| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/29/2011 | CN102109771A Method for detecting semiconductor device |
| 06/29/2011 | CN102109770A MDOF (multiple degree of freedom) coarse motion workpiece platform |
| 06/29/2011 | CN102109769A Joint adjusting device and joint adjusting method of workpiece stage interferometer and mask stage interferometer |
| 06/29/2011 | CN102109768A Rotary silicon wafer carrying platform and method using same for precise alignment of silicon wafer |
| 06/29/2011 | CN102109767A Method and system for determining alignment precision matching between lithography machines |
| 06/29/2011 | CN102109766A Decoupling mechanism and exposure machine using same |
| 06/29/2011 | CN102109765A Rotating platform |
| 06/29/2011 | CN102109764A Positive-type thermosensitive computer to plate (CPT) plate |
| 06/29/2011 | CN102109763A Positive type photosensitive resin composition |
| 06/29/2011 | CN102109762A Photosensitive composition, hard coating material and image display device |
| 06/29/2011 | CN102109761A Photosensitive resin composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same |
| 06/29/2011 | CN102109760A 抗蚀剂图案形成方法 A resist pattern forming method |
| 06/29/2011 | CN102109759A Color filter and manufacturing method thereof |
| 06/29/2011 | CN102109685A Multilayer electromagnetism modulating structure and preparation method thereof |
| 06/29/2011 | CN102109676A Designing method for multi-partition optical phase plate in photo-etching illumination |
| 06/29/2011 | CN102109672A Field-splitting microscope for realizing rapid zooming function of object lens |
| 06/29/2011 | CN102109627A Color filter and manufacturing method thereof |
| 06/29/2011 | CN102109623A Concavo-convex pattern forming sheet and method for manufacturing the same, reflection preventing body, phase difference plate, process sheet original plate, and method for manufacturing optical element |
| 06/29/2011 | CN102108062A Pyridinone compound |
| 06/29/2011 | CN102108061A Pyridone compound |
| 06/29/2011 | CN102108060A Pyridinone compound |
| 06/29/2011 | CN101713927B Adaptor and method for mounting mask |
| 06/29/2011 | CN101696266B Active etherate of pyrogallol and divinyl benzene polycondensate resin and synthesizing method thereof |
| 06/29/2011 | CN101694839B Array substrate and manufacture method thereof |
| 06/29/2011 | CN101670720B Process for printing QS quality safety sign on gold card paper |
| 06/29/2011 | CN101634815B Alignment method based on a plurality of different wavelengths |
| 06/29/2011 | CN101590730B Binary electro-deposition processing method for metal inkjet plate |
| 06/29/2011 | CN101561636B Device and method for controlling photoetching exposure dose |
| 06/29/2011 | CN101533226B Leveling and focusing mechanism and microstage and workpiece stage using same |
| 06/29/2011 | CN101526750B Alignment system for photolithographic device and photolithographic device applying same |
| 06/29/2011 | CN101526749B Photolithographic system and method for measuring deviation between variable gap of photolithographic system and center of mask stage |
| 06/29/2011 | CN101526747B Double workpiece platform device |
| 06/29/2011 | CN101526744B Positioning access mechanism of mask |
| 06/29/2011 | CN101487985B Alignment mark search system used for photo-etching equipment and its alignment mark search method |
| 06/29/2011 | CN101487976B Solution method preparation for metal photon crystal |
| 06/29/2011 | CN101487975B Production method for theta modulating holographic grating |
| 06/29/2011 | CN101477317B Illumination optical system used for micro-photoetching |
| 06/29/2011 | CN101446769B Method for selecting exposure conditions of lithography |
| 06/29/2011 | CN101430503B Double-layer glue removing method used for electron beam lithography stripping |
| 06/29/2011 | CN101419402B Method for making cemented carbide punching mold |
| 06/29/2011 | CN101361024B Lithographic apparatus |
| 06/29/2011 | CN101344375B High resolution heterodyne laser interference system and method for improving definition |
| 06/29/2011 | CN101329514B System and method for aligning photolithography apparatus |
| 06/29/2011 | CN101313250B Method for forming structural material layer on workpiece |
| 06/29/2011 | CN101285083B Process for preparing patterned cellulosic by micro-fluidic chip |
| 06/29/2011 | CN101261451B On-site measurement method Photo-etching machine image-forming quality and workpiece station positioning accuracy |
| 06/29/2011 | CN101251722B Positive photoresist striping liquid and method for making the same |
| 06/29/2011 | CN101231466B Method for forming phototonus composition, direction distribution membrane and optical compensation membrane |
| 06/29/2011 | CN101221261B Miniature ultra-optical spectrum integrated optical filter and its production method |
| 06/29/2011 | CN101145515B Method for forming a fine pattern of a semiconductor device |
| 06/29/2011 | CN101126897B Continuous surface micro-structure forming method based on microlens array |
| 06/29/2011 | CN101109910B Inspection method and apparatus, lithographic apparatus, and device manufacturing method |
