| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/23/2011 | US20110151383 Method of manufacturing optical element, and optical element |
| 06/23/2011 | US20110151382 Method and apparatus for manufacturing semiconductor device |
| 06/23/2011 | US20110151381 Fluorinated monomer, fluorinated polymer, resist composition, and patterning process |
| 06/23/2011 | US20110151379 Black matrix composition with high light-shielding and improved adhesion properties |
| 06/23/2011 | US20110151378 Radiation-sensitive resin composition for liquid immersion lithography, polymer, and resist pattern-forming method |
| 06/23/2011 | US20110151377 Compositions Including Magnetic Materials |
| 06/23/2011 | US20110151376 Antireflective Coating Composition and Process Thereof |
| 06/23/2011 | US20110151361 Optical-image-intensity calculating method, pattern generating method, and manufacturing method of semiconductor device |
| 06/23/2011 | US20110151359 Integrated circuit layout design |
| 06/23/2011 | US20110151357 Exposure dose monitoring method and method of manufacturing exposure dose monitoring mask |
| 06/23/2011 | US20110151215 Transparent Conductive Laminate, Method For Manufacturing The Same And Capacitance Type Touch Panel |
| 06/23/2011 | US20110151195 Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer and semiconductor device using the photosensitive adhesive composition |
| 06/23/2011 | US20110151190 Shadow edge lithography for nanoscale patterning and manufacturing |
| 06/23/2011 | US20110149378 Electrophoretic display device and method for manufacturing the same |
| 06/23/2011 | US20110148092 Laser Imaging and Its Use In Security Applications |
| 06/23/2011 | US20110147984 Methods of directed self-assembly, and layered structures formed therefrom |
| 06/23/2011 | US20110147337 Use of block copolymers for preparing conductive nanostructures |
| 06/23/2011 | US20110147054 Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate |
| 06/23/2011 | US20110146724 Photoresist stripping solutions |
| 06/22/2011 | EP2336838A1 Method and control device for aligning a stage in an electro chemical pattern reproduction process |
| 06/22/2011 | EP2336830A1 Lithography system |
| 06/22/2011 | EP2336829A1 Photoresists and methods for use thereof |
| 06/22/2011 | EP2336828A2 Photoresists and methods for use thereof |
| 06/22/2011 | EP2336827A1 Photoresists and methods for use thereof |
| 06/22/2011 | EP2336826A2 Sulfonyl photoacid generators and photoresists comprising same |
| 06/22/2011 | EP2336825A1 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 06/22/2011 | EP2336824A1 Methods of forming electronic devices |
| 06/22/2011 | EP2336256A1 Composition for forming silicon-containing resist underlayer film with onium group |
| 06/22/2011 | EP2336216A1 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same |
| 06/22/2011 | EP2335271A1 Methods of forming patterns utilizing lithography and spacers |
| 06/22/2011 | EP2335118A1 Protection module for euv lithography apparatus, and euv lithography apparatus |
| 06/22/2011 | EP2334774A1 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition |
| 06/22/2011 | EP2334496A2 Improvements in or relating to printing |
| 06/22/2011 | EP2252857B1 Method and arrangement for displacement |
| 06/22/2011 | EP2001602B1 Lithography imprinting system |
| 06/22/2011 | EP1816502B1 Projection optical system, exposure equipment and exposure method |
| 06/22/2011 | EP1652005B1 Method and appliance for cleaning a surface of an optical device |
| 06/22/2011 | EP1614002B1 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 06/22/2011 | EP1557869B1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 06/22/2011 | DE102009054888A1 Optisches Element mit einer Mehrzahl von refletiven Facettenelementen An optical element having a plurality of facet elements refletiven |
| 06/22/2011 | DE102009054860A1 Optical system in microlithographic projection exposure apparatus, has measurement arrangement, which determines relative position of first and second optical component in six different length measurement sections |
| 06/22/2011 | DE102008038993B4 Optisches Element und Verfahren zu seiner Herstellung Optical element and process for its preparation |
| 06/22/2011 | CN201878429U Manual exposure machine for high-density interconnection circuit board technology |
| 06/22/2011 | CN201876667U Coating oven used in fabrication of CTcP (Computer to Conventional Plate) |
| 06/22/2011 | CN1904727B Cluster tool and method for process integration in manufacturing of a photomask |
| 06/22/2011 | CN1885162B Alkali developing photosensitive resin composition |
| 06/22/2011 | CN1690849B Optics film and its manufacturing method |
| 06/22/2011 | CN1664698B Polymerizable composition and lithographic printing plate precursor |
| 06/22/2011 | CN102105837A Mirror, lithographic apparatus and device manufacturing method |
| 06/22/2011 | CN102105836A Radiation source, lithographic apparatus and device manufacturing method |
