| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/21/2011 | US7964331 Positive resist composition and method of forming resist pattern |
| 06/21/2011 | US7964326 Exposure mask for divided exposure |
| 06/21/2011 | US7964248 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article |
| 06/21/2011 | US7964047 Manufacturing method of three-dimensional structure and manufacturing device therefor |
| 06/16/2011 | WO2011072307A2 Compositions comprising base-reactive component and processes for photolithography |
| 06/16/2011 | WO2011072202A1 Imprint lithography template |
| 06/16/2011 | WO2011072199A2 Water-soluble degradable photo-crosslinker |
| 06/16/2011 | WO2011071753A2 Generation of combinatorial patterns by deliberate tilting of a polymer-pen array |
| 06/16/2011 | WO2011071380A1 Method for manufacturing a multilayer structure with a lateral pattern for application in the xuv wavelength range, and bf and lmag structures manufactured according to this method |
| 06/16/2011 | WO2011071133A1 Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device |
| 06/16/2011 | WO2011071126A1 Multilayer mirror for euv lithography and process for producing same |
| 06/16/2011 | WO2011071123A1 Reflective-layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for producing reflective-layer-equipped substrate |
| 06/16/2011 | WO2011071107A1 Photosensitive adhesive composition having adhesiveness even after photocuring reaction and after pattern formation |
| 06/16/2011 | WO2011071086A1 Optical member for use in euv lithography |
| 06/16/2011 | WO2011070947A1 Radiation-sensitive resin composition, polymer, monomer and method for producing radiation-sensitive resin composition |
| 06/16/2011 | WO2011070853A1 Spatial light modulator, illumination optical system, exposure apparatus, and method for manufacturing device |
| 06/16/2011 | WO2011070718A1 Low-molecular-weight positive-type radiation-sensitive composition, and resist pattern formation method |
| 06/16/2011 | WO2011069947A1 Photoinitiators for uv-led curable compositions and inks |
| 06/16/2011 | WO2011069943A1 Uv-led curable compositions and inks |
| 06/16/2011 | WO2011069881A1 Euv light source for an illumination system of a microlithographic projection exposure apparatus |
| 06/16/2011 | WO2011014020A3 Photoresist composition for forming a self-aligned double pattern |
| 06/16/2011 | WO2011006710A3 Honeycomb condenser, particularly for a microlithographic projection exposure system |
| 06/16/2011 | US20110144295 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer |
| 06/16/2011 | US20110143289 Substrate processing method, computer-readable storage medium and substrate processing system |
| 06/16/2011 | US20110143288 Radiation source, lithographic apparatus and device manufacturing method |
| 06/16/2011 | US20110143287 Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method |
| 06/16/2011 | US20110143286 Laser apparatus, light therapy apparatus, exposure apparatus, device manufacturing method, and object inspection apparatus |
| 06/16/2011 | US20110143285 Method of fabricating liquid crystal display device |
| 06/16/2011 | US20110143284 Method and apparatus for preparing lithographic printing plate precursors |
| 06/16/2011 | US20110143283 Method for improving sensitivity of resist |
| 06/16/2011 | US20110143282 Photosensitive composition, partition walls, color filter and organic el device |
| 06/16/2011 | US20110143281 Coating compositions for photoresists |
| 06/16/2011 | US20110143280 Positive resist composition for immersion exposure and pattern forming method |
| 06/16/2011 | US20110143279 Radiation-sensitive resin composition |
| 06/16/2011 | US20110143272 Image forming apparatus and image stabilization control method used in image forming apparatis |
| 06/16/2011 | US20110143271 Pattern generating method and process determining method |
| 06/16/2011 | US20110143269 Radiation source, lithographic apparatus, and device manufacturing method |
| 06/16/2011 | US20110143268 Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning |
| 06/16/2011 | US20110143266 Negative resist composition and patterning process |
| 06/16/2011 | US20110143103 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition |
| 06/16/2011 | US20110143099 Photoacid Generators for Extreme Ultraviolet Lithography |
| 06/16/2011 | US20110143092 Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts |
| 06/16/2011 | US20110141717 Display apparatus |
| 06/16/2011 | US20110141407 Retardation substrate, method of manufacturing the same, and liquid crystal display |
| 06/16/2011 | US20110140302 Capillary Imprinting Technique |
| 06/16/2011 | US20110140181 Removal of Masking Material |
| 06/16/2011 | US20110139616 Photoformed Silicone Sensor Membrane |
| 06/16/2011 | DE102009054653A1 Spiegel für den EUV-Wellenlängenbereich, Substrat für einen solchen Spiegel, Verwendung einer Quarzschicht für ein solches Substrat, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel oder einem solchen Substrat und Projetktionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, the substrate for such a mirror, using a quartz layer of such a substrate, projection lens for microlithography with such a mirror or such a substrate and Projetktionsbelichtungsanlage for microlithography with such a projection lens |
