/09/2011 | WO2011026610A3 Pattern generation system |
| 06/09/2011 | WO2011016655A3 Super-hydrophobic photosensitive resin composition and black matrix thereof |
| 06/09/2011 | WO2011014011A3 Photoresist composition comprising a crosslinkable curing substance |
| 06/09/2011 | WO2011008042A3 A polyimide and a light-sensitive resin composition comprising the same |
| 06/09/2011 | US20110136952 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device including the cured film |
| 06/09/2011 | US20110136932 Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof |
| 06/09/2011 | US20110136717 Formulations And Method For Post-CMP Cleaning |
| 06/09/2011 | US20110136346 Substantially Non-Oxidizing Plasma Treatment Devices and Processes |
| 06/09/2011 | US20110136064 Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacutring method |
| 06/09/2011 | US20110136063 Method to fabricate a redirecting mirror in optical waveguide devices |
| 06/09/2011 | US20110136062 Positive photosensitive composition and pattern forming method using the same |
| 06/09/2011 | US20110136061 Crosslinked polyimide, composition comprising the same and process for producing the same |
| 06/09/2011 | US20110136048 Photomask and pattern formation method using the same |
| 06/09/2011 | US20110135959 Pmr writer and method of fabrication |
| 06/09/2011 | US20110135891 Film type photodegradable transfer material |
| 06/09/2011 | US20110134496 Security Element and Method for Producing a Security Element |
| 06/09/2011 | US20110134403 Microlithographic projection exposure apparatus |
| 06/09/2011 | US20110133192 Method of forming conductive pattern and organic thin film transistor |
| 06/09/2011 | US20110132754 Perpendicular magnetic recording medium, method of manufacturing the same, and magnetic read/write apparatus |
| 06/09/2011 | US20110132752 Perpendicular magnetic recording medium, method of manufacturing the same, and magnetic read/write apparatus |
| 06/09/2011 | US20110132639 Printed wiring board and method for producing the same |
| 06/09/2011 | DE102010052497A1 Kühlsysteme und Verfahren für EUV-Lithographiekollektoren mit streifendem Einfall Cooling systems and methods for EUV lithography collectors grazing incidence |
| 06/09/2011 | DE102009032210B4 Bearbeitungsanlage Processing plant |
| 06/09/2011 | DE102006029225B4 Randwallentfernung bei der Immersionslithographie Edge bead removal in immersion lithography |
| 06/09/2011 | CA2780810A1 Block copolymer-assisted nanolithography |
| 06/08/2011 | EP2330464A1 Process for producing lithographic printing plate |
| 06/08/2011 | EP2330463A1 Negative resist composition and patterning process |
| 06/08/2011 | EP2329425A1 Multi-coloured codes |
| 06/08/2011 | EP2329323A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
| 06/08/2011 | EP2329322A2 Lithographic apparatus, programmable patterning device and lithographic method |
| 06/08/2011 | EP2329321A1 Projection exposure apparatus with optimized adjustment possibility |
| 06/08/2011 | EP2329320A1 Positive resist composition for immersion exposure and pattern forming method |
| 06/08/2011 | EP2329319A1 Improved nanoimprint method |
| 06/08/2011 | EP2328864A1 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition |
| 06/08/2011 | EP1652008B1 Method for monitoring an immersion lithography system |
| 06/08/2011 | EP1642715B1 Method and device for manufacturing relief printing plate terminal for seamless printing |
| 06/08/2011 | EP1567915B1 Pattern forming materials and pattern formation method using the materials |
| 06/08/2011 | CN1987661B Flat surface stage apparatus |
| 06/08/2011 | CN1890779B Exposure apparatus, exposure method, device producing method |
| 06/08/2011 | CN1881080B Photosensitive resin composition, partition of display panel and display panel |
| 06/08/2011 | CN1816777B Method providing an improved bi-layer photoresist pattern |
| 06/08/2011 | CN102089860A Reflective mask blank for EUV lithography and reflective mask for EUV lithography |
| 06/08/2011 | CN102089715A Method of resist treatment |
| 06/08/2011 | CN102089714A Method and apparatus for thermal processing of photosensitive printing elements |
| 06/08/2011 | CN102089713A Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element |
| 06/08/2011 | CN102089712A On-press developable imageable elements |
| 06/08/2011 | CN102089711A Positive photosensitive resin composition and polyhydroxyamide resin |
| 06/08/2011 | CN102089710A Positive-type resist composition, and method for production of microlens |
| 06/08/2011 | CN102089709A Radiation-sensitive resin composition |
| 06/08/2011 | CN102089708A Adaptive nanotopography sculpting |
