| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/20/2011 | CN102132216A Mask holding mechanism |
| 07/20/2011 | CN102132215A Optimization of focused spots for maskless lithography |
| 07/20/2011 | CN102132214A Spectral purity filter and lithographic apparatus |
| 07/20/2011 | CN102132213A Spectral purity filter, lithographic apparatus including such spectral purity filter and device manufacturing method |
| 07/20/2011 | CN102132212A Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component |
| 07/20/2011 | CN102132174A Pattern-forming member and method of manufacturing same |
| 07/20/2011 | CN102132173A Manufacturing method for pattern-forming body and processing apparatus using electromagnetic beam |
| 07/20/2011 | CN102131958A Method of forming a microstructure |
| 07/20/2011 | CN102131883A Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer and semiconductor device using the photosensitive adhesive composition |
| 07/20/2011 | CN102131766A New propanoates and processes for preparing the same |
| 07/20/2011 | CN102130024A Method for plating silver on front side of silicon wafer |
| 07/20/2011 | CN102130009A Manufacturing method of transistor |
| 07/20/2011 | CN102129971A Method and system for etching graphical sapphire substrate |
| 07/20/2011 | CN102129968A Double-patterning method |
| 07/20/2011 | CN102129890A Amorphous alloy-based optical focusing lens and preparation method thereof |
| 07/20/2011 | CN102129182A Method and system for monitoring conservation time of photoresist |
| 07/20/2011 | CN102129181A Full wafer width scanning using step and scan system |
| 07/20/2011 | CN102129180A Micro-mirror device screening method, micro-mirror device screening device and no-mask exposure device |
| 07/20/2011 | CN102129179A Immersion lithographic apparatus and a device manufacturing method |
| 07/20/2011 | CN102129178A Photoetching mark structure for SiGeC device |
| 07/20/2011 | CN102129177A Method and system for monitoring exposure energy of exposure machine station |
| 07/20/2011 | CN102129176A Method for eliminating oblique error caused by surface shape of elongated lens |
| 07/20/2011 | CN102129175A Rotating platform supported by air flotation |
| 07/20/2011 | CN102129174A Method for repairing defocusing of imaging blocks on edge of wafer |
| 07/20/2011 | CN102129173A Photoetching machine projection objective lens wave aberration field measurement method |
| 07/20/2011 | CN102129172A Negative resist composition and patterning process |
| 07/20/2011 | CN102129171A Photoresist composition |
| 07/20/2011 | CN102129170A Attenuated phase shift mask production method |
| 07/20/2011 | CN102129167A Photolithographic mask and photolithographic method |
| 07/20/2011 | CN102129097A Backlight module, light guide device and light guide plate manufacturing method |
| 07/20/2011 | CN102129094A Heat resistant flexible color filter |
| 07/20/2011 | CN102128678A Device and method for measuring and correcting energy sensor |
| 07/20/2011 | CN102127201A Water-solubility hyperbranched photosensitive organic silicon prepolymer and preparation method thereof |
| 07/20/2011 | CN102127012A Pyridone compound |
| 07/20/2011 | CN102126951A Crosslinkable compound and photosensitive composition comprising the same |
| 07/20/2011 | CN102126948A Light sensitive monomer, liquid crystal material, liquid crystal display panel and manufacturing method thereof, and photoelectronic device and manufacturing method thereof |
| 07/20/2011 | CN101776851B Three DOF micro-positioning workbench for nano-imprint lithography system |
| 07/20/2011 | CN101750900B Method for determining photoetching procedure causing low yield rate in the unit of exposure area |
| 07/20/2011 | CN101694561B Multi-mask photoetching machine silicon wafer stage system |
| 07/20/2011 | CN101655666B Photoetching method and system |
| 07/20/2011 | CN101598902B Lithographic apparatus and device manufacturing method |
| 07/20/2011 | CN101587303B Lithographic apparatus and device manufacturing method |
| 07/20/2011 | CN101583909B Radiation system and lithographic apparatus comprising the same |
| 07/20/2011 | CN101576687B Liquid crystal directing agent, and production method of liquid crystal oriented film formed by same |
| 07/20/2011 | CN101573664B Method and system for detecting existence of an undesirable particle during semiconductor fabrication |
| 07/20/2011 | CN101551599B Double-stage switching system of photoetching machine wafer stage |
| 07/20/2011 | CN101526685B Color film substrate and manufacture method thereof |
| 07/20/2011 | CN101520606B Non-contact long-stroke multi-degree-of-freedom nanometer precision working table |
| 07/20/2011 | CN101493655B Exposure method |
| 07/20/2011 | CN101464634B Lithographic apparatus, workbench system and its control method |
| 07/20/2011 | CN101446682B Preparation method of continuous diaphragm type micro deformable mirror based on SOI |
