| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/14/2011 | US20110171584 Method of manufacturing high resolution organic thin film pattern |
| 07/14/2011 | US20110171583 Process Solutions Containing Surfactants |
| 07/14/2011 | US20110171582 Three Dimensional Integration With Through Silicon Vias Having Multiple Diameters |
| 07/14/2011 | US20110171581 Photoresist compostion and method of manufacturing array substrate using the same |
| 07/14/2011 | US20110171580 Positive resist composition and patterning process |
| 07/14/2011 | US20110171579 Negative resist composition and patterning process |
| 07/14/2011 | US20110171578 Positive Photosensitive Resin Composition |
| 07/14/2011 | US20110171577 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition |
| 07/14/2011 | US20110171576 Salt and photoresist composition containing the same |
| 07/14/2011 | US20110171575 Photoresist composition |
| 07/14/2011 | US20110171569 Sulfonium derivatives and the use therof as latent acids |
| 07/14/2011 | US20110171568 Mask blank substrate |
| 07/14/2011 | US20110171566 Reflective mask blank for euv lithography |
| 07/14/2011 | US20110171478 Acid-etch resistant, protective coatings |
| 07/14/2011 | US20110171438 Laser Imageable Paper |
| 07/14/2011 | US20110171436 Negative-type photosensitive resin composition, pattern forming method and electronic parts |
| 07/14/2011 | US20110171392 System and Method for Manufacturing Embedded Conformal Electronics |
| 07/14/2011 | US20110170080 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method |
| 07/14/2011 | US20110170077 Lithographic apparatus and device manufacturing method |
| 07/14/2011 | US20110170075 Device for chemical and biochemical reactions using photo-generated reagents |
| 07/14/2011 | US20110169013 Growing polygonal carbon from photoresist |
| 07/14/2011 | US20110168923 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 07/14/2011 | US20110168911 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 07/14/2011 | DE102010056553A1 Quellkollektormodul mit GIC-Spiegel und LPP-EUV-Lichtquelle Source collector module with GIC mirror and LPP EUV light source |
| 07/14/2011 | DE102010004642A1 Magnetaktor sowie Verfahren zu dessen Montage Magnetic actuator and method of assembly |
| 07/13/2011 | EP2343730A1 Method for concave and convex pattern formation and apparatus for manufacturing concave and convex pattern |
| 07/13/2011 | EP2343598A1 Substrate processing liquid and method for processing resist substrate using same |
| 07/13/2011 | EP2343597A2 Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound |
| 07/13/2011 | EP2343195A1 Lithographic printing original plate, method for producing lithographic printing plate, and polymerizable monomer |
| 07/13/2011 | EP2342601A1 Reflective optical element and methods for producing it |
| 07/13/2011 | EP2342600A2 Fluid dispense device calibration |
| 07/13/2011 | EP2342254A1 Media for volume-holographic recording based on self-developing polymer |
| 07/13/2011 | EP2342249A1 Prepolymer-based polyurethane formulations for producing holographic media |
| 07/13/2011 | EP2342243A1 Composition for imprints, pattern and patterning method |
| 07/13/2011 | EP2342237A1 Photoinitiator mixtures |
| 07/13/2011 | EP2133744B1 Photosensitive resin composition |
| 07/13/2011 | CN201897692U Masking plate with alignment marks |
| 07/13/2011 | CN201897691U Cleaning system of developing bath circulation treatment device |
| 07/13/2011 | CN1940726B Method for producing resin for chemically amplified positive resist |
| 07/13/2011 | CN1894629B Photosensitive composition remover |
| 07/13/2011 | CN1890603B Methods and devices for fabricating three-dimensional nanoscale structures |
| 07/13/2011 | CN1809791B Developer composition for resists and method for formation of resist pattern |
| 07/13/2011 | CN102124414A Photoresist remover composition and method for removing photoresist |
| 07/13/2011 | CN102124413A A hardmask process for forming a reverse tone image |
| 07/13/2011 | CN102124412A Projection system, lithographic apparatus, method of projecting a beam of radiation onto a target and device manufacturing method |
| 07/13/2011 | CN102124411A Device for microlithographic projection illumination and device for the inspection of a surface of a substrate |
| 07/13/2011 | CN102124410A Photosensitive letterpress printing original plate |
| 07/13/2011 | CN102124409A Process for fabricating multi-level metal parts by the UV-LIGA technique |
| 07/13/2011 | CN102124064A Composition for forming silicon-containing resist underlayer film with onium group |
| 07/13/2011 | CN102122121A Process solutions containing surfactants |
| 07/13/2011 | CN102122120A Two-table switching system of stepping and scanning lithography machine |
| 07/13/2011 | CN102122119A Improved quickly-propelling method for simulating three-dimensional etching process of photoresist |
| 07/13/2011 | CN102122118A Laser direct-writing device |
| 07/13/2011 | CN102122117A Lithographic apparatus and method |
