| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/07/2011 | WO2011081062A1 Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method |
| 07/07/2011 | WO2011081055A1 Curable resin composition and printed wiring board comprising same |
| 07/07/2011 | WO2011080992A1 Positive-type photosensitive resin composition |
| 07/07/2011 | WO2011080311A1 Exposure method |
| 07/07/2011 | WO2011080310A1 Integrated sensor system |
| 07/07/2011 | WO2011080309A1 Capacitive sensing system with differential pairs |
| 07/07/2011 | WO2011080308A1 Capacitive sensing system |
| 07/07/2011 | WO2011080019A1 Illumination system, lithographic apparatus and illumination method |
| 07/07/2011 | WO2011080016A2 Methods of directed self-assembly and layered structures formed therefrom |
| 07/07/2011 | WO2011031028A3 Resist stripper composition for forming copper-based wiring |
| 07/07/2011 | WO2011025307A3 Photosensitive resin composition which is curable at a low temperature, and dry film produced using same |
| 07/07/2011 | WO2011025180A3 A photoresist stripping composition for manufacturing lcd |
| 07/07/2011 | WO2011003880A3 Method and device for treating substrates |
| 07/07/2011 | US20110165523 Substrate treating solution and method employing the same for treating a resist substrate |
| 07/07/2011 | US20110165522 Imaging optical system |
| 07/07/2011 | US20110165521 Process for producing photoresist pattern |
| 07/07/2011 | US20110165520 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 07/07/2011 | US20110165519 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 07/07/2011 | US20110165518 lithographic printing plate precursor |
| 07/07/2011 | US20110165517 Organic el element, organic el display apparatus, and manufacturing method of organic el element |
| 07/07/2011 | US20110165516 Compound for resist and radiation-sensitive composition |
| 07/07/2011 | US20110165515 Novel photoresist materials and photolithography processes |
| 07/07/2011 | US20110165514 Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate |
| 07/07/2011 | US20110165513 Photoresist composition |
| 07/07/2011 | US20110165512 Resist composition and method of forming resist pattern |
| 07/07/2011 | US20110165505 Photomasks, Methods of Forming Photomasks, and Methods of Photolithographically-Patterning Substrates |
| 07/07/2011 | US20110165504 Reflective mask blank for euv lithography, process for producing the same and mask for euv lithography |
| 07/07/2011 | US20110165503 Method of generating photomask data, method of fabricating photomask, memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array |
| 07/07/2011 | US20110165389 Method for forming conductive polymer pattern |
| 07/07/2011 | US20110164161 Method of manufacturing cmos image sensor using double hard mask layer |
| 07/07/2011 | DE102008049556B4 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus |
| 07/07/2011 | DE102006030359B4 Verfahren zum Entwickeln eines Photolacks A method for developing a photoresist, |
| 07/06/2011 | EP2341391A2 Projection objective for a projection exposure apparatus |
| 07/06/2011 | EP2341089A1 Photosensitive compositions |
| 07/06/2011 | EP2340464A2 Microlithographic projection exposure apparatus |
| 07/06/2011 | EP2340463A1 Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light |
| 07/06/2011 | EP2340169A1 Improvements in or relating to printing |
| 07/06/2011 | EP1656591B1 A method of retaining a substance originating from a radiation source by means of a filter |
| 07/06/2011 | CN201892819U Soldering-resistance developing machine |
| 07/06/2011 | CN201892818U Device preventing sample from damage in coating membrane equipment |
| 07/06/2011 | CN201892817U Protecting film for negative film |
| 07/06/2011 | CN1991587B Laser processing device, exposure device and exposure method |
| 07/06/2011 | CN1954406B Projection optical system, exposure apparatus, and exposure method |
| 07/06/2011 | CN1910520B Processless digitally imaged photopolymer elements using microspheres |
| 07/06/2011 | CN1841197B X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element |
| 07/06/2011 | CN1637595B Forming image method |
| 07/06/2011 | CN1606713B Spincoating antireflection paint for photolithography |
| 07/06/2011 | CN1573542B Colored photoresist composition |
| 07/06/2011 | CN102119366A Radiation source, lithographic apparatus and device manufacturing method |