| 06/22/2011 | CN102105823A Method for manufacturing substrate with partition walls and pixels formed therein |
| 06/22/2011 | CN102103988A Substrate processing method, program and computer storage medium |
| 06/22/2011 | CN102103985A Method for preparing small-sized patterned substrate |
| 06/22/2011 | CN102103334A Resist stripper composition |
| 06/22/2011 | CN102103333A Method for baking photoresist and device using method |
| 06/22/2011 | CN102103332A High-speed digital scanning direct write photoetching device |
| 06/22/2011 | CN102103331A Stage device, exposure apparatus, and method of manufacturing devices |
| 06/22/2011 | CN102103330A Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product |
| 06/22/2011 | CN102103329A Light beam stabilizing device applied to photoetching equipment |
| 06/22/2011 | CN102103328A Coloring composition, color filter and color liquid crystal display element |
| 06/22/2011 | CN102103327A Black matrix composition with high light-shielding and improved adhesion properties |
| 06/22/2011 | CN102103326A Method of manufacturing optical element, and optical element |
| 06/22/2011 | CN102103325A Photomask for forming fine pattern and method for forming fine pattern with the photomask |
| 06/22/2011 | CN102103269A Method for adjusting collimated light in holographic grating exposure light path by using Moire fringes |
| 06/22/2011 | CN102103222A Method for fabricating color filter using surface plasmon and method for fabricating liquid crystal display device |
| 06/22/2011 | CN102101948A Ammonia-releasing, nitrogen-releasing, acid-producing foaming dissolution inhibitor/promoter for thermosensitive computer to plate (CTP) plate, and preparation method and use thereof |
| 06/22/2011 | CN102101872A Polyfunctional acrylic compound and photosensitive composition with the same |
| 06/22/2011 | CN101770182B Three-degree of freedom flexible precision positioning workbench |
| 06/22/2011 | CN101750899B Lithography layout and method for measuring lithography deformation thereof |
| 06/22/2011 | CN101738881B Two-stage image precise contraposition method for upper plate and lower plate, and device thereof |
| 06/22/2011 | CN101661886B Method for preparing source-drain injection structures in preparation of semiconductors |
| 06/22/2011 | CN101634808B Device and method for detecting lens aberration of lithography machines |
| 06/22/2011 | CN101620317B Laser device with long depth of focus |
| 06/22/2011 | CN101614961B Partial zonal photon sieve and manufacturing method thereof |
| 06/22/2011 | CN101414119B Method for building sub-micron or nano-scale formwork by micrometre scale formwork |
| 06/22/2011 | CN101380161B Technique of applying temperature-sensing discolored ink in noble metal coin (badge) |
| 06/22/2011 | CN101373323B Optical mask and manufacturing method thereof |
| 06/22/2011 | CN101303970B Operation of photolithography process |
| 06/22/2011 | CN101262738B Printed circuit boards |
| 06/22/2011 | CN101258447B Exposure apparatus |
| 06/22/2011 | CN101256358B Photosensitive compound, polyhydroxystyrene and novolac resin |
| 06/22/2011 | CN101256357B Photosensitive compound, polyhydroxystyrene, calixarene and novolac resin |
| 06/22/2011 | CN101206688B lithography system, device manufacture method, fixed data optimization method and production device |
| 06/22/2011 | CN101122742B Superbranched poly-siloxane base photoresist |
| 06/22/2011 | CN101063806B Method and apparatus for solving mask precipitated defect |
| 06/22/2011 | CN101055429B Moving beam with respect to diffractive optics in order to reduce interference patterns |
| 06/21/2011 | US7966584 Pattern-producing method for semiconductor device |
| 06/21/2011 | US7965446 Structure for pattern formation, method for pattern formation, and application thereof |
| 06/21/2011 | US7965387 Image plane measurement method, exposure method, device manufacturing method, and exposure apparatus |
| 06/21/2011 | US7965381 Self-aligned, sub-wavelength optical lithography |
| 06/21/2011 | US7965377 Method for adjusting a projection objective |
| 06/21/2011 | US7965376 Environmental system including a transport region for an immersion lithography apparatus |
| 06/21/2011 | US7965372 Apparatus for removing photoresist film |
| 06/21/2011 | US7964857 Plasma source of directed beams and application thereof to microlithography |
| 06/21/2011 | US7964654 Photoacid generators for the synthesis of oligo-DNA in a polymer matrix |
| 06/21/2011 | US7964480 Single scan irradiation for crystallization of thin films |
| 06/21/2011 | US7964336 Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern |
| 06/21/2011 | US7964335 Ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink |
| 06/21/2011 | US7964334 Mixture containing urea compound as photoinitiator; curing by exposure to laser light |
| 06/21/2011 | US7964332 Methods of forming a pattern of a semiconductor device |