| 07/20/2011 | CN101441411B Surface plasma resonance exposure photolithography method |
| 07/20/2011 | CN101377622B Method for detecting photolithography equipment exhaust system and judging product CPK |
| 07/20/2011 | CN101354529B Photomask data generation method, photomask generation method, exposure method, and device manufacturing method |
| 07/20/2011 | CN101342840B Method for manufacturing integrated molding module directly with paper card design diagram |
| 07/20/2011 | CN101313252B Developer solution and process for use |
| 07/20/2011 | CN101303531B A wafer chuck and a method of forming a wafer chuck |
| 07/20/2011 | CN101220927B Cover for shielding a portion of an arc lamp, arc lamp and etching device |
| 07/20/2011 | CN101196645B RGBW colorful color filter structure and its production method |
| 07/20/2011 | CN101192008B Coating method and coating device |
| 07/20/2011 | CN101158813B Positive photoresist consumed reactive compound and light sensitive complexes thereof |
| 07/20/2011 | CN101128774B Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter |
| 07/20/2011 | CN101111803B Positive dry film photoresist and composition for preparing the same |
| 07/20/2011 | CN101038444B System and method for moving a component, lithographic apparatus and device manufacturing method |
| 07/19/2011 | USRE42556 Apparatus for method for immersion lithography |
| 07/19/2011 | US7982857 Stage apparatus, exposure apparatus, and exposure method with recovery device having lyophilic portion |
| 07/19/2011 | US7982851 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device |
| 07/19/2011 | US7982850 Immersion lithographic apparatus and device manufacturing method with gas supply |
| 07/19/2011 | US7982312 Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning |
| 07/19/2011 | US7982189 Spectrometer for fluid analysis |
| 07/19/2011 | US7982000 Composition comprising various proteorhodopsins and/or bacteriorhodopsins and use thereof |
| 07/19/2011 | US7981985 Polymer and chemically amplified resist composition comprising the same |
| 07/19/2011 | US7981824 For optical device; pure quartz bland doped with titanium or fluorine; trasmitting radiation in wavelength of 15 mn; obtained by flame hydrolysis; homogenizing |
| 07/19/2011 | US7981814 Replication and transfer of microstructures and nanostructures |
| 07/19/2011 | US7981595 Reduced pitch multiple exposure process |
| 07/19/2011 | US7981594 Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same |
| 07/19/2011 | US7981592 Double patterning method |
| 07/19/2011 | US7981591 Semiconductor buried grating fabrication method |
| 07/19/2011 | US7981590 Method for producing a base material for screen printing, and base material of this type |
| 07/19/2011 | US7981589 Fluorinated monomer, fluorinated polymer, resist composition and patterning process |
| 07/19/2011 | US7981577 Microfiltration of dye, photopolymerization initiator and free radical polymerizable monomers prior to patterning exposure through mask; suppressing generation of minute contaminates; smooth, uniform thickness |
| 07/19/2011 | CA2439696C Method and apparatus for texturing a metal sheet or strip |
| 07/14/2011 | WO2011084288A1 Selective diffractive optical element and a system including the same |
| 07/14/2011 | WO2011083872A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film |
| 07/14/2011 | WO2011083724A1 Liquid-immersion member, exposing device, exposing method, and device manufacturing method |
| 07/14/2011 | WO2011083554A1 Polyamide or polyimide resin compositions that contain phosphine oxide, and cured products thereof |
| 07/14/2011 | WO2011083411A1 Image projection apparatus and method |
| 07/14/2011 | WO2011082872A1 Optical element having a plurality of reflective facet elements |
| 07/14/2011 | WO2011062812A3 Magnification control for lithographic imaging system |
| 07/14/2011 | WO2011062296A3 Exposure apparatus, exposing method, and device fabricating method |
| 07/14/2011 | WO2011061501A3 Methanofullerene derivatives, photoresist composition containing it and method for forming a resist layer |
| 07/14/2011 | WO2011034728A3 Laser ablation tooling via distributed patterned masks |
| 07/14/2011 | WO2011031123A3 Isocyanurate compound for forming organic anti-reflective layer and composition including same |
| 07/14/2011 | WO2011025305A3 Novel polyamic acid, polyimide, photosensitive resin composition comprising same, and dry film produced from the composition |
| 07/14/2011 | WO2010147241A3 Exposure apparatus and device manufacturing method |
| 07/14/2011 | WO2010147240A3 Exposure apparatus and device manufacturing method |
| 07/14/2011 | US20110172349 Photosensitive insulating resin composition, cured product thereof and aba block copolymer |
| 07/14/2011 | US20110172110 Tracers and assembly for labeling chemical or biological molecules methods and kits using the same |
| 07/14/2011 | US20110171586 Resist processing method |
| 07/14/2011 | US20110171585 Photolithography Method |