| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/05/2011 | US7973889 Liquid crystal display having interval adjustment layer between substrates and method of producing the same |
| 07/05/2011 | US7973197 Colorant compound and blue resist composition for use in color filter containing the same |
| 07/05/2011 | US7972766 Method for forming fine pattern of semiconductor device |
| 07/05/2011 | US7972765 Pattern forming method and a semiconductor device manufacturing method |
| 07/05/2011 | US7972763 Patterns having high resolution; used for semiconductor microfabrication employing a lithography |
| 07/05/2011 | US7972762 resist pattern with reduced defects and excellent lithographic characteristics; acrylate ester copolymer obtained by polymerizing an ( alpha -lower alkyl)acrylate ester having tertiary alkyl ester-type acid dissociable dissolution inhibiting group, under a presence of acid |
| 07/05/2011 | US7972761 Photoresist materials and photolithography process |
| 07/05/2011 | US7972754 Reduce ink residues on walls; uniformity in film thickness |
| 07/05/2011 | US7972752 Photomask and method for forming a resist pattern |
| 07/05/2011 | US7972751 Reflection photolithography mask, and process for fabricating this mask |
| 07/05/2011 | US7972553 Method for imprint lithography at constant temperature |
| 06/30/2011 | WO2011078968A2 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes |
| 06/30/2011 | WO2011078106A1 Positive photosensitive resin composition, cured film formed from same, and element having cured film |
| 06/30/2011 | WO2011078083A1 Method of manufacturing semiconductor device and system for manufacturing semiconductor device |
| 06/30/2011 | WO2011078070A1 Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method |
| 06/30/2011 | WO2011077993A1 Radiation-sensitive composition |
| 06/30/2011 | WO2011077992A1 Photomask |
| 06/30/2011 | WO2011077965A1 Exposure device |
| 06/30/2011 | WO2011077941A1 Radiation-sensitive resin composition and compound contained therein |
| 06/30/2011 | WO2011077697A1 Exposure method, and exposure device |
| 06/30/2011 | WO2011076500A1 Lithographic apparatus and device manufacturing method |
| 06/30/2011 | WO2011042770A8 Positive-working photoimageable bottom antireflective coating |
| 06/30/2011 | WO2011039261A3 Illumination system for microlithography |
| 06/30/2011 | WO2011031396A3 Near-infrared absorbing film compositions |
| 06/30/2011 | US20110159670 Method and Apparatus of Patterning a Semiconductor Device |
| 06/30/2011 | US20110159447 Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography |
| 06/30/2011 | US20110159446 Plasmon head with hydrostatic gas bearing for near field photolithography |
| 06/30/2011 | US20110159445 Method for Making a Texture on a Transparent Conductive Film of a Solar Cell |
| 06/30/2011 | US20110159444 Method for manufacturing probe sheet |
| 06/30/2011 | US20110159443 Method of forming a pattern in a semiconductor device and method of forming a gate using the same |
| 06/30/2011 | US20110159442 Method of manufacturing semiconductor device |
| 06/30/2011 | US20110159441 Lithographic apparatus and device manufacturing method |
| 06/30/2011 | US20110159440 Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device |
| 06/30/2011 | US20110159439 Thermally crosslinkable resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same |
| 06/30/2011 | US20110159438 Thermally crosslinkable resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same, and relief printing plate and process for making same |
| 06/30/2011 | US20110159437 Method of preparing lithographic printing plate |
| 06/30/2011 | US20110159436 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes |
| 06/30/2011 | US20110159435 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area |
| 06/30/2011 | US20110159434 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages |
| 06/30/2011 | US20110159433 Photosensitive composition, pattern-forming method using the composition, and resin used in the composition |
| 06/30/2011 | US20110159432 Positive photosensitive resin composition, cured film, protecting film, insulating film and semiconductor and display devices using the same |
| 06/30/2011 | US20110159431 Photoacid generators and lithographic resists comprising the same |
| 06/30/2011 | US20110159430 Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board |
| 06/30/2011 | US20110159429 Photosensitive compositions |
| 06/30/2011 | US20110159411 Phase-shift photomask and patterning method |
| 06/30/2011 | US20110159409 Decorated device and method of fabricating the same |
| 06/30/2011 | US20110159373 Electrochemical cell |
| 06/30/2011 | US20110159253 Methods of forming photolithographic patterns |
| 06/30/2011 | US20110159252 Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices |
| 06/30/2011 | US20110159238 Photosensitive adhesive composition, photosensitive film adhesive, adhesive pattern, semiconductor wafer with adhesive, semiconductor device and electronic component |
| 06/30/2011 | US20110157570 Lithographic apparatus |
| 06/30/2011 | US20110157278 Process For Preparing An Ink Jet Print Head Front Face Having A Textured Superoleophobic Surface |
| 06/30/2011 | US20110157277 Superoleophobic and Superhydrophobic Surfaces And Method For Preparing Same |