| 07/13/2011 | CN102122116A Method and system for automatically controlling thickness of optical resist |
| 07/13/2011 | CN102122115A Method of generating photomask data, method of fabricating photomask, solid-state image sensor having microlens array and method of manufacturing same |
| 07/13/2011 | CN102122114A Process for producing photoresist pattern |
| 07/13/2011 | CN102122113A Photoetching method |
| 07/13/2011 | CN102122112A Method for forming patterns |
| 07/13/2011 | CN102122111A Pixel-based optimization method for optical proximity correction |
| 07/13/2011 | CN101479310B Amine imide compound to be activated by irradiation of active energy ray, composition using the same, and method for curing the same |
| 07/13/2011 | CN101303537B Process for wafer backside polymer removal and wafer front side photoresist removal |
| 07/13/2011 | CN101290468B Mask preparation method |
| 07/13/2011 | CN101281368B Black solder resist compound and cured product thereof |
| 07/13/2011 | CN101278234B Positive photosensitive resin composition |
| 07/13/2011 | CN101226299B Method for manufacturing colorful filter layer with light scattering effect |
| 07/13/2011 | CN101218539B Photosensitive adhesive composition, and obtained adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part using the same |
| 07/13/2011 | CN101089733B A method of characterising the transmission losses of an optical system |
| 07/12/2011 | US7978304 Processing apparatus for processing object in vessel |
| 07/12/2011 | US7977655 Method and system of monitoring E-beam overlay and providing advanced process control |
| 07/12/2011 | US7977653 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 07/12/2011 | US7977651 Illumination system particularly for microlithography |
| 07/12/2011 | US7977247 Field effect transistor device including an array of channel elements |
| 07/12/2011 | US7977039 Rinse treatment method, developing treatment method and developing apparatus |
| 07/12/2011 | US7977038 Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereon |
| 07/12/2011 | US7977037 Photoresist processing methods |
| 07/12/2011 | US7977036 Using resist composition which has a photosensitivity to a predetermined light source and bringing the resist pattern formed on the substrate into contact with a supercritical processing solution comprising a supercritical fluid which contains a crosslinking agent; fine resist pattern, etching resistance |
| 07/12/2011 | US7977035 light penetrable thin film is formed by using t-butyl acrylate/maleic anhydride/t-butyl 5-norbornene-2-carboxylate/2-hydroxyethyl 5-norbornene-2-carboxylate) polymer, an organic alcoholic solvent and a photoacid generator, baking; polymer compound is absorbable by a light |
| 07/12/2011 | US7977033 Method of forming pattern of semiconductor device |
| 07/12/2011 | US7977032 Method to create region specific exposure in a layer |
| 07/12/2011 | US7977031 Method of processing overcoated lithographic printing plate |
| 07/12/2011 | US7977030 Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming |
| 07/12/2011 | US7977029 Positive photosensitive composition |
| 07/12/2011 | US7977028 Photosensitive resin composition and adhesion promoter |
| 07/12/2011 | US7977027 Resist composition and patterning process |
| 07/12/2011 | US7977017 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 07/12/2011 | US7977015 Acrylic, styryl, methacrylic substituents of benzene rings joined through a ketone |
| 07/07/2011 | WO2011081323A2 Composition for the bottom layer of a photoresist, and method using same to manufacture semiconductor device |
| 07/07/2011 | WO2011081322A2 Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device |
| 07/07/2011 | WO2011081321A2 Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device |
| 07/07/2011 | WO2011081316A2 Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device |
| 07/07/2011 | WO2011081285A2 Polymer containing an aromatic ring for a resist underlayer, and resist underlayer compound including the polymer |
| 07/07/2011 | WO2011081215A1 Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method |
| 07/07/2011 | WO2011081151A1 Photosensitive composition, partition wall, color filter and organic el element |
| 07/07/2011 | WO2011081150A1 Photosensitive composition, partition wall, color filter and organic el element |
| 07/07/2011 | WO2011081149A1 Photosensitive composition, partition wall, color filter and organic el element |
| 07/07/2011 | WO2011081131A1 Photosensitive resin composition, photosensitive dry film, and pattern forming method |
| 07/07/2011 | WO2011081127A1 Photosensitive resin composition, photosensitive dry film, and pattern forming method |
| 07/07/2011 | WO2011081084A1 Method for producing flexographic printing plate and flexographic printing plate |
| 07/07/2011 | WO2011081064A1 Support for planographic printing plate, method for producing support for planographic printing plate, and planographic printing original plate |