| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/15/2011 | CN102096346A Silicon wafer photoresist-removing method and device and method for removing photoresist on silicon wafer by using developing bench |
| 06/15/2011 | CN102096345A Thick-film photoresist cleaning solution and cleaning method thereof |
| 06/15/2011 | CN102096344A Developing solution as well as preparation method and application thereof |
| 06/15/2011 | CN102096343A Developing cavity and developing machine base |
| 06/15/2011 | CN102096342A Developing unit |
| 06/15/2011 | CN102096341A Assembly, a conditioning system, a lithographic apparatus and methods |
| 06/15/2011 | CN102096340A Lithographic apparatus, projection assembly and active damping |
| 06/15/2011 | CN102096339A Dual stage lithographic device and method of manufacturing the device |
| 06/15/2011 | CN102096338A Mask table system |
| 06/15/2011 | CN102096337A Device for detecting eccentricity and focal surface position of spherical surface or curved surface in projection photoetching |
| 06/15/2011 | CN102096336A Method for determining illumination intensity distribution of light source of photoetching process |
| 06/15/2011 | CN102096335A Double-exposure method |
| 06/15/2011 | CN102096334A Super-diffraction imaging device for improving resolution based on phase shifting principle and manufacturing method thereof |
| 06/15/2011 | CN102096333A Variable rectangular window adjusting mechanism |
| 06/15/2011 | CN102096332A Measurement system, lithographic apparatus and measurement method |
| 06/15/2011 | CN102096331A Polarization designs for lithographic apparatus |
| 06/15/2011 | CN102096330A Lithographic apparatus and a device manufacturing method |
| 06/15/2011 | CN102096329A Lithographic apparatus and surface cleaning method |
| 06/15/2011 | CN102096328A Exposure procedure of liquid crystal panels and mask |
| 06/15/2011 | CN102096327A Exposure device, exposure method and producing method of display panel substrate |
| 06/15/2011 | CN102096326A Double exposure method and etching method |
| 06/15/2011 | CN102096325A Light intensity attenuation device and method |
| 06/15/2011 | CN102096324A Glue-spraying device and method |
| 06/15/2011 | CN102096323A Positive light-sensitive waterless offset printing plate containing heavy-nitrogen resin and manufacturing method thereof |
| 06/15/2011 | CN102096322A Lithographic pellicle |
| 06/15/2011 | CN102096321A Negative resist composition and patterning process |
| 06/15/2011 | CN102096320A Coloring photonasty composition, color filter and producing method thereof, and liquid crystal display device |
| 06/15/2011 | CN102096319A Photoresist composition and method of manufacturing a display substrate using the same |
| 06/15/2011 | CN102096318A Method for preparing multi-level structural microarray by laser direct-writing technology |
| 06/15/2011 | CN102096317A Method for preparing periodic nanostructure with high aspect ratio |
| 06/15/2011 | CN102096316A Method for improving super-diffraction lithographic resolution and lithographic quality by utilizing island-type structure mask |
| 06/15/2011 | CN102096315A Device and method for nanoimprinting of full wafer |
| 06/15/2011 | CN102096314A Methods of fabricating an imprint mold and of forming a pattern using the imprint mold |
| 06/15/2011 | CN102096313A Yaw circuit system in wind power generating system |
| 06/15/2011 | CN102096312A Photoetching method |
| 06/15/2011 | CN102096310A Method for correcting photoresist pattern and etching method |
| 06/15/2011 | CN102096298A Exposure lighting set and exposure machine |
| 06/15/2011 | CN102096190A Metallic photo-thermal drive microswitch and manufacturing method thereof |
| 06/15/2011 | CN102096134A Quantum dot implant reflection type active grating and manufacturing method thereof |
| 06/15/2011 | CN102094221A Method for preparing SMT (surface mount technology) nickel-phosphorus alloy plate by dry-film wet process |
| 06/15/2011 | CN102093752A Pigment dispersion composition, coloring photosensitive composition, color filter and manufacture method thereof, liquid crystal display device and solid state camera element |
| 06/15/2011 | CN102093751A Pigment particle dispersion body, photo-curing composition and color filter using dispersion |
| 06/15/2011 | CN102093514A Resin composition and display device |
| 06/15/2011 | CN102093282A 肟酯光敏引发剂 Oxime ester photoinitiator |
| 06/15/2011 | CN101706592B Method for manufacturing Moire grating by directly copying metal mother set |
| 06/15/2011 | CN101661225B Phase-type zone plate photon sieve |
| 06/15/2011 | CN101566804B Developing agent for flat-panel display |
| 06/15/2011 | CN101506252B Thiourethane compound and photosensitive resin composition |
| 06/15/2011 | CN101504513B Air-supporting slide rail system |
| 06/15/2011 | CN101467103B Image recording device |
| 06/15/2011 | CN101435994B Even glue chromium plate optical filter turnover engraving process |