| 06/16/2011 | DE102009054540A1 Beleuchtungsoptik für die EUV-Mikrolithographie Illumination optics for EUV microlithography |
| 06/16/2011 | DE102009047712A1 EUV-Lichtquelle für eine Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage EUV light source for an illumination device of a microlithography projection exposure apparatus |
| 06/16/2011 | DE102009005972B4 Verfahren zum Erzeugen eines periodischen Musters A method for generating a periodic pattern |
| 06/16/2011 | DE102005003183B4 Verfahren zur Herstellung von Halbleiterstrukturen auf einem Wafer A process for producing semiconductor structures on a wafer |
| 06/16/2011 | CA2780036A1 Photoinitiators for uv-led curable compositions and inks |
| 06/16/2011 | CA2779560A1 Uv-led curable compositions and inks |
| 06/15/2011 | EP2333611A1 Illumination optical unit for EUV microlithography |
| 06/15/2011 | EP2333610A1 Negative resist composition and patterning process |
| 06/15/2011 | EP2333609A2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part |
| 06/15/2011 | EP2333608A1 Colored curable composition, color filter and method for production thereof, and solid imaging element |
| 06/15/2011 | EP2333589A1 Manufacturing method for pattern-forming body and electromagnetic beam processing apparatus |
| 06/15/2011 | EP2333015A2 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition |
| 06/15/2011 | EP2332960A2 Cholate photoacid generators and photoresists comprising same |
| 06/15/2011 | EP2332645A1 Apparatus for chemical and biochemical reactions using photo-generated reagents |
| 06/15/2011 | EP2332012A1 Energy activated compositions |
| 06/15/2011 | EP2331599A1 Photocurable composition |
| 06/15/2011 | EP2331328A1 Negative-working imageable element and method of use |
| 06/15/2011 | EP2217450B1 Processing of lithographic printing plates with hydrophilic polymer in finisher solution |
| 06/15/2011 | EP2188674B1 Lithographic apparatus with rotation filter device |
| 06/15/2011 | EP1646075B1 Exposure apparatus and device manufacturing method |
| 06/15/2011 | EP1642171B1 Method of designing an exposure mask, exposure method, pattern forming method and device manufacturing method |
| 06/15/2011 | CN201867585U 光刻胶涂覆设备 Photoresist coating equipment |
| 06/15/2011 | CN1991479B Liquid crystal display device and method for fabricating the same |
| 06/15/2011 | CN1975580B System and method to increase surface tension and contact angle in immersion lithography |
| 06/15/2011 | CN1975574B Radiation sensitive resin composition |
| 06/15/2011 | CN1970172B Condenser type ultrasonic transducing device and its making method |
| 06/15/2011 | CN1924710B Optical resist clearing agent composition for wiping improved optical resist of semiconductor device |
| 06/15/2011 | CN1853138B Photoresist composition |
| 06/15/2011 | CN1831648B 正型感光性树脂组合物 The positive-type photosensitive resin composition |
| 06/15/2011 | CN1828416B Photosensitive resin composition |
| 06/15/2011 | CN1800977B Chemically amplified positive resist composition |
| 06/15/2011 | CN1721569B Coat base with curved surface and method for manufacturing such coat base |
| 06/15/2011 | CN1621944B Projection light etching image-forming system |
| 06/15/2011 | CN1621555B Mask and container and manufacturing apparatus |
| 06/15/2011 | CN102099749A Positive-type radiation-sensitive composition, and resist pattern formation method |
| 06/15/2011 | CN102099748A A method and apparatus for preparing lithographic printing plate precursors |
| 06/15/2011 | CN102099747A Radiation source, lithographic apparatus, and device manufacturing method |
| 06/15/2011 | CN102099746A Extreme uv radiation generating device comprising a contamination captor |
| 06/15/2011 | CN102099745A Optical element mount for lithographic apparatus |
| 06/15/2011 | CN102099744A Alignment of collector device in lithographic apparatus |
| 06/15/2011 | CN102099743A Illumination system of a microlithographic projection exposure apparatus |
| 06/15/2011 | CN102099742A Imaging optics |
| 06/15/2011 | CN102099741A Photosensitive resin composition containing polyimide resin and novolak resin |
| 06/15/2011 | CN102099740A Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film |
| 06/15/2011 | CN102099734A Method for patterning a surface using selective adhesion |
| 06/15/2011 | CN102098444A Multi-step exposure method using electronic shutter and photography apparatus using the same |
| 06/15/2011 | CN102097535A Method for preparing moth-eye structure for antireflection on surface of solar battery |
| 06/15/2011 | CN102097362A Method for forming mask layer and etching method |
| 06/15/2011 | CN102097303A Photolithographic process for thick metal |
| 06/15/2011 | CN102097296A Preparation method of semiconductor nano circular ring |
| 06/15/2011 | CN102096349A System for automatic dual-grating alignment in proximity nanometer lithography |
| 06/15/2011 | CN102096348A Digital Moire fringe method for improving quality of Moire fringe images in imprinting alignment process |