| 06/30/2011 | US20110157276 Superoleophobic and Superhydrophobic Devices And Method For Preparing Same |
| 06/30/2011 | US20110155855 Method for making an acoustic panel for the air intake lip of a nacelle |
| 06/30/2011 | DE19817714C5 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface |
| 06/30/2011 | DE19542818B4 Verfahren zum Abschätzen des Aussehens eines Resistmusters und darauf beruhendes Verfahren A method for estimating the appearance of a resist pattern and method based thereon |
| 06/30/2011 | DE10322239B4 Geblazetes diffraktives optisches Element sowie Projektionsobjektiv mit einem solchen Element Blazed diffractive optical element and projection lens with such an element |
| 06/30/2011 | DE102010063530A1 Aperture element for use in projection illumination system for extreme UV lithography for manufacturing of microelectronic components, has shadowing region comprising deflection unit for deflecting radiation of wavelength range |
| 06/30/2011 | DE102010044139A1 Vorrichtung und Verfahren zum Justieren der Rückseite eines Wafers mit der Vorderseite eines Wafers Device and method for adjusting the backside of a wafer with the front face of a wafer |
| 06/30/2011 | DE102009055184A1 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage An optical system, in particular of a microlithographic projection exposure apparatus |
| 06/30/2011 | DE102009035788B4 Optische Anordnung in einem optischen System, insbesondere einer Beleuchtungseinrichtung An optical arrangement in an optical system, in particular a lighting device |
| 06/29/2011 | EP2339405A1 Method of preparing lithographic printing plate |
| 06/29/2011 | EP2339404A2 Lithographic apparatus and device manufacturing method |
| 06/29/2011 | EP2339403A2 Lithographic apparatus and device manufacturing method |
| 06/29/2011 | EP2339402A1 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 06/29/2011 | EP2339401A1 Method of preparing lithographic printing plate |
| 06/29/2011 | EP2339400A2 Lithographic printing plate precursor and plate making method thereof |
| 06/29/2011 | EP2339204A1 Active mount, and method for tuning such active mount |
| 06/29/2011 | EP2338089A1 Positive photosensitive composition and pattern forming method using the same |
| 06/29/2011 | EP2338088A1 Composition, process of preparation and method of application and exposure for light imaging paper |
| 06/29/2011 | EP2255252B1 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material |
| 06/29/2011 | EP1966652B1 Immersion lithography apparatus and method of performing immersion lithography |
| 06/29/2011 | EP1450153B1 Inspection device and inspection method for pattern profiles |
| 06/29/2011 | EP1361961B1 Forming a mark on a gemstone or industrial diamond |
| 06/29/2011 | CN201886368U Temperature and humidity controller for coating and developing machine and coating and developing machine |
| 06/29/2011 | CN201886281U Self-circulation type version washing machine |
| 06/29/2011 | CN201886280U Protector |
| 06/29/2011 | CN1914185B Piperazino photoinitiation sensitisers |
| 06/29/2011 | CN1452731B On-press development of thermosensitive lithographic plates |
| 06/29/2011 | CN102112926A Active spot array lithographic projector system with regulated spots |
| 06/29/2011 | CN102112925A Illumination optical unit for microlithography |
| 06/29/2011 | CN102112924A Photosensitive flexographic printing original plate |
| 06/29/2011 | CN102112923A Negative working photosensitive composition, partition wall for optical element using nagative working photosensitive composition, and optical element comprising partition wall |
| 06/29/2011 | CN102112922A Positive photosensitive composition and permanent resist |
| 06/29/2011 | CN102112921A Flame-retardant photocurable resin composition, dry film and cured product of same, and printed circuit board using composition thereof |
| 06/29/2011 | CN102112920A Flame-retardant photocurable resin composition, dry film and cured product of same, and printed circuit board using composition thereof |
| 06/29/2011 | CN102112651A Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored |
| 06/29/2011 | CN102112497A Photoinitiator mixtures |
| 06/29/2011 | CN102112438A Oxime ester photoinitiators |
| 06/29/2011 | CN102112312A Employing secondary back exposure of flexographic plate |
| 06/29/2011 | CN102112281A Apparatus and method for depositing and curing flowable material |
| 06/29/2011 | CN102110775A Method for realizing graphical semiconductor polymer, and device prepared by applying same |
| 06/29/2011 | CN102109778A Adjusting mechanism |
| 06/29/2011 | CN102109777A Regeneration liquid of plasma display barrier wall slurry |
| 06/29/2011 | CN102109776A Process for developing photoresist, and device thereof |
| 06/29/2011 | CN102109775A Lithographic apparatus and device manufacturing method utilizing data filtering |
| 06/29/2011 | CN102109774A Design method for CCD (charge coupled device) counterpoint read point on exposure film |
| 06/29/2011 | CN102109773A Exposure method, exposure apparatus, and maintenance method |
| 06/29/2011 | CN102109772A Method for automatically building interlayer error measurement programs in batch in photoetching process |