| 06/29/2011 | CN101061409B Optical projection system |
| 06/29/2011 | CN101046629B Solidifying resin composition and condensate thereof |
| 06/28/2011 | US7971159 Data generating method, data generating device, and program in an exposure system for irradiating multigradation-controllable spotlights |
| 06/28/2011 | US7969663 Projection objective for immersion lithography |
| 06/28/2011 | US7969557 Exposure apparatus, and device manufacturing method |
| 06/28/2011 | US7969552 Environmental system including a transport region for an immersion lithography apparatus |
| 06/28/2011 | US7968278 Rinse treatment method and development process method |
| 06/28/2011 | US7968277 Imaging post structures using X and Y dipole optics and a single mask |
| 06/28/2011 | US7968276 Positive resist composition and method of forming resist pattern |
| 06/28/2011 | US7968275 Method of forming a pattern using a photoresist composition for immersion lithography |
| 06/28/2011 | US7968273 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 06/28/2011 | US7968271 Photosensitive recording material, planographic printing plate precursor, and stacks of the same |
| 06/28/2011 | US7968270 Process of making a semiconductor device using multiple antireflective materials |
| 06/28/2011 | US7968269 Positive resist composition for immersion exposure and method of forming resist pattern |
| 06/28/2011 | US7968258 System and method for photolithography in semiconductor manufacturing |
| 06/28/2011 | US7968256 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device |
| 06/28/2011 | US7968074 Method for making low-stress large-volume crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby |
| 06/28/2011 | US7966934 Process for on-press developing overcoat-free lithographic printing plate |
| 06/23/2011 | WO2011075555A1 Led curable liquid resin compositions for additive fabrication |
| 06/23/2011 | WO2011075553A1 Liquid radiation curable resins for additive fabrication comprising a triaryl sulfonium borate cationic photoinitiator |
| 06/23/2011 | WO2011075084A1 Method and apparatus for making polymeric resin-based optical components via ultra-violet radiation |
| 06/23/2011 | WO2011074775A2 Cylindrical magnetic levitation stage and lithography |
| 06/23/2011 | WO2011074752A1 Novel compound, pigment dispersion composition and photosensitive resin composition including the same, and color filter using the same |
| 06/23/2011 | WO2011074705A1 Light-shielding curable composition, wafer level lens and light-shielding color filter |
| 06/23/2011 | WO2011074649A1 Method for maintaining substrate processing apparatus, and safety apparatus for substrate processing apparatus |
| 06/23/2011 | WO2011074528A1 Photosensitive resin composition, dry film thereof, and printed wiring board formed using same |
| 06/23/2011 | WO2011074494A1 Composition for formation of resist underlayer film |
| 06/23/2011 | WO2011074474A1 Substrate support member, substrate conveyance apparatus, substrate conveyance method, exposure apparatus, and device manufacturing method |
| 06/23/2011 | WO2011074469A1 Solder resist ink composition, and cured product thereof |
| 06/23/2011 | WO2011074433A1 Composition for forming photosensitive resist underlayer film |
| 06/23/2011 | WO2011074400A1 Exposure method and exposure apparatus |
| 06/23/2011 | WO2011074319A1 Deformable mirror, illumination optical system, exposure device, and method for producing device |
| 06/23/2011 | WO2011073429A1 A photosensitive recording material |
| 06/23/2011 | WO2011073157A1 Reflective optical element for euv lithography |
| 06/23/2011 | WO2011073013A1 Methods of directed self-assembly with 193 - nm immersion lithography and layered structures formed therefrom |
| 06/23/2011 | WO2011072953A1 Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective |
| 06/23/2011 | WO2011072905A1 Lithographic apparatus and device manufacturing method |
| 06/23/2011 | WO2011072897A1 Imprint lithography |
| 06/23/2011 | WO2011072598A1 Dual-stage exchanging system for silicon wafer stage of lithography machine and exchange method thereof |
| 06/23/2011 | WO2011072597A1 Dual silicon wafer stage exchange method and system for lithographic apparatus |
| 06/23/2011 | WO2011019189A3 Resist stripping solution composition, and method for stripping resist by using same |
| 06/23/2011 | WO2011008036A3 Photosensitive polyimide and photosensitive resin composition comprising same |
| 06/23/2011 | WO2010091795A8 Method for producing holographic photopolymers on polymer films |
| 06/23/2011 | WO2010059954A3 Process optimization with free source and free mask |
| 06/23/2011 | WO2010032224A3 Lithographic apparatus, programmable patterning device and lithographic method |
| 06/23/2011 | US20110154274 Frequency division multiplexing (fdm) lithography |
| 06/23/2011 | US20110151653 Spin-on formulation and method for stripping an ion implanted photoresist |
| 06/23/2011 | US20110151630 Display element manufacturing method and manufacturing apparatus, thin film transistor manufacturing method and manufacturing apparatus, and circuit forming apparatus |