| 06/08/2011 | CN102088823A Printed wiring board and method for producing the same |
| 06/08/2011 | CN102087487A Novel method for cleaning silicon wafer by normal pressure plasma free radical beam |
| 06/08/2011 | CN102087486A Heating apparatus, coating, developing device and heating method |
| 06/08/2011 | CN102087485A Silicon wafer stage micro-rotation mechanism of projection lithographic machine |
| 06/08/2011 | CN102087484A Method and system for photoengraving graphical sapphire substrate |
| 06/08/2011 | CN102087483A Optical system for focal plane detection in projection lithography |
| 06/08/2011 | CN102087482A Synchronized motion error correction and control system of photoetching machine worktable |
| 06/08/2011 | CN102087481A Method for adjusting real-time monitor device in exposure path of concave holographic grating |
| 06/08/2011 | CN102087480A Method for adjusting real-time monitoring device in exposure light path of planar holographic grating |
| 06/08/2011 | CN102087479A Optical alignment methods for forming LEDs having a rough surface |
| 06/08/2011 | CN102087478A 掩模版扫描装置 Reticle scanning device |
| 06/08/2011 | CN102087477A Wafer exposure method |
| 06/08/2011 | CN102087476A Shutter device for exposure subsystem of photoetching machine |
| 06/08/2011 | CN102087475A Measuring device and measuring method for position of reticle stage of scanning lithography |
| 06/08/2011 | CN102087474A Method and device for conveying photomask |
| 06/08/2011 | CN102087473A Radiation sensitive resin composition, interlayer dielectric, and method for producing thereof |
| 06/08/2011 | CN102087472A Method for fabricating cliche and method for forming thin film pattern by using the same |
| 06/08/2011 | CN102087471A Method for improving photoetching critical dimension in groove process |
| 06/08/2011 | CN102087468A Photomask |
| 06/08/2011 | CN102086937A Lithographic apparatus and sealing device for the same |
| 06/08/2011 | CN102086171A Oxime ester compound and photopolymerization initiator containing the same |
| 06/08/2011 | CN101666940B Adjustable guided-mold resonance optical filter based on oriented polymer dispersed liquid crystal material |
| 06/08/2011 | CN101578542B Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror |
| 06/08/2011 | CN101559669B Manufacturing method and device of thin film pattern layer |
| 06/08/2011 | CN101536095B Optical storage medium comprising tracks with positive and negative marks, and stampers and production methods for manufacturing of the optical storage medium |
| 06/08/2011 | CN101430385B Improved spring leaf production technology |
| 06/08/2011 | CN101393392B Vacuum molding device for nanometer stamping |
| 06/08/2011 | CN101291763B Method for producing metal particle dispersion, metal particle dispersion, and colored composition, photosensitive transfer material, substrate with light-blocking image, color filter and liquid crystal display |
| 06/08/2011 | CN101226328B Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition |
| 06/08/2011 | CN101205082B Process for producing titanium-containing metal oxide, hologram recording material, process for producing the same, and hologram recording medium |
| 06/08/2011 | CN101086623B Method for rendering optical approximate revision more accurate based on model |
| 06/08/2011 | CN101072813B Siloxane resin coating |
| 06/08/2011 | CN101005024B Method of treatment of porous dielectric films to reduce damage during cleaning |
| 06/08/2011 | CN101000468B Colorful resist remover composition for thin film transistor LCD |
| 06/07/2011 | US7958463 Computer automated method for manufacturing an integrated circuit pattern layout |
| 06/07/2011 | US7957449 Two-stage laser system for aligners |
| 06/07/2011 | US7957055 Pattern generator |
| 06/07/2011 | US7956984 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 06/07/2011 | US7955938 Wiring technique |
| 06/07/2011 | US7955787 Plasma display panel manufacturing method |
| 06/07/2011 | US7955784 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same |
| 06/07/2011 | US7955783 Lamination for printed photomask |
| 06/07/2011 | US7955782 Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same |
| 06/07/2011 | US7955781 Negative-working photosensitive material and negative-working planographic printing plate precursor |
| 06/07/2011 | US7955780 Positive resist composition and pattern forming method using the same |
| 06/07/2011 | US7955779 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| 06/07/2011 | US7955777 Compound, acid generator, resist composition and method of forming resist pattern |