| 07/06/2011 | CN102119365A Radiation source, lithographic apparatus and device manufacturing method |
| 07/06/2011 | CN102119364A Optical apparatus with adjustable action of force on an optical module |
| 07/06/2011 | CN102119363A Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale |
| 07/06/2011 | CN102119347A Method for manufacturing color filter, color filter substrate and color filter |
| 07/06/2011 | CN102117764A Method for performing photolithographic process on deep hole substrate |
| 07/06/2011 | CN102117026A Method for detecting and correcting period of alignment signal of lithography tool |
| 07/06/2011 | CN102117025A Photoresist detergent composition |
| 07/06/2011 | CN102117024A Photoresist cleaning agent |
| 07/06/2011 | CN102117023A Photoresist detergent |
| 07/06/2011 | CN102117022A Photoresist detergent composition |
| 07/06/2011 | CN102117021A Preparation process of photo-resist cleaning liquid |
| 07/06/2011 | CN102117020A Method of preparing lithographic printing plate |
| 07/06/2011 | CN102117019A Apparatus for developing photoresist and method for operating the same |
| 07/06/2011 | CN102117018A Lithographic apparatus and device manufacturing method |
| 07/06/2011 | CN102117017A Photoetching equipment with vacuum silicon chip box |
| 07/06/2011 | CN102117016A Device for measuring position of mask table of scanning lithography machine |
| 07/06/2011 | CN102117015A Maskless lithography device adopting digital phase shift and method thereof |
| 07/06/2011 | CN102117014A Photoresist for patterning semiconductor device and a method of manufacturing semiconductor device |
| 07/06/2011 | CN102117013A Photoresist composition |
| 07/06/2011 | CN102117012A Method for increasing focal depth in lithography process |
| 07/06/2011 | CN102116985A Method for manufacturing electrophoretic particle storage by direct laser exposure |
| 07/06/2011 | CN102116960A Color film substrate and manufacturing method thereof |
| 07/06/2011 | CN102116901A Silica-based optical substrate with stepped V-shaped slot structure and manufacturing method thereof |
| 07/06/2011 | CN102116176A Patterned turbomachine component and method of forming a pattern on a turbomachine component |
| 07/06/2011 | CN102115426A Aromatic ring-containing compound for a resist underlayer and resist underlayer composition |
| 07/06/2011 | CN102114738A Double-coating laser digital printing plate and plate making method |
| 07/06/2011 | CN102114726A Laser thermal-ablation mask coating for printing plate and preparation method thereof |
| 07/06/2011 | CN102114725A Positive image thermosensitive lithographic plate forebody and plate-making method thereof |
| 07/06/2011 | CN101748619B Process method of blind embossing jacquard satin print of towel |
| 07/06/2011 | CN101661226B Carrying box of photomask boxes and fixing pieces thereof |
| 07/06/2011 | CN101620982B Method for cleaning wafer and cleaning device |
| 07/06/2011 | CN101609261B Method for exposure |
| 07/06/2011 | CN101593744B Alignment mark and manufacture method thereof |
| 07/06/2011 | CN101592876B Forming method of under pump metal layer and connecting cushion |
| 07/06/2011 | CN101526756B Photolithography device and method |
| 07/06/2011 | CN101452217B Exposure method |
| 07/06/2011 | CN101354534B Method for coating photoresist and method for forming photolithography pattern |
| 07/06/2011 | CN101290471B Photoresist combination and laminating body |
| 07/06/2011 | CN101281367B Solder resist compound and cured product thereof |
| 07/06/2011 | CN101273303B Positive photosensitive resin composition |
| 07/06/2011 | CN101246309B Photoresist mask forming method |
| 07/06/2011 | CN101192009B Method for establishing OPC model |
| 07/06/2011 | CN101192007B Mask plate, mask plate layout design method and defect repairing method |
| 07/06/2011 | CN101145514B Method of forming fine pattern of semiconductor device |
| 07/06/2011 | CN101137938B Lithographic method |
| 07/06/2011 | CN101126896B Super resolution lithography method based on PDMS template and silver board material |
| 07/06/2011 | CN101116034B Compositions curable with actinic energy ray |
| 07/06/2011 | CN101059658B A method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method |
| 07/06/2011 | CN101042541B Lithographic apparatus and device manufacturing method |
| 07/05/2011 | US7974804 Registration detection system |
| 07/05/2011 | US7973906 Exposure apparatus, exposure method, method for manufacturing device |