| 06/15/2011 | CN101419403B Diazo sheet for processing printed circuit board and method for producing the same |
| 06/15/2011 | CN101393294B Interference filter and method for its production |
| 06/15/2011 | CN101359168B Methof for producing graytone mask and graytone mask |
| 06/15/2011 | CN101354476B Low thermal effect projection objective |
| 06/15/2011 | CN101335187B Substrate treating apparatus |
| 06/15/2011 | CN101320205B Method for producing outer casing of electronic product |
| 06/15/2011 | CN101303530B Preparation exhaust device for slit coating machine |
| 06/15/2011 | CN101295553B X ray holography diffraction grating beam divider |
| 06/15/2011 | CN101221357B Device for fabricating thin film pattern and method for fabricating thin film with the same |
| 06/15/2011 | CN101218263B Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| 06/15/2011 | CN101206409B Balance mass orientation system for workpiece platform |
| 06/15/2011 | CN101206399B Photosensitive resin composition for column spacers for liquid crystal display device, column spacers formed using the composition and display device comprising the column spacers |
| 06/15/2011 | CN101206361B Liquid crystal display device and method of fabricating the same |
| 06/15/2011 | CN101196681B Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
| 06/15/2011 | CN101183221B Multiple exposing device |
| 06/15/2011 | CN101169593B Metal lithographic mask box |
| 06/15/2011 | CN101126902B Photosensitive resin composition |
| 06/15/2011 | CN101126895B Process for forming corrosion-resisting pattern, semiconductor device and manufacturing method for the same |
| 06/15/2011 | CN101107569B Composition for forming of underlayer film for lithography that contains compound having protected carboxyl group |
| 06/15/2011 | CN101097406B Tracing system, tracing data correcting device and method, and manufacturing method of base plate |
| 06/15/2011 | CN101063810B Dual-purpose copy arrangement for ultraviolet lighting micro-nano graph air pressure stamping and photolithography |
| 06/15/2011 | CN101048702B Edge cure prevention composition and process for using the same |
| 06/15/2011 | CN101008785B Apparatus for coating photoresist material |
| 06/14/2011 | US7962238 Process for the production of a three-dimensional object with resolution improvement by pixel-shift |
| 06/14/2011 | US7961932 Method and apparatus for manufacturing diamond shaped chips |
| 06/14/2011 | US7961298 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system |
| 06/14/2011 | US7961294 Imaging device in a projection exposure facility |
| 06/14/2011 | US7961293 Lithographic apparatus and device manufacturing method |
| 06/14/2011 | US7960829 Support structure for use in thinning semiconductor substrates and for supporting thinned semiconductor substrates |
| 06/14/2011 | US7960097 Methods of minimizing etch undercut and providing clean metal liftoff |
| 06/14/2011 | US7960096 Sublithographic patterning method incorporating a self-aligned single mask process |
| 06/14/2011 | US7960095 Combination of base additives including a room temperature solid base, and a liquid low vapor pressure base; for chromium-containing layers used in mask-making |
| 06/14/2011 | US7960094 Laser induced thermal imaging apparatus and laser induced thermal imaging method |
| 06/14/2011 | US7960091 Resist composition and method of forming resist pattern |
| 06/14/2011 | US7960090 Pattern forming method, pattern formed thereby, mold, processing apparatus, and processing method |
| 06/14/2011 | US7960089 Compound, method for producing same, positive resist composition and method for forming resist pattern |
| 06/14/2011 | US7960088 MiXTURE OF THERMOPLASTIC ELASTOMER, A BUTADIENE POLYMER, PHOTOPOLYMERIZABLE UNSATURATED MONOMER AND PHOTOINITIATOR |
| 06/14/2011 | US7960087 Positive photosensitive composition and pattern-forming method using the same |
| 06/14/2011 | US7960078 Exposure condition setting method, substrate processing device, and computer program |
| 06/14/2011 | US7960076 Reflective-type mask |
| 06/14/2011 | US7960075 Photomask unit, exposing method and method for manufacturing semiconductor device |
| 06/14/2011 | US7959975 Methods of patterning a substrate |
| 06/14/2011 | US7959816 Wet-processing apparatus and method of fabricating display panel |
| 06/09/2011 | WO2011068960A2 Block copolymer-assisted nanolithography |
| 06/09/2011 | WO2011068951A1 Magnetic reversibly attached template (mrat) and uses therefor |
| 06/09/2011 | WO2011068884A2 A system for producing patterned silicon carbide structures |
| 06/09/2011 | WO2011068254A1 Exposure apparatus and device fabricating method |
| 06/09/2011 | WO2011068249A2 Exposure apparatus, liquid immersion member, and device manufacturing method |
| 06/09/2011 | WO2011068223A1 Optical member for euv lithography, and process for production of reflective-layer-attached substrate for euv lithography |